n-ZnO/i-MgO/p-GaN异质结发光二极管

用等离子体辅助分子束外延的方法生长了n-ZnO/i-MgO/p-GaN异质结发光二极管。I-V测量表明其具有典型的二极管整流特性。电致发光峰位于382nm,通过与n型ZnO和p型GaN的光致发光谱比较,其发光峰位与线形都与ZnO的自由激子发射一致,表明该电致发光来自于ZnO的自由激子发射。通过Anderson模型比较了n-ZnO/i-MgO/p-GaN和n-ZnO/p-GaN异质结的能带示意图,证明了由于MgO层的插入抑制了ZnO向GaN层中的电子注入,且有利于空穴向ZnO层注入,从而实现了ZnO层中的电注入发光。     

Low-voltage blue light emission from n-ZnO/p-GaN heterojunction formed by RF magnetron sputtering method

High quality n-ZnO/p-GaN heterojunction was fabricated by growing highly crystalline ZnO epitaxial films on commercial p-type GaN substrates via radio frequency (RF) magnetron sputtering. Low-voltage blue light emitting diode with a turn-on voltage of ∼2.5 V from the n-ZnO/p-GaN heterojunction was demonstrated. The diode gives a bright blue light emission located at ∼460 nm and a low threshold voltage of 2.7 V for emission. Based on the results of the photoluminescence (PL) and electroluminescence (EL) spectra, the origins of the EL emissions were studied in the light of energy band diagrams of ZnO–GaN heterojunction, and may attribute to the radiative recombination of the holes in p-GaN and the electrons injected from n-ZnO, which almost happened on the side of p-GaN layer. These results may have important implications for developing short wavelength optoelectronic devices.     

Effect of MgZnO barrier layer on the UV emission of n-ZnO/p-Si heterojunction diodes

ZnO-based heterojunction light emitting diodes (LEDs) with MgZnO barrier layer had been fabricated on the p-Si substrate by metal-organic chemical vapor deposition (MOCVD) technology. The current-voltage (I-V) characteristics exhibited a typical p-n diode behavior. Both ultraviolet (UV) and visible emissions could be detected in the electroluminescence (EL) measurement. The result was compared with the EL spectrum of n-ZnO/p-Si heterojunction LED without MgZnO barrier layer. An improved light extraction efficiency by about 31% was realized owing to the current-blocking effect of MgZnO layer. The result indicated that MgZnO barrier layer can prevent the electrons as expected and realize electron-hole recombination in ZnO layer effectively.     

Atomic fluorescence mapping of optical field intensity profiles issuing from nanostructured slits, milled into subwavelength metallic layers

In this work, we report on the fabrication and characteristics of light-emitting diodes based on p-GaN/i-ZnO/n-ZnO heterojunction. A 30 nm i-ZnO layer was grown on p-GaN by rf reactive magnetron sputtering, then a n-ZnO was deposited by the electron beam evaporation technique. The current-voltage characteristic of the obtained p-i-n heterojunction exhibited a diode-like rectifying behavior. Because the electrons from n-ZnO and the holes from p-GaN could be injected into a i-ZnO layer with a relatively low carrier concentration and mobility, the radiative recombination was mainly confined in i-ZnO region. As a result, an ultraviolet electro-emission at 3.21 eV, related to ZnO exciton recombination, was observed in a room-temperature electroluminescence spectrum of p-i-n heterojunction under forward bias.     

生长在p-GaAs衬底上的ZnO基异质结二极管电致发光(英文)

利用等离子体辅助分子束外延在p型砷化镓衬底上制备了ZnO异质结发光二极管。实验表明:GaAs与ZnO之间的氧化镁绝缘层能够有效改善器件光电性能,I-V特性的研究表明该器件具有良好的整流特性,开启电压为3 V,电致发光光谱由一个紫外发光峰和一个可见发光带构成,其来源分别为ZnO层中近带边缺陷以及深能级缺陷相关的辐射复合。     

Improvement in electroluminescence performance of n-ZnO/Ga_2O_3 /p-GaN heterojunction light-emitting diodes

n-ZnO/p-GaN heterojunction light-emitting diodes with and without a Ga2O3 interlayer are fabricated. The electroluminescence （EL） spectrum of the n-ZnO/p-GaN displays a single blue emission at 430 nm originating from GaN, while the n-ZnO/Ga2O3/p-GaN exhibits a broad emission peak from ultraviolet to visible. The broadened EL spectra of n-ZnO/Ga2O3/p-GaN are probably ascribed to the radiative recombination in both the p-GaN and n-ZnO, due to the larger electron barrier （ΔEC=1.85 eV） at n-ZnO/Ga2O3 interface and the much smaller hole barrier （ΔEV=0.20 eV） at Ga2O3/p-GaN interface.     

The influence of electronic transport across interface junction between Si substrate and the root of ZnO micro-prism on field emission performance

ZnO micro-prisms are prepared on the p-type and n-type Si substrates, separately. The $I$--$V$ curves analysed by AFM show that the interface junctions between the ZnO micro-prisms and the p-type substrate and between the ZnO micro-prisms and the n-type Si substrate exhibit p--n junction behaviour and ohmic contact behaviour, respectively. The formation of the p--n heterojunction and ohmic contact is ascribed to the intrinsic n-type conduction of ZnO material. Better field emission performance (lower onset voltage and larger emission current) is observed from an individual ZnO micro-prism grown on the n-type Si substrate. It is suggested that the n-Si/n-ZnO interfacial ohmic contact benefits the electron emission; while the p-Si/n-ZnO interface heterojunction deteriorates the electron emission.     

White light electroluminescence from poly(9-vinylcarbazole) (PVK)/ZnO NRs/poly(2-methoxy-5-(2-ethylhexyloxy)-1, 4-phenylenevinylene) (MEH-PPV) dual heterojunctions

In this paper, we fabricated a p-PVK/n-ZnO nanorods (NRs)/p-MEH-PPV dual heterojunctions white light-emitting diode. Relative to previously reported p–n heterojunction structure including ZnO NRs and polymer, the device exhibits a low turn-on voltage of 7 V. An obviously broad electroluminescence emission band, originated from the overlap of PVK emission and ZnO defects emissions, was observed extending from 360 up to 700 nm. The influence of the two introduced p-type polymer layers on the device characteristic is discussed. With its hole conductivity, the p-PVK layer cannot only improve the holes tunnel into ZnO NRs layer, but also lower the barrier between ITO and the valance band of ZnO NRs. On the other hand, p-MEH-PPV could be regarded as block layer for the injection of electrons from the Al electrode. Both of two p-type polymers dramatically improve the injection balance of carriers, leading to a low turn-on voltage. Meanwhile, the carrier transport mechanism of the device under different forward bias region was discussed on the basis of current–voltage curve.     

Direct-current piezoelectric nanogenerator based on p-Si/n-ZnO heterojunction

We have demonstrated a direct-current piezoelectric nanogenerator with a novel structure of p-Si/n-ZnO heterojunction. Low resistance p-type silicon chip, with a large number of nano-concaves on the surface, was utilized as a top electrode over the n-type ZnO nanorod arrays, forming a heterojunction nanogenerator. Piezoelectric current, with average singles about 1 nA, was generated from the heterojunction nanogenerator. Rectifying behavior of the p-Si/n-ZnO heterojunction in our piezoelectric nanogenerator was analyzed from the I–V curve and the energy band structure. Furthermore, output tests of reverse connection and two devices parallel connection clearly eliminate the effects from measurement system errors and confirms that the current is generated from the nanogenerator. Our research presents an approach to integrating a new type of nanogenerator using the silicon chip directly, without expensive Pt or Au coated on the electrode surfaces.     

Deep level states and negative photoconductivity in n-ZnO/p-Si hetero-junction diodes

Negative photoconductivity (NPC) was observed in n-ZnO/p-Si heterojunction diode grown by ultra-high vacuum sputtering method under nitrogen ambient. Under the illumination of ultra-violet light, positive photoconductivity was observed at low bias voltages, whereas NPC was observed at high bias voltages. The defect states in the ZnO layers grown on Si were analyzed by photoluminescence and deep level transient spectroscopy measurements. Two deep levels were measured at E_c-0.51 eV and E_c-0.54 eV, which might be originated from oxygen vacancy and nitrogen atom related defects, respectively. Based on the simulation of band diagram, the defect states were located below Fermi level at zero bias voltage. However, as increasing the bias voltages, NPC was observed due to the increase of empty defect states. This analysis allowed us to consider the possibility that the NPC phenomenon in n-ZnO/p-Si heterojunction diode is originated dominantly from the defect states as a carrier recombination center in ZnO layer.     

Green electroluminescence from an n-ZnO: Er/p-Si heterostructured light-emitting diode

Erbium-doped ZnO (ZnO:Er) thin films with various doping concentrations were deposited on p-Si substrates by ultrasonic spray pyrolysis (USP). The n-ZnO:Er/p-Si heterojunctions were further employed to fabricate light-emitting diodes (LEDs). The devices showed diode-like rectifying current–voltage characteristics with a low reverse breakdown voltage, attributed to the avalanche breakdown. A distinct green electroluminescence peaking at 537 nm and 558 nm were observed at room temperature under reverse bias. The green electroluminescence originated from the electron impact excitation of Er³⁺ ions doped in ZnO films.     

Growth and optical properties of quadrangular zinc oxide nanorods on copper-filled porous silicon

Zinc oxide (ZnO) nanorods with quadrangular morphology have been successfully prepared on a copper-filled porous silicon substrate using a vapor phase transport method. Scanning electron microscopy showed that the diameters of the nanorods were scattered in a range of 100–400 nm and the lengths up to 2 m. High-resolution transmission electron microscopy and a selected-area electron-diffraction pattern confirmed that the quadrangular ZnO nanorods had a single-crystal wurtzite structure and grew along the (0001) direction. The photoluminescence spectrum under excitation at 325 nm showed an ultraviolet emission at 386 nm and a strong broad green emission at 518 nm at room temperature. PACS 81.05.Dz; 81.05.Rm; 81.07.Bc     

ZnMgO/n-ZnO/ZnMgO/p-GaN异质结LED的紫外电致发光

利用等离子体辅助分子束外延( P-MBE)技术制备了ZnMgO/n-ZnO/ZnMgO/p-GaN异质结LED.Ni/Au电极与p-GaN、In电极与ZnMgO之间都形成了良好的欧姆接触.在ZnMgO/n-ZnO/ZnMgO/p-GaN异质结器件中观察到了明显的整流特性.异质结的电致发光强度随着注入电流的增大而逐渐增强...     

Electroluminescence of an n-ZnO/p-GaN Heterojunction under Forward and Reverse Biases

Electroluminescent characteristics of n-ZnO/p-GaN heterojunctions under forward and reverse biases are studied. Emissions at 389nm and 57Ohm are observed under forward bias. An unusual emission at 390ram appears under reverse bias, and is attributed to the recombination in the p-GaN side of the heterojunction. The yellow emission peaked at 57Ohm is suppressed under reverse bias. The light intensity exponentially depends on the reverse current. The emission under reverse bias is correlated to tunnelling carrier transport in the heterostructure. Our results also support that the well-known yellow band of GaN comes from the transitions between some near-conduction-band-edge states and deep localized acceptor states.     

Growth of ZnO nanorods by a simple chemical method

ZnO nanorods were grown by a near-room-temperature, simple, chemical solution method on large-area Zn foils and substrate materials such as silicon, and zinc oxide thin films on silicon and glass. Study of the ZnO nanorods on the different substrates by electron microscopy methods shows that the morphology and size of the ZnO nanorods can be tuned varying the growth parameters and the substrates used. The growth mechanism is briefly discussed. Photoluminescence experiments at room temperature reveal a major emission peak of the nanorods at around 385 nm, which is attributed to the band edge transition of ZnO and weaker defect-related visible band peaks. PACS 81.05.Dz; 78.55.Et; 81.07.-b     

White electroluminescence of n-ZnO：Al/p-diamond heterostructure devices

An n-ZnO：A1/p-boron-doped diamond heterostructure electroluminescent device is produced, and a rectifying be- havior can be observed. The electroluminescence spectrum at room temperature exhibits two visible bands centred at 450 nm-485 nm （blue emission） and 570 nm-640 nm （yellow emission）. Light emission with a luminance of 15 cd/m2 is observed from the electroluminescent device at a forward applied voltage of 85 V, which is distinguished from white light by the naked eye.     

ZnO纳米线二极管发光器件制备及特性研究

运用液相法生长成ZnO纳米线薄膜，并利用肖特基型异质结的发光原理，构造成功肖特基型ZnO纳米线二极管发光器件.在大于6V直流电压驱动下，观察到近紫外波段392nm处和可见光波段525nm的发射谱带.从单向导电特性及ZnO纳米线材料的能带结构等方面探讨了该种器件的电致发光机理.     

ZnO纳米线二极管发光器件制备及特性研究

运用液相法生长成ZnO纳米线薄膜,并利用肖特基型异质结的发光原理,构造成功肖特基型ZnO纳米线二极管发光器件.在大于6V直流电压驱动下,观察到近紫外波段392nm处和可见光波段525nm的发射谱带.从单向导电特性及ZnO纳米线材料的能带结构等方面探讨了该种器件的电致发光机理. 关键词： ZnO纳米线 肖特基二极管 电致发光     

ZnO纳米线双绝缘层结构电致发光器件制备及特性研究

在利用液相法生长ZnO纳米线薄膜的基础上，构造成功基于ZnO纳米线双绝缘层结构的交流电致发光器件.此器件呈现出良好的阻容特性，在室温下以一定频率的交流电压驱动，可观察到近紫外波段387 nm处和可见光波段552 nm处的发射谱带.从阻容结构的导电特性及ZnO纳米线材料的能带结构等方面探讨了这种器件的电致发光机理及频率特性.     

Excellent UV absorption in spin-coated thin films of oleic acid modified zinc oxide nanorods embedded in Polyvinyl alcohol

The aim of the study is to investigate the optical properties of spin-coated, highly transparent nanocomposite films of oleic acid modified ZnO (Zinc oxide) nanorods embedded in Polyvinyl alcohol (PVA) matrix. Pristine and oleic acid (OA) modified ZnO nanorods have been prepared by wet chemical synthesis and are characterized by X-ray diffraction, FESEM, TEM and FT–IR spectroscopy techniques. The optical properties of ZnO/PVA films are studied using UV–visible absorption and Photoluminescence (PL) spectroscopy. The results show that the optical absorption of the films in the UV region is quite high and more than 95% absorption is observed in films prepared from OA modified ZnO nanorods. The excellent UV absorption at around 300 nm offers prospects of applications of these films as efficient UV filters in this wavelength region. The PL spectrum of pristine ZnO nanorods shows almost white light emission whereas OA modified ZnO nanorods have a more intense peak centered in the blue region. The PL emission of OA modified ZnO/PVA film shows appreciable increase in intensity compared to the film obtained with pristine ZnO. The surface modification of ZnO by the polymer matrix removes defect states within ZnO and facilitates sharp near band edge PL emission at 364 nm.