CoPt(FePt)-C纳米复合膜的结构与磁性

用磁过滤脉冲真空电弧沉积方法制备了CoPt(FePt) C纳米复合薄膜，并在不同温度下进行了退火处理，研究了薄膜中碳的含量以及退火温度对薄膜结构与磁性能的影响.制备态薄膜经过足够高的温度退火后，x射线衍射和磁力显微镜分析发现，在碳基质中生成了面心四方相的CoPt(FePt)纳米颗粒.对于特定组分为Co24Pt31C45和Fe43Pt35C22的薄膜，矫顽力以及颗粒尺寸都随退火温度的升高而增大，当退火温度为700℃时，Co24Pt31C45薄膜的矫顽力为21×105A/m，晶粒尺寸为17nm;当退火温度为650℃时，Fe43Pt35C22相应值分别为28×105A/m和105nm. 关键词： 磁记录材料 磁性薄膜 CoPt FePt纳米复合薄膜     

Ag对CoPt/Ag纳米复合膜的结构与磁性的影响

采用直流磁控溅射的方法制备了一系列(CoPt/Ag)_n多层膜，然后在不同温度下 进行了退火处理，并对其结构和磁性做了初步的表征，研究了Ag的含量以及薄膜中每一单元 厚度与总厚度对退火后薄膜的结构以及磁性能的影响.结果表明，膜厚较薄时(大约20 nm)有 利于薄膜沿(001)取向生长，Ag的加入不但能够抑制CoPt晶粒的过分长大还可以诱导薄膜的( 001)取向，使退火后的薄膜在垂直于膜面方向上的矫顽力大大增强.对于特定组分为Co ₄₀Pt₄₃Ag₁₇的薄膜，经600℃退火后已经显示了明显的(001) 取向，垂直于膜面方向上的矫顽力为5.6×10⁵ A/m，饱和磁化强度为0.65T, 并 且磁滞回线具有很好的矩形度，剩磁比(s)为0.95. 关键词： 磁记录材料 磁性薄膜 CoPt/Ag纳米复合膜     

高软磁低电导率Fe-Fe3N薄膜的N原子含量调控

微电子器件具有广泛的应用前景,为了使微电子器件具有优良的高频特性,同时具有高饱和磁化强度、低矫顽力以及高电阻率软磁薄膜的研发成为其中的关键.本文采用射频原子源辅助真空热蒸发方法制备了不同N原子含量的Fe-Fe3N软磁薄膜.高饱和磁化强度Fe₃N相含量和(102)取向度的增大,使薄膜的饱和磁化强度增大,相比于Fe薄膜,饱和磁化强度提高了55.2%,达到1705.6 emu/cm³ (1 emu/cm3=10³ A/m).此外, Fe₃N(102)取向度的增大会产生较大的晶格错配,阻碍Fe和Fe₃N晶粒的生长,使薄膜晶粒尺寸降低,矫顽力(50.3 Oe (1 Oe=103/(4π) A/m))比Fe薄膜降低了68.6%.同时,较大的晶格错配也会促进载流子散射,提高了Fe-Fe₃N薄膜电阻率,使得其电阻率(8.80μΩ·m)比Fe薄膜增大了7倍.因此,本文为高饱和磁化强度、低矫顽力以及高电阻率软磁薄膜的研发提供了新方法.     

Nd28Fe66B6/Fe50Co50双层纳米复合膜的结构和磁性

利用磁控溅射法制备了Nd28F66B6/Fe50Co50双层纳米复合磁性薄膜,研究了其结构和磁性.经873K退火处理15min后,利用x射线衍射仪测定薄膜晶体结构,采用俄歇电子能谱仪估算薄膜厚度和超导量子干涉仪测量其磁性.磁性测量表明,1)该系列薄膜具有垂直于膜面的磁各向异性.从起始磁化曲线和小回线的形状特征可知,矫顽力机制主要是由畴壁钉扎控制.2)对于固定厚度(10nm)层的硬磁相Nd-Fe-B和不同厚度(dFeCo=1-100nm)层软磁相FeCo双层纳米复合膜,剩磁随软磁相FeCo厚度的增加快速增加,而矫顽力则减少.当dFeCo=5nm时,最大磁能积达到160×103A/m.磁滞回线的单一硬磁相特征说明,硬磁相Nd-Fe-B层和软磁相FeCo层之间的相互作用使两相很好地耦合在一起.剩磁和磁能积的提高是由于两相磁性交换耦合所致.     

强磁场下Sm-Fe薄膜不同晶态组织演化及磁性能调控

针对Sm-Fe薄膜的不同晶态组织演化和磁性能调控问题,采用分子束气相沉积方法制备Sm-Fe薄膜时,通过改变Sm含量、膜厚和强磁场来调节薄膜的晶态和磁性能.结果表明,Sm含量可以调节Sm-Fe薄膜的晶态组织演化,而晶态组织的演化和强磁场对磁性能有显著影响.Sm-Fe薄膜在Sm原子比为5.8%时是体心立方晶态组织,在Sm含量为33.0%时为非晶态组织,而膜厚和强磁场不会影响薄膜的晶态组织.非晶态薄膜的表面粗糙度和表面颗粒尺寸都比晶态薄膜的小,施加6 T强磁场会使表面颗粒尺寸增大,而表面粗糙度降低.非晶态薄膜的饱和磁化强度M_s比晶态薄膜的M_s(1466 emu/cm~3,1 emu/cm~3=4π×10-10T)低约47.6%,施加6 T强磁场使非晶态和晶态薄膜的M_s均降低约50%.Sm-Fe薄膜的矫顽力H_c在6—130 Oe(1 Oe=103/(4π)A/m)之间,其中,非晶态薄膜的H_c比晶态薄膜的H_c大.施加6 T强磁场使晶态薄膜的H_c增大,而使非晶态薄膜的H_c减小,最高可以减少95%.结果表明含量和强磁场可以用于调控Sm-Fe薄膜的晶态和磁性能.     

退火对FeMn钉扎自旋阀性质的影响

通过对退火后FeMn钉扎自旋阀磁性的研究表明,真空退火对自旋阀的性质有影响.低于200℃的退火能有效的提高钉扎场;退火温度高于200℃时,自旋阀的钉扎场要下降,其他性能也恶化;在300℃时,钉扎场降为零,giantmagnetoresistance(GMR)现象消失.俄歇电子能谱仪(AES)的结果表明,在自旋阀多层膜中存在着晶界扩散 关键词： 真空退火 自旋阀 晶界扩散     

氧化物隔离对Si基片上生长L1_0相FePt薄膜磁性的影响

用MgO和SiO_2两种氧化物将FePt薄膜与Si(100)基片隔离,分析隔离层在FePt层发生A1→L1_0转变过程中的作用,寻找用Si母材涂敷L1_0-FePt磁性层来提高磁力显微镜针尖矫顽力的合理方案.采用磁控溅射法在400?C沉积Fe Pt薄膜,在不同温度进行2 h的真空热处理,分析晶体结构和磁性的变化.结果表明:没有隔离层,Si基片表层容易发生扩散,50 nm厚FePt薄膜的矫顽力最大只有5kOe(1 Oe=10~3/(4π)A·m~(-1));而插入隔离层,矫顽力可以超过10 kOe;MgO在Si基片上容易碎裂,热处理温度不能高于600?C,用作隔离层,FePt的最大矫顽力为12.4 kOe;SiO_2与Si基片的晶格匹配更好,热膨胀系数差较小,能承受的最高热处理温度可以超过800?C,使得Fe Pt的矫顽力可以在5 kOe到15 kOe范围内调控,更适合用于制作矫顽力高并可控的磁力显微镜针尖.     

分子束外延制备的垂直易磁化MnAl薄膜结构和磁性

系统地研究了利用分子束外延方法在GaAs(001) 衬底上外延生长的MnAl_x薄膜的结构和垂直易磁化特性随组分及生长温度的依赖关系. 磁性测试表明, 可在较大组分范围内 (0.4≤x≤1.2) 获得大矫顽力的垂直易磁化MnAl_x薄膜, 然而同步辐射X射线衍射和磁性测试发现当x≤0.6时MnAl薄膜出现较多的软磁相, 当x >0.9时, MnAl薄膜晶体质量和化学有序度逐渐降低, 组分为MnAl_0.9时制备的薄膜有最好的[001]取向. 随着生长温度的增加, MnAl_0.9薄膜的有序度、垂直磁各向异性常数、矫顽力和剩磁比均增加, 350℃时制备的MnAl_0.9薄膜化学有序度高达0.9, 其磁化强度、剩磁比、矫顽力和垂直磁各向异性常数分别为265emu/cm³、93.3%、8.3kOe (1 Oe=79.5775A/m)和7.74Merg/cm³ (1 erg=10^-7J). 不含贵金属及稀土元素、良好的垂直易磁化性质、 与半导体材料结构良好的兼容性以及磁性能随不同生长条件的可调控 性使得MnAl薄膜有潜力应用于多种自旋电子学器件. 关键词： 分子束外延 大矫顽力材料 磁各向异性     

纳米Zn_(0.6)Co_xFe_(2.4-x)O_4晶粒的结构相变与磁性研究

采用溶胶 凝胶自燃烧法制备了纳米尺度的锌钴铁氧体Zn0 6 CoxFe2 4 -xO4 (x =0— 0 30 )粉体 ,分别在不同温度下进行了热处理 ,利用x射线衍射仪 (XRD)和振动样品磁强计 (VSM)对其物相结构和磁性进行了测量和分析 .实验结果表明 ,锌钴铁氧体Zn0 6 Co0 1 5Fe2 2 5O4 在 5 5 0— 80 0℃温度区间出现α Fe2 O3过渡相 ,在高于 80 0℃温度时生成单一尖晶石相锌钴铁氧体 ;随钴含量的增加 ,Zn0 6 CoxFe2 4 -xO4 的比饱和磁化强度先增后减 ,x =0 0 75— 0 1 5比饱和磁化强度较高 ;Zn0 6 CoxFe2 4 -xO4 在 1 30 0℃时x =0 0 75的矫顽力为 4 75 2 0A m ,x≥ 0 1 5时矫顽力在 1 2 0 0℃附近随温度缓慢上升 ,在 1 2 0 0— 1 30 0℃之间为平台状态 ,并且随钴含量的增加 ,矫顽力略有升高 .在x =0 1 0附近 ,可同时获得较高的比饱和磁化强度和较高的矫顽力     

Sm(CobalFe0.1Cu0.1Zr0.033)6.9高温永磁合金的矫顽力

对Sm(Co_balFe_0.1Cu_0.1Zr_0.033)_6.9合金, 经810℃等温时效后以0.5℃/min逐渐冷却, 在600℃-400℃温度区间淬火, 研究了不同淬火温度下的磁滞回线、磁畴和矫顽力温度系数β. 发现时效600℃淬火后磁滞回线出现台阶状, 说明畴壁中应存在两处钉扎. 随淬火温度的降低, 合金的室温矫顽力显著增加, 磁滞回线的台阶消失. 通过磁畴形貌发现时效600℃淬火后的磁畴接近条形畴, 1:5相中Cu分布相对均匀, 形成的畴壁钉扎较弱, 从而使磁滞回线出现台阶, 决定矫顽力的畴壁钉扎位于两相界面处; 随时效淬火温度的降低, 磁畴逐渐细化, 畴壁1:5相中的畴壁能降低, 形成了较强的内禀钉扎, 并决定材料的矫顽力, 两相界面处的畴壁钉扎被掩盖. 对不同温度淬火合金的高温矫顽力研究表明, 最强的畴壁钉扎位于两相界面处时, 矫顽力随温度升高逐渐增加, 矫顽力出现温度反常现象; 最强的畴壁钉扎位于1:5相中心时, 矫顽力随温度升高逐渐衰减. 当测试温度达到500℃后不同淬火温度样品的矫顽力几乎相同, 此时最强畴壁钉扎均在两相界面处.     

Effects of spacer layers on magnetic properties and exchange couplings of Nd-Fe-B/Nd-Ce-Fe-B multilayer films

The influences of the spacer-layer Ta on the structures and magnetic properties of Nd Fe B/Nd Ce Fe B multilayer films are investigated via DC sputtering under an Ar pressure of 1.2 Pa. An obvious(00l) texture of the hard phase is observed in each of the films, which indicates that the main phase of the film does not significantly change with Ta spacer-layer thickness. As a result, both the remanence and the saturation magnetization of the magnet first increase and then decrease,and the maximum values of 4πM_r and H_(cj) are 10.4 k Gs(1 Gs = 10_(-4)T) and 15.0 kOe(1 Oe = 79.5775 A·m_(-1)) for the film with a 2-nm-thick Ta spacer-layer, respectively, where the crystalline structures are columnar shape particles. The measured relationship between irreversible portion D(H) =-?M_(irr)/2 M_r and H indicates that the nucleation field of the film decreases with spacer layer thickness increasing, owing to slightly disordered grains near the interface between different magnetic layers.     

Effects of thickness and annealing condition on magnetic properties and thermal stabilities of Ta/Nd/NdFeB/Nd/Ta sandwiched films

Ta/Nd/NdFeB/Nd/Ta sandwiched films are deposited by magnetron sputtering on Si(100) substrates,and subsequently annealed in vacuum at different temperatures for different time.It is found that both the thickness of NdFeB and Nd layer and the annealing condition can affect the magnetic properties of Ta/Nd/NdFeB/Nd/Ta films.Interestingly,the thickness and annealing temperature show the relevant behaviors that can affect the magnetic properties of the film.The high coercivity of 24.1 kOe(1 Oe = 79.5775 A/m) and remanence ratio(remanent magnetization/saturation magnetization)of 0.94 can be obtained in a Ta/Nd(250 nm)/NdFeB(600 nm)/Nd(250 nm)/Ta film annealed for 3 min at 1023 K.In addition,the thermal stability of the film is also linked to the thickness of NdFeB and Nd layer and the annealing temperature as well.The excellent thermal stability can be achieved in a Ta/Nd(250 nm)/NdFeB(600 nm)/Nd(250 nm)/Ta film annealed at1023 K.     

Effects of underlayer materials and substrate temperatures on the structural and magnetic properties of Nd2Fe14B films

Thin films of Nd_2Fe_{14}B were fabricated on heated glass substrates by dc magnetron sputtering. Different material underlayers (Ta, Mo, or W) were used to examine the underlayer influence on the structural and magnetic properties of the NdFeB films. Deposited on a Ta buffer layer at 420℃, the 300 nm thick NdFeB films were shown to be isotropic. But when the substrate temperature T_s was elevated to 520℃, the Nd_2Fe_{14}B crystallites of (00l) plane were epitaxially grown on Ta (110) underlayer. In contrast, Mo (110) buffer layer could not induce any preferential orientation in NdFeB film irrespective of the substrate temperature or film thickness. The W buffer layer was found to be most effective for the nucleation of Nd_2Fe_{14}B crystallites with c-axis alignment perpendicular to the film plane when T_s<490℃. But at T_s=490℃ the magnetic layer became isotropic. The maximum coercivity obtained was about 995 kA/m for the 100nm film deposited on W underlayer at 490℃. These variations were tentatively explained in terms of the lattice misfit between the underlayer and the magnetic layer, combined with the considerations of underlayer morphologies.     

高温氢退火还原V2O5制备二氧化钒薄膜及其性能的研究

过渡金属氧化物二氧化钒(VO₂)在温度340 K附近会发生金属绝缘体的转变(metal-insulator transition, MIT). 基于金属绝缘体的转变性质, VO₂薄膜材料具有很好的应用前景. 本文首先采用脉冲激光沉积制备了高质量的V₂O₅薄膜, 再通过高温氢退火还原V₂O₅薄膜制备出VO₂多晶薄膜. 研究了不同的退火温度、退火时间、退火气氛对VO₂薄膜制备的影响, 采用X射线衍射、X射线光电子能谱、变温电阻特性测量等手段对样品进行分析, 发现在H₂(5%)/Ar退火气氛下, 在一定的退火温度范围内(500–525 ℃), 退火 3 h, 得到了B相和M相共存的VO₂薄膜, 具有M相的VO₂的MIT特性, 而相同退火温度下退火时间达到4.5 h, 薄膜完全变成B相的VO₂. 通过纯Ar气氛下对B相VO₂再退火, 得到了转变温度为350 K, 电阻突变接近4个数量级的M相的VO₂薄膜. 实现了VO₂的B相和M相的相互转变. 关键词： 2薄膜')" href="#">VO₂薄膜 金属绝缘体转变 氢退火     

Influence of temperature on thermal relaxation of exchange bias field in CoFe/Cu/CoFe/IrMn spin valve

A multilayered spin valve film with a structure of Ta(5 nm)/Co_(75)Fe_(25)(5 nm)/Cu(2.5 nm)/Co_(75)Fe_(25)(5 nm)/Ir_(20)Mn_(80)(12 nm)/Ta(8 nm) is prepared by the high-vacuum direct current(DC) magnetron sputtering. The effect of temperature on the spin valve structure and the magnetic properties are studied by x-ray diffraction(XRD), atomic force microscopy(AFM), and vibrating sample magnetometry. The effect of temperature on the exchange bias field thermomagnetic properties of multilayered spin valve is studied by the residence time of samples in a reverse saturation field. The results show that as the temperature increases, the Ir Mn(111) texture weakens, surface/interface roughness increases, and the exchange bias field decreases. Below 200℃, the exchange bias field decreases with the residence time increasing, and at the beginning of the negative saturation field, the exchange bias field Hex decreases first quickly and then slowly gradually. When the temperature is greater than 200℃, the exchange bias field is unchanged with the residence time increasing.     

过量B的Ta/CoFeB/MgO薄膜垂直各向异性和温度稳定性的增强

以CoFeB/MgO为核心单元的垂直各向异性薄膜体系和相关的垂直磁隧道结已获得广泛研究,其中CoFeB的B含量基本都保持为原子比20%.本文采用磁控溅射制备了Ta/(Co0.5Fe0.5)1-xBx/MgO三明治结构及生长顺序相反的系列薄膜,并在573—623K进行真空退火,研究了样品垂直各向异性随B成分的变化.结果显示,当B含量减小到10%时,Ta/CoFeB/MgO体系的垂直各向异性明显降低;相反,当B含量增加至30%时,该体系的垂直各向异性明显增强;发现在高B含量的情形下,样品的垂直各向异性大小与温度稳定性均与三明治结构的生长顺序密切相关;获得了具有优异温度稳定性的垂直磁化MgO/CoFeB/Ta样品.结果表明适当增加B含量是增强CoFeB/MgO体系垂直各向异性和温度稳定性的有效途径之一.     

The effect of thickness and annealing condition on the microstructure and magnetic properties of Fe/Pt multilayer thin films

[Fe(0.5 nm)/Pt(0.5 nm)]₄₀, [Fe(1 nm)/Pt(1.5 nm)]₂₀ and [Fe(3 nm)/Pt(3 nm)]₁₀ multilayer were prepared by DC magnetron sputtering. By conventional furnace annealing (CA) at 270–600 °C for various time, all of the films still remained the disordered structure with the soft magnetic phase. By rapid thermal annealing (RTA) at 500 °C for various time, we obtained the [Fe(1 nm)/Pt(1.5 nm)]₂₀ and [Fe(3 nm)/Pt(3 nm)]₁₀ films with L1₂ ordered FePt₃ phase which was almost ferromagnetic at room temperature. However, the [Fe(0.5 nm)/Pt(0.5 nm)]₄₀ films was still disordered state even under RTA. Compared with CA, RTA exposed an outstanding effect on accelerating the phase transition when the film thickness is over [Fe(0.5 nm)/Pt(0.5 nm)]₄₀.     

薄膜异质结中磁性斯格明子的相关研究

磁性斯格明子由于具有拓扑保护、尺寸小、驱动电流密度低等优异的属性,有望作为未来超高密度磁存储和逻辑功能器件的信息载体.为了满足器件中信息写入和读取的基本要求,需要在室温下实现斯格明子的精确产生、操控和探测.该综述简要介绍最近我们针对上述问题取得的一系列研究进展,包括:1)证明可以通过控制磁性薄膜材料的垂直磁各向异性在室温下产生斯格明子,并进一步在基于反铁磁的薄膜异质结中发现了室温、零磁场下稳定存在的斯格明子;2)证明能够利用电流产生的自旋轨道力矩操控斯格明子,并进一步制备出一种基于斯格明子的原理型器件,实现了利用电学方式产生和操控数量可控的斯格明子.     

Enhanced magnetic properties of Nd–Fe–B thin films crystallized by heat treatment

Nd₂Fe₁₄B Φ phase crystallites were formed in Nd_16.7Fe_65.5B_17.8 thin films prepared by RF sputtering with subsequent heat treatment. The 2 μm-thick films were deposited onto 0.1 mm Mo sheets at an average substrate temperature (T_s) of 365°C. The enhanced magnetic properties of the magnetically anisotropic thin films were investigated using different heating rates (h_r) of 10°C, 20°C, 50°C and 100°C/min in an annealing experiment. Transformation from the amorphous phase to the crystalline phase is clearly manifested by the formation of fine crystallites embedded as a columnar matrix of Nd₂Fe₁₄B phase. High-resolution scanning electron microscope data of the cross-section of the annealed films show columnar stacking of Nd₂Fe₁₄B crystallites with sizes <500 nm. Transmission electron microscope observations revealed that the microstructure of these films having out-of-plane magnetization consists of uniformly distributed Φ phase with grain size around 400 nm together with small Nd rich particles. This grain size of Φ phase is comparable to the single domain particle diameter of Nd₂Fe₁₄B. Significant change in _iH_c, 4πM_r and 4πM_s with h_r was confirmed. Annealing conditions with a heating rate of 50°C/min to an annealing temperature (T_a) of 650°C for 30 min was consequently found to give optimum properties for the NdFeB thin films. The resulting magnetic properties, considered to be the effect of varying h_r were _iH_c= 1307–1357 kA/m, 4πM_r=0.78–1.06 T and 4πM_s=0.81–1.07 T.     

Perpendicularly oriented barium ferrite thin films with low microwave loss,prepared by pulsed laser deposition

Barium ferrite(Ba M) thin films are deposited on platinum coated silicon wafers by pulsed laser deposition(PLD).The effects of deposition substrate temperature on the microstructure,magnetic and microwave properties of Ba M thin films are investigated in detail.It is found that microstructure,magnetic and microwave properties of Ba M thin film are very sensitive to deposition substrate temperature,and excellent Ba M thin film is obtained when deposition temperature is 910℃ and oxygen pressure is 300 m Torr(1 Torr = 1.3332×10~2Pa).X-ray diffraction patterns and atomic force microscopy images show that the best thin film has perpendicular orientation and hexagonal morphology,and the crystallographic alignment degree can be calculated to be 0.94.Hysteresis loops reveal that the squareness ratio(M_r/M_s) is as high as 0.93,the saturated magnetization is 4004 Gs(1 Gs = 10~4T),and the anisotropy field is 16.5 kOe(1 Oe = 79.5775 A·m~(-1)).Ferromagnetic resonance measurements reveal that the gyromagnetic ratio is 2.8 GHz/kOe,and the ferromagnetic resonance linewith is108 Oe at 50 GHz,which means that this thin film has low microwave loss.These properties make the Ba M thin films have potential applications in microwave devices.