Phonon scattering by Ni3+ ions in Al2O3

Previous thermal conductivity measurements on Al₂O₃ + Ni single crystals have been extended down to 80 mK. The quantitative analysis shows that the lineshape of the low temperature resonant is determineded by random strains in the crystal, and gives a possible value for the ‘tunneling splitting’ 3Γ of 0.54 cm^?1.     

H+和Ar11+激发Si的K壳层X射线发射研究

测量了50–250 keV H⁺和1.0–3.0 MeV Ar¹¹⁺ 轰击Si表面过程中辐射的X射线. 结果表明, 在Ar¹¹⁺入射的情况下, 引起了Si的L壳层上3, 4个电子的多电离.计算了Si的K壳层X射线产生截面, 并将两体碰撞近似(BEA), 平面波恩近似, ECPSSR理论计算与实验值进行了对比. ECPSSR理论与质子产生的截面数据能够很好地符合; 而考虑多电离后, BEA理论与Ar¹¹⁺的实验结果符合较好. 关键词： X射线 高电荷态重离子 多电离     

Luminescent collisions of He+ and He++ ions with H2 molecules at energies below 2 keV

Spectroscopic studies of collisions between He⁺ and He⁺⁺ ions with H₂ gas target have been performed in the 200–600 nm wavelength range. Atomic lines of hydrogen Balmer series and several helium lines were identified and their excitation functions between 50 eV and 1 keV (2 keV for He⁺⁺) were determined.     

Structural and compositional changes in ion-bombarded Ta2O5

A detailed study of the effect of heavy-ion bombardment on Ta₂O₅ has been undertaken using a combination of radioactive tracer techniques, electron microscopy, and Rutherford backscattering. Crystalline Ta₂O₅ is amorphized at ~6 × 10¹³ ions cm^?2, while at a dose of ~5 × 10¹⁶ ions cm^?2 the electron microscopy reveals the development of random grains of a new crystalline phase. By ~1 × 10¹⁷ ions cm^?2 the grains are not yet overlapping but still yield a diffraction pattern consistent with either δ-Ta-O (not to be confused with TaO) or Ta_1?xO₂, thus indicating that Ta₂O₅, like most other transition-metal oxides, is subject to preferential sputtering. Preferential sputtering was confirmed by backscattering analysis of specimens bombarded to high doses, where the average surface composition was found to be Ta_1.8±0.2O₂ or, equivalently, Ta₂O_2.2±0.2. The surface alteration had an average composition independent of the mass and energy of the incident ions.     

Sputtering yields of PMMA films bombarded by keV C60 ions

A quartz crystal microbalance (QCM) has been used to determine total-mass sputtering yields of PMMA films by 1-16 keV C₆₀^+,2+ ion beams. Quantitative sputtering yields for PMMA are presented as mass loss per incident ion Y_m. Mass-lost rate QCM data show that a 13 keV C₆₀ cluster leads to emission equivalent to 800 PMMA molecules per ion. The power law obtained for the increase in sputtering yield with primary ion energy is in good agreement those predicted by “thermal spike” regime and MD models, when crater sizes are used to estimate sputtering.     

Ar16+和Ar17+离子与Zr作用产生的X射线谱

将超导离子源提供的10—20keV/q Ar¹⁶⁺和Ar¹⁷⁺离子入射到Zr金属表面,在相互作用中产生的X射线谱表明,高电荷态Ar¹⁶⁺离子在金属表面中性化过程中有可能存在多电子激发,使Ar¹⁶⁺的K壳层电子被激发形成空穴,在退激过程中发射特征Kα-X射线.空心原子Ar的K层发射X射线强度随入射离子的动能而减弱,靶原子Zr的L壳层发射X射线强度随入射离子动能的增加而增强.Ar¹⁷⁺的单离子的Kα- 关键词： 高电荷态离子 空心原子 X射线     

Ar16+和Ar17+离子与Zr作用产生的X射线谱

将超导离子源提供的10—20keV/q Ar¹⁶⁺和Ar¹⁷⁺离子入射到Zr金属表面，在相互作用中产生的X射线谱表明，高电荷态Ar¹⁶⁺离子在金属表面中性化过程中有可能存在多电子激发，使Ar¹⁶⁺的K壳层电子被激发形成空穴，在退激过程中发射特征Kα-X射线.空心原子Ar的K层发射X射线强度随入射离子的动能而减弱，靶原子Zr的L壳层发射X射线强度随入射离子动能的增加而增强.Ar¹⁷⁺的单离子的Kα-     

Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors

Ta2O5 and Nb2O5 films are deposited on BK7 glass substrates using an electron beam evaporation method and are annealed at 673 K in the air.In this letter,comparative studies of the optical transmittance,microstructure,chemical composition,optical absorption,and laser-induced damage threshold(LIDT) of the two films are conducted.Findings indicate that the substoichiometric defect is very harmful to the laser damage resistance of Ta2O5 and Nb2O5 films.The decrease of absorption improves the LIDT in films deposited by the same material.However,although the absorption of the Ta2O5 single layer is less than that of the Nb2O5 single layer,the LIDT of the former is lower than that of the latter.High-reflective(HR) coatings have a higher LIDT than single layers due to the thermal dissipation of the SiO2 layers and the decreased electric field intensity(EFI).In addition,the Nb2O5 HR coating achieves the highest LIDT at 25.6 J/cm 2 in both single layers and HR coatings.     

不同酸催化条件下Ta2O5气凝胶的制备

采用溶胶-凝胶技术,以乙醇钽为前躯体,乙醇为溶剂,分别以盐酸、硝酸、硫酸为催化剂,结合CO2超临界干燥技术制备了Ta2O5气凝胶。研究发现：硫酸作催化剂的体系,其胶凝时间远远小于其他体系,且溶剂交换及超临界干燥过程中的收缩开裂现象明显改善;扫描电镜分析结果显示,硫酸为催化剂制备的Ta2O5气凝胶骨架颗粒间存在较严重的团簇现象,比表面积约167 m2/g,明显低于以盐酸、硝酸为催化剂的体系。X射线光电子能谱测试结果显示,Ta2O5气凝胶中无相应的Cl元素或N元素残留,而S元素则基本上滞留在Ta2O5气凝胶中。说明S元素进入了Ta-O-Ta交联结构,正是因为这种结构的引入,Ta2O5气凝胶的收缩龟裂现象得以明显改善并呈现出相对较高的力学性能。     

金属醇盐法制备Ta2O5气凝胶

以乙醇钽为前驱物,采用金属醇盐溶胶-凝胶技术,获得了Ta2O5湿凝胶,分析了不同条件下的溶胶-凝胶过程,并初步探讨了凝胶过程机理。Ta2O5的溶胶-凝胶过程主要受到水量、催化剂用量及钽源浓度等因素的影响：体系在强酸性条件下凝胶,且随着酸性的增强,体系凝胶时间明显缩短;当水量较少时,凝胶时间随水量的增加而增加,但当水量增加到一定程度时,体系凝胶时间基本不变;实验证明,通过增大溶剂用量,体系凝胶时间延长,气凝胶理论密度降低。通过对溶胶-凝胶过程的控制,结合超临界干燥技术,获得了密度低至44 mg/cm3的Ta2O5气凝胶样品。     

Biquadratic exchange interaction between Ru5+ ions in (Ru2O9) clusters

The energy levels of a Ru₂O₉ cluster have been calculated, including a higher order spin interaction. The Ru⁵⁺-Ru⁵⁺ coupling is described by the Hamiltonian ?= -2JS₁· S₂ ?j(S₁·S₂)². The temperature dependence of the magnetic susceptibility is used to determine the values of the bilinear J and biquadratic j exchange integrals: J/k = -161K and j/k = 6.6K. The second term in the Hamiltonian corresponds to a fourth order perturbation involving low spin states.     

Ar+17和 Ar+16谱线的电子碰撞展宽

利用修改后伦敦理工大学的UCL扭曲波程序, 本文计算了自由电子与原子或离子的碰撞反应矩阵, 以此得到它的散射矩阵和碰撞强度.利用碰撞强度, 研究电子碰撞对辐射谱线影响.具体地, 以Ar⁺¹⁷和Ar⁺¹⁶的α线和β线为例, 计算了不同电子温度和密度下谱线的展宽和位移.     

Sputtering of AlxGa1−x As semiconductor targets by Ar+ ions with energies of 2–14 keV

Investigations of the sputtering of Al_xGa_1−x As semiconductor solid solutions by Ar⁺ ions with energies of 2–14 keV are performed. The dependence of the sputtering yield on the energy and angle of incidence of the ions are determined and the character of the surface relief formed during the sputtering is investigated. A comparison with theory shows that the best agreement between theory and experiment is achieved when the Haff-Switkowski formula is used together with Yudin’s stopping cross section. It is shown that the surface binding energies obtained differ from the atomization energies by an amount approximately equal to the amorphization energy. Zh. Tekh. Fiz. 67, 113–117 (June 1997)     

Ta2O5/Ta界面分析的新模型

对Ta₂O₅/Ta样品界面区的深度剖面曲线进行了研究。基于离子溅射引起影响层存在的考虑,提出一种解释该曲线的新模型。通过此模型能很好地拟合实验曲线,并反映了溅射过程中的离子混合效应、原子堆积效应及相应的特征参数。样品由阳极氧化法制得,其厚度为500埃。表面分析在PHI-590型扫描俄歇微探针上完成,所有测量均在室温下进行。研究表明:深度剖面曲线并不符合误差函数分布;影响层的厚度为30—50埃,它是进行深度剖面分析时,决定元素俄歇信号强度的第一位重要因素;深度剖面 关键词：     

Waveguiding and photoluminescence in Er-doped Ta2O5 planar waveguides

The optimization of erbium-doped Ta₂O₅ thin film waveguides deposited by magnetron sputtering onto thermally oxidized silicon wafer is described. Optical constants of the film were determined by ellipsometry. For the slab waveguides, background losses below 0.4 dB/cm at 633 nm have been obtained before post-annealing. The samples, when pumped at 980 nm yielded a broad photoluminescence spectrum (FWHM∼50 nm) centred at 1534 nm, corresponding to ⁴I_13/2-⁴I_15/2 transition of Er³⁺ ion. The samples were annealed up to 600 °C and both photoluminescence power and fluorescence lifetime increase with post-annealing temperature and a fluorescence lifetime of 2.4 ms was achieved, yielding promising results for compact waveguide amplifiers.     

The depth distribution of disorder produced by room temperature 30 keV Ar+ and Cl+ ion irradiation of silicon

The depth distribution of disorder produced by room temperature 30 keV Ar⁺ and Cl⁺ ion irradiation of silicon was monitored by high depth resolution Rutherford backscattering-channelling techniques. A bimodal depth distribution of disorder was observed and under certain implantation conditions a clear dependence of the magnitude of disorder upon incident ion flux noted.     

Charge trapping at Pt/high-k dielectric (Ta2O5) interface

A detailed analysis of the effects of constant low current injection was done, both in accumulation (J=0.001-0.2 mA cm⁻²) and in inversion (J=0.001-0.04 mA/cm²). The samples under investigation were metal-insulator-silicon structures containing high-k dielectric Ta₂O₅ radio frequency sputtered on p-type Si wafers, with Pt metal gate electrodes. The obtained results were compared with the ones obtained for Al gate samples. This experiment confirms the occurrence of charge trapping in the case of high-work-function Pt as metal. The effect has been attributed to emitting of electrons into the Pt conduction band during which creation of empty traps in the dielectric occurs, which then attract electrons injected in the dielectric. In order to examine the reversibility of the process, successive short runs as well as long runs (up to 10000 s) were performed.     

Ta2O5/MgF2异质结构三维光子晶体的偏振性

为了在可见及近红外波段得到具有良好带隙结构的三维光子晶体,利用传输矩阵法分析了MgF₂、Ta₂O₅ 以及Ta₂O₅/MgF₂异质结构三维光子晶体的带隙性质.结果表明：Ta₂O₅/MgF₂异质结构三维光子晶体在820~1 020 nm的近红外波段TM模式下具有不受入射光方向影响的全方位光子带隙.该结构有望用于制作近红外光波段的偏振器件.     

Emission features of Ho ion in Nb2O5, Ta2O5 and La2O3 mixed Li2O-ZrO2-SiO2 glasses

Li₂O-ZrO₂-SiO₂: Ho³⁺ glasses mixed with three interesting d-block elemental oxides, viz., Nb₂O₅, Ta₂O₅ and La₂O₃, were prepared. Optical absorption and photoluminescence spectra of these glasses have been recorded at room temperature. The luminescence spectra of Nb₂O₅ and Ta₂O₅ mixed Li₂O-ZrO₂-SiO₂ glasses (free of Ho³⁺ ions) have also exhibited broad emission band in the blue region. This band is attributed to radiative recombination of self-trapped excitons (STEs) localized on substitutionally positioned octahedral Ta⁵⁺ and Nb⁵⁺ ions in the glass network. The Judd-Ofelt theory was successfully applied to characterize Ho³⁺ spectra of all the three glasses. From this theory various radiative properties, like transition probability A, branching ratio β_r and the radiative lifetime τ_r, for ⁵S₂ emission levels in the spectra of these glasses have been evaluated. The radiative lifetime for ⁵S₂ level of Ho³⁺ ions has also been measured and quantum efficiencies were estimated. Among the three glasses studied the La₂O₃ mixed glass exhibited the highest quantum efficiency. The reasons for such higher value have been discussed based on the relationship between the structural modifications taking place around the Ho³⁺ ions.     

Radiative decay of lithium-like ions following charge exchange collisions of 60 keV O6+ ions with H2

The distribution of captured electrons in the 60 keV $\text{O}{}^{\mathrm{6+}}\text{+}\text{H}{}_2\text{→}\text{O}{}^{\mathrm{5+1}}\text{(nl) +}\text{H}{}_2{}^{\mathrm{+}}$ collision is studied by detection of the subsequent far UV radiation. Strong lines corresponding to the 4f → 3d → 2p cascade have been observed. Assuming that capture to the n = 4 manifold dominates at this energy, a relative population of the l sublevels which increases with l-value is obtained.