Power loss to generating ion current in radio-frequency ion thrusters and technological sources of ions

The balance of power in a radio-frequency ion source is constructed by calculating the inevitable power loss at surfaces bordering the inductive discharge plasma and power loss to the generation and preliminary acceleration of working-gas ions. The relationship between the specific radio-frequency power consumption per ion-current unit emerging from the source and electron temperature and geometric parameters of the gas discharge chamber is determined.     

RF absorption and ion heating in helicon sources

Experimental data are presented that are consistent with the hypothesis that anomalous rf absorption in helicon sources is due to electron scattering arising from parametrically driven ion-acoustic waves downstream from the antenna. Also presented are ion temperature measurements demonstrating anisotropic heating (T( perpendicular)>T(parallel)) at the edge of the discharge. The most likely explanation is ion-Landau damping of electrostatic slow waves at a local lower-hybrid-frequency resonance.     

A computer model of particle balance in ECR ion sources

The investigation of the widespread model of particle balance and energy transport [1–5] for calculating the ion charge state distribution (CSD) in an electron cyclotron resonance (ECR) ion source [6] is given. The modification of this model that makes it possible to describe the confinement and accumulation processes of highly charged ions in ECR plasma for the case of gas mixing is more precisely discussed. The discussion of the new technique for calculating the time confinement of ions and electrons, which is based on the Pastukhov theory [7, 8], is given: calculation of confinement times during two step minimization of special type functionals. The preliminary results obtained with this approach have been compared with available experimental data. The text was submitted by the authors in English.     

RF离子源引出特性的研究

为了使RF离子源具有良好的引出特性,测试了吸极几何参数、振荡器板压和引出电压对离子源聚焦度的影响,对实验结果进行了分析。在其它参数不变的情况下,吸极的外径D与内径d之比存在最佳值,增加D/d,有利于过聚焦的离子束恢复聚焦状态。吸极的长度为L,石英套管比吸极长l。当l/D增大时,聚焦度上升,引出束流下降。L/d之比减小时,聚焦度增大。当L/d小于4时,聚焦度增加趋势变缓。综合考虑聚焦度、引出束流和气压,D/d,l/D,L/d适宜的选择范围分别为1.6～2.1,0.7～1.1,4～7。增加振荡器功率会使离子束呈弱聚焦,而增加引出电压会使离子束呈过聚焦。振荡器功率和引出电压都存在最佳值。     

RF离子源引出特性的研究

 为了使RF离子源具有良好的引出特性,测试了吸极几何参数、振荡器板压和引出电压对离子源聚焦度的影响,对实验结果进行了分析。在其它参数不变的情况下,吸极的外径D与内径d之比存在最佳值,增加D/d,有利于过聚焦的离子束恢复聚焦状态。吸极的长度为L,石英套管比吸极长l。当l/D增大时,聚焦度上升,引出束流下降。L/d之比减小时,聚焦度增大。当L/d小于4时,聚焦度增加趋势变缓。综合考虑聚焦度、引出束流和气压,D/d,l/D,L/d适宜的选择范围分别为1.6～2.1,0.7～1.1,4～7。增加振荡器功率会使离子束呈弱聚焦,而增加引出电压会使离子束呈过聚焦。振荡器功率和引出电压都存在最佳值。     

Stability of liquid-metal ion sources

In this paper we find the parameters (radii, lengths, velocities) of the jets produced in liquid-metal ion sources. The jet stability with respect to developing sausages (Rayleigh instability) is studied. The Rayleight instability is shown to occur for rather large currents (in long jets). The currents critical for the instability initiation are calculated for Ga and Au sources. The results are in accordance with the experimental data available. In the case of Ga, the accordance is achieved only for the hot jet model (TT _m , whereT _m is the melting temperature), when the viscosity is appreciably lower.     

高频离子源等离子体的光谱诊断

 采用发射光谱法研究了高频离子源的等离子体性质。该离子源应用于ZF-200keV中子发生器中，是一种电感耦合型无极环形放电高频离子源。实验采用绝对定标后的光学多道分析系统测定了离子源等离子体在不同阶段氢原子巴耳末谱线系中前三条谱线的强度，并采用部分局部热力学平衡状态的理论，计算出了相应阶段高频离子源等离子体的电子温度、氢原子浓度、氢离子浓度等参数，并进行了简要分析。     

高频H型放电离子源的场特性

从Maxwell方程组出发,推导了高频H型放电离子源放电空间的场分布, 并采用Mafia软件进行了三维实体建模,计算了高频离子源放电击穿前和稳定工作后的电磁场分布,得到了高频离子源放电空间电磁场分布的直观图像。通过比较击穿前高频电场的轴向和环向分量,得出了轴向电场在高频离子源击穿中起主要作用的结论,并进而推导出了高频离子源的击穿判据,得出了气体击穿时离子源击穿电压和放电管内气压的关系,与实验结果符合较好。     

高频离子源等离子体的光谱诊断

采用发射光谱法研究了高频离子源的等离子体性质。该离子源应用于ZF-200keV中子发生器中,是一种电感耦合型无极环形放电高频离子源。实验采用绝对定标后的光学多道分析系统测定了离子源等离子体在不同阶段氢原子巴耳末谱线系中前三条谱线的强度,并采用部分局部热力学平衡状态的理论,计算出了相应阶段高频离子源等离子体的电子温度、氢原子浓度、氢离子浓度等参数,并进行了简要分析。     

高频H型放电离子源的场特性

 从Maxwell方程组出发，推导了高频H型放电离子源放电空间的场分布, 并采用Mafia软件进行了三维实体建模，计算了高频离子源放电击穿前和稳定工作后的电磁场分布，得到了高频离子源放电空间电磁场分布的直观图像。通过比较击穿前高频电场的轴向和环向分量，得出了轴向电场在高频离子源击穿中起主要作用的结论，并进而推导出了高频离子源的击穿判据，得出了气体击穿时离子源击穿电压和放电管内气压的关系，与实验结果符合较好。     

Development of arc ion sources for heavy ion fusion

An overview of the development of arc ion sources for heavy ion fusion is presented. Two approaches to heavy ion fusion (HIF)-the RF linac-storage ring approach and the induction linac approach-are described. RF linac schemes require low emittance and moderate current levels, because the beam is accumulated in storage rings before being focused on target. The induction linac approach requires low emittance and high current, because this is a single-pass approach to HIF and one wishes to limit the number of beams in the machine. The RF scheme generally uses long pulse sources together with a buncher of RFQ. The induction linac approach requires sources in the microsecond pulse length range, with good optics being maintained during the pulse. Emphasis is on the induction linac approach pursued at the Lawrence Berkeley Laboratory     

Numerical investigation of radio-frequency negative hydrogen ion sources by a three-dimensional fluid model

A three-dimensional fluid model is developed to investigate the radio-frequency inductively coupled H2 plasma in a reactor with a rectangular expansion chamber and a cylindrical driver chamber, for neutral beam injection system in CFETR. In this model, the electron effective collision frequency and the ion mobility at high E-fields are employed, for accurate simulation of discharges at low pressures(0.3 Pa–2 Pa) and high powers(40 k W–100 k W). The results indicate that when the high E-field ion mobility is taken into account, the electron density is about four times higher than the value in the low E-field case. In addition, the influences of the magnetic field, pressure and power on the electron density and electron temperature are demonstrated. It is found that the electron density and electron temperature in the xz-plane along permanent magnet side become much more asymmetric when magnetic field enhances. However, the plasma parameters in the yz-plane without permanent magnet side are symmetric no matter the magnetic field is applied or not. Besides, the maximum of the electron density first increases and then decreases with magnetic field, while the electron temperature at the bottom of the expansion region first decreases and then almost keeps constant. As the pressure increases from 0.3 Pa to 2 Pa, the electron density becomes higher, with the maximum moving upwards to the driver region, and the symmetry of the electron temperature in the xz-plane becomes much better. As power increases, the electron density rises, whereas the spatial distribution is similar. It can be summarized that the magnetic field and gas pressure have great influence on the symmetry of the plasma parameters, while the power only has little effect.     

Thermal release of trapped deuterium from silica injected by 80-keV D+ ion implantation and RF D2 plasma

When silica is irradiated by 80-keV D⁺ ions or RF plasma of D₂ gas, deuterium is trapped in the silica forming Si-OD bonds. The deuterium, trapped as OD bonds, is desorbed from the silica upon heating to form some release products. The thermal detrapping process corresponds to decrease of OD bonds and was studied by measurement of infrared Fourier transform spectroscopy (FTIR). The release products HDO, D₂O, HD, and D₂ were measured by quadrupole mass spectroscopy (QMS). The detrapping and release processes of trapped deuterium were studied by simultaneous measurement of FTIR and QMS. Since the release spectra of HDO, D₂O, HD, and/or D₂ correspond to the decrease spectra of OD bonds, these release products are formed by thermal decomposition of OD bonds. The formation of water (HDO, D₂O) and hydrogen (HD, D₂) depends upon concentration of pre-existing OH bonds and deuterium injection methods (80-keV D⁺ implantation or RF D₂ plasma irradiation).     

Polarized ion sources: Status and perspectives

Modern polarized ion sources generate polarized ion beams with high intensity and polarization. Mainly, atomic beam-type and optically pumped polarized ion sources are used to provide polarized ion beams to accelerators. Principles of both methods are outlined in the paper. Characteristics as well as possible improvements of polarized ion sources are considered.     

Low-Power RF plasma sources for technological applications: III. helicon plasma sources

The third part of the paper is devoted to an investigation of the so-called helicon plasma sources. These are RF devices operating with a relatively weak external magnetic field, which is, at the same time, strong enough for the resonant electron gyrofrequency to be much higher than the industrial frequency (ω=8.52×10⁷ s⁻¹). As in [1, 2], a study is made of elongated cylindrical plasma sources in a longitudinal (directed along the cylinder axis) magnetic field and planar disk-shaped plasma sources in a transverse (perpendicular to the plane of the disk) magnetic field. A comparison of the present results with the results that were obtained in [3] without using the helicon approximation leads to the conclusion that elongated helicon sources hold great promise for plasma technologies.     

ǿ��RF ����Դ���Ƽ�����ʵ��

介绍了RF离子源驱动源的结构设计及RF线圈的热流固耦合分析。RF离子源采用外置天线的感应耦合方式,采用双射频驱动源设计,每个射频驱动源功率约60kW,总体功率为120kW,可产生均匀高密度的等离子体,以满足稳定的长脉冲运行的要求。在完成上述工作的基础上完成了RF离子源样机组装和初步实验测试。     

强流RF 离子源研制及初步实验

介绍了RF离子源驱动源的结构设计及RF线圈的热流固耦合分析。RF离子源采用外置天线的感应耦合方式,采用双射频驱动源设计,每个射频驱动源功率约60kW,总体功率为120kW,可产生均匀高密度的等离子体,以满足稳定的长脉冲运行的要求。在完成上述工作的基础上完成了RF离子源样机组装和初步实验测试。