基于旋涂法和电子束蒸发法制备的V2O5/Ag/V2O5叠层透明导电薄膜

利用溶胶-凝胶技术与电子束蒸镀相结合的方法在常温下制备了叠层V₂O₅/Ag/V₂O₅（VAV）透明导电薄膜,研究了各层薄膜厚度对叠层结构光电特性的影响。用原子力显微镜、紫外-可见光分光光度计、四探针电阻仪及开尔文探针对样品的表面形貌、光电性能及功函数等性质进行了表征。实验结果表明,该薄膜具有良好的光学和电学性质,可见光（380~780 nm）平均透过率达75%,迁移率为16.89 cm²/（V·s）,载流子浓度为－1.043×10²² cm^-3,方块电阻值为15.1 Ω/□,功函数为5.17 eV。该制备方法降低了V₂O₅薄膜的工艺制备难度,为该材料在太阳能电池中的应用创造了良好的前期基础。     

基于Sb_2O_3/Ag/Sb_2O_3叠层透明导电薄膜的自组装沟道透明薄膜晶体管

首次利用Sb2O3/Ag/Sb2O3(SAS)叠层透明导电薄膜作为透明电极,并采用衍射自组装沟道的方法研制了一种透明薄膜晶体管。通过一次掩模工艺,在电子束热蒸发过程中的SAS源漏电极之间制作沟道层。SAS透明导电薄膜具有优异的光电性能。研制的透明薄膜晶体管具有良好的器件性能,其迁移率高达11.36cm2/(V·s)。整个器件在可见光范围内的平均透过率为80%。结果表明,这种透明薄膜晶体管有希望应用于低成本透明光电子产品中。     

基于ZnSe/Ag/ZnSe可见区透明导电薄膜

利用红外光学材料ZnSe和金属Ag在室温下采用电子束蒸发镀膜技术研制了透明导电薄膜ZnSe/Ag/ZnSe,该薄膜的电子浓度为1.208×1020cm-3,电子迁移率和电阻率分别为17.22 cm2 V1s-1和2.867×10-5Ω·cm,功函数达到5.13 eV,在可见区的平均透过率理论模拟值超过80％,而测量结果...     

基于ZnSe/Ag/ZnSe可见区透明导电薄膜

利用红外光学材料ZnSe和金属Ag在室温下采用电子束蒸发镀膜技术研制了透明导电薄膜ZnSe/Ag/ZnSe,该薄膜的电子浓度为1.208×1020 cm－3,电子迁移率和电阻率分别为17.22 cm2 V－1 s－1和2.867×10－5 Ω·cm,功函数达到5.13 eV,在可见区的平均透过率理论模拟值超过80%,而测量结果为63.8%,测量的最高透过率为83%.结果表明,该透明导电薄膜具有良好的光学和电学性能,可作为透明电极应用于发光二极管等光电子器件中.     

溶剂对溶胶-凝胶法制备的掺铝氧化锌透明导电薄膜性质的影响

采用溶胶-凝胶法在玻璃基底上制备得到了高透光率,高导电性的掺铝氧化锌薄膜。研究了溶剂对薄膜晶体结构,薄膜厚度,表面形貌,光学性质和电学性质的影响,结果表明:在相同的制备条件下,薄膜的厚度随溶剂沸点的升高而降低;低沸点溶剂制备的薄膜由c轴择优取向的六角纤锌矿结构的晶体构成,且比较致密;所有薄膜可见光区的透光率在85%以上;乙二醇独甲醚为溶剂制备的薄膜电阻率最低,为3.0×1-0 4Ωm。     

粉末靶制备的AZO/Ag/AZO透明导电薄膜的光电性能

室温下,采用射频磁控溅射AZO粉末靶和Ag靶在玻璃基底上制备Ag层厚度分别为12 nm和15 nm两组对称结构掺铝氧化锌/银/掺铝氧化锌(AZO/Ag/AZO)透明导电薄膜,研究了Ag层和AZO层厚度对薄膜光电性能的影响。结果表明:3层薄膜的可见光区平均透光率达到了80%,550 nm处的最高透过率达到了88%,方块电阻小于5 Ω/□。Ag层厚度是影响AZO/Ag/AZO薄膜光电性能的主要因素,AZO层的厚度对薄膜光学性能影响较大。     

磁控溅射制备本征ZnO/Ag/ZnO透明导电薄膜的性质研究

室温下采用射频磁控溅射氧化锌（ZnO）粉末靶、银（Ag）靶,在玻璃衬底上制备ZnO/Ag/ZnO透明导电薄膜。首先,ZnO厚度为30 nm时,改变Ag厚度制备3层透明导电薄膜,研究Ag层厚度及膜层间配比对光电性能的影响;其次,按ZnO∶Ag厚度比为30∶11比例制备不同厚度的3层透明导电薄膜,研究多层厚度对薄膜光电性能的影响。结果表明：Ag厚度为8 nm及11 nm的ZnO/Ag/ZnO表面相对平整,结晶程度较好,在可见光范围内最高透过率达到90%及86%,并且方块电阻为6 Ω/□及3.20 Ω/□,具有优良的光电性;当按配比制备ZnO/Ag/ZnO 3层膜时,增加ZnO厚度对Ag层的增透作用反而减弱,同时增加Ag层厚度也会降低3层薄膜的整体光学性。     

Ag/Zn共掺杂TiO2薄膜的制备及其光学性能

采用溶胶-凝胶旋涂法制备本征TiO2、Ag单掺Ag-TiO2及Ag/Zn共掺Ag/Zn-TiO2的薄膜样品.测试结果表明:所有TiO2薄膜样品的主要晶面是(101)且没有其他杂质晶面.Ag的掺杂使得样品的晶粒尺寸减小,样品的吸收边出现红移,带隙能减小,最小值为3.476 eV.与本征TiO2和Ag-TiO2相比,随着Z...     

氧氩比对SnO2/Ag/SnO2透明导电膜光电性能的影响

在室温及不同的氧氩比条件下,采用射频磁控溅射Ag层和直流磁控溅射SnO2层,在载玻片衬底上制备出了SnO2/Ag/SnO2多层薄膜.用霍尔效应测试仪、四探针电阻测试仪和紫外-可见-近红外光谱仪等表征了薄膜的电学性质和光学性质.实验结果表明:当氧氩比为1:14时,所制得的薄膜的光电性质优良指数最大,为1.69×10-2 Ω-1;此时,薄膜的电阻率为9.8×10-5Ω·cm,方电阻为9.68Ω/sq,在400～800 nm可见光区的平均光学透射率达85％;并且,在氧氩比为1:14时,利用射频磁控溅射Ag层和直流磁控溅射SnO2层在PET柔性衬底上制备出了光电性质优良的柔性透明导电膜,其在可见光区的平均光学透过率达85％以上,电阻率为1.22×10-4Ωcm,方电阻为12.05Ω/sq.     

InZnO薄膜透明导电的制备及其柔性的表征

利用激光脉冲沉积(PLD)技术在室温条件下将IZO薄膜生长在塑料衬底上,通过控制生长压强来调节薄膜的电学性质。然后对光电性质最优的薄膜进行了柔性测试,结果显示薄膜的内弯折半径小于9 mm后电阻会显著增加,对于弯折引起的电学性能的变化进行了初步的讨论。     

Formation of Li2O in a chemically Li-intercalated V2O5 xerogel

We studied the electronic structure of a chemically Li-intercalated V₂O₅ xerogel. The technique used in the study was V 2p and O 1s X-ray absorption spectroscopy (XAS). The V ions in the as-prepared V₂O₅ xerogel are mostly in a pentavalent V⁵⁺ state. The spectra show that the V ions are partially reduced to V⁴⁺ and V³⁺ states upon Li intercalation. The results also show that low Li intercalation (x<1) affects mostly O 2p–V 3d mixed states, whereas for higher Li intercalation (x>1), this mechanism saturates and leads to Li₂O formation.     

氧氩比对SnO2/Ag/SnO2透明导电膜光电性能的影响

在室温及不同的氧氩比条件下,采用射频磁控溅射Ag层和直流磁控溅射SnO₂层,在载玻片衬底上制备出了SnO₂/Ag/SnO₂多层薄膜.用霍尔效应测试仪、四探针电阻测试仪和紫外-可见-近红外光谱仪等表征了薄膜的电学性质和光学性质.实验结果表明:当氧氩比为1:14时,所制得的薄膜的光电性质优良指数最大,为1.69×10^-2 Ω^-1;此时,薄膜的电阻率为9.8×10^-5 Ω·cm,方电阻为9.68 Ω/sq,在400~800 nm可见光区的平均光学透射率达85%;并且,在氧氩比为1:14时,利用射频磁控溅射Ag层和直流磁控溅射SnO₂层在PET柔性衬底上制备出了光电性质优良的柔性透明导电膜,其在可见光区的平均光学透过率达85%以上,电阻率为1.22×10^-4 Ωcm,方电阻为12.05 Ω/sq.     

Photoelectron spectroscopic study of Li oxides on Li over-deposited V2O5 thin film surfaces

The Li oxides species formed on Li over-deposited V₂O₅ thin film surfaces have been studied by using X-ray and UV induced photoelectron spectroscopy (XPS and UPS). The photoelectron spectroscopic data show that the Li over-deposited V₂O₅ system itself is not stable. Further chemical decomposition reactions are taken place even under UHV conditions and lead to form Li₂O and Li₂O₂ compounds on the surface. The formation of Li₂O₂ causes to arise an emission line at about 11.3 eV in the valence band spectra.     

Modeling catalytic reduction of NO by ammonia over V2O5

Preservation of the natural environment and therefore elimination of pollutants has become a major concern in the present world. NO_x is efficiently removed from the gas exhausts produced by fixed plants by the selective catalytic reduction processes where NO_x is reduced by ammonia. Despite the wide use of this process, many aspects concerning the reaction mechanism are still poorly understood. The reaction is very exothermic but requires a catalyst. Here we report the present status of the proposed mechanisms for the selective catalytic reduction of NO by ammonia on V₂O₅/titania catalyst. The discussion is centered on the last decade and focuses on new theoretical findings in the field. We provide ab initio calculations based on cluster and periodic models to analyze the adsorption of the reactants in reduced, oxidized and stoichiometric surfaces, assuming dry and wet conditions, to evaluate the intermediates proposed in the literature. Several conditions are settled to propose an active catalyst. Coadsorption is investigated and in dry conditions quasi spontaneous reaction is obtained on an oxidized catalyst when the model includes NO and NH₃ and is allowed easy hydration-dehydration processes. We conclude that adsorption of reactants takes place on reactive O sites provided by the catalyst, V₂O₅ dispersed on TiO₂–anatase phase. Dispersion is essential to generate reactive O atoms necessary for a good catalytic activity. Finally, we propose a new pathway to proceed in oxidizing conditions. Results are compared to recent theoretical calculations and to experimental data.     

Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors

The effects of annealing on structure and laser-induced damage threshold (LIDT) of Ta₂O₅/SiO₂ dielectric mirrors were investigated. Ta₂O₅/SiO₂ multilayer was prepared by ion beam sputtering (IBS), then annealed in air under the temperature from 100 to 400 °C. Microstructure of the samples was characterized by X-ray diffraction (XRD). Absorption of the multilayer was measured by surface thermal lensing (STL) technique. The laser-induced damage threshold was assessed using 1064 nm free pulsed laser at a pulse length of 220 μs.

It was found that the center wavelength shifted to long wavelength gradually as the annealing temperature increased, and kept its non-crystalline structure even after annealing. The absorbance of the reflectors decreased after annealing. A remarkable increase of the laser-induced damage threshold was found when the annealing temperature was above 250 °C.     

The structure of AgI-Ag2O-V2O5 glasses

Structures of 10AgI-3Ag₂O-2V₂O₅, 3AgI-3Ag₂O---2V₂O₅ and 2AgI---2Ag₂O-V₂O₅ glasses have been investigated by neutron diffraction experiments. The characteristic features of observed structure factors S(Q) in 10AgI-3Ag₂O-2V₂O₅ glass is similar to those of other superionic conducting glasses and molten AgI. From the standpoint of the pair distribution functions, it is clarified that the Ag-I and I-I correlation strength and Ag---Ag correlation length increase with increasing AgI concentration. Observed results suggest that the local AgI structure accompanied by the re-arrangement of silver ions is formed with highly doped iodide ions.     

Lu2O3∶Eu3+纳米粉末及透明陶瓷的制备及其发光性能

采用共沉淀法和溶剂热法制备了Lu2O3∶Eu3+纳米粉体,通过X射线衍射谱、傅里叶变换红外光谱和扫描电镜照片,比较了两种方法制备的Lu2O3∶Eu3+粉末的微观结构,测量和比较合成粉体的激发与发射光谱.将获得的Lu2O3∶Eu3+煅烧粉体在不使用任何添加剂的情况下,干压成型制成素坯,先在真空中1100℃煅烧5h,氮气氛...