Auger electron spectroscopy investigation of sputter induced altered layers in SiC by low energy sputter depth profiling and factor analysis

The thickness of the altered layer created by ion bombardment of the 6H–SiC single crystal was determined by means of Auger electron spectroscopy (AES) depth profiling in conjunction with factor analysis. After pre-bombardment of the surface by argon ions with energies 1, 2 and 4 keV until the steady state, the depth profiles of the induced altered layers were recorded by sputtering with low energy argon ions of 300 eV. Since the position and shape of the carbon Auger peak depend on the perfection of the crystalline structure, they were used for depth profile evaluation by factor analysis. In this way the depth profiles of the damaged surface region could be estimated in dependence on the ion energy. As a result, the thickness of the altered layer of SiC bombarded with 1, 2 and 4 keV Ar ions using an incident angle of 80° as well as the corresponding argon implantation profile could be measured.     

Study of the electron damage of the MgO(100)-D2O system by ESD

An electron-stimulated desorption (ESD) study of electron damage of a D₂O layer adsorbed on the MgO(100) surface at room temperature is presented. After exposing the surface to D₂O, the surface spectrum shows the main ESD component to be D⁺ ions, with lower intensity signals corresponding to O⁺ and OD⁺ ions. When the surface is simultaneously exposed to heavy water and electron bombardment, there is a rapid initial increase of the D⁺ intensity accompanied by a decrease of the intensity of the O⁺ ions. Electron damage of the surface after exposing to D₂O produces a significant decrease of the D⁺ intensity, while the O⁺ and OD⁺ intensities decrease more slowly. Heavy water adsorption does not change the form of the ion kinetic energy distribution of the O⁺ ions with electron dose, except for a decrease in intensity. Electron damage increases the intensity of the ion kinetic energy distribution of D⁺ again without changing its shape. These experiments show that heavy water adsorption under electron bombardment does not induce any chemistry of the adsorbed species, but enhances the fragmentation rate of the OD species which, in turn, increases the yield of D⁺ ions. Values of total desorption cross-sections for the three ions species are reported.     

Comparative study on low energy ion beam modification of thermoplastic polymers

ABSTRACT

Polycarbonate (PC) and polyethylene terephthalate (PET) thermoplastic polymer films were irradiated by low energy ion beams such as 100 keV Hydrogen (H⁺) ions and 350 keV Nitrogen (N⁺) ions at varied fluence from 1?×?10¹³ ions/cm² to 5?×?10¹⁴ ions/cm². The depth profile concentration of ions was calculated using Stopping and Range of Ions in Matter (SRIM) software code. Fourier Transform Infrared (FTIR) technique shows decrement in the intensity of peaks and disappearance of peaks mainly related to carbonyl stretching at 1770?cm^?1 and C–C stretching at 1500?cm^?1. Scanning electron microscopy (SEM) of irradiated polymers showed the formation of pores. X-ray diffraction (XRD) analysis has showed decrease in the intensity indicating the decrease in crystallinity after irradiation. Mechanical studies revealed that the molecular weight and microhardness decrease with increase in ion fluence due to increase in chain scission. The contact angle increased with increase in ion fluence indicating the hydrophobic nature of polymer after irradiation. Antibiofilm activity test of irradiated films shows resistance to Salmonella typhi (S. typhi) pathogen responsible for typhoid. The study shows that Nitrogen ion induces more damage compared to Hydrogen ions and PC films get more modified than PET films.     

Commissioning of electron cooling in CSRm

A new generation electron cooler has started operation in the heavy ion synchrotron CSRm which is used to increase the intensity of heavy ions. Transverse cooling of the ion beam after horizontal multi-turn injection allows beam accumulation at the injection energy. After optimization of the accumulation process an intensity increase in a synchrotron pulse by more than one order of magnitude has been achieved. In given accumulation time interval of 10 seconds, 108 particles have been accumulated and accelerated to the final energy. The momentum spread after accumulation and acceleration in the 10-4 range has been demonstrated in six species of ion beams. Primary measurements of accumulation process varying with electron energy, electron beam current, electron beam profile, expansion factor and injection interval have been performed. The lifetimes of ion beams in the presence of electron beams were roughly measured with the help of DCCT signal.     

Nonlinear interaction of ultraintense laser pulse with relativistic thin plasma foil in the radiation pressure-dominant regime

We present a study of the effect of laser pulse temporal profile on the energy /momentum acquired by the ions as a result of the ultraintense laser pulse focussed on a thin plasma layer in the radiation pressure-dominant (RPD) regime. In the RPD regime, the plasma foil is pushed by ultraintense laser pulse when the radiation cannot propagate through the foil, while the electron and ion layers move together. The nonlinear character of laser–matter interaction is exhibited in the relativistic frequency shift, and also change in the wave amplitude as the EM wave gets reflected by the relativistically moving thin dense plasma layer. Relativistic effects in a high-energy plasma provide matching conditions that make it possible to exchange very effectively ordered kinetic energy and momentum between the EM fields and the plasma. When matter moves at relativistic velocities, the efficiency of the energy transfer from the radiation to thin plasma foil is more than 30% and in ultrarelativistic case it approaches one. The momentum /energy transfer to the ions is found to depend on the temporal profile of the laser pulse. Our numerical results show that for the same laser and plasma parameters, a Lorentzian pulse can accelerate ions upto 0.2 GeV within 10 fs which is 1.5 times larger than that a Gaussian pulse can.     

Plasma doping dosimetry

Plasma immersion ion implantation (PIII) is a large-area doping technique that can provide very high implant current at very low implant energy. Multiple ion species, plasma conditions, and implanter current-voltage waveforms in PIII lead to an exponential implant profile which is different from conventional implant profiles. A methodology is developed for using in situ measurements of the implanter current (I) and implant voltage (V) to derive an energy spectrum for a single implant pulse. The advantage of this technique is that a per-pulse profile may be determined experimentally, even in the presence of substrate etching, without any need for an implant model. If the ion species concentrations in the plasma are known, the energy spectrum found from the ion current and voltage waveforms can be used to construct a per-pulse implant profile. If the ion species distribution is not known a priori for a multispecies plasma, secondary ion mass spectroscopy (SIMS) data from an implanted sample can be used to estimate the ion species distribution and calibrate the IV-generated profile within a factor of two. Data from 1-5 kV, 2.5-5 kHz BF₃ PIII implants are used to demonstrate the concept. The implant profile for a single pulse can then be used to project the final implant profile and total implanted dose as a function of implant time, Pm pulse frequency, and substrate etching. In this work, an estimated secondary electron yield function is used to separate the total implant current into ion and secondary electron current components. The 25% dose variation error introduced by this effective secondary electron yield function could be avoided in a system which can measure ion current directly     

Determination of the Radial Potential Profile in the Modified Penning Discharge with a Heavy Ion Beam Probe

A heavy ion beam probe is used to examine the radial electrostatic potential profile in the Modified Penning Discharge. The plasma potential in the discharge violates the usual constraint on the ion beam energy in that the primary probing beam energy undergoes large changes in its energy while passing through the plasma. In order to determine the radial potential profile, the primary beam trajectories are calculated to agree with measured trajectories by parametric variation of a potential model in the trajectory calculating program. This iteration calculation provides a first approximation to the profile. This profile can be used to predict observation of secondary ions, and observation of such ions provides a confirmation and cross check on the potential profile model found by the primary beam.     

Plasmon tsunamis on metallic nanoclusters

A model is constructed to describe inelastic scattering events accompanying electron capture by a highly charged ion flying by a metallic nanosphere. The electronic energy liberated by an electron leaving the Fermi level of the metal and dropping into a deep Rydberg state of the ion is used to increase the ion kinetic energy and, simultaneously, to excite multiple surface plasmons around the positively charged hole left behind on the metal sphere. This tsunami-like phenomenon manifests itself as periodic oscillations in the kinetic energy gain spectrum of the ion. The theory developed here extends our previous treatment (Lucas et al 2011 New J. Phys. 13 013034) of the Ar(q+)/C(60) charge exchange system. We provide an analysis of how the individual multipolar surface plasmons of the metallic sphere contribute to the formation of the oscillatory gain spectrum. Gain spectra showing characteristic, tsunami-like oscillations are simulated for Ar(15+) ions capturing one electron in distant collisions with Al and Na nanoclusters.     

HIRFL-CSRm冷却束流寿命

实验研究了HIRFL-CSRm中电子冷却装置对C6+,Ar15+两种束流寿命的影响。首先,通过对比实验的测量确定电子冷却可以有效提高束流寿命;其次,探究了电子冷却装置中的各项参数（主要是电子束密度分布、流强、能量、绝热展开因子）是如何影响束流寿命的,通过改变电子束参数,测量束流寿命的变化趋势和规律,并且结合电子冷却相关理论对实验结果给予解释,最终通过实验优化和确定最佳的冷却装置参数,使束流在HIRFL-CSRm上获得了较高的寿命,从而提高HIRFL-CSRm束流累积过程中的流强增益。     

Effect of the electron beam and ion flux parameters on the rate of plasma nitriding of an austenitic stainless steel

The method of nitriding of metals in an electron beam plasma is used to change the current density and energy of nitrogen ions by varying the electron beam parameters (5–20 A, 60–500 eV). An electron beam is generated by an electron source based on a self-heated hollow cathode discharge. Stainless steel 12Kh18N10T is saturated by nitrogen at 500°C for 1 h. The microhardness is measured on transverse polished sections to obtain the dependences of the nitrided layer thickness on the ion current density (1.6–6.2 mA/cm²), the ion energy (100–300 eV), and the nitrogen-argon mixture pressure (1–10 Pa). The layer thickness decreases by 4–5 μm when the ion energy increases by 100 V and increases from 19 to 33 μm when the ion current density increases. The pressure dependence of the layer thickness has a maximum. These results are in conflict with the conclusions of the theory of the limitation of the layer thickness by ion sputtering, and the effective diffusion coefficient significantly exceeds the well-known reported data.     

Electron and photon stimulated desorption of positive ions from alkali halide surfaces

We have observed desorption of positive ions from alkali halides stimulated by low energy electron and photon bombardment. Our experiments include the first measurements of electron stimulated desorption (ESD) of Na⁺ from NaCl and the first measurements of photon stimulated desorption (PSD) of positive ions from NaCl and LiF. The energy dependence data indicate that the initial onset for Na⁺ ejection by ESD occurs at the excitation threshold of the Cl(3s) core level. Similarly for the PSD of positive ions from NaCl and LiF we can relate incident photon beam energy dependent ion yields with the production of substrate core holes. The data provide insight into the mode of initial energy transfer to the solid which leads to desorption. ESD and PSD ion yields were measured to be on the order of 10^?7 ions per incident electron or photon.     

Dissociative ionization of the H2O molecule bombarded by swift singly charged and slow highly charged ions

Fragment ion energy spectra of the water molecule have been measured in conventional crossed-beam experiments by the impact of 46 keV/u energy, singly charged ions (SCIs) and 4.3 keV/u energy, highly charged ions (HCIs). Double differential cross sections have been determined and a comparative analysis has been performed. We found that the fragmentation spectra for SCIs and HCIs are very similar, indicating that both collisions lead to the same fragmentation channels. This suggests that the Coulomb explosion of the water molecule is dominantly determined by the charge state of the transient molecular ions, and it is almost independent from the primary ionization mechanism. Differences were observed not only between the SCI and HCI impact-induced fragmentation cross sections, but between those obtained by the 60 keV N⁶⁺ and 70 keV O⁷⁺ projectiles. The differences were attributed to the selectivity of the electron capture process for HCIs. Multiple target ionization cross sections have been deduced from the fragment ion spectra. We found contributions of up to fivefold ionization for SCIs and up to sixfold ionization for HCIs.     

Ionization of iridium ions in the Dresden EBIT studied by X-ray spectroscopy of direct excitation and radiative recombination processes

Ir^q+ ( 41≤q≤64) ions with open-shell configurations have been produced in the electron beam of the room-temperature Dresden Electron Beam Ion Trap (Dresden EBIT) at electron excitation energies from 2 keV to 13 keV. X-ray emission from direct excitation processes and radiative capture in krypton-like to aluminium-like iridium ions is measured with an energy dispersive Si(Li) detector. The detected X-ray lines are analyzed and compared with results from multiconfigurational Dirac-Fock (MCDF) atomic structure calculations. This allows to determine dominant produced ion charge states at different electron energies. The analysis shows that at the realized working gas pressure of 5×10^-9mbar for higher charged ions the maximum ion charge state is not preferently determined by the chosen electron beam energy needed for ionization of certain atomic substates, but by the balance between ionization and charge state reducing processes as charge exchange and radiative recombination. This behaviour is also discussed on the basis of model calculations for the resulting ion charge state distribution. Received 12 July 2001 and Received in final form 10 September 2001     

Ion implantation induced by Cu ablation at high laser fluence

High energy laser plasma-produced Cu ions have been implanted in silicon substrates placed at different distances and angles with respect to the normal to the surface of the ablated target. The implanted samples have been produced using the iodine high power Prague Asterix Laser System (PALS) using 438 nm wavelength irradiating in vacuum a Cu target. The high laser pulse energy (up to 230 J) and the short pulse duration (400 ps) produced a non-equilibrium plasma expanding mainly along the normal to the Cu target surface. Time-of-flight (TOF) technique was employed, through an electrostatic ion energy analyzer (IEA) placed along the target normal, in order to measure the ion energy, the ion charge state, the energy distribution and the charge state distribution. Ions had a Boltzmann energy distributions with an energy increasing with the charge state. At a laser fluence of the order of 6 × 10⁶ J/cm², the maximum ion energy was about 600 keV and the maximum charge state was about 27+.In order to investigate the implantation processes, Cu depth profiles have been performed with Rutherford backscattering spectrometry (RBS) of 1.5 MeV helium ions, Auger electron spectroscopy (AES) with 3 keV electron beam and 1 keV Ar sputtering ions in combination with scanning electron microscopy (SEM). Surface analysis results indicate that Cu ions are implanted within the first surface layers and that the ion penetration ranges are in agreement with the ion energy measured with IEA analysis.     

Near infrared spectroscopy assessment of the glucose solution processed by ultrasonic cavitation

The near infrared (NIR) absorption was investigated on the glucose aqueous solutions with various optical pathlengths (PLs) and processed by ultrasonic cavitation. In water, the strong absorption peak at a wavelength of 1430 nm, appeared in the case of short PL, was separated into several peaks in the case of wide PL due to increasing the number of H(2)O clusters. In a d(+) glucose solution, it was seen that NIR absorption was reduced at peculiar wavelengths of 970 nm and 1130 nm and its profile changed in a capricious manner in the region from 1300 nm to 1600 nm. The cavitation generated lots of OH(-) ion in water and made the capricious absorption profile regularly graded with the cavitation time toward less-absorptive direction. These effects are supposed to be caused by the dipole moments of H(2)O clusters arranged by the interaction between them and generated basic OH ions. The statistical principal component regression (PCR) and partial least-squares (PLS) regression demonstrated that the treatment of UC was helpful to enhance the glucose sensitivity.     

Enhanced sputtering from the F/Si(100) surface with extraction of the surface bond direction

It was found that slow highly charged ions had a high ability to ionize F atoms on a F/Si(100)-2×1 surface and desorb F+ ions along the local bond direction. Actually, the F+ ion yields were proportional to the incident charge cubed, and the F+ ions were emitted along the Si-F bond directions showing a fourfold symmetry pattern. The trigger process of the F+ formation is discussed based on a charge transfer process of F 2p electrons by extending the classical over barrier model. Further, we found that the kinetic energy of highly charged ion induced F+ ions is lower than that of electron stimulated F+ ions caused by the removal of a F 2s electron.     

129Xeq+轰击N型和P型Si表面时的电子发射产额研究

在兰州重离子加速器国家实验室测量了1.8 MeV Xeq+离子分别轰击N型和P型Si两种靶材表面时的电子发射产额。实验中,通过改变入射离子的电荷态,研究了入射离子势能沉积对两种靶材表面电子发射产额的贡献。结果发现同一离子入射时,N型Si表面的电子发射产额高出P型Si表面的电子发射产额约12.5%;对于具有相同入射动能的Xeq+离子,两种靶材表面的电子发射产额均随着入射离子势能的增加而线性增加。此外,还测量了3.4 MeV Xeq+离子分别轰击以上两种靶材时的电子发射产额,得到了类似的结果。本文利用功函数分别从动能电子发射和势能电子发射两个角度对实验结果进行了分析讨论。The electron emissions from N-type Si and P-type Si induced by 1.8 MeV 129Xeq+are measured in the National Laboratory of Heavy Ion Research Facility in Lanzhou,The contribution to electron emission yield from potential energy of incident ions is studied through changing the charge state of incident ions.The results show that for the same incident ion,electron emission yield of N type Si surface is higher than that of P-type Si surface about 12.5%.For incident ions with the same kinetic energy,both electron emission yields of two targets increase linearly with incident ion energy.In addition,the electron emissions induced by 3.4 MeV 129Xeq+from N-type Si and P-type Si mentioned above are measured,which give similar results.The experimental results are analyzed and discussed using work function from two angles of the kinetic electron emission and the potential energy electron emission.     

Role of polarization interaction in photoionization of negative ions of alkali metals

Photoionization processes of negative ions of sodium, potassium, and rubidium were investigated. Calculations of the dependence of the photoionization cross section on the photon energy were performed within the Random Phase Approximation with Exchange for outer subshells (RPAE) and within the Generalized Random Phase Approximation with Exchange (GRPAE) for inner subshells. The latter theoretical approach includes both many-electron correlations and core rearrangement due to escape of one of the electrons from the system. The results of calculations for the negative sodium ion were found to be in good agreement with experimental data. Better agreement was achieved by allowing dynamical polarization of the electron core. It manifests itself as a many-electron response to variation of the external electromagnetic field, which results from the excitation of the many-electron system. Detailed study of the main mechanisms determining the cross section dependence profile was carried out. These mechanisms are the inter- and intrachannel correlations acting as a many-electron response to the external field, the electron core rearrangement, and the dynamic polarization. Besides sodium and potassium ions, photoionization of rubidium ion was investigated. A new method accounting for polarization corrections to optical transition amplitudes based on combination of the Dyson equation and RPAE is proposed.     

Ion generation from Al-laser-produced plasma

Particle diagnostics of Al-laser-produced plasma based on ion collectors identified three groups of emitted ions. Their velocity distributions were analyzed to obtain the mean ion energy, energy and charge carried by ions, including the angular distributions of these quantities. The electron temperature evaluated from these measurements was compared with X-ray results. A satisfactory agreement between the two sets of data was found. In both the cases the electron temperature grows only very slowly with the incident laser power. Origin of different ion groups is discussed. Iodine photodissociation laser system PERUN was used as a driver.     

The REX-ISOLDE project

The Radioactive Beam Experiment REX-ISOLDE [1–3] is a pilot experiment at ISOLDE (CERN) testing the new concept of post acceleration of radioactive ion beams by using charge breeding of the ions in a high charge state ion source and the efficient acceleration of the highly charged ions in a short LINAC using modern ion accelerator structures. In order to prepare the ions for the experiments singly charged radioactive ions from the on-line mass separator ISOLDE will be cooled and bunched in a Penning trap, charge bred in an electron beam ion source (EBIS) and finally accelerated in the LINAC. The LINAC consists of a radiofrequency quadrupole (RFQ) accelerator, which accelerates the ions up to 0.3 MeV/u, an interdigital H-type (IH) structure with a final energy between 1.1 and 1.2 MeV/u and three seven gap resonators, which allow the variation of the final energy. With an energy of the radioactive beams between 0.8 MeV/u and 2.2 MeV/u a wide range of experiments in the field of nuclear spectroscopy, astrophysics and solid state physics will be addressed by REX-ISOLDE. This revised version was published online in July 2006 with corrections to the Cover Date.