The thermodynamic and kinetic properties of hydrogen dimers on graphene

The thermodynamic and kinetic properties of hydrogen adatoms on graphene are important to the materials and devices based on hydrogenated graphene. Hydrogen dimers on graphene with coverages varying from 0.040 to 0.111 ML (1.0 ML = 3.8 × 10¹⁵cm^? 2) were considered in this report. The thermodynamic and kinetic properties of H, D and T dimers were studied by ab initio simulations. The vibrational zero-point energy corrections were found to be not negligible in kinetics, varying from 0.038 (0.028, 0.017) to 0.257 (0.187, 0.157) eV for H (D, T) dimers. The isotope effect exhibits as that the kinetic mobility of a hydrogen dimer decreases with increasing the hydrogen mass. The simulated thermal desorption spectra with the heating rate α = 1.0 K/s were quite close to experimental measurements. The effect of the interaction between hydrogen dimers on their thermodynamic and kinetic properties was analyzed in detail.     

Adsorption and desorption characteristics of 3-dimensional networks of fused graphene

Here we explore the exceptional structural characteristics of a set of graphene-related materials prepared by a wet chemical approach. We present a comprehensive study of the effects of morphology, sonication, temperature, probe species, and stacking behaviour on the measurement of graphene surface area. Nitrogen gas was used in the solid state gas adsorption measurements and methylene blue dye for adsorption measurements on aqueous dispersions of graphene. The surface area values obtained are among the highest reported for synthetic graphenes: 1700 m² g^? 1 in aqueous dispersions and 612 m² g^? 1 in the solid state. Microscopy revealed the graphene used in the study was present in large part as free sheets and electron diffraction confirmed the successful synthesis of high quality graphene with a regular C–C bond length of 1.41 ± 0.02 Å.     

Anomalous scaling behaviour of cobalt cluster size distributions on graphite,epitaxial graphene and carbon-rich (6√3 × 6√3)R30°

The influence of the underlying interface on adsorption of cobalt (Co) is investigated by comparing the nucleation and growth of Co at room temperature on three carbon (C) surfaces, i.e. highly oriented pyrolytic graphite (HOPG), epitaxial graphene/SiC(0001) (hereafter abbreviated as EG) and precursor of EG i.e. C-rich (6√3 × 6√3)R30°/SiC(0001) (hereafter abbreviated as 6√3). On all three surfaces, Co adopts Volmer–Weber growth mode via formation of three-dimensional dome-shaped nanoclusters. Co clusters formed on 6√3 surface are smaller but denser than Co/HOPG or Co/EG. Scaling analysis reveals a critical nucleus size, i* = 1 (atom) and the smallest stable cluster (i* + 1) would be a dimer. Co/HOPG and Co/EG have the same order of magnitude for their cluster densities and sizes. Scaling analyses however show that the i* for Co/EG (i* = 3) is larger than Co/HOPG (i* = 0) and in this respect the smallest stable cluster would be tetramer and monomer respectively. This difference is attributed to the influence of an interface situated between graphene and SiC bulk. It appears that EG is more inert than HOPG towards the adsorption of Co and may act as a better substrate to host Co clusters.     

AFM study of a SiC film grown on Si(1 0 0) surface using a C2H4 beam

A 3C-silicon carbide (SiC) thin film grown on a Si(1 0 0) surface using an ethylene (C₂H₄) molecular beam has been studied by atomic force microscopy. At the center of the irradiation area of the ethylene beam, the shape of the SiC islands was rectangular, the average length of which was 74.5 nm and the average height was 13.1 nm. Each SiC island consists of the SiC particles with the average diameter of 17 nm. Just inside of the boundary region of the beam irradiation, the average size and height of the islands decreased to 50.1 and 8.2 nm, respectively. Just outside of the boundary region, the average size and height decreased to 17.7 and 5.1 nm, respectively. The average reaction probabilities at the above three points were estimated to be 0.14, 0.27 and 2.7%, respectively. New growth mode of the crystal growth is proposed (particles gathering island mode).     

Graphene on SiC(0001) and SiC(0001̅) surfaces grown via Ni-silicidation reactions

This paper presents the structure and electronic properties of graphene grown on 6H-SiC(0001) and SiC(0001?) surfaces via Ni-silicidation reactions at temperatures around 800 °C. Silicidation reactions take place at temperature higher than 400 °C for Ni(10 ML)/SiC and a single-phase θ-Ni₂Si(0001)-layer grows epitaxially on SiC(0001?) at 500 °C, whereas a mixed phase silicide-layer is formed on the SiC(0001) substrate. Annealing at 800 °C leads to growth of ordered graphite layers on both SiC(0001?) and SiC(0001) surfaces with an areal occupation ratio of ～ 65%, which surround the Ni-silicide islands. High-resolution ion scattering analysis reveals that single- and double-layer of graphite grow on the SiC(0001?) and SiC(0001), respectively. The dispersion curve of the π band for the double-layer graphite (DG) on the Si-face lies about 1 eV above that of the single-layer graphite (SG) on the C-face around the Γ-point. The work functions of the SG/SiC(0001?) and DG/SiC(0001) are derived to be 5.15 ± 0.05 and 4.25 ± 0.05 eV, respectively, which coincide well with the theoretical prediction based on the ab initio calculations. The present results indicate that the electronic states of graphene are influenced by the interaction with supports.     

Transport characteristics of a single-layer graphene field-effect transistor grown on 4H-silicon carbide

We have investigated transport characteristics of epitaxial graphene grown on semi-insulating silicon-face 4H-silicon carbide (SiC) substrate by thermal decomposition method in relatively high N₂ pressure atmosphere. We have succeeded in forming 1–2 layers of graphene on SiC in controlled manner. The surface morphology of formed graphene was analyzed by atomic force microscopy (AFM), low-energy electron diffraction (LEED) and low-energy electron microscope (LEEM). We have confirmed single-layer graphene growth in average by this method. Top-gated, single-layer graphene field-effect transistors (FETs) were fabricated on epitaxial graphene grown on 4H-SiC. Increased on/off ratio of nearly 100 at low temperature and extremely small minimum conductance (0.018–0.3 in 4 e²/h) in gated Hall-bar samples suggest possible band-gap opening of single-layer epitaxial graphene grown on Si-face SiC.     

Effects of ultrasonic agitation and surfactant additive on surface roughness of Si (1 1 1) crystal plane in alkaline KOH solution

In the silicon wet etching process, the “pseudo-mask” formed by the hydrogen bubbles generated during the etching process is the reason causing high surface roughness and poor surface quality. Based upon the ultrasonic mechanical effect and wettability enhanced by isopropyl alcohol (IPA), ultrasonic agitation and IPA were used to improve surface quality of Si (1 1 1) crystal plane during silicon wet etching process. The surface roughness R_q is smaller than 15 nm when using ultrasonic agitation and R_q is smaller than 7 nm when using IPA. When the range of IPA concentration (mass fraction, wt%) is 5–20%, the ultrasonic frequency is 100 kHz and the ultrasound intensity is 30–50 W/L, the surface roughness R_q is smaller than 2 nm when combining ultrasonic agitation and IPA. The surface roughness R_q is equal to 1 nm when the mass fraction of IPA, ultrasound intensity and the ultrasonic frequency is 20%, 50 W and 100 kHz respectively. The experimental results indicated that the combination of ultrasonic agitation and IPA could obtain a lower surface roughness of Si (1 1 1) crystal plane in silicon wet etching process.     

Dry etch chemistries for TiO2 thin films

Several different plasma chemistries were investigated for dry etching of TiO₂ thin films. Fluorine-based discharges produced the fastest etch rates (∼2000 Å min⁻¹) and selectivities >1 for Si over TiO₂. Chlorine-based discharges also showed a chemical enhancement over pure Ar sputtering and had selectivities <1 for Si over TiO₂ for a range of plasma conditions. Methane–hydrogen discharges produced very slow etch rates, below those obtained with Ar sputtering. The etched surface morphologies of TiO₂ were excellent in all three types of plasma chemistry. Small concentrations (2 at.%) of chlorine- or fluorine-containing residues were identified on the TiO₂ surface after Cl₂/Ar or SF₆/Ar etching, but these residues were water soluble.     

Ultrafast relaxation of hot optical phonons in monolayer and multilayer graphene on different substrates

Hot carrier cooling in few-layer and multilayer epitaxial graphene on SiC, and chemical vapor deposition (CVD) grown graphene transferred onto a glass substrate was investigated by transient absorption spectroscopy and imaging. Coupling to the substrate was found to play a critical role in charge carrier cooling. For both multilayer epitaxial graphene and monolayer CVD graphene, charge carriers transfer heat predominantly to intrinsic in-plane optical phonons of graphene. At high pump intensity, a significant number of optical phonons are accumulated, and the optical phonon lifetime presents a bottleneck for charge carrier cooling. This hot phonon effect did not occur in few-layer epitaxial graphene because of strong coupling to the substrate, which provided additional cooling channels. The limiting charge carrier lifetimes at high excitation densities were 1.8 ± 0.1 ps and 1.4 ± 0.1 ps for multilayer epitaxial graphene and monolayer CVD graphene, respectively. These values represent lower limits on the optical phonon lifetime for the graphene samples.     

Scanning probe microscopy investigations of the electrical properties of chemical vapor deposited graphene grown on a 6H-SiC substrate

Sublimated graphene grown on SiC is an attractive material for scientific investigations. Nevertheless the self limiting process on the Si face and its sensitivity to the surface quality of the SiC substrates may be unfavourable for later microelectronic processes. On the other hand, chemical vapor deposited (CVD) graphene does not posses such disadvantages, so further experimental investigation is needed. In this paper CVD grown graphene on 6H-SiC (0 0 0 1) substrate was investigated using scanning probe microscopy (SPM). Electrical properties of graphene were characterized with the use of: scanning tunnelling microscopy, conductive atomic force microscopy (C-AFM) with locally performed C-AFM current–voltage measurements and Kelvin probe force microscopy (KPFM). Based on the contact potential difference data from the KPFM measurements, the work function of graphene was estimated. We observed conductance variations not only on structural edges, existing surface corrugations or accidental bilayers, but also on a flat graphene surface.     

Role of substrate,temperature, and hydrogen on the flame synthesis of graphene films

Graphene films are grown in open-atmosphere on metal substrates using a multiple inverse-diffusion flame burner with methane as fuel. Substrate material (i.e. copper, nickel, cobalt, iron, and copper–nickel alloy), along with its temperature and hydrogen treatment, strongly impacts the quality and uniformity of the graphene films. The growth of few-layer graphene (FLG) occurs in the temperature range 750–950 °C for copper and 600–850 °C for nickel and cobalt. For iron, the growth of graphene is not exclusively observed. The variation of graphene quality for different substrates is believed to be due primarily to the difference in carbon solubility between the metals.     

Nanostructures on GaAs surfaces due to 60 keV Ar+-ion beam sputtering

The effect of 60 keV Ar⁺-ion beam sputtering on the surface topography of p-type GaAs(1 0 0) was investigated by varying angle of incidence of the ion (0–60°) with respect to substrate normal and the ion fluence (2 × 10¹⁷–3 × 10¹⁸ ions/cm²) at an ion flux of 3.75 × 10¹³ ions/cm²-s. For normal incidence and at a fluence of 2 × 10¹⁷ ions/cm², holes and islands are observed with the former having an average size and density of 31 nm and 4.9 × 10⁹ holes/cm², respectively. For 30° and 45° off-normal incidence, in general, a smooth surface appears which is unaffected by increase of fluence. At 60° off-normal incidence dots are observed while for the highest fluence of 3 × 10¹⁸ ions/cm² early stage of ripple formation along with dots is observed with amplitude of 4 nm. The applicability and limitations of the existing theories of ion induced pattern formation to account for the observed surface topographies are discussed.     

A simple method for well-defined and clean all-SiC nano-ripples in ambient air

Well-defined and clean all-SiC nano-ripples with a period of about 150 nm are produced via the combination of 800-nm femtosecond laser irradiation and chemical selective etching with mixture solution of 65 wt% HNO₃ acid (20 mL) and 40 wt% HF acid (20 mL). The incorporation mechanism of oxygen (O) species into the laser induced obscured nano-ripples is attributed to femtosecond laser induced trapping effect of dangling bonds, while that of chemical etching induced well-defined and clean nano-ripples is assigned to chemical reactions between mixture acid solution and amorphous silicon carbide (SiC) or silicon oxide (SiO₂). Results from EDX analysis show that the incorporated foreign O species (atomic percentages of 9.39%) was eliminated effectively via chemical etching, while the atomic percentages of silicon (Si) and carbon (C) were about 47.82% and 52.18% respectively, which were similar to those of original SiC material. And the influences of laser irradiation parameters on the nano-ripples are also discussed.     

Studies of Li intercalation of hydrogenated graphene on SiC(0001)

The effects of Li deposition on hydrogenated bilayer graphene on SiC(0001) samples, i.e. on quasi-freestanding bilayer graphene samples, are studied using low energy electron microscopy, micro-low-energy electron diffraction and photoelectron spectroscopy. After deposition, some Li atoms form islands on the surface creating defects that are observed to disappear after annealing. Some other Li atoms are found to penetrate through the bilayer graphene sample and into the interface where H already resides. This is revealed by the existence of shifted components, related to H–SiC and Li–SiC bonding, in recorded core level spectra. The Dirac point is found to exhibit a rigid shift to about 1.25 eV below the Fermi level, indicating strong electron doping of the graphene by the deposited Li. After annealing the sample at 300–400 °C formation of LiH at the interface is suggested from the observed change of the dipole layer at the interface. Annealing at 600 °C or higher removes both Li and H from the sample and a monolayer graphene sample is re-established. The Li thus promotes the removal of H from the interface at a considerably lower temperature than after pure H intercalation.     

Single crystalline graphene synthesized by thermal annealing of humic acid over copper foils

Production of graphene by thermal annealing on copper foil substrates has been studied with different sources of carbon. The three carbon sources include humic acid derived from leonardite, graphenol, and activated charcoal. Hexagonal single crystalline graphene has been synthesized over the copper foil substrates by thermal annealing of humic acid, derived from leonardite, in argon and hydrogen atmosphere (Ar/H₂=20). The annealing temperature was varied between 1050 °C and 1100 °C at atmospheric pressure. Samples have been investigated using scanning electron microscope (SEM) and Raman spectroscopy. At lower temperatures the thermal annealing of the three carbon sources used in this study produces pristine graphene nanosheets which cover almost the whole substrate. However when the annealing temperature has been increased up to 1100 °C, hexagonal single crystalline graphene have been observed only in the case of the humic acid. Raman analysis showed the existence of 2D band around 2690 cm⁻¹.     

Synchrotron quantification of ultrasound cavitation and bubble dynamics in Al–10Cu melts

Knowledge of the kinetics of gas bubble formation and evolution under cavitation conditions in molten alloys is important for the control casting defects such as porosity and dissolved hydrogen. Using in situ synchrotron X-ray radiography, we studied the dynamic behaviour of ultrasonic cavitation gas bubbles in a molten Al–10 wt% Cu alloy. The size distribution, average radius and growth rate of cavitation gas bubbles were quantified under an acoustic intensity of 800 W/cm² and a maximum acoustic pressure of 4.5 MPa (45 atm). Bubbles exhibited a log-normal size distribution with an average radius of 15.3 ± 0.5 μm. Under applied sonication conditions the growth rate of bubble radius, R(t), followed a power law with a form of R(t) = αt^β, and α = 0.0021 & β = 0.89. The observed tendencies were discussed in relation to bubble growth mechanisms of Al alloy melts.     

Ion beam induced reaction of carbon films on Si(1 0 0)

The irradiation effects of 2 MeV He⁺ and Ar⁺ ions on the film structure of the C–Si system were investigated with RHEED and XPS. The formation of SiC phase and/or the growth of epitaxial SiC were possible by He⁺ irradiation for the carbon films up to 0.7 nm in thickness, which was thinner than that by Ar⁺ irradiation. The He⁺ irradiation could not grow the turbostratic graphite which could be grown by Ar⁺ irradiation. The mechanism of the formation and the epitaxial growth of SiC by ion irradiation was discussed from the view point of the energy transfer from the irradiated ions.     

Ab initio determination of atomic structure and energy of surface states of bare and hydrogen covered GaN (0001) surface — Existence of the Surface States Stark Effect (SSSE)

Density Functional Theory (DFT) calculations indicate that energetically stable structure of clean GaN(0001) surface posses (2 × 1) reconstruction, having every second row of Ga located near plane of N atoms, that gives rise to Ga-related dispersionless surface electronic state, already identified by angle resolved photoelectron spectroscopy (ARPES) measurements [S.S. Dhesi et al. Phys. Rev. B 56 (1997) 10271, L. Plucinski et al. Surf. Sci 507-10 (2002) 223, S. M. Widstrand et al. Surf. Sci. 584 (2005) 169]. The energy reduction in reconstruction proceeds via change of the hybridization of the occupied Ga surface states from sp³ to sp², transforming the empty states to p_z type. It is also shown that the electric subsurface field, modeled in new slab model which allows to simulate electric fields at the semiconductor surfaces [P. Kempisty et al., J. Appl. Phys. 106 (2009) 054901], strongly affects the energy of electronic states of GaN(0001) surfaces. The change of the field may shift the energy of surface states of bare and hydrogen covered GaN(0001) surface, by several eV with respect to the band states. The phenomenon, denoted as Surface States Stark Effect (SSSE), explains various band bending values, measured at differently doped n-type GaN(0001) surfaces. It is shown also that, for the adsorbate density up to one H atom for each Ga surface atom i.e. 1 monolayer coverage (1 ML), the hydrogen adatoms are located at the on-top positions, i.e. directly above Ga atoms. For these adsorbate densities, the H-related quantum surface state is located slightly below the valence band maximum (VBM) in the case of p-type GaN surface. For n-type GaN, the H-related surface state is located deeply in the valence band, about 2 eV below VBM. For higher, 1.25 ML hydrogen coverage, the two H adatoms create either surface attached H₂ ad-molecule (energetically stable) or triple bridge configuration is created (metastable). The H₂ ad-molecule is weekly attached to the surface, having the desorption energy barrier equal to 0.16 eV. For 1.25 ML coverage the DFT results were obtained for p-type GaN only. They show that in the ad-molecule case, a new surface electronic state arises which is located about 6.7 eV below VBM. In the case of the bridge configuration, the bridge related surface state is located closely to the conduction band minimum (CBM).     

Rapid growth of hydroxyapatite nanoparticles using ultrasonic irradiation

A rapid, environmental friendly and low-cost method to prepare hydroxyapatite nanoparticles is proposed. In this method, hydroxyapatite is produced in a sonicated pseudo-body solution. The sonication time was found effective in the formation of the crystalline phase of nanoparticles. In our experimental condition, 15 min sonication resulted in the most pure hydroxyapatite phase. Also it was shown that growth temperature is a crucial factor and hydroxyapatite crystallizes only at 37 °C. The particles formed by sonication were generally smaller and more spherical than those obtained without sonication. Sonication increased the hydroxyapatite crystal growth rate up to 5.5 times compared to non-sonication condition. The comparison between the specific surface area of hydroxyapatite nanoparticles obtained by sonication and without sonication demonstrated that sonication increased the specific surface area from 63 m²/g to 107 m²/g and decreased the size of nanoparticles from 30 nm to 18 nm. Analysis on the pore structure demonstrated that the fractal structures obtained with and without sonication were considerably different.     

Ag on Mo(110) studied by AES and STM

Auger electron spectroscopy (AES) and scanning tunnelling microscopy (STM) have been used to investigate the growth behaviour of ultra-thin Ag films on a Mo(110) surface at room temperature. An analysis of AES and STM measurements indicates that three-dimensional (3D) growth of a Ag film is observed. For submonolayer coverage, the growth of Ag is mediated by a two-dimensional step-flow mechanism. During the initial stage of this growth, the first Ag layer nucleates and creates islands (average size of islands is about 180 ± 20 nm²) at Mo step edges. In the monolayer coverage range, the decoration of substrate steps by Ag can be distinguished by the presence of a fractional step of p₁ = 0.86 ± 0.6 Å height at the Ag–Mo boundary. As the sample is post-annealed to 700 K, the morphology of the surface changes. Step-flow growth in this case gives rise to a regular Ag nanostripe network attached to Mo(110) step edges. The corrugation profiles reveal the protrusion of silver nanostripes of thicknesses p₁ = 0.98 ± 0.16 Å and p₂ = 0.39 ± 0.06 Å for submonolayer and monolayer coverage ranges, respectively, above each single step of a Mo terrace morphology.