Shifting of the thermal properties of amorphous germanium films upon relaxation and crystallization

The modification of the thermal conductivity and melting temperature of unrelaxed amorphous Ge films on Si substrates upon laser-induced relaxation and crystallization is presented. Real-Time Reflectivity (RTR) measurements are used to determine experimentally both the melting threshold and the melt durations, and the finite element method is used to simulate the laser-induced heat-flow process. A thermal conductivity ofk=0.010 W dem K is determined for the unrelaxed material by fitting the experimental melting thresholds of unrelaxed films of different thicknesses. A similar procedure applied to the amorphous relaxed and crystallized materials lead to a shift to higher values of both the thermal conductivity and the melting temperature. In order to achieve a good fit of the experimental melt durations, it was necessary to assume a large degree of undercooling prior to solidification. The role of undercooling in the solidification process is finally discussed in terms of its dependence on the faser energy density and the high thermal conductivity of the substrate.     

Optical and structural properties of thin films deposited from laser fused Zirconia,Hafnia, and Yttria

The optical and structural properties of films deposited from laser sintered Zirconia (ZrO₂), Hafnia (HfO₂), and Yttria (Y₂O₃) and from the commercially available (unprocessed material) Zirconia, Hafnia and Yttria, were studied and compared. All the films had low absorption. Films deposited from the laser sintered material had very low optical inhomogeneity. ZrO₂ films showed negative inhomogeneity for films deposited from the unprocessed material. The refractive index increased for ZrO₂ films deposited from the laser sintered material. HfO₂ and Y₂O₃ films showed positive inhomogeneity when deposited from the unprocessed material. The refractive index of the films of these materials decreased when deposited from the laser sintered material. The thin films of ZrO₂ and Y₂O₃ prepared from laser sintered material had stable monoclinic and cubic structures respectively while HfO₂ films were found to be amorphous.     

Laser-induced synthesis of compound semiconducting films

Compound semiconducting films are synthesized by laser irradiation of sandwich films of the constituants, under various conditions (time of irradiation, laser power, temperature, etc.). Experimental data give evidence of the roles of various parameters. After a presentation of the experimental results, the fundamental physico-chemical mechanisms of laser material interactions are analyzed. Particular emphasis is given to effects that need to be treated by using very-far-from-equilibrium concepts.     

Optical constants of thin CoSi2 films on silicon

The optical transmission of CoSi₂ films of thickness 2.6–15 nm is measured in the wavelength range 1–20 m. The optical constants are evaluated by taking into account multiple reflections in the film and by fitting a Drude model. The plasma frequency _p=5.4–7.6 eV is equivalent to a carrier density n _eff=3×10²² cm^–3 and one carrier per unit cell. The relaxation frequency of the plasma resonance assumes high values =2 eV near the interface to silicon and decreases into the bulk film over several nanometers. Films grown off-axis from the (111) Si orientation exhibit an enhanced relaxation frequency.     

Laser-induced desorption of Na-dimers

We find that Na-dimers are desorbed in a thermal process if rough Na surfaces are irradiated with pulsed laser light of λ=532 nm. In contrast, for light of λ=355 nm, Na₂ can be detached in a non-thermal reaction at low laser fluences. This is concluded from the kinetic energy distributions of the dimers determined by time-of-flight measurements using a second laser at λ=248 nm for photoionization. The transition from non-thermal to thermal desorption at large fluences of the laser light can also be identified. Received: 23 July 1996 / Accepted: 26 August 1996     

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Influence of the carrier gas on HfCl₄-H₂O and ZrCl₄-H₂O atomic layer processes was investigated. The growth rates of HfO₂ and ZrO₂ decreased with increasing flow rate and pressure of the N₂ carrier gas. Data of real-time quartz crystal microbalance measurements demonstrated that the effect observed was mainly due to influence of carrier gas on surface reactions and the role of overlapping the precursor pulses was negligible. At the same increase of the carrier gas mass flow, the increase of the linear flow rate led to more significant changes of thin-film properties than the increase of the carrier gas pressure did. Thin films with higher density, higher refractive index and, particularly, lower concentration of residual chlorine were obtained at higher carrier gas flow rates. Increase of the carrier gas flow rate also resulted in a higher concentration of a metastable phase in HfO₂ thin films deposited at 300 °C.     

CW laser-assisted oxidation of thin Cd,In, Sn,and Zn films in air

Thin films of Cd, In, Sn, and Zn are deposited onto glass and irradiated in air by means of a cw-Ar⁺ laser beam. The films are oxidized. The variations of the diameter of the oxidized zones are measured as a function of time and laser beam power, P. The temperature is measured by an interferometric method. It is shown that oxidation proceeds rapidly at some critical temperature, independent of P over some range of P, in the cases of Cd, In, and Zn. These critical temperatures correspond to the melting temperatures of Cd and In. No relation to any specific temperature of the Zn-O phase diagram is found. Feedback effects are also discussed.     

Structural, optical and electrical properties of ZnO and ZnO-Al2O3 films prepared by dc magnetron sputtering

ZnO and ZnO-Al₂O₃ thin films were prepared by dc magnetron sputtering and their structural, optical and electrical properties were studied comparatively. It is discovered that the ZnO-Al₂O₃ thin films remain transparent in a shorter wavelength range than the ZnO films, resulting from the increase of their band gap. Their resistivity decreases by seven orders of magnitude, which is caused by doping of Al to ZnO grains in the film. Preferential orientation of ZnO grains in the ZnO-Al₂O₃ thin films deteriorates because of the existence of Al₂O₃ impurity phase in the film. Received: 5 January 1999 / Accepted: 11 October 1999 / Published online: 8 March 2000     

Kinetic studies of laser-induced synthesis of thin vanadium pentoxide films

The kinetics of Ar⁺ laser-induced oxidation of 100 nm thick vanadium films on glass substrates is followed by measuring time-dependent changes in reflected and transmitted intensity of a He-Ne probe beam. The growth rate of the vanadium pentoxide layer increases with increasing laser powerP as = ₀ exp(-a/P). At power densities above kW/cm² vanadium pentoxide crystallizes from the melt.     

Effect of the growth conditions on infrared upconversion efficiency of CaS: Eu, Sm thin films

High-quality electron-trapping thin films CaS: Eu, Sm with red light output have been successfully deposited on quartz and single-crystal silicon substrates by electron beam evaporation (EBE) and radio frequency (RF) magnetron sputtering in vacuum and H₂S partial pressures. Infrared upconversion efficiency of CaS: Eu, Sm thin films under different growth conditions has been investigated by using ultrashort infrared (IR) laser pulse with 20 ps (full width at half-maximum (FWHM)). The results show that upconversion efficiency of CaS: Eu, Sm thin films depends strongly on growth conditions in spite of the existence of “exhaustion” phenomena. Microstructures identified by X-ray diffraction (XRD) indicate that crystallinity of CaS films relies on both substrate materials and growth conditions. The stoichiometric composition of CaS films was measured by secondary-ion mass spectrometry (SIMS). The post-annealing process was found to promote grain growth and activate strong luminescence so that it could obviously improve upconversion efficiency of CaS: Eu, Sm films, even though it had negative influence on transmittance and spatial resolution of these films. Received: 5 June 2000 / Accepted: 7 June 2000 / Published online: 23 August 2000     

Kinetics of CW laser-induced crystallization and oxidation of thin,Sb, Se,and Sb2Se3 films in air

Thin films of Sb, Se and Sb₂Se₃ are deposited onto glass and irradiated by a cw-Ar⁺ laser beam. The kinetics of crystallization and oxidation are traced via the time dependence of optical reflectivity and temperature, T, of the irradiated zone. For Sb₂Se₃, transformations start abruptly when T attains a critical value, T _c, independently of the laser beam power. These T _c values are comparable to the ones observed under furnace annealing conditions.     

Optical absorptivity of ion-beam irradiated silicon

Single-crystal layers of silicon on sapphire have been irradiated with Ne and Kr ions at room temperature. The concomitant changes in optical absorption have been measured as a function of photon energy. The absorptivity of the amorphized silicon is about one order of magnitude higher as compared to the crystalline state in the photon energy interval of 1.5–3 eV. This is sufficient for generating optical patterns of high contrast by irradiation of selected parts of the wafer.     

Ionographic patterns with amorphous/crystalline contrast

Ion irradiation of thin layers of crystalline semiconductors induces a phase transition to the amorphous state. The concomitant optical contrast between unirradiated, crystalline, and irradiated, amorphous, material may be used for pattern fabrication in the submicron range. This process will be explained by the example of silicon single-crystal layers on sapphire.International Patents pending     

Physical properties of GaAs on glass

Physical properties of GaAs layers grown by molecular beam epitaxy on glass substrates are investigated by Raman light scattering, Photothermal Deflection Spectroscopy (PDS), optical absorption and Scanning Electron Microscopy (SEM) measurements. The results indicate that the layers are polycrystalline and strain-free. Raman spectra exhibit GaAs-TO and LO modes at 260 and 283 cm^–1, respectively. The peaks are shifted by about 10 cm^–1 with respect to bulk GaAs which we attribute to local heating effects induced by laser excitation. The phonon lines are strong and have a bandwidth of about 5 to 8 cm^-1 indicating a good crystalline quality. However, neither photoluminescence nor the Hall effect could be observed that is suggestive of the presence of a large number of electronic defects. SEM micrographs taken from the surface and the interface exhibit a granular structure with the polycrystal sizes of well under 1 m. PDS results show about 10¹⁸ cm^–3 defects and some disorder at the band gap.     

Study of the gas-phase parameters affecting the silicon-oxide film deposition induced by an ArF laser

A study of the gas-phase parameters involved in ArF laser induced chemical vapour deposition of silicon-oxide thin films is presented. A complete set of experiments has been performed showing the influence of the concentration of the precursor gases, N₂O and SiH₄, and their influence on total and partial pressures on film growth and properties. In this paper we demonstrate the ability of this LCVD method to deposit silicon oxide films of different compositions and densities by appropriate control of gas composition and total pressure. Moreover, a material specific calibration plot comprising data obtained using different preparation techniques is presented, allowing determination of the stoichiometry of SiO _x films by using FTIR spectroscopy independently of the deposition method. For the range of processing conditions examined, the experimental results suggest that chemical processes governing deposition take place mainly in the gas phase.     

Modifications in structural and optical properties of Mn-ion implanted CdS thin films

In this paper, we report on modifications in structural and optical properties of CdS thin films due to 190 keV Mn-ion implantation at 573 K. Mn-ion implantation induces disorder in the lattice, but does not lead to the formation of any secondary phase, either in the form of metallic clusters or impurity complexes. The optical band gap was found to decrease with increasing ion fluence. This is explained on the basis of band tailing due to the creation of localized energy states generated by structural disorder. Enhancement in the Raman scattering intensity has been attributed to the enhancement in the surface roughness due to increasing ion fluence. Mn-doped samples exhibit a new band in their photoluminescence spectra at 2.22 eV, which originates from the d-d (⁴T₁ → ⁶A₁) transition of tetrahedrally coordinated Mn²⁺ ions.     

Optical gate realization with thin CdS films

A spray deposited thin (6 m) CdS film laser induced optical device (LIOD) was studied experimentally and theoretically. The all optical bistable (all-OB) and the hybrid bistable (HB) features at 210 K were investigated. It is shown for the first time that the observation of equal contrasted all-OB and HB loops is possible in thin CdS films. The slope of the all-OB loops were calculated with a new theoretical model which is established on the thermal enhanced shift of the absorption edge and the transmitted light equilibrium condition. A good agreement with the experiments is found. Furthermore, it is pointed out that the electron life time determines the fashion and the contrast of the HB loops. In this context the proof is furnished that the maximal possible HB loops is observed. Finally, the influence of Joule's heat on OB and HB is demonstrated.     

Investigation by ellipsometry of the damage in GaAs bombarded with low-energy Ar ions

The crystalline-amorphous transition in GaAs induced by Ar ions (energy 1–3 keV) has been investigated using single-wavelength ellipsometry. The experiments have been performed in-situ at room temperature. Ion damage straggling, amorphization threshold and critical energy density have been derived by means of a simple analytical model for the growth of the amorphous layer. This model is discussed and the corresponding calculations are found to be in satisfactory agreement with experimental data.     

The slowing-down of ultrafast relaxation in C60 films at high femtosecond pump intensities

60 thin film was investigated in the energy range between 1.6 eV and 3.4 eV by a pump-supercontinuum probe (PSCP) technique with a 40 fs time resolution. The relaxation rate showed pronounced spectral dependence, with a maximum at 2 eV in the region of photo-induced darkening and at 2.4 eV in the region of photo-induced bleaching. The ultrafast relaxation rate decreased with increasing pump-pulse intensity. We suggest that the observed decrease results from extraheating of the carriers in the h_u and t_1u bands due to internal conversion from higher excited states, which are populated by two-step photon absorption of the intense pump pulse. Received: 2 May 1997/Revised version: 4 August 1997     

Ion-beam induced mixing in Al-Ni

Ion beam induced mixing of Al-Ni has been studied using N ₂ ⁺ and Ar⁺ bombardment. High dose (4×10¹⁷ ions cm^–2) nitrogen bombardment was found to cause blister formation with no unambiguous evidence of mixing. However, using argon ions at elevated substrate temperatures (400–450 °C) led to extensive mixing of 2000 Å Al layers on Ni. The mixing mechanism is considered to be point defect mediated radiation enhanced diffusion with a possible contribution from cascade mixing and interfacial oxide layer breakdown during the initial stages of treatment.