Ordered growth of germanium dots induced by the strain field of tilt dislocations in molecular bonded silicon (0 0 1) thin films

Germanium dots have been grown on high twist angle (twist angle as high as 20°) molecular bonded silicon (0 0 1) substrates. We show that, depending on the thickness of the silicon film, the strain field generated by an ordered array of mixed edge interfacial tilt (miss-cut) dislocations may induce an ordered growth of germanium dots. We also show that in order to observe an influence of the mixed edge interfacial dislocations on the growth of germanium dots, the thickness of the film has to be much lower that the period of the mixed edge dislocations array. Germanium dots grown by molecular beam epitaxy on 10-15 nm thick silicon films with the period of tilt dislocation array of 43 nm show a high degree of self-ordering.     

STM study of successive Ge growth on “V”-stripe patterned Si (0 0 1) surfaces at different growth temperatures

The self-assembly process of Ge islands on patterned Si (0 0 1) substrates is investigated using scanning tunneling microscopy. The substrate patterns consist of one-dimensional stripes with “V”-shaped geometry and sidewalls inclined by an angle of 9° to the (0 0 1) surface. Onto these stripes, Ge is deposited in a step-wise manner at different temperatures from 520 °C to 650 °C. At low temperature, the Ge first grows nearly conformally over the patterned surface but at about 3 monolayers a strong surface roughening due to reconstruction of the surface ridges as well as side wall ripple formation occurs. At 600 °C, a similar roughening takes place, but Ge accumulates within the grooves such that at a critical thickness of 4.5 monolayers, 3D islands are formed at the bottom of the grooves. This accumulation process is enhanced at 650 °C growth, so that the island formation starts about 1 monolayers earlier. At 600 and 650 °C, all islands are all aligned at the bottom of the stripes, whereas at 550 °C Ge island form preferentially on top of ridges. The experimental observations are explained by the strong temperature dependence of Ge diffusion over the patterned surface.     

Ferromagnetic nature of (Ga, Cr)As epilayers revealed by magnetic circular dichroism

A systematic study of magnetic circular dichroism (MCD) was carried out in a wave length range 500-960 nm for (Ga_1−x, Cr_x)As epilayers with x=2.38% and 4.59% grown by the low temperature molecular beam epitaxy (LT-MBE) technique. Hysteresis characteristics showed up indeed in the magnetic field dependence of both MCD and magnetization measured by the superconductor quantum interference device (SQUID). The Curie temperature of the (Ga_1−x, Cr_x)As epilayer was determined to be about 12 K by the Arrott approach. The present result provides evidences that there is strong coupling of the Cr spins to the GaAs host band structure in (Ga_1−x, Cr_x)As samples. That affects the critical point of the semiconductor host, and makes the magnetization behavior in a plot of M∼B/T (magnetic field divided by temperature) substantially different from standard superparamagnetism.     

Characterization of InN epilayers grown on Si(1 1 1) substrates at various temperatures by MBE

InN films have been grown by plasma-assisted molecular beam epitaxy (PAMBE) and characterized by various technologies. It was found that the structural, optical and electrical properties can be drastically improved by raising growth temperature from 440 to 525 °C. Grainy morphology was found in the grain size was found in atomic force microscope images. The large grain size was about 360 nm for a film grown at 525 °C. These films exhibited Wurtzite structure with a c/a ratio ranging from 1.59 to 1.609. The dislocation densities estimated by X-ray diffraction techniques closely agreed with those analyzed by plan-view transmission electron microscopy. Photoluminescence (PL) studies confirmed near band-to-band transitions and the narrowest low-temperature PL peak width was found to be 24 meV at 0.666 eV. Carrier concentrations decreased from 1.44×10¹⁹ to 1.66×10¹⁸ cm⁻³ and Hall mobility increased from 226 to 946 cm² V⁻¹ s⁻¹ as the growth temperature is progressively increased from 440 to 525 °C. Raman spectra also indicated improved crystal quality as the growth temperature was raised.     

Phosphorus incorporation during InP(0 0 1) homoepitaxial growth by solid source molecular beam epitaxy

The incorporation behaviour of phosphorus (P₂) during growth by molecular beam epitaxy of InP thin films on InP(0 0 1) substrates has been studied in situ by reflection high energy electron diffraction. The incorporation coefficient of P₂ decreases from 0.94 at 360 °C to 0.54 at 470 °C. This behaviour is attributed to the increasing fraction of the incident P₂ flux that desorbs from the surface at higher temperatures and does not contribute to layer growth. The low- and temperature-dependent incorporation coefficients imply the need for high P₂:In flux ratios and low substrate temperatures for the preparation of smooth InP epitaxial layers.     

Si epitaxial growth on LaAlO3(0 0 1)

We report on the growth of Si on c(2 × 2) reconstructed LaAlO₃(0 0 1) surfaces at high substrate temperature (700 °C) by molecular beam epitaxy. An initial Volmer-Weber mode is evidenced using reflection high energy electron diffraction (RHEED), X-ray photoelectron diffraction (XPD) and atomic force microscopy. After the deposition of a few monolayers, the islands coalesce. Using X-ray photoelectron spectroscopy, we demonstrate that Si islands exhibit an abrupt interface with the LaAlO₃ substrate without formation of silicate or silica. Finally, combined RHEED and XPD measurements show the epitaxial growth of Si with a unique Si(0 0 1)//LaAlO₃(0 0 1) and Si<1 0 0>//LAO<1 1 0> relationship.     

Influence of substrate misorientation and growth temperature on N incorporation in InGaAsN/GaAs quantum wells grown on (1 1 1)B GaAs

In this work, the effects of the substrate misorientation in the nitrogen incorporation in InGaAsN (1 1 1)B p–i–n diode structures grown by molecular beam epitaxy are discussed. The (1 1 1)B surfaces misoriented towards [2–1–1] are found to be more suitable to enhance the optical quality of the samples. We also found that the nitrogen incorporation is highly dependent on the growth temperature as well as on the V–III flux ratio. In addition to this, the optical properties and crystal quality of these structures depend strongly on the nitrogen content, as in the case of similar samples grown on (1 0 0) surfaces. High nitrogen contents (up to 3%) in InGaAsN layers grown on two different misoriented (1 1 1)B GaAs substrates are reported. Besides, low-temperature photoluminescence emission wavelengths longer than 1.4 μm are achieved using (1 1 1)B misoriented substrates.     

Photoluminescence and structural properties of GaInNAs/GaAs quantum wells grown by molecular beam epitaxy under different arsenic pressures

GaInNAs/GaAs quantum wells grown by molecular beam epitaxy under different arsenic pressures have been studied using photoluminescence (PL), X-ray diffraction (XRD) and secondary-ion mass spectrometry (SIMS). The best optical properties are achieved with the V/III beam equivalent pressure ratio (V/III_BEP) of 10. The PL emission wavelength remains unchanged for 8V/III_BEP12, suggesting that within this range neither the alloy composition nor the nitrogen sticking coefficient is changed. For the lower and higher V/III_BEP ratios the PL wavelength is red-shifted or blue-shifted, respectively. The XRD results indicate that the nitrogen incorporation into the group-V sub-lattice is enhanced at low As pressures and reduced at high As pressures. The PL behaviour can thus be understood as a competition between As and N adatoms in occupying anion lattice sites.     

Morphology and photoluminescence of ultrasmall size of Ge quantum dots directly grown on Si(0 0 1) substrate

High density and ultrasmall size of Ge quantum dots (QDs) have been achieved directly on Si(0 0 1) (2 × 1) reconstruction surface. Their detailed morphology was observed by atomic force microscope (AFM) and shows that small pyramids, small domes, huts, and multi-headed large domes coexist in the film grown at 400 °C, while small domes and multi-headed large domes formed at 450 °C. Their low temperature photoluminescence (PL) showed that a very strong non-phonon (NP) peak with a large blue shift of 0.19 eV at 14 K, which can be attributed to their very high areal density, 5.2 × 10¹¹ cm⁻², and sub-10-nm mean size, 7.6 ± 2.3 nm.     

Study of post-growth annealing and Ga coverage effects in low-density GaAs/AlGaAs quantum dots grown by modified droplet epitaxy

We present a detailed analysis of the Ga coverage and of the post-growth annealing effects on the optical properties of very-low-density self-assembled GaAs/AlGaAs quantum dots grown by modified droplet epitaxy. Through theoretical calculation of the QD electronic states, including thermally activated Al–Ga interdiffusion processes, we were able to relate our spectroscopic observations to QD structural properties.     

Influence of boron on the initial stages of Si molecular beam epitaxy on Si(1 1 1) studied by reflection high-energy electron diffraction

The influence of boron as a function of coverage on molecular beam epitaxial Si growth on Si(1 1 1) surface was systematically studied by reflection high-energy electron diffraction. At boron coverage above 0.3 monolayer regular oscillations occur with a period typically for two-bilayers, whereas at lower boron coverage a transient behaviour with irregular intensity oscillations was observed in the initial growth stages. This behaviour can be attributed to a superposition of a bilayer and a two-bilayer dominated growth mode. The appearance of these two growth modes is discussed in terms of an initial surface defect-induced nucleation of bilayer-high Si islands and the formation of two-bilayers-high Si islands on top of the van der Waals like boron-covered surface, respectively. We suggest that these surface defects are of intrinsic nature, and their number only depends on the amount of boron at the surface. The oscillations become regular during further Si deposition with a bilayer period, indicating a diminishing influence of the layer/substrate interface on the growth processes.     

Chlorine chemisorption on Cu(0 0 1) by surface X-ray diffraction: Geometry and substrate relaxation

We report on the precise location of Cl atoms chemisorbed on a Cu(0 0 1) surface and the interlayer relaxations of the metal surface. Previous studies have shown that chlorine dissociates on Cu(0 0 1) to form a c(2 × 2) chemisorbed layer with Cl atoms occupying four-fold hollow sites. A Cu-Cl interlayer spacing of 1.60 Å and a slightly expanded Cu-Cu first interlayer spacing of 1.85 Å (1.807 Å for bulk Cu) was determined by LEED. The resulting Cu-Cl bond length, 2.41 Å, is very similar to the SEXAFS value of 2.37 Å. Contradictory results were obtained by angle-resolved photoemission extended fine structure: while confirming the Cu-Cl interlayer spacing of 1.60 Å, no first Cu-Cu interlayer relaxation has been observed. On the other hand, a small corrugation of the second Cu layer was pointed out. We carried out a detailed structural determination of the Cu(0 0 1)-c(2 × 2)-Cl system using surface X-ray diffraction technique with synchrotron radiation. We find a Cu-Cl interlayer spacing of 1.584(5) Å and confirm the expansion of the first Cu-Cu interlayer, with an average spacing of 1.840(5) Å. In addition, we observe a small corrugation of the second Cu layer, with Cu atoms just below Cl atoms more tightly bound to the surface layer, and even a second Cu-Cu interlayer expansion.     

Development of cross-hatch grid morphology and its effect on ordering growth of quantum dots

We investigate the development of cross-hatch grid surface morphology in growing mismatched layers and its effect on ordering growth of quantum dots (QDs). For a 60° dislocation (MD), the effective part in strain relaxation is the part with the Burgers vector parallel to the film/substrate interface within its component; so the surface stress over a MD is asymmetric. When the strained layer is relatively thin, the surface morphology is cross-hatch grid with asymmetric ridges and valleys. When the strained layer is relatively thick, the ridges become nearly symmetrical, and the dislocations and the ridges inclined-aligned. In the following growth of InAs, QDs prefer to nucleate on top of the ridges. By selecting ultra-thin In_0.15Ga_0.85As layer (50 nm) and controlling the QDs layer at just formed QDs, we obtained ordered InAs QDs.     

InAs/GaAs(0 0 1) wetting layer formation observed in situ by concurrent MBE and STM

The growth of InAs on GaAs(0 0 1) has attracted great interest and investigation over the past few decades primarily due to the opto-electronic properties of the self-assembled quantum dot (QD) arrays formed. Scanning tunnelling microscopy (STM) has been extensively employed to investigate the complicated and spontaneous mechanism of QD growth via molecular beam epitaxy (MBE). In order to access surface dynamics, MBE and STM must be performed concurrently. The system herein combines MBE functionality into an STM instrument in order to investigate wetting layer formation dynamically. The GaAs(0 0 1)-(2 × 4) starting surface undergoes 2D island growth, reconstruction change-induced roughness and re-entrant 3D island formation prior to the Stranski-Krastanow transition point.     

Photoemission study of Ag nanofilm grown on pseudomorphic fcc Fe(1 0 0)

An angle-resolved photoemission study for Ag nanofilm grown on pseudomorphic metastable-fcc-phase Fe(1 0 0) has been done in order to investigate in detail the quantized electronic structures. From the low-energy electron-diffraction and angle-resolved photoemission spectra, it is found that the present Ag nanofilms were grown in the direction of [1 1 1] on pseudomorphic fcc Fe(1 0 0) substrates. The angle-resolved photoemission spectra of Ag nanofilms grown on pseudomorphic fcc Fe(1 0 0) exhibit the features derived from Shockley-type surface state and additional fine-structures derived from the quantized state of Ag sp valence electron. The experimental nanofilm-thickness dependence of binding energies of these quantized states is compared with the theoretical calculation based on the phase accumulation model, taking into account the phase shifts of electron reflection at both interfaces of the Ag nanofilm. From these results, we discuss the quantized electronic structure in Ag nanofilm grown on pseudomorphic fcc Fe(1 0 0).     

Photoluminescence and secondary ion mass spectroscopy characterization of GaAs-AlGaAs quantum wells grown on GaAs (1 0 0) substrates with different surface treatments

GaAs (1 0 0) substrates prepared in a quartz chamber under a H₂/As₄ flux, and then exposed to air were used for the subsequent growth of GaAs-AlGaAs single quantum wells by molecular beam epitaxy. The substrates prepared by this method showed atomically flat surfaces corroborated by atomic force microscopy analysis. Quantum wells grown directly on these substrates without a GaAs buffer layer exhibited narrow and intense photoluminescence peaks, an indication of a high quality material. The secondary ion mass spectroscopy analysis showed oxygen and carbon traces on the first AlGaAs barrier layer grown after air exposure with no effects on the quantum wells optical emissions. From the results we conclude that the prepared GaAs surfaces are useful for the epitaxial growth of high quality quantum structures.     

Studies on scattering of fast H and He atoms from Fe films grown on Cu(0 0 1)

The structure of ultrathin epitaxial Fe films grown on Cu(0 0 1) at room temperature is investigated by grazing scattering of fast H and He atoms. By making use of ion beam triangulation, direct information on the atomic structure of the film and substrate surfaces are obtained. We discuss a new variant of this method based on the detection of the number of emitted electrons. The data is analyzed via computer simulations using classical mechanics which provides a quantitative analysis with respect to projectile trajectories.     

Optical anisotropy of GaNAs grown on GaAs(0 0 1) substrate

In this paper GaN_xAs_1−x surfaces during growth are observed using reflectance difference or reflectance anisotropy spectroscopy (RDS or RAS). The epi-layer was grown by solid-source molecular beam epitaxy (MBE) system with a RF nitrogen prasma source. RD spectra showed broader structure and reduced amplitude compared to those of GaAs surfaces; GaAs(2 × 4)-like features were still observed with weak and blue-shifted peaks. In the low growth temperature region, an extra structure was also observed around 3.02 eV. We proposed that GaN_xAs_1−x surface can be classified into three types of the surface.     

Structure and magnetism of bcc(1 1 0)-like Fe films grown on Cu(0 0 1) via ion beam triangulation and spin-polarized electron capture

The structure and magnetism of thin epitaxial Fe layers grown on Cu(0 0 1) is investigated by grazing scattering of fast H and He atoms. Information on the atomic structure of the film and substrate surfaces is obtained by making use of ion beam triangulation with protons. The magnetic behavior is studied via the polarization of light emitted after capture of spin-polarized electrons into excited atomic terms during scattering of He atoms. For the formation of bcc(1 1 0)-like Fe films at higher coverages, we detect differences in structural and magnetic properties for room and low temperature growth. We suggest that the crystalline structure depends on the film morphology and that Cu impurities affect the magnetic properties.