Evolution of structural and magnetic properties of sputtered nanocrystalline Co thin films with thermal annealing

Ultrafine grain films of cobalt prepared using ion-beam sputtering have been studied using X-ray diffraction (XRD), X-ray reflectivity (XRR), atomic force microscopy (AFM) and magneto-optical Kerr effect (MOKE) measurements. As-prepared films have very smooth surface owing to the ultrafine nature of the grains. Evolution of the structure and morphology of the film with thermal annealing has been studied and the same is correlated with the magnetic properties. Above an annealing temperature of 300 °C, the film gradually transforms from HCP to FCC phase that remains stable at room temperature. A significant contribution of the surface energy, due to small grain size, results in stabilisation of the FCC phase at room temperature. It is found that other processes like stress relaxation, grain texturing and growth also exhibit an enhanced rate above 300 °C, and may be associated with an enhanced mobility of the atoms above this temperature. Films possess a uniaxial anisotropy, which exhibits a non-monotonous behaviour with thermal annealing. The observed variation in the anisotropy and coercivity with annealing can be understood in terms of variations in the internal stresses, surface roughness, and grain structure.     

Effect of substrate temperature on the magnetic properties and internal stresses of CoPt/AlN multilayer deposited by dc magnetron sputtering

Magnetic properties and internal stresses of AlN(20 nm)/[CoPt(2 nm)/AlN(20 nm)]₅ multilayer structure deposited at different substrate temperatures by dc magnetron sputtering have been studied. It is found that with increasing the substrate temperature from room temperature to 400 °C, in-plane magnetic anisotropy field of the film becomes smaller, and the out-of-plane magnetization becomes stronger. Especially when the film is deposited at substrate temperature of 400 °C, the out-of-plane magnetization becomes as strong as the in-plane magnetization. On the other hand, the total in-plane residual stress of the film changes gradually from compressive to tensile. The compressive intrinsic stress is generated during deposition process and decreases with increasing the substrate temperature. After annealing at high temperatures, the films show strong perpendicular magnetic anisotropy. With increasing the annealing temperature, the in-plane thermal stress also increases and becomes dominant, which is considered to result in the perpendicular magnetic anisotropy of the films.     

Influence of annealing on microstructure and magnetic-transport of FeCo–SiO2 nanogranular films

A series of FeCo–SiO₂ nanogranular films were prepared using magnetron controlled sputtering method. The microstructure, tunneling giant magnetoresistance (TMR) and magnetic properties of FeCo–SiO₂ films deposited at room temperature and then annealed at various temperatures were investigated using transmission electron microscopy (TEM), conventional four probes method and vibrated sample magnetometer (VSM) under room temperature, respectively. The results showed that all FeCo–SiO₂ films consisted of FeCo granules with equiaxial shape uniformly dispersed in the SiO₂ matrix and formed body-centered cubic (bcc) structure. With increasing the annealing temperature, FeCo granule size increased monotonically. For film with 30.5 vol% FeCo, the size distribution satisfied the log-normal function at lower annealing temperature. While with increasing annealing temperature, the size distribution deviated gradually from the log-normal function. Meanwhile, upon varying the annealing temperature, the TMR of films with lower volume fraction reached a peak value at higher annealing temperature and the TMR of films with higher volume fraction reached a peak value at lower annealing temperature. In addition, the results also indicated that the sensitivity of TMR changed non-monotonically with the increment of the annealing temperature and both the saturation magnetization and the susceptibility of FeCo (30.5 vol%)–SiO₂ films increased with increasing the annealing temperature.     

退火温度对溅射铝膜结构与电性能的影响

 采用直流磁控溅射方法成功地制备了Al膜,研究了退火温度对Al膜表面形貌、晶体结构、应力、择优取向及反射率的影响。研究表明：不同退火温度的薄膜晶粒排布致密而光滑,均方根粗糙度小。XRD测试表明：不同温度退火的铝膜均成多晶状态,晶体结构为面心立方,退火温度升高到400 ℃时,Al膜的应力最小达0.78 GPa,薄膜平均晶粒尺寸由18.3 nm增加到25.9 nm;随着退火温度的升高,(200)晶面择优取向特性变好。薄膜紫外-红外反射率随着退火温度的升高而增大。     

Effect of magnetic field annealing on microstructure and magnetic properties of FePt films

FePt (20 nm) films were annealed in a magnetic field (along the normal direction of the films) at a temperature around the Curie temperature of L1₀ FePt. The influence of magnetic filed annealing on texture and magnetic properties of FePt films were investigated. The results indicate that preferential (0 0 1) orientation and perpendicular anisotropy can be obtained in L1₀ FePt films by using magnetic field annealing around the Curie temperature of L1₀ FePt. This is one of the potential methods to obtain (0 0 1) orientation and thus to improve the perpendicular anisotropy in FePt films.     

Anisotropic conductance of Pb–induced chain structures on Si(557) in the monolayer regime

We present data of a study of four-point conductance of adsorbed Pb films on Si(557) in the thickness range between 0.6 up to several monolayers (ML) at various annealing stages. These measurements are combined with tunneling microscopy (STM). Onset of conductance is found close to the percolation limit. Pb layers annealed to room temperature are characterized by activated contributions to conductance up to 3 ML, a purely metallic temperature dependence at thicker layers, and an anisotropy of at most a factor of 2. On the contrary, annealing to 640 K, leaving only the first monolayer on the Si(557) surface results in extremely high surface state conductance which is quasi one–dimensional below a critical temperature of Tc=78 K, associated with an order–disorder phase transition. Induced by a 10-fold superperiodicity along the Pb chains and their lateral ordering, the system switches from low to high conductance anisotropy, with a metal–insulator transition in the direction perpendicular to the chain structure, while in the direction along the chains conductance with a 1/T + const. temperature dependence was found.     

Heat-Treatment Induced Magnetic Anisotropy of GaMnSb Films

Conditions and mechanisms of controlled variation of the magnetic anisotropy of GaMnSb films containing magnetic MnSb nanoinclusions by means of heat treatment have been determined. For this purpose, the temperature and magnetic-field dependences of the magnetic moments of samples before and after thermal annealing were measured using a SQUID magnetometer. It is established that the heat treatment of GaMnSb films leads to a significant increase in the values of characteristics determined by the magnetic anisotropy, including the growth of blocking temperature (from 95 to 390 K) and the magnetic anisotropy field (from 330 to 630 Oe). Results of transmission electron microscopy investigation indicate that a change in the magnetic anisotropy of GaMnSb films as a result of their thermal annealing can be related to a transition of the crystalline structure of magnetic MnSb nanoinclusions from hexagonal (space group P6₂/mmc) to cubic (space group F-43m).     

Low-temperature ordering of L10 FePt phase in FePt thin film with AgCu underlayer

FePt (20 nm) films with AgCu (20 nm) underlayer were prepared on thermally oxidized Si (0 0 1) substrates at room temperature by using dc magnetron sputtering, and the films annealed at different temperature to examine the disorder–order transformation of the FePt films. It is found that the ordered L1₀ FePt phase can form at low annealing temperature. Even after annealing at 300 °C, the in-plane coercivity of 5.2 kOe can be obtained in the film. With increase in annealing temperature, both the ordering degree and coercivity of the films increase. The low-temperature ordering of the films may result from the dynamic stress produced by phase separation in AgCu underlayer and Cu diffusion into FePt phase during annealing.     

The magnetic anisotropy of samarium-alnico pseudobinary alloys

The anisotropy properties of samarium-Alnico V pseudobinary alloys have been investigated. With alloys containing less than 12.0 mol% samarium, the K₁ values are negative at 77 K and increase with increasing temperature to approximately zero at room temperature. The K₂ values remain positive at all temperatures. We do not find the easy cone that has long been thought to be existed in those alloys with K₁ < 0 and K₂ #62; 0. In alloys with samarium contents between 13.3 and 19.0 mol%, the K₁ and K₂ values are positive at all temperatures. The anisotropy fields are not changed monotonically in the whole range of 10.1 to 19.0 mol% of samarium. It is concluded that the alloys are characteristics in thermodynamically of first-order transition. We have found that the “hard cone” exists in each of those alloys with samarium content more than 16.0 mol% and at temperatures above 77 K. The alloys with samarium less that 13.4 mol% also have “hard cone” under 77 K. However, the observed “hard cone” is different from the well known one in the first-order magnetization process, and it will collapse to the easy axis when the measuring field and temperature increase while under room temperature.     

Comparative study of annealing and gold dopant effect on DC sputtered vanadium oxide films for bolometer applications

Vanadium oxide (VO_x) thin film has been widely used for IR detectors and it is one of the promising materials for THz detectors due to its high temperature coefficient of resistance (TCR) values. VO_x films with proper TCR values have also high resistance and it restricts bolometer performance especially for uncooled bolometers. To overcome this problem, deposition at elevated temperatures or annealing approach has been accepted and used but gold co-deposition approach has been proposed recently. In this study, vanadium oxide films were fabricated on high resistivity silicon substrates by reactive direct current magnetron sputtering in different O₂/Ar atmosphere at room temperature. We investigated influence of oxygen partial pressure during deposition process and fabricated VO_x thin films with sufficient TCR values for bolometer applications. In order to decrease resistivity of the deposited films, post annealing and gold doping approaches were performed separately. Effect of both post annealing process and gold doping process on structural and electrical properties of VO_x thin films deposited at room temperature were investigated and detailed comparison between these methods were presented. We obtained the best possible approach to obtain optimum conditions for the highly reproducible VO_x thin films which have the best resistivity and suitable TCR value for bolometer applications.     

Internal stress influence on the coercivity of FeCuNbSiB thin films

Thin films of Finemet-type alloy with thickness varying from 50 to 1000 nm have been deposited by RF sputtering and annealed at temperature ranging from 150 to 450 °C. Their magnetic and structural properties have been characterized using alternating gradient field magnetometry and X-ray diffraction. In addition, the stress in the films has been measured as a function of temperature from the curvature of the wafers using a laser scanning technique.The coercive field of the films first decreases with annealing temperature due to stress relaxation, and then increases again when crystallisation begins. The optimal annealing conditions comprises between the glass transition and the crystallisation temperature.Its is observed that the coercivity of the as-deposited material is continuously decreasing as the thickness increases, following an inverse square root dependence, in relation with the stress-induced magneto-elastic contribution to the total anisotropy. By opposition, it has been found that the coercive field of devitrified and totally relaxed films is inversely proportional to film thickness. In order to explain this evolution, a model is proposed, based on random anisotropy considerations applied to thin films in which the anisotropy was considered localised in the dimension of thickness.     

Laser ablated bismuth cuprate thin films preparation and effect of oxygen nonstoichiometry upon superconductivity

Thin films of Bi₂Sr₂CaCu₂O₈ and (Bi, Pb)₂Sr₂Ca₂Cu₃O₁₀ have been prepared on monocrystalline (100) MgO substrates, using a laser ablation method with post annealing treatment. The influence of substrate temperature and oxygen pressure during deposition were investigated. SEM observations, EDS analysis, electric and magnetic measurements have been used to characterize the films. Superconducting “2212” films, with T_c(R = 0) at 80–83 K and J_c (50 K) up to 5 × 10⁵ A/cm², have been currently achieved, while Pb-doped “2223” films exhibit T_c as high as 110 K with J_c = 5 × 10⁴ A/cm² at 77 K. The effect of annealing at low temperature (350°C) in an argon flow has been studied for the 2212 phase, it shows the influence of the oxygen non-stoichiometry, i.e. of the hole carrier density upon T_c's which can be measured up to 89 K (zero resistance).     

Structural and photoluminescence characteristics of ZnO films by room temperature sputtering and rapid thermal annealing process

ZnO thin films deposited on SiO₂/Si substrates at room temperature by sputtering technology were annealed with a rapid thermal annealing process at various temperatures from 200 °C to 900 °C. The physical and optical properties of the ZnO films were investigated by X-ray diffraction, scanning electron microscopy and room-temperature photoluminescence (PL). The surface structures of the thin films showed great variations with increased annealing temperature. The PL spectrum illustrated that a stronger UV emission intensity appeared at an annealing temperature of 500 °C. On the other hand, visible-light emission could be obtained when the ZnO films were annealed above 500 °C and reached a maximum intensity at 900 °C. The possible mechanisms for visible-light emission are discussed. PACS 81.15.Cd; 81.40.Ef; 78.55.-m; 78.55.Et     

Reduction of dislocation density and improvement of optical quality in ZnO layers by MgO-buffer annealing

Optical properties of ZnO thin films with/without MgO-buffer annealing were investigated by low and room temperature photoluminescence measurements. The ZnO films were grown on c-sapphire substrates by plasma-assisted molecular-beam epitaxy employing a thin MgO-buffer layer. Dislocation density of ZnO layer was reduced from 5.3 × 10⁹ to 1.9 × 10⁹ cm⁻² by annealing MgO-buffer prior to the growth of ZnO. The intensity of free exciton emission from the sample with MgO-buffer annealing was almost twice of that from the sample without annealing, while the deep level emission from the sample with MgO-buffer annealing was about 1/3 of that without annealing. The MgO-buffer annealing improves optical quality of overgrown ZnO films.     

The electrical properties of thin permalloy films

The magnetic properties of thin Permalloy films have been the subject of many investigations, but the work on their electrical properties is very limited [1]. By observing the change in electrical resistance with temperature the structural transformations taking place during the annealing of the condensates can be inferred.The authors of [1] did not undertake a detailed study of the electrical properties of Permalloy. They used Permalloy 79NMA in their investigation, and the dependence of the change in electrical resistance on the temperature of annealing in a magnetic field enabled them to reach conclusions about the nature of the uniaxial anisotropy of thin films.In the present work a detailed study has been made of the electrical resistance of Permalloy films in relation to the temperature of the substrate during evaporation and annealing; the temperature coefficient of resistance (TCR) has also been studied.     

掺钇二氧化锆薄膜制备及其特性测量

采用电子束蒸发法在室温下制备出掺钇二氧化锆薄膜.借助紫外分光光度计、原子力显微镜(AFM)、X射线衍射(XRD)方法研究了薄膜的透射率、表面结构.同时研究了不同退火温度下对薄膜光学性质的影响.研究的结果表明:退火温度的增加,使得二氧化锆薄膜的漏电流增大,从而导致其热稳定性变差.不同浓度三氧化二钇的掺杂对其透射率影响很小.     

Optimization of the optical and electrical properties of electron beam evaporated aluminum-doped zinc oxide films for opto-electronic applications

Aluminum-doped zinc oxide (AZO) thin films have been deposited by electron beam evaporation technique on glass substrates. The structural, electrical and optical properties of AZO films have been investigated as a function of annealing temperature. It was observed that the optical properties such as transmittance, reflectance, optical band gap and refractive index of AZO films were strongly affected by annealing temperature. The transmittance values of 84% in the visible region and 97% in the NIR region were obtained for AZO film annealed at 475 °C. The room temperature electrical resistivity of 4.6×10⁻³ Ω cm has been obtained at the same temperature of annealing. It was found that the calculated refractive index has been affected by the packing density of the thin films, whereas, the high annealing temperature gave rise to improve the homogeneity of the films. The single-oscillator model was used to analyze the optical parameters such as the oscillator and dispersion energies.     

Influence of atmospheric exposure of tris (8-hydroxyquinoline) aluminum (Alq<Subscript>3</Subscript>): a photoluminescence and absorption study

We have investigated the effects of atmospheric exposure on the properties of tris (8-hydroxyquinoline) aluminum (Alq₃) thin films by photoluminescence (PL) and UV-Vis absorption measurements. Alq₃ films were evaporated on glass substrates at different temperatures. The influence of annealing on the environmental stability of the films has also been investigated. It has been found that deposition at higher substrate temperature and annealing of the samples deposited at room temperature yield an improvement in the environmental stability of the films, i.e. less decrease in the PL intensity over time with exposure to atmosphere, as well as increased PL intensity. To investigate further the effects of the air exposure, films deposited at room temperature were stored for four days in air, nitrogen, and oxygen. No decrease in PL intensity has been found for storage in nitrogen, while the decrease for the film stored in oxygen was smaller than that for the film stored in air, indicating that both humidity and oxygen play a role in the PL intensity decrease in Alq₃ thin films. PACS 78.55.Kz; 78.40.Me     

Effect of annealing atmosphere on ferromagnetism in Mn doped ZnO films

This paper reports that Zn_0.97Mn_0.03O thin films have been prepared by radio-frequency sputtering technology followed by rapid thermal processing in nitrogen and oxygen ambient respectively. Magnetic property investigation indicates that the films are ferromagnetic and that the Curie temperature (T_c) is over room temperature. It is observed that the saturation magnetization of the films increases after annealing in nitrogen ambience but decreases after annealing in oxygen. Room temperature photoluminescence spectra indicate that the amount of defects in the films differs after annealing in the different ambiences. This suggests that the ferromagnetism in Zn_0.97Mn_0.03O films is strongly related to the defects in the films.     

Annealing effects on the plasmonic excitations of metal/metal interfaces

The effects of the annealing procedure at 400-450 K on the electronic properties of nanoscale thin films of Ca, Au and Ag grown on Cu(1 1 1) at room temperature were probed by high-resolution electron energy loss spectroscopy measurements. Ca surface plasmon underwent to a significant red-shift upon annealing, due to the oxidation of the topmost Ca layer. Water strongly interacted with the CaO interface at room temperature. Au surface plasmon disappeared upon annealing the gold film, as a consequence of the formation of an Au-Cu alloy. Ag surface plasmon red-shifted both in the annealed adlayer and with increasing temperature compared with the frequency recorded for the as-deposited silver film.