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1.
Zinc indium selenide (ZnIn2Se4) thin films have been deposited onto amorphous and fluorine doped tin oxide (FTO)-coated glass substrates using a spray pyrolysis technique. Aqueous solution containing precursors of Zn, In, and Se has been used to obtain good quality deposits at different substrate temperatures. The preparative parameters such as substrate temperature and concentration of precursors solution have been optimized by photoelectrochemical technique and are found to be 325 °C and 0.025 M, respectively. The X-ray diffraction patterns show that the films are nanocrystalline with rhombohedral crystal structure having lattice parameter a=4.05 Å. The scanning electron microscopy (SEM) studies reveal the compact morphology with large number of single crystals on the surface. From optical absorption data the indirect band gap energy of ZnIn2Se4 thin film is found to be 1.41 eV.  相似文献   

2.
Bismuth telluride thin films have been grown by close space vapor transport (CSVT) technique as a function of substrate temperature (Tsub). Both N- and P-type samples can be obtained by this method which is a relatively simple procedure, which makes the method interesting for technological applications. The samples were deposited onto amorphous glass and polycrystalline CdTe film substrates in the substrate temperature range 300-425 °C, with a fixed gradient between source and substrate of 300 °C. The influence of the type of substrate and substrate temperature in the CSVT chamber on the physical properties of the films is presented and discussed.  相似文献   

3.
CuIn(SxSe1−x)2 thin polycrystalline films were grown by the chemical spray pyrolysis method on the glass substrate at 280-400°C. The alloy composition in the film was studied with relation to that in the splay solution. Films were characterized by X-ray diffraction, optical absorption, Raman spectroscopy, resistivity and surface morphology. The CuInSe2-rich alloy films grown at high substrate temperature had chalcopyrite structure, while, the CuInS2-rich films grown at low substrate temperature exhibited sphalerite structure. Optical-gap energies were smaller than that of the bulk crystal by 0.1-0.2 eV for CuInS2-rich films. Raman spectra exhibited both CuInSe2-like and CuInS2-like A1 modes, and their relative changed systematically with alloy composition.  相似文献   

4.
CuAlO2 thin film was successfully prepared by rapid thermal annealing of an Al2O3/Cu2O/sapphire structure in air above 1000 °C. The film was mostly with single crystalline structure as verified by X-ray diffraction methods. We found that crystal quality and electrical conductivity of the films were affected by the cooling rate after annealing. The highest conductivity obtained in this work was 0.57 S/cm. Optical gap of this film was determined to be 3.75 eV.  相似文献   

5.
Structural, optical and electrical properties of CuIn5S8 thin films grown by thermal evaporation have been studied relating the effects of substrate heating conditions of these properties. The CuIn5S8 thin films were carried out at substrate temperatures in the temperature range 100-300 °C. The effects of heated substrate on their physico-chemical properties were investigated using X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), optical transmission and hot probe method. X-ray diffraction revealed that the films are strong preferred orientation along the (3 1 1) plane upon substrate temperature 200 °C and amorphous for the substrate temperatures below 200 °C. No secondary phases are observed for all the films. The composition is greatly affected by heated substrate. From the optical transmission and reflection, an important absorption coefficient exceeds 105 cm−1 at 800 nm was found. As increasing the substrate temperature, the optical energy band gap decreases from 1.70 eV for the unheated films to 1.25 eV for the deposited films at 300 °C. It was found that CuIn5S8 thin film is an n-type semiconductor at 250° C.  相似文献   

6.
The anatase-TiO2 transparent films, containing 3 mol% of Si and P elements (as dopants), were synthesized using a process combining the sol-gel method and spin-coating technique. Effects of relative ratio of dopants and calcination temperature on phase transformation, grain growth, surface morphology, light transmittance, band-gap energy and photocatalytic activity of the P/Si-TiO2 films were examined and their results were compared with those of the undoped-TiO2 and Si-TiO2 films. The P/Si-TiO2 films calcined at temperature between 600 and 900 °C adhered strongly to the surface of fused-silica substrate and were composed of anatase-TiO2 monophase. The photocatalytic activities of the films were measured and represented using a characteristic time constant (τ) for the methylene blue (MB) photodegradation. The small τ stands for high photocatalytic ability of the film. The P/Si-TiO2 film, containing equalmolar Si and P dopants, calcined at 800 °C gave the best performance in photocatalysis; this film had τ=5.7 h and decomposed about 90 mole% of MB in the water after 12 h of the 365-nm UV light irradiation.  相似文献   

7.
The influence of substrate temperature on structural and dielectric properties of cubic pyrochlore Bi1.5Zn1.0Nb1.5O7 (BZN) thin films prepared by pulsed laser deposition process has been investigated. BZN thin films were deposited on Pt/Ti/SiO2/Si(1 0 0) substrate and in situ annealed at 700 °C. The results indicate that the substrate temperature has a significant effect on the structural and dielectric properties of BZN thin films. The films exhibit a cubic pyrochlore structure in the substrate temperature range from 550 °C to 700 °C and at the annealing temperature of 700 °C. With further increase of substrate temperature to 750 °C, the phases of Bi2O3, BiNbO4 and Bi5Nb3O15 can be detected in the XRD pattern due to the Zn loss. The dielectric constant and loss tangent of the films deposited at 650 °C are 192 and 6 × 10−4 at 10 kHz, respectively. The tunability is 10% at a dc bias field of 0.9 MV/cm.  相似文献   

8.
B. Fu 《Applied Surface Science》2010,257(5):1500-1505
This paper addresses the in situ growth stress evolution and post-growth stress relaxation during the phase separation of immiscible Fe0.51Cu0.49 thin films at various in situ deposition temperatures. Each film was sputter-deposited onto a 10 nm Si3N4 underlayer that was grown on top of Si [0 0 1] substrate at 25 °C, 145 °C, 205 °C, 265 °C or 325 °C. The thin film stress was measured using a wafer curvature technique. The in situ growth stress increased in compression with increasing substrate temperature. The stress relaxation of the Fe0.51Cu0.49 was found to have a linear increase with the inverse grain size for films deposited at temperatures greater than 205 °C. The stress state was correlated to the films’ phase and morphology by X-ray diffraction, (scanning) transmission electron microscopy and atomic force microscopy techniques.  相似文献   

9.
Ion beam sputtering process was used to deposit n-type fine-grained Bi2Te3 thin films on BK7 glass substrates at room temperature. In order to enhance the thermoelectric properties, thin films are annealed at the temperatures ranging from 100 to 400 °C. X-ray diffraction (XRD) shows that the films have preferred orientations in the c-axis direction. It is confirmed that grain growth and crystallization along the c-axis are enhanced as the annealing temperature increased. However, broad impurity peaks related to some oxygen traces increase when the annealing temperature reached 400 °C. Thermoelectric properties of Bi2Te3 thin films were investigated at room temperature. The Bi2Te3 thin films, including as-deposited, exhibit the Seebeck coefficients of −90 to −168 μV K−1 and the electrical conductivities of 3.92×102-7.20×102 S cm−1 after annealing. The Bi2Te3 film with a maximum power factor of 1.10×10−3 Wm−1 K−2 is achieved when annealed at 300 °C. As a result, both structural and transport properties have been found to be strongly affected by annealing treatment. It was considered that the annealing conditions reduce the number of potential scattering sites at grain boundaries and defects, thus improving the thermoelectric properties.  相似文献   

10.
The dielectric properties of MgO-Ta2O5 continuous composition spread (CCS) thin films were investigated. The MgO-Ta2O5 CCS thin films were deposited on Pt/Ti/SiO2/Si substrates by off-Axis RF magnetron sputtering system, and then the films were annealed at 350 °C with rapid thermal annealing system in vacuum. The dielectric constant and loss of MgO-Ta2O5 CCS thin films were plotted via 1500 micron-step measuring. The specific point of Ta2O5-MgO CCS thin film (post annealed at 350 °C) showing superior dielectric properties of high dielectric constant (k ∼ 28) and low dielectric loss (tan δ < 0⋅004) at 1 MHz were found in the area of 3-5 mm apart from Ta2O5 side on the substrate. The cation's composition of thin film was Mg:Ta = 0.4:2 at%.  相似文献   

11.
We report the laser-induced voltage (LIV) effects in c-axis oriented Bi2Sr2Co2Oy thin films grown on (0 0 1) LaAlO3 substrates with the title angle α of 0°, 3°, 5° and 10° by a simple chemical solution deposition method. A large open-circuit voltage with the sensitivity of 300 mV/mJ is observed for the film on 10° tilting LaAlO3 under a 308 nm irradiation with the pulse duration of 25 ns. When the film surface is irradiated by a 355 nm pulsed laser of 25 ps duration, a fast response with the rise time of 700 ps and the full width at half maximum of 1.5 ns is achieved. In addition, the experimental results reveal that the amplitude of the voltage signal is approximately proportional to sin 2α and the signal polarity is reversed when the film is irradiated from the substrate side rather than the film side, which suggests the LIV effects in Bi2Sr2Co2Oy thin films originate from the anisotropic Seebeck coefficient of this material.  相似文献   

12.
NbNx films were deposited on Nb substrate using pulsed laser deposition. The effects of substrate deposition temperature, from room temperature to 950 °C, on the preferred orientation, phase, and surface properties of NbNx films were studied by X-ray diffraction, atomic force microscopy, and electron probe micro analyzer. We find that the substrate temperature is a critical factor in determining the phase of the NbNx films. For a substrate temperature up to 450 °C the film showed poor crystalline quality. With temperature increase the film became textured and for a substrate temperature of 650−850 °C, mix of cubic δ-NbN and hexagonal phases (β-Nb2N + δ′-NbN) were formed. Films with a mainly β-Nb2N hexagonal phase were obtained at deposition temperature above 850 °C. The c/a ratio of β-Nb2N hexagonal shows an increase with increased nitrogen content. The surface roughness of the NbNx films increased as the temperature was raised from 450 to 850 °C.  相似文献   

13.
SrRuO3 thin films have been grown on singular (1 0 0) MgO substrates using pulsed laser deposition (PLD) in 30 Pa oxygen ambient and at a temperature of 400-700 °C. Ex situ reflection high-energy electron diffraction (RHEED) as well as X-ray diffraction (XRD) θ/2θ scan indicated that the films deposited above 650 °C were well crystallized though they had a rough surface as shown by atom force microscopy (AFM). XRD Φ scans revealed that these films were composed of all three different types of orientation domains, which was further confirmed by the RHEED patterns. The heteroepitaxial relationship between SrRuO3 and MgO was found to be [1 1 0] SRO//[1 0 0] MgO and 45°-rotated cube-on-cube [0 0 1] SRO//[1 0 0] MgO. These domain structures and surface morphology are similar to that of ever-reported SrRuO3 thin films deposited on the (0 0 1) LaAlO3 substrates, and different from those deposited on (0 0 1) SrTiO3 substrates that have an atomically flat surface and are composed of only the [1 1 0]-type domains. The reason for this difference was ascribed to the effect of lattice mismatch across the film/substrate interface. The room temperature resistivity of SrRuO3 films fabricated at 700 °C was 300 μΩ cm. Therefore, epitaxial SrRuO3 films on MgO substrate could serve as a promising candidate of electrode materials for the fabrication of ferroelectric or dielectric films.  相似文献   

14.
Y2O3 thin films were grown on silicon (1 0 0) substrates by pulsed-laser deposition at different substrate temperatures and O2 pressures. The structure and composition of films are studied by using X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The Y2O3 thin films deposited in vacuum strongly oriented their [1 1 1] axis of the cubic structure and the film quality depended on the substrate temperature. The magnitude of O2 pressure obviously influences the film structure and quality. Due to the silicon diffusion and interface reaction during the deposition, yttrium silicate and SiO2 were formed. The strong relationship between composition and growth condition was discussed.  相似文献   

15.
Bi0.5(Na0.7K0.2Li0.1)0.5TiO3 (BNKLT) thin films were prepared on Pt/Ti/SiO2/Si substrates by pulsed laser deposition (PLD) technique. The films prepared were examined by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The effects of the processing parameters, such as oxygen pressure, substrate temperature and laser power, on the crystal structure, surface morphology, roughness and deposition rates of the thin films were investigated. It was found that the substrate temperature of 600 °C and oxygen pressure of 30 Pa are the optimized technical parameters for the growth of textured film, and all the thin films prepared have granular structure, homogeneous grain size and smooth surfaces.  相似文献   

16.
We deposited SrCu2O2 (SCO) films on sapphire (Al2O3) (0 0 0 1) substrates by pulsed laser deposition. The crystallographic orientation of the SCO thin film showed clear dependence on the growth temperature. X-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis showed that the film deposited at 400 °C was mainly oriented in the SCO [2 0 0] direction, whereas when the growth temperature was increased to 600 °C, the SCO film showed a dominant orientation of SCO [1 1 2]. The SCO film deposited at 500 °C was obvious polycrystalline, showing multi peaks from (2 0 0), (1 1 2), and (2 1 1) diffraction in the XRD spectrum. The SCO film deposited at 600 °C showed a band gap energy of 3.3 eV and transparency up to 80% around 500 nm. The photoluminescence (PL) spectra of the SCO films grown at 500 °C and 600 °C mainly showed blue-green emission, which was attributed to the intra-band transition of the isolated Cu+ and Cu+–Cu+ pairs according to the temperature dependent-PL analysis.  相似文献   

17.
(Pb,Ca)TiO3 (PCT) thin films have been deposited on Pt/Ti/SiO2/Si substrate by metal-organic decomposition (MOD) technique. The film processing parameters such as drying and annealing temperatures have been optimized to obtain good-quality PCT films. Compositional analysis of the film has been studied by X-ray photoelectron spectroscopy (XPS). The effect of the annealing temperature on the crystalline structure, microstructure and electrical properties have been investigated by X-ray diffraction, atomic force microscopy (AFM) and impedance analyzer, respectively. Amorphous PCT films form at 350 °C and crystallize in the perovskite phase following the isothermal annealing at ?650 °C for 3 h in oxygen ambient. Typical tetragonal structure of the PCT film is evidenced from X-ray diffraction pattern. The grain size in the PCT films increases with an increase in annealing temperature. Significant improvement in the dielectric constant value is observed as compared to other reported work on PCT films. The observed dielectric constant and dissipation factor at 100 kHz for 650 °C annealed PCT films are 308 and 0.015, respectively. The correlation of the film microstructural features and electrical behaviors is described.  相似文献   

18.
Co2MnGa0.5Sn0.5 (CMGS) thin films were epitaxially grown on MgO (0 0 1) substrates by magnetron sputtering and the current spin polarizations of the films with different post annealing conditions were measured by the point contact Andreev reflection method. The film deposited at a substrate temperature of 150 °C had a B2 structure and its spin polarization was estimated to be 59%. The film was ordered to the L21 structure by annealing at 600 °C, and the spin polarization was enhanced to 66%. The spin polarization and the intensity of the L21 diffraction showed clear correlation, suggesting L21 ordering is essential to achieve higher spin polarization of this quaternary Heusler alloy.  相似文献   

19.
Bi1.5Zn1.0Nb1.5O7/Ba0.6Sr0.4TiO3/Bi1.5Zn1.0Nb1.5O7 tunable multilayer thin film has been fabricated by pulsed laser ablation and characterized. Phase composition and microstructure of multilayer films were characterized by X-ray diffraction, scanning electron microscopy (SEM) and atomic force microscopy (AFM). The film has very smooth surface with RMS roughness of 1.5-2 nm and grain size of 100-150 nm. Total film thickness has been measure to be 375 nm. The BZN thin films at 300 K, on Pt(1 1 1)/SiO2/Si substrate showed zero-field dielectric constant of 105 and dielectric loss tangent of 0.002 at frequency of 0.1 MHz. Thin films annealed at 700 °C shows the dielectric tunability of 18% with biasing field 500 kV/cm at 0.1 MHz. The multilayer thin film shows nonferroelectric behavior at room temperature. The good physical and electrical properties of multilayer thin films make them promising candidate for tunable microwave device applications.  相似文献   

20.
Bi3TiNbO9:Er3+:Yb3+ (BTNEY) thin films were fabricated on fused silica by pulsed laser deposition. It was demonstrated that different laser fluence and substrate temperature during growth of BTNEY upconversion photoluminescence (UC-PL) samples control the film’s grain size and hence influences the UC-PL properties. The average grain size of BTNEY thin films deposited on fused silica substrates with laser fluence 4, 5, 6, and 7 J/cm2 are 30.8, 35.9, 40.6, and 43.4 nm, respectively. The 525 nm emission intensities increase with the deposition laser fluence and the emission intensities of BTNEY thin film deposited under 700 and 600 °C are almost 24 and 4 times, respectively, as strong as those of samples under 500 °C. The grain size of BTNEY thin film increases with the increasing temperature. UC-PL of BTNEY films is enhanced by increasing grain size of the films.  相似文献   

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