局域功函数图像及其在Cu(111)-Au/Pd表面的应用

用扫描隧道显微镜（STM）对Cu(111)-Au和Cu(111)-Pd表面的局域功函数进行了研究.通过 测量隧道电流对针尖样品间距的响应，得到了与STM形貌图一一对应的表面局域功函数图像. 实验发现，Au/Pd覆盖层和Cu衬底间的功函数有明显的不同.Pd薄膜的功函数甚至超过了其体 本征值，且功函数在台阶处变小.用偶极子的形成解释了台阶处功函数的降低.这一工作表明 ，用测量局域功函数的方法容易区分表面上不同的元素，并具有纳米尺度的空间分辨率. 关键词： 扫描隧道显微镜 局域功函数 台阶     

用扫描隧道显微镜测量局域功函数

用扫描隧道显微镜在Cu（111）-Au和Pt（111）-Ag表面上对局域功函数进行了测量．在扫描的同时通过测量隧道电流对针尖样品间距离变化的响应，可以在得到扫描隧道显微镜（STM）图的同时得到功函数图．用这种方法，成功地观察到Au，Ag覆盖层与Cu，Pt衬底间的功函数的差别．结果表明：Au覆盖层的功函数介于Cu（111）和Au（111）的功函数之间，这与其它方法的结果一致．在Pt（111）-Ag表面观察到了局域功函数随覆盖层厚度的变化．本工作表明：扫描隧道显微镜在研究功函数与表面结构的关系方面是十分有用的；用测量局域功函数的方法还可以区分表面不同种的物质 关键词：     

高功函数的钛酸镧掺杂氧化铟透明导电薄膜的制备与光电特性研究

制备了一种新型的具有高功函数的掺钛酸镧(LaTiO3)的氧化铟(ILTO)三元透明导电氧化物薄膜,并研究了其光电特性。EDX能谱测试结果证实了样品中In、La及Ti的存在,薄膜的掺杂具有良好的均匀性及一致性。由原子力显微镜测试可知,在一个5μm×5μm的扫描区域内,样品的表面粗糙度(RMS)较小,为1 nm量级。ILTO薄膜在可见光区域的平均透过率超过了85%,其功函数接近于金的功函数(5.2 eV左右),远高于目前商业化的ITO的功函数(4.5～4.7 eV)。由于导电薄膜的功函数在光电器件中对异质结界面的势垒高度有着直接影响,较高的功函数可以提高载流子的注入及抽取能力,因此采用ILTO作为光电器件的阳极将有望改善器件的性能。     

超导体电输运及交流磁化率双模式测量系统研制

介绍了一种基于小型制冷机的超导转变温度电输运和交流磁化率双模式单腔测量装置。该装置包括电输运法测量和交流磁化率法测量两部分,分别实现对高温超导薄膜样品的超导转变温度的测量。电输运法测量部分利用四点法测量原理对超导薄膜的电阻进行测量,获取电阻随温度变化的曲线;同时利用电流换向法消除热电势带来的测量误差,以进一步提高测量的精度。交流磁化率法测量部分利用的是电磁感应原理和超导磁效应。该部分包含有初级线圈和次级线圈,超导样品放置于两线圈之间。初级线圈用于产生交变激励磁场,次级线圈的输出信号反应了超导样品磁化率的变化,其输出信号由锁相放大器获取。测量过程中使用计算机自动记录测量数据。     

小型烧结炉装置的设计与制作

设计与研制了一种小型的用于制备薄膜样品电接触的烧结炉装置。该装置简单、实用 ,特别适用于半导体霍耳样品电极的烧接。     

透明软质薄膜的表面形貌测量

为了实现光刻胶表面形貌的广域、高精度测量,对新一代测量理论及测量方法进行了研究。首先分析了被测物件的特性,根据其柔软、透明的特征提出应用光干涉法和机械探针相结合的方法进行测量,同时阐明了使用此方法进行表面形貌测量的优点,并据此原理搭建了光学多探针表面形貌测量装置,光学测量部分采用白光干涉计,探针部分采用拥有8只球型探头的多点悬臂测量探针。然后应用此装置对标准刻槽试件和半透明光造型薄膜试件进行了测量。测量52 nm的标准刻槽试件时得到了测量误差小于2%,标准偏差小于1 nm的结果,表明本装置可以达到高精度测量表面形貌的目的。通过测量高约400 nm的树脂材料证实了此装置可以克服多重反射的影响测量透明薄膜的表面形貌。     

不同电流下气体开关电极烧蚀特性实验研究

在不同短路电流条件下,进行了不锈钢(1Cr18Ni9Ti)电极气体火花开关连续多次自击穿放电实验,通过测量电极质量损失、表面粗糙度和自击穿电压的变化,研究电极烧蚀特性及其对自击穿性能的影响。实验结果表明:随着放电电流峰值和周期增大,电极材料烧损速率与电容电荷量呈线性增加,而电极表面烧蚀粗糙度与电流峰值呈线性增大,自击穿电压变化达到峰值和稳定区的放电次数减少,但稳定阶段的自击穿电压值及其相对标准偏差同时减少,五种放电电流情况下,自击穿电压概率密度分布均遵循高斯函数。     

小型烧结炉装置的设计与制作

设计与研制了一种小型的用于制备薄膜样品电接触的烧结炉装置，该装置简单、实用、特别适用于半导体霍尔样品电极的烧结。     

Ni全硅化金属栅功函数调节技术研究

通过制备栅内不同掺杂条件的Ni全硅化金属栅电容并分析其C-V和V_fb-EOT特性发现,Ga和Yb较常规的杂质而言具有更好的栅功函数调节能力,能够分别将Ni全硅化金属栅电极功函数调节到价带顶和导带底附近,满足高性能体硅平面互补金属氧化物半导体(CMOS)器件对栅电极功函数的要求. 同时根据电偶极子(Dipole)理论分析了Ga和Yb具有较强栅功函数调节能力的原因. 另外,研究发现栅内掺入Ga或Yb杂质后的Ni全硅化金属栅电容的电容值变大、栅极泄漏电流反而变小,通过对C-V和栅极泄漏电流特性进行分析,对这一现象进行了解释. 关键词： 金属栅电极 功函数 硅化物     

“阳”加速器磁驱动平面飞片实验和速度计算校验

脉冲功率驱动源作为磁驱动加载的重要手段,通过调整其电路参数可调节负载电流波形,实现对样品无冲击准等熵加载。在"阳"加速器上,开展了一系列轴对称结构和带状结构构型的磁驱动平面飞片发射实验,电极材料采用不锈钢和LY-12铝。实验中测量了进入负载的电流历史和电极后自由面速度历史,并通过时序控制将两者时间关联起来。本文以测量到的电流历史数据为基础,引入负载电流分布系数,并结合已知的LY-12铝的状态方程数据,计算电极后自由面速度历史和飞片速度历史。通过实验测量自由面速度历史校验负载各个位置的电流分布系数。另外,基于装置参数和实验数据确定了考虑负载电感变化的装置等效电路模型,形成了计算样品压力加载历史和电极后自由面速度历史估算程序。此外,初步分析不同厚度电极的自由面速度历史,获取了电极材料的准等熵加载波剖面信息,观察到一系列准等熵加载下材料动力学性能引起的物理现象。     

Progress in Modification of Indium-Tin Oxide/Organic Interfaces for Organic Light-Emitting Diodes

The oxide/organic interfaces play crucial roles in the hole injection from the anode electrodes to the emitting organics in organic light-emitting diodes (OLEDs), and hence have strong impacts on the efficiencies and other properties of the devices. Indium-tin oxide (ITO) is currently the most popular anode material used in OLEDs due to several merits, such as good etch ability, good adherence, high transparency, low resistivity, and high work function. Interfacial engineering between the ITO electrode and the overlying organic layers is an important process to obtain the high performance of the diode devices. In this article, recent progress in modification of the ITO/organic interfaces is reviewed, as these interfaces are important to the development of the technologies aiming at improving the electroluminescence, and efficiencies as well as reducing the operation voltages of OLEDs. ITO/Organic interfacial properties can be controlled or modified by simply changing the surface properties of ITO using chemical or physical treatments, and by adding a buffer layer (e.g., metal, oxide, or organic thin films) between the ITO and hole transport or emitting organic layers. The literature data showed that the electroluminescence, efficiencies, and lifetimes of the OLEDs could be greatly increased and the operation voltage considerably decreased when the ITO/organic interfaces have been properly improved.     

On the improvement of the electroluminescent signal of organic light emitting diodes by the presence of an ultra‐thin metal layer at the interface organic/ITO

The electroluminescent (EL) signal of organic light emitting diodes (OLEDs) based on simple “hole transporting layer/electron transporting layer” (HTL/ETL) structures has been studied as a function of the anode/HTL interface, the anode being an indium tin oxide (ITO) film. It is shown that the electroluminescent (EL) signal increases when a metal ultra‐thin layer is introduced between the anode and the HTL. Experimental results show that the work function value of the metal is only one of the factors which allow improving the EL signal via better hole injection efficiency. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

微腔结构顶发射有机发光器件

以Ag/ITO为全反射阳极，以Al/Ag为半透明复合阴极，制备了绿色、蓝色两种微腔结构顶发射有机发光器件，研究了微腔效应对顶发射器件颜色的影响，通过调节光程，实现了用同一种有机发光层制备出不同波长的发射.Alq基顶发射器件得到波长峰值从500 nm到584 nm的不同颜色的器件，发光光谱半高宽由传统器件的100 nm窄化到20—40 nm，最高电流效率1.77 cd/A.蓝光顶发射器件发光峰值从464 nm变化到532 nm，半高宽由传统器件的65 nm窄化到17—21 nm，并得到色坐标为(0.141，0.049)的深蓝色顶发射有机发光器件. 关键词： 有机发光 顶发射 微腔效应     

Surface modification of indium tin oxide anode with self-assembled monolayer modified Ag film for improved OLED device characteristics

Modification of electrodes has attracted much attention in the study of organic semiconductor devices. A self-assembled monolayer (SAM) of 4-fluorothiophenol is employed to modify the Ag film on the surface of indium tin oxide (ITO) to improve the hole injection and the surface morphology. The modified anode was characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), and UV–vis transmittance spectra. To investigate the effect of the modification on the device characteristics, typical double layer devices with the structure of anode/-naphthylphenylbiphenyl diamine (NPB, 60 nm)/tris-(8-hydroxyquinoline) aluminum (Alq₃, 60 nm)/LiF(0.7 nm)/Al(100 nm) were fabricated using the modified anode and the bare ITO. The effect of Ag layer thickness on the device performance is also investigated. The results revealed that SAM modified ultra-thin Ag film is an effective buffer layer for organic light emitting diode. The device using the ITO/Ag (5 nm)/SAM as anode show improved device characteristics than that of using bare ITO as anode. The enhancements in luminance and efficiency are attributed to enhanced hole injection and smooth surface between anode and the organic material. The Ag thickness of 5 nm is chosen as an acceptable compromise between substrate transparency and the device performance.     

以ILTO为阳极的高效有机电致发光器件

以高功函数的掺杂钛酸镧的氧化铟薄膜(ILTO)及氧化铟锡(ITO)作为阳极,制备了Glass/anode/NPB/Alq3/LiF/Al结构的有机电致发光器件。得益于ILTO较好的掺杂性、低的表面粗糙度、高的可见光透过率以及高的有效功函数,以ILTO为阳极的有机电致发光器件的开路电压得到降低,最高亮度、电流效率、功率效率以及外量子效率均获得了成倍的提高。研究结果表明,ILTO是一种潜在的光学窗口材料,有望在各种光电器件中得到广泛的应用。     

ITO阳极电阻对有机电致发光器件性能的影响

以不同方块电阻的ITO作为阳极,利用真空热蒸发的方法制备了双层结构有机电致发光器件ITO/TPD/Alq3/LiF/Al,定量研究了ITO阳极电阻对器件光电性能的影响。实验结果表明,具有较大阳极电阻的器件在一定的驱动电压下表现出较低的电流密度和亮度,我们认为主要原因是阳极电阻的分压导致用于载流子注入的有效驱动电压减少。扣除阳极电阻以后,我们发现用于载流子注入的有效驱动电压并不受阳极电阻的影响。另外,我们没有观察到阳极电阻对器件发光效率的明显影响。     

PrF3阳极缓冲层对OLED器件性能的影响

使用真空热蒸镀法制备的OLED器件,利用不同厚度的PrF3作阳极缓冲层,并和未加缓冲层的器件进行了对比.实验结果表明:0.5nm厚的PrF3阳极缓冲层可以有效增强OLED器件的空穴注入能力,增强电子和空穴的浓度平衡,优化器件的电致发光特性.器件的最大电流效率为4.9 cd/A,最大亮度为33 600 cd/m2,分别是...     

Enhanced performance in organic photovoltaic devices with KMnO4 solution treated indium tin oxide anode modification

The properties of poly(3-hexylthiophene):(6,6)-phenyl C₆₁ butyric acid methyl ester (P3HT:PCBM) organic photovoltaic devices (OPVs) with indium tin oxide (ITO) anode treated by KMnO₄ solution are investigated. The optimized KMnO₄ solution has a concentration of 50 mg/L, and ITO is treated for 15 min. The modification of ITO anode results in an enhancement of the power conversion efficiency (PCE) of the device, which is responsible for the increase of the photocurrent. The performance enhancement is attributed to the work function modification of the ITO substrate through the strong oxygenation of KMnO₄, and then the charge collection efficiency is improved.     

Bi‐directional organic light‐emitting diodes with nanoparticle‐enhanced light outcoupling

An effective method is presented for enhancing the outcoupling efficiency of translucent/bi‐directional organic light‐emitting diodes (TL/BD‐OLEDs) with a bottom indium tin oxide (ITO) anode and a top cathode comprised of a thin Ag layer covered with an organic capping layer. Upon insertion of a nanoparticle (NP)‐based scattering layer (NPSL) between the substrate and the ITO anode, the TL/BD‐OLEDs exhibit significantly enhanced external quantum efficiency (EQE) in both emission directions. Furthermore, the NPSL improves the color stability of the TL/BD‐OLEDs over a wide range of viewing angles. Simulations based on geometrical and statistical optics are performed to elucidate the mechanism by which the efficiency is enhanced and to establish strategies for further optimization. Simulations performed on the scattering layers with varying NP volume percentage reveal that the bottom‐side emission is governed by competition between waveguide‐mode extraction and backward scattering by NPs in the film, while the top‐side emission is largely dominated by the latter. Optimized bi‐directional OLEDs achieve a 1.64‐fold enhanced EQE compared to reference devices without NPSL.     

硅片上顶发射的有机电致发光器件

为了更好地实现有机发光器件在硅片上的有源矩阵显示,有必要探讨在硅片上直接制作透明阴极的顶发射有机发光器件。在顶发射发光器件中,为了到达高的发光效率,底部阳极一般采用高反射率的金属。在通常所用的各种金属当中,金属银对可见光具有很高的反射率,然而由于其具有相当低的功函数,导致与有机材料间能级的不匹配,从而引起有机发光器件中阳极空穴注入的不理想而影响器件的性能。我们在硅片上制备顶发射的有机发光器件,用薄层QAD(quinacridone)作为发光层,表面修饰的银作为阳极,制备的有机发光器件的亮度在外加电压10V时达到13700cd／m^2,器件的最大电流效率在7V时达到4．3cd／A,是没有薄层QAD器件的2倍多,是由在器件中存在Alq3与QAD之间Foester能量转移机制引起的。