Photoluminescence measurements in Be-δ-doped back-gated quantum well

We measured the photoluminescence (PL) spectra of a two-dimensional electron system induced in a Be-δ-doped GaAs/AlGaAs quantum well (QW) with a back gate. The electron density is controlled by means of the back-gate voltage. We estimated the electron density using the magneto-optical method and the PL linewidth, and also by undertaking transport measurements. We show that a uniform 2DES as large as 1 mm² is induced by the back-gate operation from 2.5 × 10¹⁰ cm⁻². This experiment indicates that optical measurement with a back-gated QW is advantageous for studying the low-density 2DES.     

Effects of donor density and temperature on electron systems in AlGaN/AlN/GaN and AlGaN/GaN structures

It was reported by Shen et al that the two-dimensional electron gas (2DEG) in an AlGaN/AlN/GaN structure showed high density and improved mobility compared with an AlGaN/GaN structure, but the potential of the AlGaN/AlN/GaN structure needs further exploration. By the self-consistent solving of one-dimensional Schr\"{o}dinger--Poisson equations, theoretical investigation is carried out about the effects of donor density (0--1\times 10¹⁹cm^-3 and temperature (50--500K) on the electron systems in the AlGaN/AlN/GaN and AlGaN/GaN structures. It is found that in the former structure, since the effective \Delta E_c is larger, the efficiency with which the 2DEG absorbs the electrons originating from donor ionization is higher, the resistance to parallel conduction is stronger, and the deterioration of 2DEG mobility is slower as the donor density rises. When temperature rises, the three-dimensional properties of the whole electron system become prominent for both of the structures, but the stability of 2DEG is higher in the former structure, which is also ascribed to the larger effective \Delta E_c. The Capacitance--Voltage (C-V) carrier density profiles at different temperatures are measured for two Schottky diodes on the considered heterostructure samples separately, showing obviously different 2DEG densities. And the temperature-dependent tendency of the experimental curves agrees well with our calculations.     

高电子迁移率晶格匹配InAlN/GaN材料研究

文章基于蓝宝石衬底采用脉冲金属有机物化学气相淀积(MOCVD)法生长的高迁移率InAlN/GaN材料,其霍尔迁移率在室温和77 K下分别达到949和2032 cm²/Vs,材料中形成了二维电子气(2DEG). 进一步引入1.2 nm的AlN界面插入层形成InAlN/AlN/GaN结构,则霍尔迁移率在室温和77 K下分别上升到1437和5308 cm²/Vs. 分析样品的X射线衍射、原子力显微镜测试结果以及脉冲MOCVD生长方法的特点,发现InAlN/GaN材料的结晶质量较高,与GaN晶格匹配的InAlN材料具有平滑的表面和界面. InAlN/GaN和InAlN/AlN/GaN材料形成高迁移率特性的主要原因归结为形成了密度相对较低(1.6×10¹³-1.8×10¹³ cm^-2)的2DEG,高质量的InAlN晶体降低了组分不均匀分布引起的合金无序散射,以及2DEG所在界面的粗糙度较小,削弱了界面粗糙度散射. 关键词： InAlN/GaN 脉冲金属有机物化学气相淀积 二维电子气 迁移率     

AlGaN/GaN heterostructure-based surface acoustic wave-structures for chemical sensors

We present a new approach in forming of interdigital surface acoustic wave-structures on AlGaN/GaN heterostructure to be applied in chemical sensors technology. This approach uses a selective self-aligned SF₆ plasma treatment of the AlGaN/GaN barrier layer to modify 2DEG density and surface field distribution in the range of interdigital transducers (IDTs) thus enabling SAW excitation. Secondary ion mass spectroscopy was applied to explain the modification of 2DEG density in the plasma treated AlGaN/GaN heterostructure. The initial results in the process technology and characterization are presented.     

Laterally patterned high mobility two-dimensional electron gases obtained by overgrowth of focused ion beam implanted Al1−xGaxAs

The use of focused ion beam implantation doping of an inverted GaAs/Al_1−xGa_xAs heterostructure during a growth interruption allows for the lateral modulation of the heterostructure doping. Hence, laterally patterned two dimensional electron gases (2DEGs) are obtained with no further processing steps required. We have performed the direct writing of a 2DEG with a Hall-bar pattern, such that only the application of ohmic contacts was necessary and the sample surface remained unharmed otherwise. The 2DEG has an electron density of 3.6×10¹¹ cm⁻² and an electron mobility of 4.8×10⁵ cm²/V s, as determined by magnetotransport measurements. A conventional mesa-etched Hall-bar with almost identical electronic properties has also been studied. Different behaviour of the longitudinal as well as the transversal magnetoresistance for the two Hall-bars is observed and can be concluded to be due to a different confinement potential.     

Optically induced gate voltage spectroscopy in a GaAs/AlGaAs heterostructure

We report on measurements of optically induced gate voltage spectroscopy in a GaAs/AlGaAs heterostructure with a high mobility 2-dimensional electron gas (2DEG) in a thin (55 nm) GaAs layer. The optically induced gate voltage between the front gate and the 2DEG is sensitive to excess electron concentrations below 10⁷ cm⁻². In the gate voltage spectrum we observe a peak below the bandgap energy of GaAs, which is not observed in the photocurrent, luminescence or excitation spectra. Due to the extremely high sensitivity of this technique we attribute this below bandgap signal to very weak absorption lines below the GaAs bandgap energy by impurity bands or defect absorption. The fall-off of the below bandgap signal varies as exp (hω/E₀), where E₀ is an indicative for the quality of the heterostructure.     

Scattering mechanisms in (Al, Ga)As/GaAs 2DEG structures

We have prepared a large number of high mobility two-dimensional electron gas (2DEG) structures, with undoped spacer thicknesses ranging from 9 to 3200Å. For samples with 400Å of (Al, Ga)As Si-doped at 1.3×10¹⁸ cm⁻³, there is a peak in the 4K mobility at spacers of 400–800Å, with a maximum value of 2×10⁶ cm² V⁻¹ s⁻¹. Increasing the thickness of the doped (Al, Ga)As to 500Å produced an increase in mobility to 3×10⁶ cm² V⁻¹ s⁻¹ for a 400Å space sample. We have compared these results with published analyses of scattering processes in 2DEG structures, and conclude that a combination of ionised impurity and acoustic phonon scattering gives a qualitative explanation of the behaviour, but that the experimental mobility values are generally higher than those predicted theoretically.     

Magnetotransport properties of two-dimensional electron gas in AlGaN/AlN/GaN heterostructures

Magnetotransport measurements are carried out on the AlGaN/AlN/GaN in an SiC heterostructure, which demonstrates the existence of the high-quality two-dimensional electron gas (2DGE) at the AlN/GaN interface. While the carrier concentration reaches 1.32 × 10¹³ cm ^{- 2} and stays relatively unchanged with the decreasing temperature, the mobility of the 2DEG increases to 1.21 × 10⁴ cm²/(V·s) at 2 K. The Shubnikov—de Haas (SdH) oscillations are observed in a magnetic field as low as 2.5 T at 2 K. By the measurements and the analyses of the temperature-dependent SdH oscillations, the effective mass of the 2DEG is determined. The ratio of the transport lifetime to the quantum scattering time is 9 in our sample, indicating that small-angle scattering is predominant.     

用逆压电极化模型对AlGaN/GaN 高电子迁移率晶体管电流崩塌现象的研究

通过自洽求解一维Poisson-Schrdinger方程,模拟了AlGaN/GaN高电子迁移率晶体管在工作时等效外电场对AlGaN/GaN异质结沟道处二维电子气(2DEG)浓度的影响.分析了逆压电极化效应的作用,从正-逆压电极化现象出发,提出了逆压电极化模型.计算结果显示：逆压电极化明显影响2DEG性质,当Al组分x=0.3,AlGaN层厚度为20 nm时,不考虑逆压电极化,2DEG浓度为1.53×10¹³cm^-2;当等效外电压分别为10和15V 关键词： AlGaN/GaN高电子迁移率晶体管 Poisson-Schrdinger方程 逆压电极化模型 电流崩塌     

Electric gating of the multichannel conduction in LaAlO_3/SrTiO_3 superlattices

The electric gating on the transport properties of two-dimensional electron gas(2DEG) at the interface of LaAlO₃/SrTiO₃(LAO/STO) heterostructure has attracted great research interest due to its potential application in fieldeffect devices. Most of previous works of gate effect were focused on the LAO/STO heterostructure containing only one conductive interface. Here, we systematically investigated the gate effect on high-quality LAO/STO superlattices(SLs)fabricated on the TiO₂-terminated(001) STO substrates. In addition to the good metallicity of all SLs, we found that there are two types of charge carriers, the majority carriers and the minority carriers, coexisting in the SLs. The sheet resistance of the SLs with a fixed thickness of the LAO layer increases monotonically as the thickness of the STO layer increases. This is derived from the dependence of the minority carrier density on the thickness of STO. Unlike the LAO/STO heterostructure in which minority and majority carriers are simultaneously modulated by the gate effect, the minority carriers in the SLs can be tuned more significantly by the electric gating while the density of majority carriers is almost invariable. Thus, we consider that the minority carriers may mainly exist in the first interface near the STO substrate that is more sensitive to the back-gate voltage, and the majority carriers exist in the post-deposited STO layers. The SL structure provides the space separation for the multichannel conduction in the 2 DEG, which opens an avenue for the design of field-effect devices based on LAO/STO heterostructure.     

Field emission graphene–oxide–silicon field effect based photodetector

Silicon‐based devices keep moving into smaller dimension for improving the speed, efficiency, and low‐power consumption. Novel designed semiconductor device architectures are needed to overcome the physical limitations. An integration of well‐designed nanostructure and nanomaterials can potentially establish new principles and approaches to nanoelectronic and photonic devices. We herein demonstrate a graphene/SiO₂/p‐Si (GOS) heterostructure with an embedded nanoscale mesa, forming a GOS‐Mesa field‐effect photodetector. The proposed structure exhibits that multiple exciton generation (MEG) can occur in a quantum‐confined two‐dimensional electron gas (2DEG) region via impact ionization, leading to high internal quantum efficiency (η_IQE). The numerical simulation of the carrier multiplication (CM) factor in our designed structure finds a reasonable agreement with empirical data. Simulated and measured internal quantum efficiency demonstrate ～195% and ～135% of UV–Vis radiation, respectively. A vertically confined 2DEG plays an important role not only in enabling the electron emission process which is responsible for the flowing of electron current, but also in developing a highly localized electric field (up to ～10⁶ V/cm) at the SiO₂/Si interface, enabling an impact ionization process under photon energy of merely ～1.95 eV. Our findings demonstrate that carrier multiplication can be achieved in a suitably designed nanoscale structure in conjunction with nanomaterial on silicon‐based devices, providing incentive to better understand MEG within quantum wells in 2DEG systems, and being a research path to enhancing the efficiency of future solar harvesting technologies. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Two-dimensional electron gas densities in AlGaN/AlN/GaN heterostructures

The dependence of two-dimensional electron gas (2DEG) density and distribution in an Al_xGa_1-xN/AlN/GaN heterostructure on the thicknesses of the Al_xGa_1-xN barrier layer and the AlN interfacial layer are investigated theoretically. A competitive contribution of the AlGaN and AlN layers to the 2DEG density is revealed. For an AlN interfacial layer thinner than a critical value d_cAlN, the 2DEG density is dominated by the AlGaN barrier and the 2DEG density increases with the increase of the AlGaN barrier thickness, as in the case of a simple AlGaN/GaN heterostructure. While the AlN interfacial layer will take the dominant contribution to the 2DEG density as its thickness exceeds d_cAlN. In this case, the increase of AlGaN barrier layer thickness leads to the decrease of the 2DEG density. Detailed calculations show that the critical AlN thickness increases with the increase of Al content in the AlGaN barrier. PACS 85.30.De; 73.40.Kp; 02.60.Cb     

Anomalous thermal field emission

The field emissivity of ZrO₂/W(100) nanoheterostructures made by applying a thin (≈10 nm) ZrO₂ layer on the surface of a needle-like W(100) microcrystal is studied. At a nanoheterostructure temperature of ≈2000 K, electron emission is found to start at a low extracting (Laplace) field (below 50 V/μm). Under the conditions of steady electron emission, the emission current density from the surface of the heterostructure may reach anomalously high values (～10⁸ A/cm²). A phenomenological model of anomalous thermal field emission of electrons from the surface of the conductor (metal)-thin insulator heterostructure is suggested.     

N极性GaN/AlGaN异质结二维电子气模拟

通过自洽求解薛定谔方程和泊松方程,较系统地研究了GaN沟道层、AlGaN背势垒层、Si掺杂和AlN插入层对N极性GaN/AlGaN异质结中二维电子气(2DEG)的影响,分析表明,GaN沟道层厚度、AlGaN背势垒层厚度及Al组分变大都能一定程度上提高二维电子气面密度,AlGaN背势垒层的厚度和Al组分变大也可提高二维电子气限阈性,且不同的Si掺杂形式对二维电子气的影响也有差异,而AlN插入层在提高器件二维电子气面密度、限阈性等方面表现都较为突出,在模拟中GaN沟道层厚度小于5nm时无法形成二维电子气,超过20nm后二维电子气面密度趋于饱和,而AlGaN背势垒厚度超过40nm后二维电子气也有饱和趋势,对均匀掺杂和delta掺杂而言AlGaN背势垒层Si掺杂浓度超过5×10~(19)cm~(-3)后2DEG面密度开始饱和,而厚度为2nmAlN插入层的引入会使2DEG面密度从无AlN插入层时的0.93×10~(13)cm~(-2)提高到1.17×10~(13)cm~(-2)。     

Single electron charging effects in semiconductor quantum dots

We have studied charging effects in a lateral split-gate quantum dot defined by metal gates in the two dimensional electron gas (2 DEG) of a GaAs/AlGaAs heterostructure. The gate structure allows an independent control of the conductances of the two tunnel barriers separating the quantum dot from the two 2 DEG leads, and enables us to vary the number of electrons that are localized in the dot. We have measured Coulomb oscillations in the conductance and the Coulomb staircase in current-voltage characteristics and studied their dependence on the conductances of the tunnel barriers. We show experimentally that at zero magnetic field charging effects start to affect the transport properties when both barrier conductances are smaller than the first quantized conductance value of a point contact at 2e ²/h. The experiments are described by a simple model in terms of electrochemical potentials, which includes both the discreteness of the electron charge and the quantum energy states due to confinement.     

Effect of polarization roughness scattering (PRS) on two-dimensional electron transport of MgZnO/ZnO heterostructures

Quantum transport properties of two-dimensional electron gas (2DEG) in undoped MgZnO/ZnO heterostructures with polarization charge effect have been investigated theoretically. Polarization roughness scattering (PRS) combining polarization charge and interface roughness scattering was proposed as a new scattering mechanism. It was found that the carriers confined in the heterostructures (HSs) would be scattered from polarization charges when they were moving along the in-plane and PRS played a very important role for the low-temperature electron mobility when the electron density N_s exceeded 1.0e11 cm⁻², especially in a higher electron density region. With PRS, the experimental data on the density dependence of 2DEG mobility in the MgZnO/ZnO HSs under study can be well reproduced. The study indicates that the improved processing techniques providing a smooth interface and a good separation between the 2DEG electrons and the polarization charges should be significant for the quantum device’s performance.     

调制掺杂GaAs/N-AlGaAs异质结的制备及输运性质

本文报道利用垂直束源式的分子束外延设备,生长了高质量的调制掺杂GaAs/N-AIGaAs异质结构,液氦温度下的二维电子迁移率达4.26×10⁵cm²/V·s(非光照)、5.9×10⁵cm²/V·S(光照)。用脉冲磁场下的磁声子共振测量,得到了二维电子的有效质量,并研究了异质结构中二维电子的低场迁移率增强特性及低温强磁场下的量子霍耳效应。 关键词：     

超强磁场下非掺杂ZnSe/BeTe Ⅱ型量子阱中激子和带电激子的光学特性

报道了液态氦温度(4.2 K)下非掺杂ZnSe/BeTe Ⅱ型量子结构中ZnSe势阱层内空间直接光致发光(PL)光谱的磁场依赖性(磁场高达53 T).实验结果显示,随着磁场的增加,激子和带电激子的PL强度呈现出相反的振动行为.当激子的PL强度增加时带电激子的PL强度减小,反之,当激子的强度减小时带电激子的强度却增加.并且在整个磁场范围内,这些振动呈现近似等间隔的周期性变化.这个行为被解释为费米能级与朗道能级的周期性共振,这个共振导致了处于费米能级上的二维电子气态密度的周期性调制. 关键词： 光致发光 二维电子气 带电激子 Ⅱ型量子阱     

调制掺杂GaAs/AlGaAs 2DEG材料持久光电导及子带电子特性研究

在掺Si的GaAs/AlGaAs二维电子气(2DEG)结构中，得到μ_2K=1.78×10^{6cm2/(V·s)的高迁移率.在低温(2K)和高磁场(6T)的条件下，对样品进行红 光辐照，观察到持久光电导(PPC)效应，电子浓度在光照后显著增加.通过整数量子霍尔效应 (IQHE)和Shubnikov-de Haas (SdH)振荡的测量，研究了2DEG的子带电子特性.样品在低温光 照后2DEG中第一子带和第二子带的电子浓度同时随电子总浓度的增加而增加；而且电子迁移 率也明显提高.同时，通过整数霍尔平台的宽度对光照前后电子的量子寿命变短现象作了理 论分析. 关键词： 二维电子气 量子霍尔效应 SdH振荡 持久光电导效应}     

The effects of GaN capping layer thickness on two-dimensional electron mobility in GaN/AlGaN/GaN heterostructures

In this paper we present a study of the effect of GaN capping layer thickness on the two-dimensional (2D)-electron mobility and the two-dimensional electron gas (2DEG) sheet density which is formed near the AlGaN barrier/buffer GaN layer. This study is undertaken using a fully numerical calculation for GaN/Al_xGa_1−xN/GaN heterostructures with different Al mole fraction in the Al_xGa_1−xN barrier, and for various values of barrier layer thickness. The results of our analysis clearly indicate that increasing the GaN capping layer thickness leads to a decrease in the 2DEG density. Furthermore, it is found that the room-temperature 2D-electron mobility reaches a maximum value of approximately 1.8×10³ cm² /Vs⁻¹ for GaN capping layer thickness grater than 100 Å with an Al_0.32Ga_0.68N barrier layer of 200 Å thick. In contrast, for same structure, the 2DEG density decreases monotonically with GaN capping layer thickness, and eventually saturates at approximately 6×10¹² cm⁻² for capping layer thickness greater than 500 Å. A comparison between our calculated results with published experimental data is shown to be in good agreement for GaN capping layers up to 500 Å thickness.