Threading dislocation densities in semiconductor crystals: A geometric approach

In this Letter, we introduce a geometric model to explain the origin of the observed shallow levels in semiconductors threaded by a dislocation density. We show that a uniform distribution of screw dislocations acts as an effective uniform magnetic field which yields bound states for a spin-half quantum particle, even in the presence of a repulsive Coulomb-like potential. This introduces energy levels within the band gap, increasing the carrier concentration in the region threaded by the dislocation density and adding additional recombination paths other than the near band-edge recombination.     

Strain induced deep electronic states around threading dislocations in GaN

Combining through-focus high-resolution transmission electron microscopy and hierarchical multiscale simulations consisting of density-functional theory, analytical empirical potentials, and continuum elastic theory we demonstrate the existence of a new dislocation type in GaN. In contrast with all previously identified or suggested dislocation structures in GaN, all core atoms are fully coordinated; i.e., no broken bonds occur, implying that the dislocation should be electrically inactive. However, as we show, the giant local strain-field around the dislocation core, in combination with the small lattice constant of GaN, causes deep defect states and thus electrically active edge dislocations independent on the specific core structure.     

Electronic states at dislocations and metal silicide precipitates in?crystalline silicon and their role in?solar cell materials

Predominant dislocation types in solar silicon are dissociated into 30°- and 90°-partials with reconstructed cores. Besides shallow 1D-band localized in their strain field and a quasi-2D band at the stacking fault connecting the two partials, the existence of several intrinsic core defects with deep lying levels has been demonstrated by electron spin resonance. The majority of core defects occur in nonequilibrium situations and, with the exception of a small EPR-signal assigned to a reconstruction defect, vanish after careful annealing above 800°C. There is good evidence now that part of deep levels observed in dislocated silicon is associated with impurities, especially with transition metal impurities. Electron-hole-pair recombination at a dislocation mainly runs via its shallow bands and is strongly increased by impurities bound to its core or in the strain field. The concentration of these impurities can be reduced by gettering processes to such a low level that radiative recombination at dislocations yields a luminescence efficiency of 0.1% at room temperature. A quite coherent picture has emerged for metal impurity precipitation in silicon. Early stages of precipitation in defect-free silicon are characterised by kinetically selected metastable defects forming as a result of large chemical driving forces for precipitation. Such defects are associated with deep level spectra which show the properties of extended multielectron defects. The evolution of the system to energetically more favourable configurations proceeds via ordinary particle coarsening but also via internal ripening, a process reminiscent of the above-mentioned metastable defects. Electronically, the defects evolve into metal-like inclusions which in general seem to act as strong recombination centers for minority carriers. In the presence of dislocations metastable defects quickly transform into equilibrium structures in the course of precipitation or do not form at all. In the presence of several metal impurities silicide precipitates which can be described as solid solutions of the respective metal atoms are observed, which is at least qualitatively in accord with ternary phase diagrams. Like single-metal silicide precipitates, strong minority carrier recombination is also typical for those multi-metal silicide particles.     

Strain analysis of misfit dislocations in α-Fe2O3/α-Al2O3 heterostructure interface by geometric phase analysis

The α-Fe₂O₃/α-Al₂O₃ heterostructure interfaces have been studied using transmission electron microscopy (TEM). The interface exhibited coherent regions separated by equally spaced misfit dislocations. The misfit dislocations were demonstrated to be edge dislocations with dislocation spacing of ∼4 nm. The strain fields around the misfit dislocation core were mapped using a combination of geometric phase analysis and high-resolution transmission electron microscopy images. The strain measurement results were compared with the Peierls–Nabarro dislocation model and the Foreman dislocation model. These comparisons show that the Foreman model (a = 2) is the most appropriate theoretical model to describe the strain fields of the dislocation core.     

p—HgCdTe反型层中子能带电子的基态能量

用变分自洽方法求解了ｐ－ＨｇＣｄＴｅ金属－绝缘体－半导体（ＭＩＳ）结构Ｎ型反型层子能带的基态能量Ｅ０及其与表面电子浓度的关系。计算中考虑了窄禁带半导体Ｈｇ１－ｘＣｄｘＴｅ带间相互作用所引起的非抛物带结构、波函数平均效应、共振缺陷态、Ｚｅｎｅｒ隧穿、以及电场在屏蔽长度内的衰减等因素，导出了子能带基态能量Ｅ０的计算公式并获得了与实验符合较好的结果。     

p-HgCdTe反型层中子能带电子的基态能量

用变分自洽方法求解了ｐ－ＨｇＣｄＴｅ金属－绝缘体－半导体（ＭＩＳ）结构Ｎ型反型层子能带的基态能量Ｅ₀及其与表面电子浓度的关系，计算中考虑了窄禁带半导体Hg_1-xCd_xTe带间相互作用所引起的非抛物带结构、波函数平均效应、共振缺陷态、Ｚｅｎｅｒ隧穿、以及电场在屏蔽长度内的衰减等因素，导出了子能带基态能量Ｅ₀的计算公式并获得了与实验符合较好的结果。     

Role of oxygen at screw dislocations in GaN

Here we report the first direct atomic scale experimental observations of oxygen segregation to screw dislocations in GaN using correlated techniques in the scanning transmission electron microscope. The amount of oxygen present in each of the three distinct types of screw dislocation core is found to depend on the evolution and structure of the core, and thus gives rise to a varying concentration of localized states in the band gap. Contrary to previous theoretical predictions, the substitution of oxygen for nitrogen is observed to extend over many monolayers for the open core dislocation.     

中波HgCdTe双色红外探测器优化模拟计算

针对光伏型中波HgCdTe双色红外探测器作了优化模拟计算，器件采用典型n-p-p-p-n结构和同时工作模式，建立的二维模型考虑了辐射复合、俄歇复合和Shockley-Read-Hall(SRH)复合三种复合机理，以及深能级辅助隧穿和带间直接隧穿效应，载流子穿过阻挡层势垒的隧道效应采用传递矩阵法计算.分析了双色器件光谱响应随吸收区SRH复合少子(电子)寿命的变化关系，以及串音与阻挡层组分的关系.模拟结果显示，随吸收区少子寿命变短，量子效率迅速下降；为了使器件有较高的量子效率，HgCdTe材料的SRH复合电子寿命应该至少在10ns以上.随阻挡层组分增大，势垒增高，串音迅速减小，大约在阻挡层组分差为0.03时下降到光学串音决定的稳定值，得出了抑制电学串音，阻挡层组分差的临界值为0.03. 关键词： HgCdTe中波双色红外探测器 光谱响应 光谱串音 少子寿命     

The influence of atomic steps on the photoelectric properties of clean cleaved silicon as derived from the surface photovoltage

The correlation of structural and electrical properties of clean silicon surfaces cleaved in UHV was investigated quantitatively by the surface photovoltage, using light with an energy larger than the band gap of silicon. The surface photovoltage, which is a function of band bending and recombination probability, depends strongly on the appearance of atomic steps. The additional surface states vary with density and crystallographic orientation of the steps as well as with adsorption of oxygen. The experimental facts can be explained by accepting a shift of the Fermi level at the surface towards the valence band due to edge atoms. By measuring the change of sign of the surface photovoltage of crystals with various dopings an exponential temperature dependence of the ratio of the recombination probabilities r_v/r_c for transitions from and into the Surface states has been derived.     

位错芯区扩散引起的非线性滞弹性内耗峰

若干年来,我们对于出现在Al-Cu和Al-Mg系中的表现正常和反常振幅效应的坐落在室温附近的内耗峰进行了系统研究,测得的激活能接近于溶质原子在位错管道中扩散的激活能，从而认为内耗峰的基本过程是溶质原子在隹错芯内的扩散，并且提出了根据位错弯结模型的物理图像。在70年代，Windler-Gniewek等根据弦模型对于位错芯内的扩散进行了理论计算，推导出描述内耗行为的数学表达式与我们的实验结果有许多相似之处。本文对于弦模型和弯结模型进行了对比，分析了位错芯内的纵向扩散和横向扩散所引起的内耗的非线性表现以及内耗峰温和峰高随着应变振幅和测量温度而变化的情况，进一步了我们发现的室温非线性内耗峰（非线性滞弹性内耗）是由于溶质原子在位错芯内扩散所引起的。 关键词：     

Electronic structure of the CuBS2 crystal

The band structure and spectra of the total and projected densities of states of a new crystal of the chalcopyrite family, namely, CuBS₂, have been calculated in terms of the density functional theory. It has been found that the crystal is a pseudo-direct-band-gap semiconductor, and the best theoretical estimate of the optical band gap is 3.44 eV. The upper valence band of the CuBS₂ crystal basically consists of the contributions from the p states of S atoms and the d states of Cu atoms. The crystal splitting is 0.2 eV. The bottom of the conduction band is basically formed by the sp states of boron and sulfur atoms with an admixture of the s states of copper atoms.     

Triple-period partial misfit dislocations at the InN/GaN (0001) interface: A new dislocation core structure for III-N materials

The lattice-misfit InN/GaN (0001) interface supports a triangular network of α-core 90° partial misfit dislocations. These misfit dislocations provide excellent strain relief. However, in their unreconstructed form the dislocation contains numerous high-energy N dangling bonds, which must be eliminated by reconstructing the dislocation core. Existing single-period (SP) and double-period (DP) dislocation reconstruction models eliminate these dangling bonds via a like-atom dimerization, such as N-N dimers. However, we show that these N–N dimers are unstable for the III-N materials, so an entirely new reconstruction mechanism is needed. A “triple-period” (TP) structural model is developed which eliminates N dangling bonds via the formation of N vacancies instead of N-N dimers. The model contains no N–N (or III–III) bonds, fully bonds all N atoms to four group-III neighboring atoms, and satisfies the “electron counting rule” by transferring charge from In dangling bonds to Ga dangling bonds.     

Theory of surface chemical reactivity

Fundamental reactivity concepts of relevance to the reactivity of transition metal surfaces are reviewed using elementary quantum-chemical concepts. The Newns-Anderson tight binding model of chemisorption is presented and subsequently used to outline the electronic structure characteristics of weak versus strong chemisorption. Fundamental concepts such as electron localization and surface complex embedding energies are defined and used to help explain surface reactivity. The emphasis here is on establishing an understanding of the surface chemical bond as a function of adatom coordination number, degree of coordinative unsaturation of the surface atoms and electron occupation of the d-type valence electron band. We derive from formal chemisorption theory the important relationships that exist between measured chemisorption properties and the average position of the d-valence electron band. The Newns-Anderson model is also used to show the relationship that exists between the d-band center and the coordinative unsaturation of the metal surface atoms. The general conclusion is that for Group VIII metals the shift of the average energy of the surface local density of states correlates with the strength of the interaction of the surface atoms with the metal atoms next to the surface layer. The same model is then used to analyze the Shustorovich bond order conservation model. The BOC or its modern version UBI-QEP is found to be consistent with a surface interaction potential comprised of a two-body repulsive term along with a constant attractive interaction independent of the number of coordinating atoms. The concepts of weak and strong chemisorption provide a very good basis for the subsequent analysis of the Brønsted-Eyring-Polanyi (BEP) relation. The extreme values of the BEP proportionality constant are related to the concept of loose and tight transition states. This proportionality constant between transition state energy and reaction energy can be expressed in parameters from the Newns-Anderson model by identifying loose transition states with intermediates in which the bond to be activated has not yet been broken, whereas in tight transition states this bond can be considered to be broken. We conclude the paper with an analysis of surface reconstruction. The power of the surface-molecule complex view of chemisorption will be quite apparent. The paper has an extensive introductory section to relate the topics of the four sections that follow with important classical catalytic notions.     

第一性原理研究四元Heusler合金TiZrCoIn (100) 的表面结构、磁性及自旋极化率

本文利用第一性原理计算方法,对具有半金属性的四元Heusler合金TiZrCoIn两个不同终端表面效应进行了理论研究,主要针对表面效应对其结构、磁性、电子结构、自旋极化率及半金属性的影响来展开调研,以便寻求适合于隧道结的表面材料,为后续相关理论研究及实验提供一定参考。研究结果显示,两终端表面不同原子分别发生了不同程度的伸缩,同层原子发生错位,致使表面原子间距改变,进而改变它们之间的杂化作用,同时也影响着原子的磁矩。另外通过分析其态密度,发现TiCo-(100)和ZrIn-(100)两个终端表面由于受到表面效应的影响,其电子结构发生了很大的改变。块体TiZrCoIn原有的宽带隙和半金属性被表面态所破坏,但仍然保留着很高的自旋极化率,尤其是ZrIn-(100)终端表面,其费米面处呈现几乎100%的自旋极化率。     

Morphology of single Shockley-type stacking faults generated by recombination enhanced dislocation glide in 4H–SiC

Morphology of single Shockley-type stacking faults (SFs) generated by recombination enhanced dislocation glide (REDG) in 4H–SiC are discussed and analysed. A complete set of the 12 different dissociated states of basal-plane dislocation loops is obtained using the crystallographic space group operations. From this set, six different double rhombic-shaped SFs are derived. These tables indicate the rules that connect shapes of SFs with the locations of partial dislocations having different core structures, the positions of slip planes in a unit cell, and the Burgers vectors of partial dislocations. We applied these tables for the analysis of SFs generated by the REDG effect reported in the past articles. Shapes, growing process of SFs and perfect dislocations for origins of SFs were well analysed systematically.     

Can vacancies lubricate dislocation motion in aluminum?

The interaction of vacancy with dislocations in Al is studied using the semidiscrete variational Peierls-Nabarro model with ab initio determined gamma surface. For the first time, we confirm theoretically the so-called vacancy lubrication effect on dislocation motion in Al, a discovery that can settle a long-standing controversy in dislocation theory for fcc metals. We provide insights into the lubrication effect by exploring the connection between dislocation mobility and its core width. We predict an increased dislocation splitting in the presence of vacancy. We find that on average there is a weak repulsion between vacancies and dislocations which is independent of dislocation character.     

Experimental evidence of dislocation related shallow states in p-type Si

Theory, models, and experimental phenomena provide evidence of the existence of shallow bands in silicon induced by the dislocation strain field. Nevertheless, only deep bands, likely associated with contamination at dislocations, have been detected up to now by junction spectroscopy. Here we present the first experimental result by junction spectroscopy that assesses the existence of the dislocation related shallow states. These are found to be located at 70 and 60 meV from the valence and conduction band edge, respectively.     

Cluster methods to study the electronic structure of condensed matter

Multiple scattering techniques have been used to study the electronic states (core and continuum states) of condensed matter. The electronic density of states, total energies, charge and spin densities are computed self consistently. The electronic and magnetic properties of the materials are evaluated from this results. The model material is a finite cluster of atoms immersed in the spherical average potential of the rest of the system. The electronic states are then either core states or continuum states. Examples in which the wave functions are given molecular boundary conditions far from the cluster of atoms are also presented.     

Non-singular descriptions of dislocation cores: a hybrid ab initio continuum approach

The core structure of straight and curved dislocations is studied by developing a hybrid approach that links the parametric dislocation dynamics method with ab initio calculations. The approach is an extension of the Peierls–Nabarro (PN) model, with the following features: (1) all three components of the displacement vector for atoms within the dislocation core are included; (2) the entire generalized stacking fault energy surface (GSFS) obtained from ab initio calculations is utilized; and (3) the method is generalized to treat curved dislocations. We combine the parametric dislocation dynamics (DD) approach for the interaction and motion of dislocations with ab initio calculations of lattice restoring forces. These forces, which are extracted from the GSFS (γ-surface), are calculated from both first-principles density functional theory (DFT) and the embedded-atom method (EAM). Dislocation core structures in aluminium and silver are determined. For straight dislocations, the results from the model are shown to be in excellent agreement with experiments for both Al and Ag. In contrast to undissociated dislocation loops in Al, it is found that the core width and the separations between partials in Ag vary along the angular direction measured with respect to the Burgers vector. It is also shown that the core-cutoff radius, which is usually employed in DD calculations to avoid singularities, must be adjusted as a function of loop size to account for the correct dislocation core energy.