Reduction of grown-in dislocation density in Ge Czochralski-grown from the B2O3-partially-covered melt

Germanium (Ge) single crystals with an extremely low density of grown-in dislocations were grown by the Czochralski (CZ) technique with boron oxide (B₂O₃) liquid. Because attachment of particles floating on the melt surface to a growing Ge crystal leads to generation of dislocations during the growth, partial covering of the Ge melt surface with B₂O₃ liquid was attempted. Such attachment of particles was drastically suppressed or the particles were caught by the introduction of B₂O₃ liquid, and a particle-free Ge melt was realized in the central region of the melt surface. Ge single crystals were successfully grown from such melt, the grown-in dislocation density being 0–1×10³ cm⁻², which was remarkably lower than that in Ge crystals grown by a conventional CZ technique. The contaminations by B and O atoms of the grown crystal detected by SIMS analysis were very low. These Ge crystals have the potential for application to be applied as high-quality, dislocation-free substrates of GaAs solar cells for various usages including in space.     

Effects of the Crystal Diameter on the Dislocation Density in KCl Crystals Grown by the Czochralski Method

The dependence of dislocation density on the crystal diameter of the Czochralski grown KCl crystals (both pure and Sr doped) was investigated by the method of the etch pit and X-ray topograph. (1) The dislocation density drastically decreased with the decrease in diameter (D) for small D (D < 2 mm, Fig. 2). (2) The dislocation density in the Sr doped crystal was lower than that of pure component in the diameter examined. (3) Many helical dislocations and dislocation loops were observed in the thin crystals (D ∼ 0.5 mm) of the pure KCl and Sr doped one, respectively, by X-ray projection topography. These results were discussed in connection with the dislocation generation mechanisms due to thermal stresses or supersaturated point defects.     

Investigations for the improvement of the radial doping homogeneity of dislocation-free floating zone silicon crystals

In order to improve the doping inhomogeneities of dislocation free FZ Silicon crystals with diameters ≧ 75 mm investigations were carried out to influence the shape and curvature of the crystallization interface during the crucible-free floating zone crystal growth process. In this works shapes and geometries of the applied melting inductors and the relative positions of these inductors to the seed axis were examined concerning the values of radial macroscopic and microscopic doping inhomogeneities in dependence on other growth parameters, for instance crystal rotation rate. The application of eccentric inductor-seed positions effects a decreasing “bending value” of the crystallization interface, that means an improvement of the macroscopic radial doping inhomogeneity with crystal rotation rate in the range between 4 and 8 min⁻¹.     

Propagation behavior of threading dislocations during physical vapor transport growth of silicon carbide (SiC) single crystals

The dislocation formation and propagation processes in physical vapor transport (PVT) grown 4H silicon carbide (4H–SiC) single crystals have been investigated using defect selective etching and transmission electron microscopy (TEM). It was found that while the growth initiation process generally increased the density of threading dislocations in the grown crystal, for certain areas of the crystal, threading dislocations were terminated at the growth initiation. Foreign polytype inclusions also introduced a high density of dislocations at the polytype boundary. In the polytype-transformed areas of the crystal, almost no medium size hexagonal etch pits due to threading screw dislocations were observed, indicating that the foreign polytype inclusions had ceased the propagation of threading screw dislocations. Based on these results, we argued the formation and propagation of the threading dislocations in PVT grown SiC crystals, and proposed the dislocation conversion process as a plausible cause of the density reduction of threading dislocations during the PVT growth of SiC single crystals.     

System of Mathematical Models for the Analysis of Industrial FZ-Si-Crystal Growth Processes

A system of coupled mathematical models and the corresponding program package is developed to study the interface shape, heat transfer, thermal stresses, fluid flow as well as the transient dopant segregation in the floating zone (FZ) growth of large silicon crystals (diameter more than 100mm) grown by the needle-eye technique. The floating zone method with needle-eye technique is used to produce high-purity silicon single crystals for semiconductor devices to overcome the problems resulting from the use of crucibles. The high frequency electric current induced by the pancake induction coil, the temperature gradients and the feed/crystal rotation determine the free surface shape of the molten zone and cause the fluid motion. The quality of the growing crystal depends on the shape of the growth interface, the temperature gradients and corresponding thermal stresses in the single crystal, the fluid flow, and especially on the dopant segregation near the growth interface. From the calculated transient dopant concentration fields in the molten zone the macroscopic and microscopic resistivity distribution in the single crystal is derived. The numerical results of the resistivity distributions are compared with the resistivity distributions measured in the grown crystal.     

Growth and characterization of magneto‐optical YFeO3 crystals

The floating zone growth of magneto‐optical crystal YFeO₃ has been investigated. The polycrystalline feed rod was prepared by a pressure of 250MPa and sintering at about 1500°C. A crack‐ free YFeO₃ single crystal has been successfully grown. The crystal preferred to crystallize along <100> direction with about 10° deviation. The X‐ray rocking curve of the crystal has a FWHM of 24 arcsec, confirming the high crystal quality of the sample. The (100) plane was etched by hot phosphoric acid and the dislocation density was about 10⁴/cm². A thin outer layer with Y₂O₃‐rich composition was found at the periphery of as‐grown crystals, which was attributed to the Fe₂O₃ evaporation during growth. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Sub-boundaries on (002) cleavages of Li2CO3 single crystals

Linear arrays of dislocations (straight, terminating and curved) are observed on etching with 2% citric acid (002) cleavages of lithium carbonate (Li₂CO₃) single crystals, grown by zone melting technique. As the dislocations are non-uniformly spaced and disappear on successive etching, they may not be revealing low-angle grain boundary, nor slip traces as they are terminating and curved meaning crystallographically non-oriented. On the observation of experiments on successive etching and etching of matched pairs, it is concluded that the arrays of etch pits reveal dislocation walls (dislocation density 1.1 × 10⁶ — 1.5 × 10⁷ pits cm⁻²) probably created due to the localized thermal stresses released as a result of high temperature annealing of the crystal during growth. The implications are discussed.     

Single‐crystal sapphire microstructure for high‐resolution synchrotron X‐ray monochromators

We report on the growth and characterization of sapphire single crystals for X‐ray optics applications. Structural defects were studied by means of laboratory double‐crystal X‐ray diffractometry and white‐beam synchrotron‐radiation topography. The investigations confirmed that the main defect types are dislocations. The best quality crystal was grown using the Kyropoulos technique. Therein the dislocation density was 10²–10³ cm⁻² and a small area with approximately 2*2 mm² did not show dislocation contrast in many reflections. This crystal has suitable quality for application as a backscattering monochromator. A clear correlation between growth rate and dislocation density is observed, though growth rate is not the only parameter impacting the quality.     

Optical defects in barium—strontium niobate single crystals

The distributions of edge dislocations and residual mechanical stresses in Ba_xSr_1-xNb₂O₆ (BSN) crystals are investigated and the explanation of the nature of the “growth column” is proposed. The “growth column” is a defect zone going through all of the crystal and usually repeating in its cross-section the contour of the seed crystal. The “growth column” boundary is the closed contour with extremely high edge dislocation density. These dislocations are connected with thermal stresses due to seed-melt contact or abrupt crystal widening. Under proper crystal seeding and widening conditions one can obtain the BSN crystals with dislocation densities less than 10 cm⁻² and without the “growth column”. The method of chemico-mechanical polishing of BSN crystals not forming a defect layer on the surface of the crystals have been developed. The high temperature diffusion annealing is shown to eliminate the growth striae in BSN crystals.     

Floating zone growth and characterization of ruby single crystals

Large, high optical quality single crystals of ruby have been grown successfully by the floating zone method under air atmosphere. The size of the grown crystal is typically 60‐70 mm in length and 7‐8 mm in diameter. The obtained crystals were red and did not have any macroscopic defects such as cracks and inclusions. Grown crystals were characterized by powder X‐ray diffraction (XRD) methods, polarized optical microscopy, scanning electron microscopy (SEM). The absorption and fluorescence spectra were measured at room temperature and the dielectric constant measurements of ruby crystals were also presented. Defects occurring in single crystals of ruby during crystal growth by floating zone method are described, and their correlation with the growth parameters is discussed. The origin and control of these defects in grown crystals were studied and the optimum method was proposed. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Singular ring‐shaped distribution of Nd in NdxY1‐xVO4 crystals grown by floating zone method

A singular ring‐shaped distribution of high Nd concentration was observed in Nd‐doped YVO₄ single crystals grown by the floating zone (FZ) method. The ring‐shaped distribution appeared 500‐1000 μm inside from the rim of the crystals. Results of growth experiments by the anisotropic heating floating zone (AHFZ) method showed that the Nd concentration was high at the high‐temperature side of the grown crystals. We found a small concave projection at a part of the convex solid‐liquid interface by quenching the molten zone during growth. The cause of the singular ring‐shaped distribution of the Nd‐rich area was discussed in relation with the concave projection at the interface and the convection in the molten zone. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

TEM and X-ray investigations of defect structure of PbSnTe crystal

The Pb_0.8Sn_0.2Te single crystal grown by the Bridgman technique was examined by X-ray and TEM methods. The X-ray reflection topography revealed that the PbSnTe crystal consisted of monocrystallinic blocks with linear dimensions of 1–5 mm separated by low angle boundaries of tilt-twist character. “As grown” defects observed by TEM method have been identified as single perfect dislocations and dislocation pairs. A mean density of dislocations inside the crystal blocks was no more than 10³ cm⁻². Except “as grown” defects rows of mobile dislocations were observed. All of dislocations lines were characterized by the same type of Burgers vector, i.e. b = 1/2a〈110〉.     

The defect structure of ammonium sulphate single crystals

The defect structure of larger ammonium sulphate crystals, grown from aqueous solutions, has been studied by means of X-ray diffraction topography after Lang's method. Several types of dislocations were identified. Moreover it was found that no relationship exists between growth rate and dislocation density, which implies that crystal growth proceeds via two-dimensional nucleation. No difference was found in the defect structure of crystals grown from pure water solutions and from aqueous solutions with 10 – 20% glycerine as additive: In both cases neither growth bands nor sector boundaries were found. On the other hand, crystals grown in aqueous solutions contaminated with Mn²⁺ and Fe³⁺ revealed growth bands and for Fe³⁺ a mosaic-like structure.     

Misfit Strain Relaxation by Dislocations in InAs Islands and Layers Epitaxially Grown on (001)GaAs Substrates by MOVPE

The misfit dislocation configurations in InAs islands as well as in more or less continuous layers grown on (001) oriented GaAs substrates were studied by weak-beam and high-resolution electron microscopy. The islands are confined by {101} and {111} facets where the aspect ratio (height/lateral extension) can be affected by the growth conditions. It is possible to grow well-defined islands as well as relatively continuous layers by MOVPE under As-stabilized conditions. At constant deposition parameters the growth is characterized by islands of different sizes (but with constant aspect ratio) in various strain states depending on their dislocation content. Coherently strained islands without any dislocation can be observed for heights up to 23 ML InAs, or otherwise, up to a maximal island extension of about 12 nm (for the particular aspect ratio ≈︂0.585). With further increase of island height and lateral extension, the introduction of dislocations becomes favourable. Independent of the island size, the layer thickness and the dislocation density, a residual elastic strain of about ε^r = —0.8% remains after relaxation. This means, about 88% of the total misfit strain of ε = —6.686 × 10^—2 were compensated by Lomer dislocations. These sessile Lomer dislocations lie in the island interior only, where single 60° dislocations were observed exclusively in their near-edge regions. With increasing island size and/or layer thickness some close-spaced 60° dislocations occur additionally within the interfacial region. The Lomer dislocations that are always located 4 monolayers (ML) above the InAs/GaAs interfacial plane result from the well-known fusion of two 60° slip dislocations. These 60° dislocations have been nucleated 7 … 8 ML above the interface at surface steps on the {111} facets confining the islands. Based on our experimental observations a new mechanism is proposed that explains the origin of these 60° dislocations. Their further fusion to sessile Lomer dislocations that compensate the misfit strain most efficiently occurs in the way as commonly accepted.     

Dislocation etching of tin iodide single crystals

Single crystals of tin-iodide (SnI₂) have been grown using the controlled reaction between SnCl₂ and KI by diffusion process in gel medium. As grown (010) surfaces of the crystals have been optically studied. Characteristic etch pits have been observed on them. This suggests that SnI₂ crystals might go into dissolution in the acid-set gel. By successively etching (010) surfaces in a mixture of ammonia, acetic acid, and CdCl₂ solution, it is established that the pits indicate the site of dislocations in the crystals. This is further confirmed by comparing the etch patterns before and after chemically polishing (010) surfaces. The average dislocation density in the crystals have been evaluated and found to be 3.2 × 10³ cm⁻² and the implications are discussed.     

The influences of supersaturation on LPE growth of GaN single crystals using the Na flux method

The dependency of LPE growth rate and dislocation density on supersaturation in the growth of GaN single crystals in the Na flux was investigated. When the growth rate was low during the growth of GaN at a small value of supersaturation, the dislocation density was much lower compared with that of a substrate grown by the Metal Organic Chemical Vapor Deposition method (MOCVD). In contrast, when the growth rate of GaN was high at a large value of supersaturation, the crystal was hopper including a large number of dislocations. The relationship between the growth conditions and the crystal color in GaN single crystals grown in Na flux was also investigated. When at 800 °C the nitrogen concentration in Na–Ga melt was low, the grown crystals were always tinted black. When the nitrogen concentration at 850 °C was high, transparent crystals could be grown.     

Growth and dielectric properties of Ta2O5 single crystal by the floating zone method

Large Ta₂O₅ single crystal with high‐dielectric permittivity was successfully grown by floating zone (FZ) method under air atmosphere. The grown crystal that has been obtained was typically about 8 mm in diameter and 90 mm in length. The crystal growth parameters were optimized. The crystal symmetry, characterized by means of X‐ray diffraction (XRD), was found to be tetragonal. The relative permittivity and loss tangent along growth and [001] direction were measured in the temperature range between ‐200 °C and 200 °C, which showed a strong dielectric anisotropy. At a frequency of 1 MHz and 20 °C, the dielectric permittivity along the growth direction and [001] direction are 81.17 and 25.04 respectively. The stabilization of high‐temperature phase can explain the dielectric enhancement.     

Floating zone growth of high-quality SrTiO3 single crystals

Strontium titanate single crystals 15–20 mm in diameter and 40–80 mm in length were grown by a floating zone method with radiation heating. Additional crystal heating just below the molten zone by an in-growth annealing furnace was applied in order to lower the temperature gradients and to achieve slower cooling of the grown crystal. The crystal perfection was studied with X-ray topography and double-crystal diffractometry. The most perfect crystals were grown in [0 0 1] direction with single grain rocking curve widths of about 30″ and subgrain misorientations of 1′–3′ over 10×10 mm² areas of the boule cross-section for both (0 0 1)-, (1 1 0)- and (1 1 1)-oriented slices. Such high-quality crystal can be grown reproducibly with starting materials of 4N grade quality.     

Studies on conventional and Sankaranarayanan–Ramasamy (SR) method grown ferroelectric glycine phosphite (GPI) single crystals

Transparent single crystals of glycine phosphite were grown by Sankaranarayanan–Ramasamy (SR) method and conventional slow evaporation solution technique (SEST) which had the sizes of 100 mm in length, 30 mm diameter and 10×11×8 mm³. The conventional slow evaporation and Sankaranarayanan–Ramasamy method grown glycine phosphite single crystals were characterized using laser damage threshold, chemical etching, Vickers microhardness, UV–vis–NIR and dielectric analysis. The laser damage threshold value was higher in SR method grown GPI crystal as against conventional method grown crystal. The SR method grown GPI has higher hardness and also higher transmittance compared to conventional method grown crystal. The chemical etching and dielectric loss measurements indicate that the crystal grown by SR method has low density of defects and low value of dielectric loss compared to conventional method grown GPI crystal.     

Effects of doping of Ca and Ba on the dislocation distribution in melt grown KCl crystals

The effects of doping of Ca and Ba (∼ 0.02 at %) upon the dislocation distribution in melt grown KCl crystals without cellular segregation were studied by an etch pit method in connection with the dispersion state of the dopants, which was examined by the dark field illumination. – (1) In the Ca-doped crystal, in which the dopants were distributed uniformly, the formation of subboundaries was completely suppressed and dislocations were distributed at random. (2) In the Ba-doped crystal, however, the dopants were non-uniformly distributed and the dislocations tended to form subboundaries. The dislocations within the subgrains were distributed in a non-uniform manner. (3) The dislocation density in the Ba doped crystal was higher than that of undoped or Ca-doped crystal. This was explained by the mechanism similar to the Tiller's prediction. – Finally, the stress distribution due to the concentration fluctuation was examined by the birefringence patterns.