纳微米PZT/水泥基压电复合材料的研究

采用溶胶-凝胶法合成了锆钛酸铅(PZT)纳微米粉体.XRD与SEM分析结果表明,经700 ℃煅烧的PZT粉体的平均晶粒尺寸约为26.4 nm,粉体团聚体的平均尺寸约为200 nm.采用干压成型-水化法制备了纳微米PZT/水泥基压电复合材料,研究了复合材料的压电及介电性能.SEM结果表明,PZT陶瓷相在基体中呈网状分布.PZT颗粒之间的良好连通性使复合材料具有优良的压电性能.     

粒度对水泥基压电复合材料的压电性能和力学性能的影响

本文制备了含不同粒度锆钛酸铅(PZT)的水泥基压电复合材料.其中,PZT 压电陶瓷粉体采用球磨法制得,其平均粒度范围为 3～482 μm.研究发现,PZT 粒度对复合材料的压电、介电性能以及力学性能有重要影响.随着PZT 陶瓷相粒度的增大,复合材料的压电应变常数(d33)和介电常数(εr)升高,但复合材料的老化稳定性变差、介电损耗(tanδ)增加、弯曲强度降低.     

Pb(In1/2Nb1/2)O3-Pb(Ni1/3Nb2/3)O3-PbTiO3压电陶瓷的介电、铁电和压电性能

采用两步法制备了0.30Pb(In1/2 Nb1/2)O3-(0.70-x)Pb(Ni1/3Nb2/3)O3-xPbTiO3(PIN-PNN-PT,x=0.33,0.35,0.37,0.39)压电陶瓷.研究了PIN-PNN-PT压电陶瓷的相结构、介电、铁电和压电性能.研究表明位于准同型相界(MPB)的组分0.30PIN-0.33PNN-0.37PT具有最佳电学性能,其居里温度TC、压电系数d33、平面机电耦合系数kp、自由介电常数ε二介电损耗tanδ、剩余极化Pr、矫顽场EC分别为200℃、386 pC/N、50;、2692、0.045、34 μC/cm2、18 kV/cm.结果 显示PIN-PNN-PT三元系相比于PNN-PT有更高的居里温度,同时保持了优异的压电性能.     

极化方法对PZT-4压电陶瓷性能的影响

Pb(Zr_1-xTi_x)O₃ (PZT)由于具有优异的综合性能而成为应用最广泛的压电陶瓷。之前研究工作证明了与直流极化(DCP)和交流极化(ACP)相比,采用交流极化和直流极化相结合的方法能进一步提高弛豫铁电单晶材料的压电性能。本工作报道了直流极化、交流极化和交流极化+直流极化后PZT-4压电陶瓷的介电性能和压电性能,探究了直流极化、交流极化和交流极化+直流极化的最佳极化条件。在最佳交流极化+直流极化条件下, PZT-4 压电陶瓷的压电常数(d₃₃)为350 pC/N,相比直流极化(305 pC/N)、交流极化(320 pC/N)分别提高了15%和9%。交流极化后的PZT-4陶瓷样品的应变值(0.08%)高于进行直流极化样品的(应变值0.05%),表明交流极化可以有效提高PZT-4陶瓷的应变值,但是交流极化后应变曲线的滞后增大不利于器件应用,交流极化对硬性压电陶瓷的影响还需要进一步探讨。     

BaTiO3/Cu复合材料的制备和性能研究

以Cu为基体,100 nm的BaTiO3颗粒为增强材料,用热压烧结的方法制备了BaTiO3/Cu复合材料,对其微观结构和性能进行了研究.结果表明:当BaTiO3颗粒的加入量为5vol;时,复合材料的微观结构均匀;BaTiO3颗粒的加入量增加到10vol;时,在复合材料中有颗粒团聚体存在.BaTiO3颗粒的加入对BaTiO3/Cu复合材料的硬度影响不大,但能提高其抗弯强度.强度提高的原因是BaTiO3颗粒能阻止位错的移动.动态力学性能检测结果表明:BaTiO3/Cu复合材料的阻尼损耗因子值有较大的提高,而储存模量有较大的下降.BaTiO3颗粒的加入量为5vol;时,BaTiO3/Cu复合材料的阻尼增强效果最佳.BaTiO3/Cu复合材料的阻尼机理可能包括位错阻尼、晶界阻尼、界面阻尼、压电阻尼和压电-导电耗散机制的协同效应.     

(La0.5Sr0.5)CoO3为电极的Pb(Zr0.4Ti0.6)O3和Pb(Zr0.2Ti0.8)O3铁电电容器结构及电学性能

分别采用磁控溅射法和溶胶-凝胶法(Sol-gel)制备了(La0.5Sr0.5)CoO3(LSCO)和Pb(Zr1-xTix)O3(PZT)薄膜,在Pt(111)/Ti/SiO2/Si基片上构架了LSCO/Pb(Zr0.4Ti0.6)O3(PZT(40/60))/LSCO和LSCO/Pb(Zr0.2Ti0.8)O3(PZT(20/80))/LSCO铁电电容器,研究了两种铁电电容器的结构和性能。XRD结构分析表明:两种四方相的不同Zr/Ti比例的PZT薄膜均为结晶良好的多晶钙钛矿结构。在5 V测试电压下,LSCO/PZT(40/60)/LSCO和LSCO/PZT(20/80)/LSCO两种铁电电容器的剩余极化强度(Pr)和矫顽场(Ec)分别为:28μC/cm2和1.2 V以及32μC/cm2和2 V。相对于PZT(40/60),PZT(20/80)具有较大的剩余极化强度和矫顽场,是由于其矩形度(c/a)较大。两种电容器都具有较好的脉宽依赖性和抗疲劳性。在5 V的测试电压下,LSCO/PZT(40/60)/LSCO电容器的漏电流密度为3.2×10-5A/cm2,LSCO/PZT(20/80)/LSCO电容器的漏电流密度为3.11×10-4A/cm2,经拟合分析发现:在0～5 V的范围内,两种电容器都满足欧姆导电机制。     

溶胶电泳沉积法制备PZT压电厚膜及其性能研究

采用溶胶-凝胶方法制备Pb(Zr0.52Ti0.48)O3(PZT)纳米粉末,将此粉末按一定比例加入到同成分PZT溶胶中,采用溶胶-电泳沉积技术在ITO玻璃衬底上制备PZT厚膜.采用X射线衍射分析、SEM及HP4294A阻抗分析仪等对PZT膜进行了微观结构和介电性能测试,研究了电泳电压、热处理温度及电泳时间对PZT膜结构及膜厚的影响,结果表明,在1V电压下进行电泳,600℃热处理20min,可以得到表面均匀平整的纯钙钛矿结构PZT膜,以(110)择优取向,通过控制电泳时间可有效控制膜的厚度.获得了膜厚为30μm、介电常数达到ε33T/ε0=781、介电损耗为tanδ=0.0083、剩余极化与矫顽电场强度分别为24.6μC/cm2与61.9kV/cm铁电性能较好的PZT膜材料.     

柠檬酸盐法制备(Na0.5 Bi0.5)1-xBaxTiO3压电陶瓷的极化特性研究

采用柠檬酸盐法合成了具有单一钙钛矿结构的(Nao5Bio5)1-xBaxTiO3(x=0,x=0.04)超细粉料,并研究了陶瓷样品的极化特性、压电性能和铁电性能.研究结果表明,柠檬酸与金属离子的摩尔比(C/M)控制在1.2～1.6、前驱体液的pH值控制在7～9范围内可以得到均匀透明的溶胶和凝胶,凝胶在600℃下热处理1h后可形成单一钙钛矿结构的超细粉料.XRD研究结果表明,x=0和x=0.04时陶瓷样品均为三方钙钛矿结构.极化电压和极化温度对陶瓷样品的压电性能有很大影响,而极化时间对压电性能的影响则不显著.Ba2+的固溶改善了陶瓷样品的铁电性能,有利于材料极化性能和压电性能的提高.与常规固相法制备的同种组成样品相比,柠檬酸盐法制备的(Nao5Bi0.5)1-xBaxTiO3(x=0,x=0.04)陶瓷具有较好的压电性能.     

B位取代PZT体系的电子结构与压电特性研究

采用自洽场离散变分Xα计算方法,分别计算了Pb(Zr1/2Ti1/2)O3(简称PZT)、Pb(Zn1/3Nb2/3)O3(简称PZN)、和Pb(Mn1/3Sb2/3)O3(简称PMS)体系的电子结构,研究了钙钛矿结构与烧绿石结构陶瓷的电子结构对压电性能的影响.结果表明,PZT铁电相较顺电相稳定,O的2p轨道与B位原子的最外层d轨道的杂化是铁电性的必要条件,杂化的强弱可表明铁电性的强弱;Mn1/3Sb2/3、Zn1/3Nb2/3取代(Zr, Ti)若生成四方钙态矿结构,体系总能量降低、轨道杂化增强,可以提高PZT体系的铁电性能,若生成立方烧绿石结构,由于B-O(//轴向)与B-O(⊥轴向)共价键强度差别太大,造成体系结构的不稳定,将导致铁电性的丧失.     

Na/Bi配比对0.94(Bi0.5+xNa0.5-x)TiO3-0.06BaTiO3压电陶瓷组织结构与性能的影响

采用传统固相烧结方法制备出0.94(Ri0.5+xNa0.5-x)TiO3-0.06BaTiO3(BNBT6)二元系无铅压电陶瓷(x分别为0,0.08;,0.12;,0.16;,0.24;和0.50;摩尔分数),系统地研究了不同Na/Bi配比对BNT基陶瓷材料物相结构、显微组织和压电、介电性能的影响.结果表明:添加不同的Na/Bi,所制备的BNBT6压电陶瓷组织分布均匀、致密度高,存在三方-四方共存的准同型相界结构,且不同的Na/Bi配比不影响陶瓷的相结构,但其烧结性能及电性能与Na/Bi配比密切相关,当x=0.16;时,BNBT6陶瓷样品的性能最佳,相对密度达到97;,在1 kHz的测试频率下,BNBT6陶瓷样品的压电常数d33为138 PC/N、介电常数εr为1486、介电损耗tanδ为2.1;、机械品质因数Qm为217.     

Calculation of phase diagrams in AlxIn1−xAs/InP,AsxSb1−xAl/InP and AlxIn1−xSb/InSb nano-film systems

The models for calculation of phase diagrams of semiconductor thin films with different substrates were proposed by considering the contributions of strain energy, the self-energy of misfit dislocations and surface energy to Gibbs free energy. The phase diagrams of the Al_xIn_1−xAs and As_xSb_1−xAl thin films grown on the InP (1 0 0) substrate, and the Al_xIn_1−xSb thin films grown on the InSb (1 0 0) substrate at various thicknesses were calculated. The calculated results indicate that when the thickness of film is less than 1 μm, the strain-induced zinc-blende phase appears, the region of this phase extends with decreasing of the layer thickness, and there is small effect of surface energies of liquid and solid phases on the phase diagrams.     

Elastic properties of GexAsySe100−x−y glasses

The elastic properties of Ge_xAs_ySe_100−x−y (0x30; 10y40) glasses have been studied. The results were analyzed in terms of the dependence on the theoretical mean coordination number (mean number of covalent bonds per atom) m (m=2+(2x+y)×0.01). Three ranges of m (2.1m2.51, 2.51<m2.78, 2.78<m3) were revealed, where different dependencies of elastic moduli (Young’s modulus, shear modulus) and Poisson’s ratio of glasses on m were observed.     

Crystal growth of NdAl3(BO3)4 from K2O/MoO3/Nd2O3/B2O3/KF flux

NdAl₃(BO₃)₄ single crystals were grown by the flux method and the TSSG technique using a K₂O/3MoO₃/B₂O₃/0.5Nd₂O₃/KF flux system. Light-violet clear crystals could be obtained. The effects of fluoride on the growth of NAB crystals were investigated. As the content of KF was gradually increased, the growth form of NAB was changed from the equant to the columnar and the primary crystalline region of NAB was shrinked. At the ratio of KF/K₂O = 0.75, NAB crystals could not be grown.     

Synthesis and structure of new phases of the Am?1Bi2BmO3m+3 (m = 2) type

Three polycrystalline bismuth-containing layered perovskite-like oxides are synthesized by high-temperature solid-state reactions. One of these compounds was described previously, namely, Bi₃Ti_1.5W_0.5O₉, for which the unit cell parameters a = 5.372(5) Å, b = 5.404(4) Å, and c = 24.95(2) Å are determined in this study. The other two compounds, namely, Na_0.75Bi_2.25Nb_1.5W_0.5O₉ with the unit cell parameters a = 5.463(1) Å, b = 5.490(7) Å, and c = 24.78(0) Å and Ca_0.5Bi_2.5Ti_0.5Nb_1.5O₉ with the unit cell parameters a = b = 3.843(2) Å and c = 24.97(6) Å, are synthesized for the first time. The compositions of these compounds are based on the composition of the well-known compound Bi₃TiNbO₉ with a high Curie temperature (T _C = 1223 K), in which bismuth, niobium, and titanium atoms are partially or completely replaced by other atoms. The experimental and calculated interplanar distances determined from the X-ray diffraction patterns of the studied compounds are presented. __________ Translated from Kristallografiya, Vol. 50, No. 1, 2005, pp. 59–64. Original Russian Text Copyright ? 2005 by Geguzina, Shuvaev, Shuvaeva, Shilkina, Vlasenko.     

Digitally alloyed modulated precursor flow epitaxial growth of AlxGa1−xN layers with AlN and AlyGa1−yN monolayers

We propose a new growth scheme of digitally alloyed modulated precursor flow epitaxial growth (DA-MPEG) using metalorganic and hydride precursors for the growth of Al_xGa_1−xN layers with high-Al content at relatively low temperatures. The growth of high-quality, high-Al content Al_xGa_1−xN layers (x_Al>50%) that are composed of AlN and Al_yGa_1−yN monolayers on AlN/sapphire template/substrates by DA-MPEG was demonstrated. The overall composition of the ternary Al_xGa_1−xN material by DA-MPEG can be controlled continuously by adjusting the Column III mole fraction of the atomic Al_yGa_1−yN sub-layer. X-ray diffraction and optical transmittance results show that the AlGaN materials have good crystalline quality. The surface morphology of DA-MPEG AlGaN samples measured by atomic force microscopy are comparable to high-temperature-grown AlGaN and are free from surface features such as nano-pits.     

Vapour epitaxial growth and characterization of InAs1-xPx

The vapour growth of InAs_1-xP_x layers has been carried out by the hydride process. The phosphorus rich part of the system (0.7 ? x ? 1) was especially investigated. Heteroepitaxial deposits of InAs_1-xP_x and InP have been performed on substrates such as InAs, GaAs and GaP. A systematic study of the influence of the substrate orientation on the quality of the layer has been carried out by growth on hemispherical substrates. Preferential planes have been pointed out: (100) and (111) A for InAs, (111) for GaAs and GaP. The band gap variation as a function of the composition has been determined by photoluminescence at 4.2 °K and X-ray diffraction measurements. It fits the equation: E_G(x) eV = 0.425 + 0.722 x + 0.273 x² at 4.2 °K.     

Crystallization behaviours ofCo100−1(x+y)NbxBy amorphous alloys

The crystallization behaviours of Co_100?1(x+y)Nb_xB_y amorphous alloys were investigated by means of differential thermal analysis and a conventional X-ray diffractometer. The crystallization sequences are discussed in terms of the equilibrium phase diagram of the ternary alloy system.Assuming crystallization occurs as a result of nucleation and growth, the stabilizing effect of eutectic phase separation on the crystallization is shown by introducing the effective free energy of the critical nucleus.