Evaluation of pulsed radiofrequency glow discharge time-of-flight mass spectrometry for precious metal determination in lead fire assay buttons

In this paper, an exploration of the capabilities and limitations of pulsed radiofrequency glow discharge time-of-flight mass spectrometry (GD-TOFMS) for the determination of the precious metals Ag, Au, Pd, Pt and Rh in lead buttons obtained by Pb fire assay is reported on. Since the matrix consists almost entirely of lead (>99%), the occurrence of doubly charged Pb (Pb²⁺) ions can hinder accurate determination of Rh. This problem was counteracted by relying on the time-resolved formation of different ion types over the pulse period of the glow discharge, which allows discrimination against the Pb²⁺ ions. The formation of ArCu⁺ ions as a result of the use of a copper anode was assessed to pose no threat to the accuracy of the results obtained for the set of samples analyzed as its contribution to the total signal at m/z = 103 could be adequately corrected for. The method developed was evaluated in terms of accuracy and precision using a set of Pb button standards with analyte concentrations between 5 and 100 μg g⁻¹. For the purpose of validation, a 10 μg g⁻¹ standard was considered as a sample. Overall, an acceptable accuracy was obtained with a bias of <5% between the experimental results and the corresponding reference values, except for Au, for which a larger deviation occurred. Precision values (repeatability) of typically <5% relative standard deviation (RSD) (for N = 3) were obtained and the limits of detection (LODs) vary from ∼0.020 μg g⁻¹ for Ag to ∼0.080 μg g⁻¹ for Pt.     

Analysis of semiconducting materials by high-resolution radiofrequency glow discharge mass spectrometry

The analytical capabilities of a high-resolution mass spectrometer in combination with a 13.56 MHz glow discharge ion source for the analysis of semiconducting materials (silicon carbide and gallium arsenide) were studied. It was shown that single positively charged ions of sample material have about 10 eV higher average energy than the ions of the discharge and residual gas. Therefore effective energy separation of the ions of analyte from the ions of the discharge and residual gas was achieved by adjusting the ion transfer optics (breadth and position of energy slit), which improves the analytical capabilities of the developed method.Some analytical applications are presented to illustrate the performance of r.f. GDMS for the bulk analysis of semiconducting materials. The results of the trace element analysis of gallium arsenide and silicon carbide samples are compared with data of independent methods (LIMS, ICP-AES, SIMS).Dedicated to Professor Dr. rer. nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthdayOn leave from the Institute of Inorganic Chemistry, 630090 Novosibirsk, Russia     

辉光放电质谱技术应用进展

对辉光放电质谱(GDMS)在金属与半导体、非导体、薄层与深度分析、分子信息分析方面的应用和一些新装置、新方法进行了综述.着重介绍了近20年来我国学者在辉光放电质谱方面的成就,并结合国际上的报道对该领域的发展现状进行了总结.     

Spectroscopic evaluation of a compact magnetically boosted radiofrequency glow discharge for time-of-flight mass spectrometry

A compact magnetically boosted radiofrequency glow discharge (GD) has been designed, constructed and its analytical potential evaluated by its coupling to a mass spectrometer (MS). Simple modifications to the original source configuration permitted the insertion of permanent magnets. Small cylindrical Nd–Fe–B magnets (∅ = 4 mm, h = 10 mm) were placed in an in-house-modified GD holder disc that allows easy and fast exchange of the magnets. The different processes taking place within the GD plasma under the influence of a magnetic field, such as sputtering, ionisation processes and ion transport into the MS, were studied using different GD operating conditions. Changes to the ionisation and ion transport efficiency caused by the magnetic field were studied using an rf-GD-TOFMS setup. A magnetic field of 60–75 gauss (G) was found not to affect the sputtering rates but to enhance the analyte ion signal intensities while decreasing the Ar species ion signals. Moreover, magnetic fields in this range were shown not to modify the crater shapes, enabling the fast and sensitive high depth resolved analysis of relatively thick coated samples (micrometre) by using the designed compact magnetically boosted rf-GD-TOFMS.

Evaluation of a pulsed glow discharge time-of-flight mass spectrometer as a detector for gas chromatography and the influence of the glow discharge source parameters on the information volume in chemical speciation analysis

The figures of merit of a pulsed glow discharge time-of-flight mass spectrometer (GD-TOFMS) as a detector for gas chromatography (GC) analysis were evaluated. The mass resolution for the GD-TOFMS was determined on FWHM in the high mass range (²⁰⁸Pb⁺) as high as 5,500. Precision of 400 subsequent analyses was calculated on ⁶³Cu⁺ to be better than 1% RSD with no significant drift over the time of the analysis. Isotope precision based on the ⁶³Cu⁺/⁶⁵Cu⁺ ratio over 400 analyses was 1.5% RSD. The limits of detection for gaseous analytes (toluene in methanol as solvent) were determined to be as low as several hundred ppb or several hundred pg absolute without using any pre-concentration technique. Furthermore, the different GD source parameters like capillary distance, cathode–anode spacing, and GD source pressure with regards to the accessible elemental, structural, and molecular information were evaluated. It was demonstrated that each of these parameters has severe influence on the ratio of elemental, structural, and parent molecular information in chemical speciation analysis.     

Model of microsecond pulsed glow discharge in hollow cathode for mass spectrometry

A new model for microsecond pulsed glow discharge in a hollow cathode and its afterglow is described. The model is based on the Monte-Carlo method together with a new method for electrical field calculation, which is based on some phenomenological laws of plasma behavior. The afterglow model uses continuity and Poisson equations. A qualitative agreement between the model results and results published in experimental and theoretical works is demonstrated. Some processes in the microsecond pulsed discharge in the hollow cathode, such as sputtering, ionization and transfer of sample, are investigated. The model is successfully used for the optimization of the operational parameters of the time-of-flight mass spectrometer with ionization by microsecond pulsed glow discharge in a hollow cathode.     

The laser as an analytical probe in glow discharge mass spectrometry

A pulsed dye laser was used alone and in combination with an auxiliary glow discharge for diagnostic studies. We have compared the mass ablation rate and ion signal in high vacuum and in the presence of an ambient buffer gas. Laser pulse energy and repetition rate were studied over the analytical range of the system. The effect of ambient gas pressure on redeposition was determined for three different gases: helium, neon, and argon. The laser/auxiliary discharge system was also shown to have analytical utility for the analysis of nonconducting samples. Spectra are included to illustrate the enhancement of the laser atomization/discharge ionization scheme over laser atomization/ionization.Presented in part at the 1989 European Winter Conference on Plasma Spectrochemistry, Reutte, Austria     

辉光放电质谱法测定高纯材料中痕量硫杂质

准确测定并控制材料中杂质元素含量是发挥高纯材料性能不可或缺的环节。辉光放电质谱法(GDMS)是准确、快速、高灵敏分析高纯材料中痕量及超痕量硫的理想方法。对GDMS分析高纯铜和镍基高温合金中痕量硫的质谱干扰进行了讨论,优化了放电电流和放电电压,采用多种标准物质对硫的相对灵敏度因子(RSF)进行了校准和验证,并与二次离子质谱法(SIMS)进行分析结果比对,验证了GDMS定量分析结果的准确性和可靠性。     

A radiofrequency glow-discharge-time-of-flight mass spectrometer for direct analysis of glasses

A radiofrequency (rf) glow-discharge (GD) ion source coupled to a commercial on-axis time-of-flight mass spectrometer (TOFMS) has been developed for the direct analysis of non-conducting samples. Different instrumental configurations of the rf-GD source, including the optional use of a sampler cone and the possibility of allowing electrical floating of the discharge, were evaluated first with a conducting sample. Higher ion signals were obtained when the GD was electrically floating and no sampler cone was used. A homogeneous glass was then analyzed using two different rf-GD configurations—with a sampler cone and discarding the use of the sampler cone. The atomic mass spectra obtained with the TOFMS using both configurations were compared. Analyte signals were systematically higher for the latest mode which avoids the sampler cone. The analytical capability of the proposed rf-GD–TOFMS system for the analysis of thick glasses, up to 6 mm, has been investigated in terms of sensitivity, isotopic ratio accuracy, and mass-resolving power. Different homogeneous glasses (including glasses as thick as 6 mm) have been analyzed and major and minor elements were detected. Isotope ratio accuracies of about ±1% and mass resolving powers of about 700 were observed.     

辉光放电质谱法测定核级石墨粉中痕量杂质

建立了直流辉光放电质谱法(DC-GDMS)测定核级石墨粉中痕量杂质元素的方法。用一定的压力将石墨粉镶嵌在高纯铟片上,形成一个直径约为5 mm的圆形石墨薄层,用铟片辅助石墨粉放电,实现了粉状样品直接检测。优化的实验条件为放电电流0.8 mA,放电电压1.2 kV,放电气体流速0.437 mL/min。用石墨粉标准样品(19J T61029)单点校准了仪器相对灵敏度因子,消除基体效应,实现15个关键杂质元素定量分析。方法检出限为5.0 ng/g,在单侧0.05显著性水平下,利用Student’s t检验,方法测定结果 t值均小于临界值,与标准值无显著性差异。相对标准偏差(RSD)均小于10%。本方法与电感耦合等离子体光谱法测定结果比较,相对误差在2.4%～17.4%之间。     

The formation of an oscillating system during the sputtering of sapphire single crystal with pulsed glow discharge

Sapphire (α-Al₂O₃, transparent corundum) single crystals were analyzed with pulsed direct current glow discharge mass spectrometry. Combined hollow cathode was used as a discharge cell. To obtain stable sputtering of dielectric material, a formation of initial surface conductivity via preliminary vacuum deposition of thin metallic layer was proposed. Al and Ta film of different thickness (30–200 nm) were considered for this purpose. The approach was found to provide the effective sputtering of dielectrics. The formation of an oscillating system was shown during the sputtering of sapphire samples in a tantalum combined hollow cathode cell. For oriented sapphire single crystals, periodic oscillations of ²⁷Al⁺ intensity were acquired. This phenomenon was observed only for dielectric single crystals and not for other dielectric samples, e.g. alumina ceramic or fused quartz. The linear dependence of oscillation period on the duration of discharge pulse was found. The origin of these oscillations seems to be attributed to periodic fluctuations of surface conductivity. Oscillation periods calculated for two different orientations of sapphire single crystals (001 and 012) were found to be proportional to the main period of sapphire lattice. Therefore, an assumption that the crystal internal structure of the sample might be the cause of the oscillations is discussed.     

Direct determination of trace amounts of acetic acid using a novel ambient glow discharge ion source

<正>A novel ambient glow discharge ion source with improved line-cylinder electrodes is put forward and designed in this paper.The diameters of inner and outer electrodes are 0.16 and 4 mm respectively.With a special assembly method,a perfect coaxiality of the two electrodes is obtained.From the gas discharge experiment,it can be seen that the discharge can stably work in normal glow discharge mode.The operating currents of the ion source are in an order of milliamperes and can generate a much larger number and wider variety of reagent ions.The MS experiment shows that the ion source has higher detection sensitivity.     

Investigation of the afterglow time regime in pulsed radiofrequency glow discharge time‐of‐flight mass spectrometry

The pulsed power operation mode of a radiofrequency (rf) glow discharge time‐of‐flight mass spectrometer was investigated, for several ions, in terms of intensity profiles along each pulse period. Particular attention was paid to the plateau and transient afterglow regions. An rf pulse period of 4 ms and a duty cycle of 50% was selected to evaluate the influence of discharge parameters in the afterglow delay and shape of Ar⁺, Ar₂⁺ and several analytes (Br, Cl, Cu) contained in polymeric layers. Pulse shapes of Ar⁺ and Ar₂⁺ ions vary with pressure and power. At low pressures the highest intensity is observed in the plateau while at higher pressures (>600 Pa) the afterpeak is the dominant region. Although the influence of the applied power is less noticeable, a widening of the afterglow time regime occurs for Ar⁺ when increasing the power. Maximum intensity of the argon signal is measured in the afterglow at 30 W, while the area of such afterpeak increases with power. The maximum intensity of Ar₂⁺ is obtained at the highest power employed (60 W) and the ratio maximum intensity/afterglow area remains approximately constant with power. Analytes with ionization potentials below (Cu) or just above (Br) the argon metastable energy show maxima intensities after argon ions decay, indicating they could be ionized by collisions with metastable Ar atoms. Chlorine signals are observed in the afterglow despite their ionization potential is well above the energy of argon metastable levels. Moreover, they follow a similar pattern to that observed for Ar₂⁺, indicating that charge‐transfer process with Ar₂⁺ could play a significant role. Copyright © 2011 John Wiley & Sons, Ltd.     

Direct analysis of glass powder samples by radio frequency glow discharge atomic emission spectrometry (rf-GD-AES)

A method is described for the elemental analysis of glass powder samples by rf-GD-AES. Glass powder samples were pressed without binder to form sample disks. A brass sample holder was designed to hold the pellet onto the source and provide a good vacuum seal. Sample preparation conditions and particle sizes are shown to influence spectral characteristics and plasma stabilization times. The discharge operating parameters were optimized based on both raw analyte signal intensity (S) and signal-to-background ratio (S/B), the latter was found more useful in terms of sample-to-sample precision and quantification. A NIST Standard Reference Material (SRM 89 Lead-Barium Glass) was used to evaluate the method. The limits of detection for trace components ranged from 1–10 g/g for several elements, depending on the concentrations of the analytes in the SRM. Sample-to-sample reproducibilities were better than 10% RSD and linear calibration curves were obtained using either the Si (I) optical emission as an internal standard or the individual analyte's S/B characteristics.     

Study of a pulsed glow discharge ion source for time-of-flight mass spectrometry

This paper describes a new type of glow discharge (GD) ion source coupled to a time-of-flight mass spectrometer (TOFMS). The GD is operated in the microsecond pulse (μs-pulse) mode. The operational parameters of the μs-pulse GD were optimized against the ion signals, giving 180 Pa for the discharge pressure, 3 A for the transient discharge current, 1.75 kHz for the discharge frequency and 2 μs for the discharge pulse duration. Experimental results show that the discharge current in the μs-pulse mode can be one order of magnitude higher than that obtained in the d.c. mode. The structure of the interface between the μs-pulse GD and the mass spectrometer was found to be critical, and a Macor disc must be applied in front of the sampling orifice in order to shield the sampling plate from the anode of the GD to achieve both a good vacuum and the best sputtering. A transient sputtering rate of 24.4 μs s⁻¹ mm⁻² was reached in the μs-pulse mode and was significantly higher than that for the d.c.-GD. Typical mass spectra of brass and nickel samples were studied and are discussed. © 1997 Elsevier Science B.V.     

辉光放电质谱法定量测定重掺晶体硅中替位碳含量

采用辉光放电质谱法测定单晶硅中替位碳含量,通过优化仪器工作条件,得到最佳放电参数.利用低温傅里叶变换红外光谱法对呈梯度的四个单晶硅片中替位碳含量进行赋值,将辉光放电质谱法测得替位碳强度与硅的离子束比与赋值结果作工作曲线,计算得到相对灵敏度因子(RSFcal)为1.19.在优化过的工作条件下,用辉光放电质谱法测未知样,用...     

Volatile organic compound analysis by pulsed glow discharge time of flight mass spectrometry as a structural elucidation tool

Pulsed glow discharge (PGD) coupled to time of flight mass spectrometry (TOFMS) has been investigated for volatile organic compound (VOC) identification and determination. Optimization of PGD operational conditions (chamber design, applied power, pressure and duty cycle) was performed using acetone and benzene as model compounds. During the different optimizations, molecular, fragment and elemental information were obtained when characteristic GD pulse regions were measured. An exploratory study for several VOCs (lineal hydrocarbons, oxygen‐containing compounds and aromatic compounds) revealed the capability of the PGD to provide crucial information to elucidate structures (fragments), molecular ions or even proton affinity nature of the molecules; this last information is a consequence of the enriched proton environment generated along the afterglow region for the ionization chamber used. Analytical characteristics were evaluated with solid phase microextraction–gas chromatography coupled to PGD‐TOFMS for special aromatic hydrocarbons (benzene, toluene, ethylbenzene, xylene: BTEX) in water, showing a good performance in terms of reproducibility and sensitivity. Copyright © 2017 John Wiley & Sons, Ltd.     

Design and construction of glow discharge-ion trap mass spectrometer (GD-ITMS) and its application for the analysis of volatile organic samples

In this study, we present a newly designed see-through type hollow cathode glow discharge (St-HCGD) cell developed for the analysis of volatile organic materials in an ion trap mass spectrometer. The cell was interfaced with a homemade ion trap mass spectrometer by adopting skimmer and sampler in an optimized dimensions based on the computer simulation done by SIMION software. The St-HCGD cell has a relatively small size (4×4×7 cm) with the diameter of the inner tube of 0.25′′. The anode and cathode were made of stainless steel-304 and helium was used as a buffer gas for discharge to enhance the Penning ionization process rather than sputtering process. Mass spectra of volatile organic samples such as benzene, toluene, cyclohexane were obtained by using the St-HCGD-ITMS.     

Comparison of dielectric barrier discharge, atmospheric pressure radiofrequency-driven glow discharge and direct analysis in real time sources for ambient mass spectrometry of acetaminophen

Three plasma-based ambient pressure ion sources were investigated; laboratory constructed dielectric barrier and rf glow discharges, as well as a commercial corona discharge (DART source). All were used to desorb and ionize a model analyte, providing sampling techniques for ambient mass spectrometry (MS). Experimental parameters were optimized to achive highest signal for acetaminophen as the analyte. Insight into the mechanisms of analyte desorption and ionization was obtained by means of emission spectrometry and ion current measurements. Desorption and ionization mechanisms for this analyte appear to be identical for all three plasma sources. Emission spectra differ only in the intensities of various lines and bands. Desorption of solid analyte requires transfer of thermal energy from the plasma source to sample surface, in the absence of which complete loss of MS response occurs. For acetaminophen, helium was the best plasma gas, providing 100- to 1000-fold higher analyte response than with argon or nitrogen. The same trend was also evident with background ions (protonated water clusters). MS analyte signal intensity correlates with the ion density (expressed as ion current) in the plasma plume and with emission intensity from excited state species in the plasma. These observations support an ionization process which occurs via proton transfer from protonated water clusters to analyte molecules.     

Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry

During the last decade the photovoltaic industry has been growing rapidly. One major strategy to reduce the production costs is the use of thin film solar cells based on hydrogenated amorphous silicon (a-Si:H). The potential of pulsed radiofrequency glow discharge coupled to optical emission spectrometry (rf-PGD-OES) for the analysis of such type of materials has been investigated in this work. It is known that when hydrogen is present in the argon discharge, even in small quantities, significant changes can occur in the emission intensities and sputtering rates measured. Therefore, a critical comparison has been carried out by rf-PGD-OES, in terms of emission intensities, penetration rates and depth resolution for two modes of hydrogen introduction in the discharge, manually external hydrogen in gaseous form (0.2% H₂–Ar) or internal hydrogen, sputtered as a sample constituent. First, a comparative optimisation study (at 600 Pa and 50 W) was performed on conducting materials and on a silicon wafer varying the pulse parameters: pulse frequency (500 Hz–20 kHz) and duty cycle (12.5–50%). Finally, 600 Pa, 50 W, 10 kHz and 25% duty cycle were selected as the optimum conditions to analyse three types of hydrogenated samples: an intrinsic, a B-doped and a P-doped layer based on a-Si:H. Enhanced emission intensities have been measured for most elements in the presence of hydrogen (especially for silicon) despite the observed reduced sputtering rate. The influence of externally added hydrogen and that of hydrogen sputtered as sample constituent from the analysed samples has been evaluated.