High‐Resolution Surface Chemical Analysis of a Trifunctional Pattern Made by Sequential Colloidal Shadowing

We present a new method for creating surface chemical patterns where three chemistries can be periodically arranged at alternate positions on a single substrate without the use of top‐down approaches. High‐resolution chemical imaging by time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS), with nanometer spatial resolution, is used to prove the success of the patterning and subsequent chemical modification steps. We use a combination of colloidal self‐assembly, plasma etching, self‐assembled monolayers (SAMs) and physical vapour deposition (PVD). The method utilizes a double colloid assembly process in which a first layer of close‐packed colloids is created, followed by plasma etching, coating with gold and deposition of a first SAM layer. A second particle layer is deposited on top of the first layer masking the interstitial spaces containing the first SAM. A second gold layer is deposited followed by a second SAM. After particle removal the surface consists of the pattern containing two different SAMs and a SiO₂ layer that can be readily functionalized with silanes. The possibility in the replacement of the two different thiols is investigated by X‐ray photoelectron spectroscopy (XPS) and it was found that no replacement is taking place. ToF‐SIMS imaging is used to show the periodicity of the chemical patterns by tracking unique fragment ions from the different surface regions. The patterning method is adaptable to create smaller or larger chemical patterns by appropriate choice of particle sizes. The patterns are useful for immobilizing biomolecules for cell studies or as multiplexed biosensors.     

Determination of ZnO(0001) surface termination by x‐ray photoelectron spectroscopy at photoemission angles of 0° and 70°

We present an XPS method to determine the termination of the ZnO(0001) surface. By measuring O 1s and Zn 2p_3/2 core‐level x‐ray photoelectron spectra at photoemission angles of 0° and 70° and comparing the intensity ratio (I_O1s/I_Zn2p3)_θ=0/(I_O1s/I_Zn2p3)_θ=70, the Zn and O termination can be distinguished. Calculations show that these two terminations have intensity ratios differing by ～17%. This difference is not affected by a contamination layer provided that the contamination layer thickness is the same for these two differently terminated surfaces. Although this determination method prefers a clean ZnO(0001) surface (in situ measurement), it seems also feasible for surfaces with known contamination layer thickness (ex situ measurement). We have measured ex situ ZnO(0001)‐Zn, ZnO(000&1macr;)‐O single crystals and an epitaxial ZnO film deposited on Al₂O₃(0001). The measured intensity ratios of the first two samples agree with the calculated values for a 0.2 and 0.26 nm contamination layer, respectively. The intensity ratio and the O 1s contamination component intensity of the epitaxial ZnO film are close to those of the ZnO(0001)‐Zn single crystal thus pointing at Zn termination of the film. Copyright © 2004 John Wiley & Sons, Ltd.     

Molecular Suction Pads: Self‐Assembled Monolayers of Subphthalocyaninatoboron Complexes on Gold

Subphthalocyaninatoboron complexes with six long‐chain alkylthio substituents in their periphery are applicable for the formation of self‐assembled monolayers (SAMs) on gold. Such films are prepared from solution with the axially chlorido‐substituted derivatives and characterised by near‐edge X‐ray absorption fine structure (NEXAFS) spectroscopy, X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). The results are in accord with the formation of SAMs assembled by the chemisorption of both covalently bound thiolate‐type as well as coordinatively bound thioether units. The adsorbate molecules adopt an essentially flat adsorption geometry on the substrate, resembling a suction pad on a surface.     

In situ XPS and SIMS analysis of O2+ beam‐induced silicon oxidation

The chemical composition variation of silicon under 4 keV O₂⁺ ion beam bombardment at different incident angles was studied by in situ small‐area XPS. The changes in secondary ion profile (³⁰Si⁺, ⁴⁴SiO⁺, ⁵⁶Si₂⁺, ⁶⁰SiO₂⁺) during oxygen ion beam bombardment also have been monitored. We present a direct correlation of the changes in secondary ion depth profile with surface composition during sputtering. Evolution of the secondary ion profile obtained from SIMS shows similar trends with variation of oxygen concentration in the crater surface measured by XPS. It is shown that when the oxygen ion beam incidence angle is < 40° silicon dioxide is the dominant species on the crater surface and the matrix ion species ratio (MISR) value for ⁴⁴SiO⁺/⁵⁶Si₂⁺ is higher than for ³⁰Si⁺/⁵⁶Si₂⁺. For incidence angles of >40°, the formation of sub‐oxide is favoured and thus the MISR value for ⁴⁴SiO⁺/⁵⁶Si₂⁺ is lower than for ³⁰Si⁺/⁵⁶Si₂. At 40° bombardment there are similar amounts of SiO₂ and sub‐oxides present on the crater surface and the MISR values for ⁴⁴SiO⁺/⁵⁶Si₂⁺ and ³⁰Si⁺/⁵⁶Si₂⁺ are also similar. Copyright © 2004 John Wiley & Sons, Ltd.