Carrier transport in two-dimensional graphene layers

Carrier transport in gated 2D graphene monolayers is considered in the presence of scattering by random charged impurity centers with density n(i). Excellent quantitative agreement is obtained (for carrier density n>10(12) cm(-2)) with existing experimental data. The conductivity scales linearly with n/n(i) in the theory. We explain the experimentally observed asymmetry between electron and hole conductivities, and the high-density saturation of conductivity for the highest mobility samples. We argue that the experimentally observed saturation of conductivity at low density arises from the charged impurity induced inhomogeneity in the graphene carrier density which becomes severe for n less, similarn(i) approximately 10(12) cm(-2).     

Temperature-dependent transport in suspended graphene

The resistivity of ultraclean suspended graphene is strongly temperature (T) dependent for 50.5 x 10(11) cm(-2), the resistivity increases with increasing T and is linear above 50 K, suggesting carrier scattering from acoustic phonons. At T=240 K the mobility is approximately 120,000 cm2/V s, higher than in any known semiconductor. At the charge neutral point we observe a nonuniversal conductivity that decreases with decreasing T, consistent with a density inhomogeneity <10(8) cm(-2).     

Ground state of graphene in the presence of random charged impurities

We calculate the carrier-density-dependent ground-state properties of graphene in the presence of random charged impurities in the substrate taking into account disorder and interaction effects nonperturbatively on an equal footing in a self-consistent theoretical formalism. We provide detailed quantitative results on the dependence of the disorder-induced spatially inhomogeneous two-dimensional carrier density distribution on the external gate bias, the impurity density, and the impurity location. We find that the interplay between disorder and interaction is strong, particularly at lower impurity densities. We show that, for the currently available typical graphene samples, inhomogeneity dominates graphene physics at low (< or approximately 10(12) cm(-2)) carrier density with the density fluctuations becoming larger than the average density.     

H/Al共掺杂对ZnO基透明导电薄膜光电性质和晶体结构的影响

利用H在ZnO中作为浅施主杂质的特性,研究了H掺杂对ZnO：Al透明导电薄膜特性的影响。通过降低ZnO：Al中Al的含量并同时引入H掺杂,解决了透明导电薄膜中高导电性与高透过率之间的矛盾。H的掺杂可以显著降低ZnO基透明导电薄膜的电阻率,这是由于H一方面作为施主可以提供电子从而提高了自由载流子浓度;另一方面与ZnO晶界中的O^-结合降低了晶界势垒,提高了载流子迁移率。利用H掺杂,可以在Al掺杂量降低10倍的情况下,仍然能获得低电阻率（6.3×10^-4 Ω·cm）的透明导电薄膜,同时其近红外波段（1 200 nm）透光率从64%提高到90%。这种具有高导电性和高透光性的透明导电薄膜可以应用于各类薄膜太阳能电池中以提升器件效率。     

Weak-localization-like temperature-dependent conductivity of a dilute two-dimensional hole gas in a parallel magnetic field

We have studied the magnetotransport properties of a high mobility two-dimensional hole gas (2DHG) in a 10 nm GaAs quantum well with densities in the range of (0.7-1.6) x 10(10) cm(-2) on the metallic side of the zero-field "metal-insulator transition." In a parallel field well above B(c) that suppresses the metallic conductivity, the 2DHG exhibits a conductivity Delta(g)(T) approximately (1/pi) (e(2)/h)lnT reminiscent of weak localization for Fermi liquids. The experiments are consistent with the coexistence of two phases in our system: a metallic phase and a weakly insulating Fermi liquid phase.     

Spin susceptibility of an ultra-low-density two-dimensional electron system

We determine the spin susceptibility in a two-dimensional electron system in GaAs/AlGaAs over a wide range of low densities from 2x10(9) cm(-2) to 4x10(10) cm(-2). Our data can be fitted to an equation that describes the density dependence as well as the polarization dependence of the spin susceptibility. It can account for the anomalous g factors reported recently in GaAs electron and hole systems. The paramagnetic spin susceptibility increases with decreasing density as expected from theoretical calculations.     

A nearly universal critical conductivity for semiconductor-metal alloys

Classical ionized impurity scattering is employed to calculate the conductivity at and in the vicinity of the critical point. The result sigma(iis)(x = x(c),T) = Asqrt[T], closely given by e(2)/Planck's over 2pilambda(dB) with the de Broglie wavelength lambda(dB) = h/(2m(*)kT)(1/2) in the nondegenerate regime epsilon(F)x(c), T) might also explain the linear scaling behavior sigma(x, T)-Asqrt[T] = sigma(0)(x/x(0)-1).     

硅的低温电学性质

本文在20°—300°K研究了室温载流子浓度2×10¹²—1×10²⁰cm^-3含硼或磷(砷)Si的电学性质。对一些p-Si样品用弱场横向磁阻法及杂质激活能法进行了补偿度的测定,并进行了比较。从霍尔系数与温度关系的分析指出,对于较纯样品,硼受主能级的电离能为0.045eV,磷施主能级为0.045eV,在载流子浓度为10¹⁸—10¹⁹cm^-3时发现了费米简并,对载流子浓度为2×10¹⁷—1×10¹⁸cm^-3的p-Si及5×10¹⁷—4×10¹⁸cm^-3的n-Si观察到了杂质电导行为。从霍尔系数与电导率计算了非本征的霍尔迁移率。在100°—300°K间,晶格散射迁移率μ满足关系式AT^-a,其中A=2.1×10⁹,α=2.7(对空穴);或A=1.2×10⁸,α=2.0(对电子)。另外,根据我们的材料(载流子浓度在5×10¹¹—5×10²⁰cm^-3间),分别建立了一条电阻率与载流子浓度及电阻率与迁移率的关系曲线,以提供制备材料时参考之用。     

Anomalous thermopower in the metalliclike phase of a 2D hole system

We report very low temperature ( T) thermopower and resistivity ( rho) measurements on variable-density, two-dimensional hole systems confined to GaAs quantum wells. As the hole density is lowered from 1.49x10(11) cm(-2) to 0.14x10(11) cm(-2), the system crosses from an insulating ( drho / dT less, similar0) to a metallic regime ( drho / dT>0) and finally displays insulating behavior ( drho / dT<0). Diffusion thermopower shows a striking sign reversal in a narrow range of density in the metallic regime, suggesting a qualitative change in the conduction or the scattering mechanism.     

Effect of strain on the carrier mobility in heavily doped p-type Si

We present an experiment that gives insight into the origin of the dependence of the hole mobility (mu) on the dopant species in heavily doped p-type Si under low electrical field. The Hall carrier concentration and mobility were measured in Si coimplanted with B and Ga in the 0.1-2 x 10{20} cm{-3} concentration range. The strain induced by substitutional dopants, detected by high resolution x-ray diffraction, was varied by changing the relative B and Ga concentration. The effect of strain on mobility was disentangled and a linear relationship between 1/mu and the perpendicular strain was found.     

氢钝化对硅纳米晶发光强度的影响

通过热蒸发方法在单晶硅衬底上沉积了SiO/SiO₂超晶格样品,在氮气保护下对样品进行高温退火,得到硅纳米晶/SiO₂超晶格结构。随后将该结构样品分别注入3.0×1014和3.0×1015 cm-2两种剂量的H+。通过对样品的光致发光光谱的分析发现,H+注入后未经过二次退火的样品发光强度急剧下降;二次退火后的样品,随着退火温度的升高,发光强度逐渐增强;注入足够剂量的H+,其发光强度可以远远超过未注入时的发光强度。研究表明,样品发光强度的变化取决于样品内部缺陷面密度的改变,而缺陷面密度是由氢离子的注入剂量和注入后再退火的温度等因素决定的。     

Electron mobility of Sr1-xLaxTiO3 ceramics between 600 °C and 1300 °C

1-x La_xO₃ ceramics (0.003<x<0.40) were measured between 600 °C and 1300 °C. The density of electrons in the conduction band was determined from Hall and thermopower measurements. A chemical approach (Ti³⁺-titration) confirmed these results. The electron mobility was calculated by combining charge carrier density and conductivity data. The temperature dependence of the mobility obeys a power law. Its exponent varies from -1.5 for slightly doped samples (x=0.003) to -2.74 for lanthanum-rich samples (x=0.4) indicating a phonon scattering controlled transport behavior. The mobility data obtained from slightly doped ceramic samples agree very well with Hall mobilities found in undoped SrTiO₃ single crystals. Received: 22 January 1997/Accepted: 1 April 1997     

Two-dimensional metal-insulator transition as a percolation transition in a high-mobility electron system

By carefully analyzing the low temperature density dependence of 2D conductivity in undoped high-mobility n-GaAs heterostructures, we conclude that the 2D metal-insulator transition in this 2D electron system is a density inhomogeneity driven percolation transition due to the breakdown of screening in the random charged impurity disorder background. In particular, our measured conductivity exponent of approximately 1.4 approaches the 2D percolation exponent value of 4/3 at low temperatures and our experimental data are inconsistent with there being a zero-temperature quantum critical point in our system.     

Theory of 2D transport in graphene for correlated disorder

We theoretically revisit graphene transport properties as a function of carrier density, taking into account possible correlations in the spatial distribution of the Coulomb impurity disorder in the environment. We find that the charged impurity correlations give rise to a density-dependent graphene conductivity, which agrees well qualitatively with the existing experimental data. We also find, quite unexpectedly, that the conductivity could increase with increasing impurity density if there is sufficient interimpurity correlation present in the system. In particular, the linearity (sublinearity) of graphene conductivity at lower (higher) gate voltage is naturally explained as arising solely from impurity correlation effects in the Coulomb disorder.     

Acousto-mechanical and thermal properties of clotted blood

The efficacy of ultrasound-assisted thrombolysis as an adjunct treatment of ischemic stroke is being widely investigated. To determine the role of ultrasound hyperthermia in the process of blood clot disruption, the acousto-mechanical and thermal properties of clotted blood were measured in vitro, namely, density, speed of sound, frequency-dependent attenuation, specific heat, and thermal conductivity. The amplitude coefficient of attenuation of the clots was determined for 120 kHz, 1.0 MHz, and 3.5 MHz ultrasound at room temperature (20 +/- 2 degrees C). The attenuation coefficient ranged from 0.10 to 0.30 Np/cm in porcine clots and from 0.09 to 0.23 Np/cm in human clots. The experimentally determined values of specific heat and thermal conductivity for porcine clotted blood are (3.2 +/- 0.5) x 10(3) J/kg x K and 0.55 +/- 0.13 W/m x K, respectively, and for human clotted blood are (3.5 +/- 0.8) x 10(3) J/kg x K and 0.59 +/- 0.11 W/m x K, respectively. Measurements of the acousto-mechanical and thermal properties of clotted blood can be helpful in theoretical modeling of ultrasound hyperthermia in ultrasound-assisted thrombolysis and other high-intensity focused ultrasound applications.     

Transport and percolation in a low-density high-mobility two-dimensional hole system

We present a study of the temperature and density dependence of the resistivity of an extremely high quality two-dimensional hole system grown on the (100) surface of GaAs. For high densities in the metallic regime (p > or approximately4x10;{9} cm;{-2}), the nonmonotonic temperature dependence ( approximately 50-300 mK) of the resistivity is consistent with temperature dependent screening of residual impurities. At a fixed temperature of T=50 mK, the conductivity versus density data indicate an inhomogeneity driven percolation-type transition to an insulating state at a critical density of 3.8x10;{9} cm;{-2}.     

He 离子注入引起的高纯钨硬化

完成了不同注量或温度下100 keV 的He 离子注入高纯钨的实验,并利用纳米压痕技术测量了材料的微观力学性能。所有注入样品的纳米硬度值都高于未注入样品的纳米硬度值。对于室温注入样品,随着注量的增加,样品抗弹性变形能力下降;当注量不高于5x1017 ions/cm2 时,钨的纳米硬度峰值随着注量的增加而增加;注量为1x1018 ions/cm2 的钨样品的纳米硬度峰值反而降低。高温注入样品的抗弹性变形能力优于室温注入样品的抗弹性变形能力;随着注入温度的增加,样品的平均纳米硬度值和弹性模量略有下降。分析讨论了He 注入钨硬化和抗弹性形变能力降低的可能原因。Tungsten has been selected as divertor materials in fusion reactors because of its high thermal conductivity,high melting point, low expansion coefficient and high threshold energy for sputtering etc. The paper presents the hardening behaviour of high pure tungsten by 100 keV He+ with different fluences from 5x1016 ions/cm2 to 1x1018ions/cm2 at room temperature, and with fluence of 1x1018 ions/cm2 at higher temperatures (400, 600 and 800 °C). The microscopic mechanical properties of these samples were investigated by nano-indentation technology. The results show that all of the implanted samples harden obviously. The reason for hardening may be that defects of interstitial dislocation loops or dense helium bubbles etc induced by helium implantation obstacle the movement of dislocation. The peak nanohardness of the samples increased with the fluences increasing when the fluence is not more than 5x1017 ions/cm2, while the nano-hardness value of the implanted sample with the fluence of 1x1018 ions/cm2 decreases and the nano-hardness changes little in the region of 50 nm to 200 nm from surface. For all the implanted samples with 1x1018 ions/cm2 at higher temperatures, their nano-hardness values are similar, but show a trend of decrease with increasing temperature.The reason may be the decrease of the defects’ density during implantation at higher temperatures. In addition, the capability of resisting deformation for the implanted tungsten reduces with increasing fluence and increases a little at higher temperatures.     

Comparative study on transport properties and scattering mechanism of group III doped SiC nanotube

The third group of elements is the acceptor of P-type silicon carbide (SiC). Therefore, studying the transport properties of group III doped SiC nanotube (SiCNTs) and revealing the carrier scattering mechanism have important scientific significance for improving the photoelectric properties and promoting the development of SiC nano-devices. In this article, the lattice structure and transport properties of IIIA-doped SiCNTs are investigated systematically using density functional theory. According to the first principle data, we calculate the temperature characteristics of the conductivity, carrier concentration, and mobility, then, analyze the contributions of optical phonon, ionized impurity, neutral impurity and inter-carrier scattering to the mobility. The calculation results show that the conductivity of IIIA-doped SiCNTs decreased with increasing temperature in the temperature range below 200 K, above 200 K, the conductivity increases with increasing temperature. The main scattering mechanisms are optical phonon scattering and neutral impurity scattering. In application, this results will help the selection of SiCNTs acceptor.     

Plateau in the temperature dependence of the thermal conductivity of solid hydrogen containing heavy isotopic neon impurities at ultimately low concentrations

The thermal conductivity of solid hydrogen with 0.0001–0.0002 at. % Ne in the form of equilibrium samples grown at a low rate after remelting is investigated in the temperature range 1.5–10.0 K. It is demonstrated that the temperature dependence of the thermal conductivity for the samples containing neon at concentrations considerably lower than the limiting solubility of the heavy impurity exhibits a symmetric plateau. This behavior of the temperature dependence of the thermal conductivity differs qualitatively from the previously observed resonance minimum in the temperature dependence of the thermal conductivity for desublimated samples. A relaxation model is proposed for explaining the observed effect. According to this model, the plateau is explained by the formation of linear impurity structures that are located along dislocation lines and considerably enhance phonon scattering by dislocation cores. The density of linear impurity structures is estimated. The influence of these structures on the thermal conductivity is compared with the corresponding effect of uniformly distributed individual neon atoms in solid hydrogen.     

High quality p-type Ag-doped ZnO thin films achieved under elevated growth temperatures

By correlating the effects of substrate temperature, oxygen pressure and laser energy on the electrical and microstructural properties of Ag-doped ZnO films grown on a sapphire (0001) substrate, p-type conductivity is achieved under various substrate temperatures in the wide range of 250-750?°C. All of the samples were deposited by pulsed-laser deposition under various designed conditions. Hall measurements indicate that the best conductivity is achieved in Ag-ZnO films under a substrate temperature of 500?°C, a partial oxygen pressure of 250-300?mTorr and laser energy between 330 and 345?mJ. The hole-carrier concentration is 2.29?×?10(18)?cm(-3), the resistivity is 0.9?Ω?cm and the mobility is 3.03?cm(2)?V(-1)?s(-1). Transmission-electron microscopy (TEM) studies on the p-type films reveal similar microstructural properties to one another, but different properties to that of the n-type films deposited at the same temperatures with different deposition parameters.