薄膜光学参数表征误差处理技术

针对光度测量数据中难以消除的系统误差对薄膜光学参数表征精度的负面影响,提出一种新型的误差处理技术。选取薄膜光谱系数对折射率和几何厚度的一阶偏导数,对大部分测量入射角满足符号相反或只有其中一个为零的条件的波段,剔除偏导数对全部测量入射角满足符号相同或同时为零条件的奇点波长附近波段,作为反演表征用的光度测量数据采集区域,以最小化光度测量系统误差引起的薄膜光学参数反演表征值相对真实值的偏差大小。通过数值模拟实验,对比研究了该技术对不同偏振光和不同测量入射角范围的适用性及实施技巧,以可复现的数值实验数据和合理的理论解释支持和验证了这种误差处理技术的可靠性。     

一种最小化薄膜光学参数表征偏差的椭偏测量系统误差处理技术

基于对椭偏测量数据中难以消除的系统误差的作用机理分析,提出了一种新型的薄膜光学参数表征误差处理技术。建议选取薄膜椭偏角关于折射率和几何厚度的一阶偏导数,对大部分测量入射角满足符号相反或只有其中一个为零的条件的波段,剔除偏导数对全部测量入射角满足符号相同或同时为零的条件的奇点波长附近波段,作为反演表征用的椭偏测量数据采集区域,以最小化椭偏测量系统误差引起的薄膜光学参数反演表征值相对真实值的偏差大小。其本质是通过一阶偏导数筛选测量数据,来最小化椭偏测量系统误差对薄膜光学参数表征的误差传递作用。通过数值模拟实验,对比研究了该技术对不同测量入射角范围的适用性及实施技巧,以可复现的数值实验数据和合理的理论解释支持和验证了这种误差处理技术的可靠性,为薄膜在线表征和镀膜监控提供了一定的参考价值。     

磁控溅射参数对NiOx薄膜光学常数的影响

采用反应性磁控溅射法制备了NiOx薄膜,并结合椭圆偏振仪、XRD和XPS研究了溅射参量对其光学常量的影响.NiOx薄膜的光学常量随着O2/Ar流量比的增大而减小;热退火后,折射率增大而消光系数下降了50%;溅射功率越大折射率也越大,而工作气压越大折射率反而越小.这些变化分别与薄膜中存在间隙O和Ni空位、NiOx分解以及NiOx薄膜的致密度有关.     

SiO2和HfO2薄膜光学性能的椭偏光谱测量

结合XRD和原子力显微镜等方法,利用椭圆偏振光谱仪测试了单层SiO2薄膜（K9基片）和单层HfO2薄膜（K9基片）的椭偏参数,并用Sellmeier模型和Cauchy模型对两种薄膜进行拟合,获得了SiO2薄膜和HfO2薄膜在300-800nm波段内的色散关系。用X射线衍射仪确定薄膜结构,并用原子力显微镜观察薄膜的微观形貌,分析表明：SiO2薄膜晶相结构呈现无定型结构,HfO2薄膜的晶相结构呈现单斜相结构;薄膜光学常数的大小和薄膜的表面形貌有关;Sellmeier和Cauchy模型较好地描述了该波段内薄膜的光学性能,并得到薄膜的折射率和消光系数等光学常数随波长的变化规律。     

一种获得半导体薄膜光学参数的方法

实现薄膜光学参数的简便测量对于薄膜的制备和应用具有重要意义。引入适用于半导体材料的Forouhi_Bloomer模型,用其表征薄膜折射率与色散的关系。考虑到粗糙度的影响,假设薄膜厚度服从正态分布,给出了模拟退火法与迭代法相结合、由可见光光谱测定薄膜光学参数的方法。作为尝试,以硅系薄膜为例进行了计算。结果表明,获得的厚度与用椭偏仪测量的结果较为吻合。该方法适用于研究和测量半导体薄膜的光学性能和膜厚,具有很高的实用价值。     

光度法确定LaF3薄膜光学常数

为了满足设计和生产多层膜系时精确确定薄膜材料光学常数的需要,建立一种基于透射率光谱包络来获取弱吸收光学薄膜光学常数的均匀模型.为消除基底背面反射对光学薄膜光谱性能测量的影响,给出一种非破坏性的薄膜光学特性校正方法,校正实测光谱数据获得光学薄膜的单面光谱,并给出确定基底光学常数的方法.研究钼舟热蒸发工艺制备的沉积在CaF...     

溅射工艺参数对AgInSbTe相变薄膜光学性质的影响

采用射频磁控溅射工艺,在K9玻璃片上用Ag-In-Sb-Te合金靶制备了相变薄膜,对沉积态薄膜在300℃下进行了热处理,测量了薄膜的光学性质。通过改变本底气压,溅射气压及溅射功率,研究了工艺参数对薄膜光学性质的影响,实验表明,本底气压,溅射气压及射功率综合决定了AgInSbTe薄膜的光学性质,对AgInSbTe薄膜的制备,选择较高的本底真空度,适当的溅射气压及溅射功率是非常重要的。     

玻璃表面层对薄膜光学参数测量的影响

利用p偏振光在镀膜平板玻璃前后表面反射光强比γ与膜层光学参数之间的密切关系,给出了玻璃表面层的光学参数分布。对典型的薄膜系统-单面镀膜与双面镀膜两种情况,理论分析了玻璃表面层对薄膜光学参数测量的影响。实验上对PMTES和SnO₂薄膜参数进行了测量,仅当计及玻璃表面层作用时,反射光强比γ的角度调制曲线才与理论拟合结果相吻合.     

膜层厚度对金属薄膜光学常数的影响

从麦克斯韦方程出发,可以得到超薄金属膜层光学常数n、k与其厚度有关系的理论依据。采用电阻热蒸发和电子束热蒸发的方法在K9玻璃基底上分别沉积了不同厚度的Cu膜、Cr膜、Ag膜,由椭偏法检测、Drude模型拟合,获得了不同厚度Cu膜、Cr膜、Ag膜光学常数n、k随波长λ的变化规律。超薄金属薄膜与块状金属的光学常数相差较大,随着薄膜厚度的增加,n、k值趋近于块状金属。通过对样品膜层吸收、色散特性的分析,发现连续金属薄膜在可见光波段对长波的吸收较大,而且相比于介质薄膜平均色散率高10mn～102nm量级。     

双轴晶体薄膜光学隧道效应

本文提出了一种研究晶体薄膜光学隧道效应的方法。我们计算了在最一般情况下双轴晶体中迅衰波的复折射率和复折射角。我们也讨论了隧道效应时晶体薄膜的反射和透射系数,找到了这些系数和薄膜光学参量的关系。这提供了用光学隧道效应检测晶体薄膜的理论基础。     

Cerium dioxide thin film optical waveguides

Cerium dioxide thin film optical waveguides were fabricated by an RF magnetron sputtering process. The films were deposited on glass substrates and on silicon dioxide layers grown on silicon substrates. Optical loss measurements for the fabricated waveguides are reported. It is seen that the volume losses in the films were fairly high compared with the surface losses.     

光学薄膜保护封闭漆

用普通光学镀膜机蒸镀的光学膜,如果暴露在大气中一经受潮,镀膜材料的折射率发生变化,其结果会令光学薄膜的中心波长产生漂移,因而影响薄膜的光学特性。如蒸镀软膜,受潮后漂移则更为严重。另外软膜表面强度差,易擦伤和脱膜。封闭漆既能有效防潮,又能改善光学薄膜表面强度,而且不影响光学薄膜的光学特性。     

利用光声效应研究ITO薄膜的光吸收率

利用基于压电效应的光声技术,研究了ITO薄膜在可见光波段的吸收特性,并与分光型光学薄膜分析系统NKD8000测得的数据进行了比较,得到了一致性较好的结果。实验证实:在可见光波段,该ITO薄膜的吸收率随波长呈非线性变化,在450nm附近吸收最强,随着波长的增加逐渐减小,在514.7nm处接近于零,之后又缓慢增大。     

System for measuring optical admittance of a thin film stack

A new method based on the polarization interferometer structure has been applied to measure the optical admittance, the refractive index and thickness of a thin film. The structure is a vibration insensitive optical system. There is one Twyman-Green interferometer part to induce a phase difference and one Fizeau interferometer part to induce the interference in the system. The intensities coming from four different polarizers were measured at the same time to prevent mechanical vibration influence. Using the polarization interferometer, the optical admittance, the refractive index and thickness of a single layer of Ta₂O₅ thin film has been measured. The measurement results were compared with the results obtained by ellipsometer. The results meet reasonable values in both refractive index and thickness.     

The accuracies of photometric, polarimetric and ellipsometric methods for the optical constants of thin films

The inherent accuracies of various techniques for determining the optical constants of thin films have been assessed by computing the errors produced in n and k by known experimental errors in the optical functions being measured. The results are presented as arrays of error parallelograms in the n–k plane covering d/λ from 0.001 to 0.20 and θ from 5° to 85°.The largest regions of accuracy, in the form of annular quadrants, were obtained using the mixed photometric and polarimetric functions at small angles of incidence. Ellipsometry gives similar results at large angles of incidence but for photometry and for polarimetry the accurate regions were in the form of two lobes.The effects of errors in x and θ were also considered.     

The effects of post-thermal annealing on the optical parameters of indium-doped ZnO thin films

Indium-doped ZnO thin films are deposited on quartz glass slides by RF magnetron sputtering at ambient temper- ature. The as-deposited films are annealed at different temperatures from 400 C to 800 C in air for 1 h. Transmittance spectra are used to determine the optical parameters and the thicknesses of the films before and after annealing using a nonlinear programming method, and the effects of the annealing temperatures on the optical parameters and the thickness are investigated. The optical band gap is determined from the absorption coefficient. The calculated results show that the film thickness and optical parameters both increase first and then decrease with increasing annealing temperature from 400 C to 800 C. The band gap of the as-deposited ZnO:In thin film is 3.28 eV, and it decreases to 3.17 eV after annealing at 400 C. Then the band gap increases from 3.17 eV to 3.23 eV with increasing annealing temperature from 400 C to 800 C.     

记录薄膜Te—In—Sb光学性质的研究

采用高频溅射方法制成Te-In-Sb系统的非晶态薄膜.系统的研究了不同组分薄膜的透射、反射谱,及其在结晶过程中的变化.用透射电镜研究了Te-In-Sb薄膜的结构和晶化过程.分析了组分对薄膜的吸收系数、介电常数、光学能隙等光学性质的影响.并由此综合评价了Te-In—Sb系统中比较适合作为光盘介质的组成.     

Ellipsometric analysis and optical absorption characterization of gallium phosphide nanoparticulate thin film

Gallium phosphide (GaP) nanoparticulate thin films were easily fabricated by colloidal suspension deposition via GaP nanoparticles dispersed in N,N-dimethylformamide. The microstructure of the film was performed by x-ray diffraction, high resolution transmission electron microscopy and field emission scanning electron microscopy. The film was further investigated by spectroscopic ellipsometry. After the model GaP+void|SiO₂ was built and an effective medium approximation was adopted, the values of the refractive index n and the extinction coefficient k were calculated for the energy range of 0.75 eV-4.0 eV using the dispersion formula in DeltaPsi2 software. The absorption coefficient of the film was calculated from its k and its energy gaps were further estimated according to the Tauc equation, which were further verified by its fluorescence spectrum measurement. The structure and optical absorption properties of the nanoparticulate films are promising for their potential applications in hybrid solar cells.