Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates

Lamellae forming diblock copolymer domains can be directed to assemble without defects and in registration with chemically nanopatterned substrates. Initially, thin films of the lamellar poly(styrene-b-methyl methacrylate) block copolymer form hexagonally close-packed styrene domains when annealed on chemical nanopatterned striped surfaces. These styrene domains then coalesce to form linear styrene domains that are not fully registered with the underlying chemical surface pattern. Defects coarsen, until defect-free directed assembly is obtained, by breaking linear styrene domains and reforming new structures until registered lamellae have been formed. At all stages in the process, two factors play an important role in the observed degree of registration of the block copolymer domains as a function of annealing time: the interfacial energy between the blocks of the copolymer and the chemically nanopatterned substrate and the commensurability of the bulk repeat period of the block copolymer and the substrate pattern period. Insight into the time-dependent three-dimensional behavior of the block copolymer structures is gained from single chain in mean field simulations. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 3444–3459, 2005     

Contact instability of thin elastic films on patterned substrates

The free surface of a soft elastic film becomes unstable and forms an isotropic labyrinth pattern when a rigid flat plate is brought into adhesive contact with the film. These patterns have a characteristic wavelength, lambda approximately 3H, where H is the film thickness. We show that these random structures can be ordered, modulated, and aligned by depositing the elastic film (cross-linked polydimethylsiloxane) on a patterned substrate and by bringing the free surface of the film in increasing adhesive contact with a flat stamp. Interestingly, the influence of the substrate "bleeds" through the film to its free surface. It becomes possible to generate complex two-dimensional ordered structures such as an array of femtoliter beakers even by using a simple one-dimensional stripe patterned substrate when the instability wavelength, lambda approximately 3H, nearly matches the substrate pattern periodicity. The free surface morphology is modulated in situ by merely varying the stamp-surface separation distance. The free surface structures originating from the elastic contact instability can also be made permanent by the UV-ozone induced oxidation and stiffening.     

Simulated annealing study of asymmetric diblock copolymer thin films

We report a simulated annealing study of the morphology of asymmetric diblock copolymer thin films confined between two homogeneous and identical surfaces. We have focused on copolymers that form a gyroidal morphology in the bulk. The morphological dependence of the confined films on the film thickness and the surface-polymer interaction has been systematically investigated. From the simulations it is found that much richer morphologies can form for the gyroid-forming asymmetric diblock copolymer thin films, in contrast to the lamella-forming symmetric and cylinder-forming asymmetric diblock copolymer films. Multiple morphological transitions induced by changing the film thickness and polymer-surface interactions are observed.     

Morphologies in solvent-annealed thin films of symmetric diblock copolymer

We have systematically studied the thin film morphologies of symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer after annealing to solvents with varying selectivity. Upon neutral solvent vapor annealing, terraced morphology is observed without any lateral structures on the surfaces. When using PS-selective solvent annealing, the film exhibits macroscopically flat with a disordered micellar structure. While PMMA-selective solvent annealing leads to the dewetting of the film with fractal-like holes, with highly ordered nanoscale depressions in the region of undewetted films. In addition, when decreasing the swelling degree of the film in the case of PMMA-selective solvent annealing, hills and valleys are observed with the coexistence of highly ordered nanoscale spheres and stripes on the surface, in contrast to the case of higher swelling degree. The differences are explained qualitatively on the basis of polymer-solvent interaction parameters of the different components.     

Solvent-induced novel morphologies in diblock copolymer blend thin films

We report the morphology and phase behaviors of blend thin films containing two polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with different blending compositions induced by a selective solvent for the PMMA block, which were studied by transmission electron microscopy (TEM). The neat asymmetric PS-b-PMMA diblock copolymers employed in this study, respectively coded as a1 and a2, have similar molecular weights but different volume fractions of PS block (fPS=0.273 and 0.722). Another symmetric PS-b-PMMA diblock copolymer, coded as s, which has a PS block length similar to that of a1, was also used. For the asymmetric a1/a2 blend thin films, circular multilayered structures were formed. For the asymmetric a1/symmetric s blend thin films, inverted phases with PMMA as the dispersed domains were observed, when the weight fraction of s was less than 50%. The origins of the morphology formation in the blend thin films via solvent treatment are discussed. Combined with the theoretical prediction by Birshtein et al. (Polymer 1992, 33, 2750), we interpret the formation of these special microstructures as due to the packing frustration induced by the difference in block lengths and the preferential interactions between the solvent and PMMA block. Results obtained here suggest that diblock copolymer blend thin films treated with a selective solvent offer an alternative and attractive approach to control the self-organization of polymers.     

Surface-induced morphologies in thin films of a rod-coil diblock copolymer

A block copolymer containing a rodlike block is studied for its adsorption and formation of nanostructured thin films on the substrate surface. The block copolymer is poly(styrene-b-3-triethoxysilylpropylisocyanate) (PS-b-PIC) of which the PIC chain consists of repeating amide units with triethoxysilyl side groups. As the copolymer chains are adsorbed onto silica surfaces, the PIC blocks pack laterally on the plane in a smectic manner, and the PS chains segregate along the ordered PIC chains, resulting in stripe patterns. The width of the stripes formed on the silica surface appeared to be much larger that on the carbon surface. This was accounted for by the bilayered smectic packing of the rod blocks that is induced by rod-surface attractive interaction. The periodicity of the stripe pattern on the carbon surface indicates that interdigitated packing is preferred by the copolymers on the hydrophobic surface in a manner similar to those in the bulk state of rod-coils. Excess rod-coils on the bilayered smectic layer resulted in a terraced morphology due to large difference in the periodicity between the bilayered smectic layer at the substrate surface and the interdigitated smectic layer in the bulk.     

Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces

The fabrication of nanoporous templates from poly(styrene)-b-poly(methyl methacrylate) diblock copolymer thin films (PS-b-PMMA, volume ratio 70:30) on silicon requires precise control of interfacial energies to achieve a perpendicular orientation of the PMMA cylindrical microdomains relative to the substrate. To provide a simple, rapid, yet tunable approach for surface neutralization, we investigated the self-assembled ordering of PS-b-PMMA diblock copolymer thin films on silicon substrates modified with a partial monolayer of octadecyldimethyl chlorosilane (ODMS), i.e., a layer of ODMS with a grafting density less than the maximum possible monolayer surface coverage. We demonstrate herein the fabrication of nanoporous PS templates from annealed PS-b-PMMA diblock copolymer thin films on these partial ODMS SAMs.     

Wetting films on chemically patterned surfaces

The behavior of thin wetting films on chemically patterned surfaces was investigated. The patterning was performed by means of imprinting of micro-grid on methylated glass surface with UV-light (λ=184.8 nm). Thus imprinted image of the grid contained hydrophilic cells and hydrophobic bars on the glass surface. For this aim three different patterns of grids were utilized with small, medium and large size of cells. The experiment showed that the drainage of the wetting aqueous films was not affected by the type of surface patterning. However, after film rupturing in the cases of small and medium cells of the patterned grid the liquid from the wetting film underwent fast self-organization in form of regularly ordered droplets covering completely the cells of the grid. The droplets reduced significantly their size upon time due to evaporation. In the cases of the largest cell grid, a wet spot on the place of the imprinted grid was formed after film rupturing. This wet spot disassembled slowly in time. In addition, formation of a periodical zigzag three-phase contact line (TPCL) was observed. This is a first study from the planned series of studies on this topic.     

Structural evolution of cylindrical‐phase diblock copolymer thin films

We have measured the time evolution of the self‐assembly process in perpendicular‐oriented cylindrical‐phase diblock copolymer thin films using statistical analysis of high‐resolution scanning electron microscope (SEM) images. Within minutes of annealing above the polymer glass‐transition temperature, microphase separation between polymer blocks results in formation of uniform nanometer‐scale domains whose relative position is initially largely uncorrelated. On further annealing, the cylindrical polymer domains organize into a two‐dimensional hexagonal lattice whose characteristic grain size increases slowly with time (～t^1/4). © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1970–1975, 2004     

Nanopatterning of substrates by self-assembly in supramolecular block copolymer monolayer films

Many technological applications require templates with nanoscale patterns.Block copolymer self-assembly is a method of choice for obtaining a large variety of such patterns,with greatest flexibility achieved when combined with a supramolecular approach.One of the ways to fabricate block copolymer templates is the Langmuir-Blodgett (LB) technique.Here,we briefly summarize recent work with LB films of polystyrene-poly(4-vinyl pyridine) (PS-P4VP) mixed with 3-n-pentade cylphenol (PDP),illustrating the different types of patterns possible and the principles governing them.One interesting pattern that can be easily achieved with this system is the so-called nanostrand network,which,when used as a template for gold deposition,can produce double striped lines of gold.Here,we show how this pattern can be modified by acetone swelling to give rise to gold monolayer ribbons with internal structure.The results also suggest new insights into the early stages of morphology formation at the air/water interface.     

Block copolymer films on patterned surfaces

We present results from a numerical study of a coarse-grained model of diblock copolymer (BCP) thin films cast on a chemically patterned surface. The patterned surface contains chemical inhomogeneities with a repeat spacing length scale comparable to the linear size of the BCP molecules. We find that the orientation of the lamellae in the thin film and the overlap of the film morphology with the preassigned surface pattern is strongly influenced by the commensurability between the bulk unconstrained lamellar size λ^*, and the linear size of the surface inhomogeneities w. PACS Numbers: 64.60.Cn, 61.41.+e, 64.60.My, 64.75.+g. © 1998 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 36: 3127–3136, 1998     

Directed self-assembly of two kinds of nanoparticles utilizing monolayer films of diblock copolymer micelles

We demonstrated a self-assembly of two different kinds of nanoparticles simultaneously directed on a monolayer film of diblock copolymer micelles via physical and chemical arrangements. We first incorporated gold nanoparticles physically around the micelles of a monolayer film of PS-PVP micelles having a short-range hexagonal order. Iron oxide nanoparticles were then synthesized chemically in the PVP core area of the ordered micelles, resulting in a mosaic nanopattern of magnetic iron oxide nanoparticles surrounded by metallic gold nanoparticles. Thus, we were able to direct two kinds of nanoparticles to self-assemble in the specific positions as an example of controlled fabrication of nanometer-sized building blocks.     

Simple fabrication of patterned gold nanoparticle arrays on functionalized block copolymer thin films

Patterned arrays of gold nanoparticles were fabricated using a simple dipping method that makes use of their specific interactions with nano-domains of carboxylic acid on a block copolymer template. Polystyrene-block-poly(tert-butyl acrylate) on the SU-8 photoresist pattern was selectively transformed to polystyrene-block-poly(acrylic acid). Au nanoparticles are selectively immobilized on the resulting carboxylic acid patterns to produce well-defined patterned Au nanoparticle arrays. This stable and robust template can be used to obtain any patterned nonaggregated metal or inorganic nanoparticle arrays.     

Atomic force microscopy investigation of asymmetric diblock copolymer morphologies in thin films

Microphase separation and the resulting morphology of asymmetric diblock copolymers of poly(ε-caprolactone) (PCL) in thin films have been investigated by atomic force microscopy. Copolymers consisted of a short block of PCL (M_n∼2500-4500 g/mole) and a longer second block of poly(methyl methacrylate) (PMMA), poly(styrene) (PS) or poly(cyclohexene oxide) (PCHO). Tendency for microphase separation above the glass transition temperature of the second block (PMMA, PS or PCHO) resulted in a pitted morphology on the surface of the thin films. This tendency was strongest for PMMA and weakest for PCHO. The presence of up to 54% PMMA homopolymer in PCL-PMMA block copolymer did not prevent the formation of such pitted morphology on the surface. The effect of the chemical structure of the second block and the possible orientations of the block copolymer molecules in thin films are discussed.     

Surface and bulk ordering in thin films of a symmetrical diblock copolymer

Amphiphilic diblock copolymers have the ability to adapt their surface's molecular composition to the hydrophilicity of their environment. In the case of about equal volume fractions of the two polymer blocks, the bulk of these polymers is known to develop a laminar ordering. We report here our investigation of the relationship between bulk ordering and surface morphology/chemical composition in thin films of such an amphiphilic diblock copolymer. Upon annealing in vacuum, the expected lamella ordering in the bulk of the film is observed and we find the morphology of the film surface to be defined by the thickness of the as‐deposited film: If the as‐deposited thickness matches the height of a lamella stack, then the film exhibits a smooth surface. Otherwise, an incomplete lamella forms at the film surface. We show that the coverage of this incomplete layer can be quantified by X‐ray reflectivity. To establish the lamella ordering in the bulk, the film needs to be annealed above the glass temperature of the two blocks. Molecular segregation at the film surface, however, is already occurring at temperatures well below the glass temperature of the two blocks. This indicates that below the glass temperature of the blocks the bulk of the thin film is “frozen,” whereas the polymer chains composing the surface lamella have an increased mobility. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys., 2013 , 51, 1282–1287     

Ellipsometry as a probe of crystallization kinetics in thin diblock copolymer films

We present results on the use of ellipsometry as a novel probe for the crystallization kinetics in thin films of a diblock copolymer. Ellipsometry makes use of the change in polarization induced upon the reflection of light from a film-covered substrate to enable the calculation of the refractive index and thickness of the film. The information obtained with these measurements can be compared with information from differential scanning calorimetry, with the additional advantages that small sample volumes and slow cooling rates can be employed and that expansion coefficients can be determined. By studying the temperature dependence of these quantities, we are able to measure the crystallization kinetics within very small volumes (∼10⁻¹⁰ L) of a poly(butadiene-b-ethylene oxide) diblock copolymer. Through a comparison of two different poly (ethylene oxide) block lengths, we demonstrate a reduction in both the crystallization and melting temperatures as the domain volume is reduced. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 44: 3448–3452, 2006     

Effect of ionic impurities on the electric field alignment of diblock copolymer thin films

In Forschung hast Du immer zu mir gesagt, Schaffe etwas!. Mein Chef, ich habe immer versucht Deinen Befehlen zu folgen. Ich widme Dir diese Veröffentlichung. Mensch, mit fünf und siebzig bist Du noch jung, schön Geburtstag!The effect of ionic impurities on the electric field alignment of lamellar microdomains in polystyrene-block-poly(methyl methacrylate) diblock copolymer thin films was studied using transmission electron microscopy (TEM) and atomic force microscopy (AFM). At lithium ion concentrations greater than ~210 ppm, the microdomain morphology in block copolymers could be aligned in the direction of an applied electric field, regardless of the strength of interfacial interactions. Complete alignment of the copolymer microdomains, even those adjacent to the polymer/substrate interface, occurred by a pathway where the applied electric field enhanced fluctuations at the interfaces of the microdomains with a wavelength comparable to L_o, the equilibrium period of the copolymer. This enhancement in the fluctuations led to a disruption of the lamellar microdomains into smaller microdomains ~L_o in size, that, in time, reconnected to form microdomains oriented in the direction of the applied field.     

Solvent-induced microphase separation in diblock copolymer thin films with reversibly switchable morphology

We have studied the surface morphology of symmetric poly(styrene)-block-poly(methyl methacrylate) diblock copolymer thin films after solvent vapor treatment selective for poly(methyl methacrylate). Highly ordered nanoscale depressions or striped morphologies are obtained by varying the solvent annealing time. The resulting nanostructured films turn out to be sensitive to the surrounding medium, that is, their morphologies and surface properties can be reversibly switchable upon exposure to different block-selective solvents.     

Preparation of long-range ordered nanostructures in semicrystalline diblock copolymer thin films using micromolding

Long-range ordered nanostructures are prepared in the poly(styrene)-block-poly(ε-caprolactone) diblock copolymer thin films using micromolding. We evaluated the change in crystallinity based on grazing-incidence X-ray diffraction and proved that the crystallinity increased with the decrease of the mold size. This means that ordered nanostructures with atomic length scale order can be adjusted by tuning the mesoscale confinement. The inherent mechanism was the cooperation of geometric confinement, microphase structure and surface-induced ordering of PS-b-PCL in the melt, which paved the way for the subsequent crystal growth. These findings establish a route to promote the cost-effective nanofabrication by combining the mature microfabrication technique with the emerging directed self-assembly of block copolymers.