Photo‐hardenable and patternable PDMS/SU‐8 hybrid functional material: A smart substrate for flexible systems

The fabrication of flexible electronics and systems, using rigid and brittle materials directly produced on stretchable substrate, leads to some issues and incompatibilities. These include rigidity for processing and modular flexibility for applications, macroscopic flexibility, and local rigidity to shield components from strain, compatibility with technological steps, and at the same time allowing patterning and machining. The development of smart substrate materials which meet such needs is therefore a promising route for flexible systems. Here, we demonstrate that by mixing polydimethylsiloxane (PDMS) and SU‐8 photoresist, we obtain both a photo‐hardenable and patternable stretchable hybrid material. A set of PDMS/SU‐8 and baking process combinations have been tested to determine an effective photo‐sensitive mixture. A standard photolithographic approach has been used on tensile test samples demonstrating a local hardening of millimeter‐sized ultraviolet exposed features and a local strain reduction reaching 35%. In addition, surface topography analysis and wet‐etching techniques have been used to demonstrate a light‐induced molding process and a selective etching of micrometer‐sized ultraviolet exposed patterns. The combined functional properties of the following material, its simplicity of implementation, and the well‐known assets of PDMS and SU‐8 make the PDMS/SU‐8 material very interesting and promising for various applications, especially stretchable systems. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 1281–1291     

基于水滴模板法的微纳复合超疏水结构制备的研究

利用粒子辅助水滴模板法的实施获得规则蜂窝状图案化多孔结构模板,并进一步利用聚二甲基硅氧烷(PDMS)复制转移技术获得表面具有微米尺寸蜂窝状突起阵列的反向图案化结构.以这种图案化突起结构作为微米尺寸所提供的微米级粗糙度为基础,设计了2种的简单的二次纳米结构的引入过程,最终实现了微米级阵列和纳米级粗糙度的复合.第一种方法借助银镜反应来实现纳米银结构的化学沉积,最终在PDMS阵列表面获得了致密的纳米银颗粒沉积层,并成功获得了表面接触角达166度的超疏水性质.第二种方法利用了聚电解质/二氧化硅粒子层层静电自组装的方法引入纳米结构,结果在仅仅进行了2个组装循环的条件下即可获得超疏水性质的表面复合结构.通过简单的实验设计试图提供一种基于水滴模板法的微纳复合超疏水结构的普适性制备方法.     

Rapid fabrication of microchannels using microscale plasma activated templating (microPLAT) generated water molds

Poly(dimethylsiloxane) (PDMS) is a common material used in fabricating microfluidic devices. The predominant PDMS fabrication method, soft lithography, relies on photolithography for fabrication of micropatterned molds. In this technical note, we report an alternative molding technique using microscale PLasma Activated Templating (microPLAT). The use of photoresist in soft lithography is replaced by patterned water droplets created using microPLAT. When liquid PDMS encapsulates patterned water and then solidifies, the cavities occupied by water become structures such as microchannels. Using this method, device fabrication is less time consuming, more cost efficient and flexible, and ideal for rapid prototyping. An additional important feature of the water-molding process is that it yields structural profiles that are difficult to achieve using photolithography.     

Novel Nanostructured Electrodes Obtained by Pyrolysis of Composite Polymeric Materials

In this work, we compare pyrolyzed carbon derived from the photoresist SU‐8 alone or in combination with polystyrene and poly(styrene)‐block‐poly(dimethylsiloxane) copolymer (PS‐b‐PDMS), to be used as novel materials for micro‐ and nanoelectrodes. The pyrolyzed carbon films are evaluated with scanning electron microscopy, thermal gravimetric analysis, X‐ray photoelectron spectroscopy, contact angle analysis, and Raman spectroscopy. Furthermore, the standard rate constant for electron transfer is determined from cyclic voltammograms and found to be lower for PS‐b‐PDMS compared to PS and SU‐8 films. This may be related to the lower carbon content of PS‐b‐PDMS, as well as to its higher microstructural disorder.     

Creating patterned poly(dimethylsiloxane) surfaces with amoxicillin and poly(ethylene glycol)

This paper reports a simple microwave plasma patterning of poly(dimethylsiloxane) (PDMS) surfaces, which is accomplished by allowing selective surface areas to microwave plasma exposure in the presence of gaseous monomer. When maleic anhydride is used for microwave plasma reaction in the presence of physical barrier on the PDMS substrate, the resulting patterned surfaces with chemically bonded maleic anhydride and carboxylic acid groups are generated. In this particular study we attached amoxicillin via ammonolysis under weak base conditions in the presence of a catalyst as well as poly(ethyleneglycol) (PEG). A combination of internal reflection IR imaging (IRIRI) and atomic force microscopy (AFM) revealed that amoxicillin and PEG can be readily reacted on the microwave plasma patterned PDMS surfaces. Surface areas directly exposed to microwave plasmons exhibit the highest reactivity due to higher content of functional groups. These studies also show that molecular weight of PEG has also significant effect on kinetics of surface reactions.     

A Simple Imprint Method for Multi‐Tiered Polymer Nanopatterning on Large Flexible Substrates Employing a Flexible Mold and Hemispherical PDMS Elastomer

This work reports a facile method to fabricate multi‐tiered polymer nanopatterns on SU‐8 by the combination of imprint‐ and photo‐lithography. First, SU‐8 is imprint patterned using a polymeric flexible mold with an anti‐adhesion coating that is deposited on a transparent and flexible substrate, at room temperature under low pressure. Next, the resulting SU‐8 nanopatterns are exposed to UV light through a chromium mask by a photolithographic process. Removal of the unexposed SU‐8 leaves behind multi‐tiered structures. The use of a hemispherical poly(dimethylsiloxane) pad facilitates the evacuation of trapped air during the imprinting process. Line/space patterns of 500 nm with the smallest line width of 200 nm were homogeneously imprint‐patterned on SU‐8 on a large flexible substrate, and three‐tiered structures, ranging in thickness from 300 nm to 2 µm, were successfully formed.

     

Construction of microfluidic chips using polydimethylsiloxane for adhesive bonding

A thin layer of polydimethylsiloxane (PDMS) prepolymer, which is coated on a glass slide, is transferred onto the embossed area surfaces of a patterned substrate. This coated substrate is brought into contact with a flat plate, and the two structures are permanently bonded to form a sealed fluidic system by thermocuring (60 degrees C for 30 min) the prepolymer. The PDMS exists only at the contact area of the two surfaces with a negligible portion exposed to the microfluidic channel. This method is demonstrated by bonding microfluidic channels of two representative soft materials (PDMS substrate on a PDMS plate), and two representative hard materials (glass substrate on a glass plate). The effects of the adhesive layer on the electroosmotic flow (EOF) in glass channels are calculated and compared with the experimental results of a CE separation. For a channel with a size of approximately 10 to 500 microm, a approximately 200-500 nm thick adhesive layer creates a bond without voids or excess material and has little effect on the EOF rate. The major advantages of this bonding method are its generality and its ease of use.     

Stable modification of PDMS surface properties by plasma polymerization: application to the formation of double emulsions in microfluidic systems

We describe a method based on plasma polymerization for the modification and control of the surface properties of poly(dimethylsiloxane) (PDMS) surfaces. By depositing plasma polymerized acrylic acid coatings on PDMS, we succeeded to fabricate stable (several days) hydrophilic and patterned hydrophobic/hydrophilic surfaces. We used this approach to generate direct and (for the first time in this material) double emulsions in PDMS microchannels.     

基于粒子辅助水滴模板法制备仿生复眼结构的研究

将微粒“皮克林乳化效应”(Pickering emulsions)和水滴模板法(breath figure method)有机结合,探索通过建立粒子辅助的水滴模板法,实现纳米粒子在蜂窝状多孔膜内壁的自组装复合,构建微纳复合的多级仿生结构.并进一步利用聚二甲基硅氧烷(PDMS)复制转移技术,获得类似于复眼结构的多级微纳复合界面仿生结构.     

From micro to nano reentrant structures: hysteresis on superomniphobic surfaces

The paper reports on the wetting characterization of two surfaces presenting reentrant shapes at micro- and nanoscale using low surface tension liquids (down to 28 mN/m). On the one hand, mushroom-like microstructures are fabricated by molding poly(dimethylsiloxane) (PDMS) onto a patterned sacrificial photoresist bilayer. On the other hand, zinc oxide nanostructures (ZnO NS) are synthesized by easy and fast chemical bath deposition technique. The PDMS and ZnO NS surfaces are then chemically modified with 1H,1H,2H,2H-perfluorodecyltrichlorosilane in vapor phase. Both PDMS and ZnO NS surfaces exhibit a large apparent contact angle (>150°) and contact angle hysteresis varying from 50° to a quasi-null value. This large discrepancy can be ascribed to the length scale and topography of the structures, promoting either a vertical imbibition or a lateral spreading within the roughness.     

Creating patterned carbon nanotube catalysts through the microcontact printing of block copolymer micellar thin films

We report a route for synthesizing patterned carbon nanotube (CNT) catalysts through the microcontact printing of iron-loaded poly(styrene-block-acrylic acid) (PS-b-PAA) micellar solutions onto silicon wafers coated with thin aluminum oxide (Al(2)O(3)) layers. The amphiphilic block copolymer, PS-b-PAA, forms spherical micelles in toluene that can form quasi-hexagonal arrays of spherical PAA domains within a PS matrix when deposited onto a substrate. In this report, we dip a poly(dimethylsiloxane) (PDMS) molded stamp into an iron-loaded micellar solution to create a thin film on the PDMS features. The PDMS stamp is then put in contact with a substrate, and uniaxial compressive stress is applied to transfer the micellar thin film from the PDMS stamp onto the substrate in a defined pattern. The polymer is then removed by oxygen plasma etching to leave a patterned iron oxide nanocluster array on the substrate. Using these catalysts, we achieve patterned vertical growth of multiwalled CNTs, where the CNTs maintain the fidelity of the patterned catalyst, forming high-aspect-ratio standing structures.     

Cell docking inside microwells within reversibly sealed microfluidic channels for fabricating multiphenotype cell arrays

We present a soft lithographic method to fabricate multiphenotype cell arrays by capturing cells within an array of reversibly sealed microfluidic channels. The technique uses reversible sealing of elastomeric polydimethylsiloxane (PDMS) molds on surfaces to sequentially deliver various fluids or cells onto specific locations on a substrate. Microwells on the substrate were used to capture and immobilize cells within low shear stress regions inside channels. By using an array of channels it was possible to deposit multiple cell types, such as hepatocytes, fibroblasts, and embryonic stem cells, on the substrates. Upon formation of the cell arrays on the substrate, the PDMS mold could be removed, generating a multiphenotype array of cells. In addition, the orthogonal alignment and subsequent attachment of a secondary array of channels on the patterned substrates could be used to deliver fluids to the patterned cells. The ability to position many cell types on particular regions within a two dimensional substrate could potentially lead to improved high-throughput methods applicable to drug screening and tissue engineering.     

Maskless photolithography using UV LEDs

A UV light emitting diode (LED) with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. Movement of the substrate with a motorised linear stage (syringe pump) allowed lines in SU-8 to be pattered with a width down to 35 microm at a linear velocity of 80 microm s(-1), while in the dry film resist Ordyl SY 330, features as narrow as 17 microm were made at a linear velocity of 245 microm s(-1). At this linear velocity, a 75 mm long feature could be patterned in 5 min. Functional microfluidic devices were made by casting PDMS on a master made by LED lithography. The results show that UV LEDs are a suitable light source for direct writing lithography, offering a budget friendly, and high resolution alternative for rapid prototyping of features smaller than 20 microm.     

Microscale patterning of organic films on carbon surfaces using electrochemistry and soft lithography

We have demonstrated three simple strategies employing poly(dimethylsiloxane) (PDMS) molds for patterning carbon surfaces with two different modifiers in an 18 microm line pattern. The PDMS molds are patterned with microfluidic channels (approximately 22 microm wide and 49 microm deep) and form a reversible, conformal seal to the pyrolyzed photoresist film (PPF) and modified PPF surfaces. Modifiers are electrochemically grafted to the PPF surface by the reduction of aryl diazonium salts and the oxidation of primary amines. For the fill-in patterning approach, the first modifier is electrografted to the PPF surface exposed within the microchannels, and in a second grafting step after removal of the PDMS mold, the second modifier fills in the remaining surface. The selective conversion strategy involves electrografting a continuous film of the modifier to the PPF surface, sealing the PDMS mold to the modified surface and carrying out an irreversible electrochemical reaction of the modifier exposed within the microchannels. In the build-up patterning approach, the PDMS mold is sealed to the modified PPF surface, and a chemical coupling reaction is effected in the microchannels to build up the pattern. The patterns are characterized using SEM, optical microscopy, the formation of condensation figures, and SEM imaging after the assembly of Au nanoparticles.     

Microscale plasma-initiated patterning (muPIP)

A novel technique to create biomolecular micropatterns of varying complexity on several types of polymer substrates is presented. This method uses a patterned PDMS stamp to preferentially expose or protect areas of an underlying polymer substrate from oxygen plasma. Following plasma treatment, the substrate is immersed in a biomolecular ink, whereby molecules preferentially adsorb to either the plasma-exposed or plasma-protected substrate regions, depending on the particular substrate/ink combination. Using this method, polyethylene (PE), polystyrene (PS), poly(methyl methacrylate) (PMMA), poly(dimethylsiloxane) (PDMS), and poly(hydroxybutyrate/hydroxyvalerate) (PHBV) were micropatterned with different aqueous-based biomolecular inks (i.e., goat anti-rabbit immunoglobulin G, poly-l-lysine, and bovine serum albumin (BSA)). Water contact angle measurements performed on substrates after oxygen plasma exposure showed that the hydrophilicity of substrate areas exposed to plasma was significantly greater than that of areas protected from plasma by the PDMS stamp. In addition, scanning electron microscopy results demonstrated that substrate areas exposed to plasma were physically modified (e.g., roughened) compared to adjacent, protected areas. Areas in contact with a patterned PDMS stamp during plasma exposure were found to be physically unaffected by plasma treatment, and exhibited spatial features/dimensions consistent with the corresponding features of the patterned stamp. Last, protein patterns of BSA on the polymer substrates were stable and distinct after 4 weeks of incubation at 37 degrees C.     

Microscale patterning of thermoplastic polymer surfaces by selective solvent swelling

A new method for the fabrication of microscale features in thermoplastic substrates is presented. Unlike traditional thermoplastic microfabrication techniques, in which bulk polymer is displaced from the substrate by machining or embossing, a unique process termed orogenic microfabrication has been developed in which selected regions of a thermoplastic surface are raised from the substrate by an irreversible solvent swelling mechanism. The orogenic technique allows thermoplastic surfaces to be patterned using a variety of masking methods, resulting in three-dimensional features that would be difficult to achieve through traditional microfabrication methods. Using cyclic olefin copolymer as a model thermoplastic material, several variations of this process are described to realize growth heights ranging from several nanometers to tens of micrometers, with patterning techniques include direct photoresist masking, patterned UV/ozone surface passivation, elastomeric stamping, and noncontact spotting. Orogenic microfabrication is also demonstrated by direct inkjet printing as a facile photolithography-free masking method for rapid desktop thermoplastic microfabrication.     

Crystallization on surfaces of well-defined topography

Single crystals of calcite with regular patterned surfaces comprising close-packed arrays of hemispherical cavities or domes were produced by crystallization on colloidal monolayers or PDMS replicas of these monolayers, respectively. Perfect replication of the substrate topography was achieved for all colloidal particles, irrespective of their size and surface chemistry when the substrate geometry permitted unrestricted ion flow to the growing crystal. This work demonstrates that crystallization within a mould provides a very general route to producing single crystals with curved surfaces and unusual morphologies and that such patterning can be applied from the micro- to the nanoscale.     

Quantum dot micropatterning on si

Using InP and PbSe quantum dots, we demonstrate that the Langmuir-Blodgett technique is well-suited to coat nonflat surfaces with quantum dot monolayers. This allows deposition on silicon substrates covered by a developed patterned resist, which results in monolayer patterns with micrometer resolution. Atomic force microscopy and scanning electron microscopy reveal the formation of a densely packed monolayer that replicates predefined structures with high selectivity after photoresist removal. A large variety of shapes can be reproduced and, due to the excellent adhesion of the quantum dots to the substrate, the hybrid approach can be repeated on the same substrate. This final possibility leads to complex, large-area quantum dot monolayer structures with micrometer spatial resolution that may combine different types of quantum dots.     

A Simple Method for Fabricating Patterned Curvilinear Microstructures in Poly(dimethylsiloxane) by Selective Wetting

The fabrication of patterned microstructures in poly(dimethylsiloxane) (PDMS) is a prerequisite for soft lithography. Herein, curvilinear surface relief microstructures in PDMS are fabricated through a simple three‐stage approach combining microcontact printing (μCP), selective surface wetting/dewetting and replica molding (REM). First, using an original PDMS stamp (first‐generation stamp) with linear relief features, a chemical pattern on gold substrate is generated by μCP using hexadecanethiol (HDT) as an ink. Then, by a dip‐coating process, an ordered polyethylene glycol (PEG) polymer‐dot array forms on the HDT‐patterned gold substrate. Finally, based on a REM process, the PEG‐dot array on gold substrate is used to fabricate a second‐generation PDMS stamp with microcavity array, and the second‐generation PDMS stamp is used to generate third‐generation PDMS stamp with microbump array. These fabricated new‐generation stamps are utilized in μCP and in micromolding in capillaries (MIMIC), allowing the generation of surface micropatterns which cannot be obtained using the original PDMS stamp. The method will be useful in producing new‐generation PDMS stamps, especially for those who want to use soft lithography in their studies but have no access to the microfabrication facilities.     

Fabrication of complex multilevel microchannels in PDMS by using three-dimensional photoresist masters

This paper demonstrates a new method of implementing complex microchannels in PDMS, which is simply constructed using three-dimensional photoresist structures as a master mold for the PDMS replica process. The process utilizes UV-insensitive LOR resist as a sacrificial layer to levitate the structural photoresist. In addition, the thickness of photoresist structures can be controlled by multi-step UV exposure. By using these techniques, various three-dimensional photoresist structures were successfully implemented, including the recessed cantilevers, suspended bridges, and the complex plates with micro-pits or micro-villi. We demonstrate that the three-dimensional photoresist structures are applicable to implementing complex multiple microchannels in PDMS by using the PDMS replica method.