Application of XPS spectral subtraction and multivariate analysis for the characterization of Ar ion beam modified polyimide surfaces

This paper presents results of a detailed X-ray photoelectron spectroscopy (XPS) characterization of complex changes at a polyimide surface resulting from Ar⁺ ion beam modification. The changes in chemical composition in the surface layer lead to formation of a layer that can act as an alignment layer for liquid crystals. The goal of this paper is to report on the result of a combination of spectral subtraction and multivariate analysis for analysis of XPS spectra. Principal component analysis (PCA), applied to curve-fitting results of difference spectra and multivariate curve resolution (MCR), applied to raw spectra, provided consistent results, and allowed for extraction of chemical anisotropy, defining factor in the ion beam (IB) alignment mechanism. This study demonstrated that more detailed chemical information about complex systems can be obtained through application of multivariate analysis to XPS spectra and curve-fits. Further, this approach can be effectively used in the characterization of various complex materials to link chemical structure to their properties.     

不同离子束参数刻蚀蓝宝石纳米微结构及其光学性能

使用微波回旋共振离子源,研究Ar+离子束在不同角度、不同入射能量下对蓝宝石表面的刻蚀效果及光学性能。结果表明:所用能量800 eV,1 000 eV及1 200 eV时透过率都有很大的提升,由原来的50％提高到70％~80％,在能量为1 000 eV时增幅最大,能量为1 200 eV时增幅最小;在相同能量、不同角度下刻蚀后蓝宝石粗糙度呈先增大后减小的趋势,而在相同角度、不同能量下粗糙度方面无明显规律。刻蚀后表面形貌测试表明:角度不变,能量为1 000 eV时出现点状纳米结构,能量为1 200 eV时出现柱状纳米结构;能量不变,角度为10、50及80时出现了规律较明显的点状或条状纳米结构,角度为30时表面较为光滑。     

Ar离子辐照导致微球玻璃机械性能的变化

为研究离子辐照导致空心玻璃微球机械性能的变化,利用Ar离子辐照与空心玻璃微球组分相同的微球玻璃薄片,结合不同温度下的等时退火处理,采用纳米压痕测试方法研究了辐照前后玻璃机械性能的变化。测试结果表明：辐照后玻璃的硬度和模量均呈下降趋势,恢复阻力明显升高;退火后的未辐照样品硬度和模量呈上升趋势,恢复阻力在误差范围内没有发生变化; 退火后的模量呈下降趋势,恢复阻力呈下降趋势;在退火温度约为300 ℃时,辐照样品退火后的恢复阻力与未辐照样品基本相同。     

国产氩离子枪的研发

氩离子枪主要由离子源、加速电极、聚焦透镜和控制电源构成,可以产生并发射氩离子束,用于样品的表面清洁处理、表面刻蚀或深度分析,是表面分析和纳米科技装置中的重要构成之一。文章介绍国产氩离子枪的设计原理和测试结果,氩离子的加速电压可达2 kV,在工作距离150 mm和氩气分压为2.0×10^-3 Pa的情况下,可产生4.5 mA的氩离子束流,束斑的直径在10—20 mm之间可调。     

Self-assembly of well-ordered and highly uniform nanoripples induced by focused ion beam

Well-ordered and highly uniform nanoripple structures on the surface of single crystal LaAlO₃ (1 0 0), SrTiO₃ (1 0 0) and Al₂O₃ (0 0 0 1) were formed via self-assembly (not by beam writing) by focused ion-beam bombardment. The morphology and topography of nanoripple structures were characterized using in-situ focused ion-beam/scanning electron microscope, as well as ex-situ atomic force microscopy. Under off-normal bombardment without sample rotation, the characteristic wavelength of nanoripples varying from 248 to 395 nm on the LaAlO₃ (1 0 0) surface can be obtained by changing ion fluence and incident angle. When all sputtering parameters except the ion fluence are constant, the wavelength of nanoripples is increased with the enhanced ion fluence. These results demonstrate the potential application of using ion sputtering method for fabricating the well-ordered and highly uniform nanoripples which can be used in nanodevices.     

电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响

运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工艺对这些薄膜性能的不同影响,以判断合理的沉积工艺。     

低能氩离子束对多孔铝阳极氧化膜表面的刻蚀效应研究

用低能氩离子束(Ar⁺)处理了多孔铝阳极氧化膜(AAO)表面.扫描电子显微镜和原 子力显微镜结果表明，Ar⁺束刻蚀不仅可以有效地去除AAO反面阻挡层，还可使A AO表面产生多种特殊的形貌，如采用倾角入射可使其表面产生波纹，倾角入射同时旋转样品 台，可实现表面抛光.并结合Bradley和Harper提出的无定形材料表面波纹的形成和演化理论 解释了AAO表面波纹的特征. 关键词： 多孔铝阳极氧化膜 离子束刻蚀     

Effect of Ar ion irradiation on the room temperature ferromagnetism of undoped and Cu-doped rutile TiO_2 single crystals

Remarkable room-temperature ferromagnetism was observed both in undoped and Cu-doped rutile TiO_2 single crystals(SCs).To tune their magnetism,Ar ion irradiation was quantitatively performed on the two crystals in which the saturation magnetizations for the samples were enhanced distinctively.The post-irradiation led to a spongelike layer in the near surface of the Cu-doped TiO_2.Meanwhile,a new CuO-like species present in the sample was found to be dissolved after the post-irradiation.Analyzing the magnetization data unambiguously reveals that the experimentally observed ferromagnetism is related to the intrinsic defects rather than the exotic Cu ions,while these ions are directly involved in boosting the absorption in the visible region.     

Three-dimensional vertical ZnO transistors with suspended top electrodes fabricated by focused ion beam technology

Three-dimensional(3D)vertical architecture transistors represent an important technological pursuit,which have distinct advantages in device integration density,operation speed,and power consumption.However,the fabrication processes of such 3D devices are complex,especially in the interconnection of electrodes.In this paper,we present a novel method which combines suspended electrodes and focused ion beam(FIB)technology to greatly simplify the electrodes interconnection in 3D devices.Based on this method,we fabricate 3D vertical core-double shell structure transistors with ZnO channel and Al₂O₃ gate-oxide both grown by atomic layer deposition.Suspended top electrodes of vertical architecture could be directly connected to planar electrodes by FIB deposited Pt nanowires,which avoid cumbersome steps in the traditional 3D structure fabrication technology.Both single pillar and arrays devices show well behaved transfer characteristics with an Ion/Ioff current ratio greater than 106 and a low threshold voltage around 0 V.The ON-current of the 2×2 pillars vertical channel transistor was 1.2μA at the gate voltage of 3 V and drain voltage of 2 V,which can be also improved by increasing the number of pillars.Our method for fabricating vertical architecture transistors can be promising for device applications with high integration density and low power consumption.     

应用离子束修正高精度CGH基底

计算全息图(CGH)作为零位补偿器广泛应用于高精度非球面的检测中,但CGH的基底误差直接限制了非球面的检测精度。为了获得超高精度的CGH基底,提出了应用离子束修正CGH基底的加工工艺。采用不同束径的离子束去除函数对一边长152 mm(有效口径140 mm圆形区域)、厚6.35 mm的正方形熔石英CGH基底分别进行了精抛、精修和透射波前修正实验。经过总计7轮的迭代修正,最终获得了透射波前为PV值20.779 nm、RMS值0.685 nm的超高精度CGH基底。实验结果表明:应用离子束修正高精度CGH基底的加工工艺具有较大优势,不仅具有较高的加工效率而且可以获得超高的加工精度。     

Evaluation of carbon stripper foils produced by a nitrogen ion beam sputtering method

Carbon stripper foils having thicknesses in the range of 5–40 μg/cm² have been prepared by a nitrogen ion beam sputtering method and their lifetimes have been tested in the Van de Graaff accelerator facility with 3.2 MeV, Ne⁺ ions. The foils of 21 μg/cm² thickness had the longest mean lifetime of 1350.0 mC/cm² (irradiation dose of 8.4×10¹⁸ atoms/cm²) which was 50 times longer than that of commercial foils. However, foils with other thicknesses had extremely short lifetimes similar to commercial foils. The nitrogen content of the foils of both long and short lifetimes has been determined using elastic scattering of 3 MeV α-particles.     

Development of exploding wire ion source for intense pulsed heavy ion beam accelerator

A Novel exploding wire type ion source device is proposed as a metallic ion source of intense pulsed heavy ion beam (PHIB) accelerator. In the device, multiple shot operations are realized without breaking the vacuum. The basic characteristics of the device are evaluated experimentally with an aluminum wire of diameter 0.2 mm and length 25 mm. A capacitor bank of capacitance 3 μF and a charging voltage of 30 kV was used, and the wire was successfully exploded by a discharge current of 15 kA with a rise time of 5.3 μs. Plasma flux of ion current density around 70 A/cm² was obtained at 150 mm downstream from the device. The drift velocity of ions evaluated by a time-of-flight method was 2.7×10⁴ m/ s, which corresponds to the kinetic energy of 100 eV for aluminum ions. From the measurement of the ion current density distribution, the ion flow is found to be concentrated toward the direction where the ion acceleration gap is placed. From the experiment, the device is found to be acceptable for applying the PHIB accelerator.     

离子束辅助沉积硅薄膜负极材料的研究

采用离子束辅助沉积法制备了锂离子电池硅薄膜负极材料,研究了硅薄膜的晶体结构、表面形貌和电化学性能.研究结果表明：硅薄膜是非晶态的结构;非晶态硅薄膜发生嵌脱锂反应的电位分别为0.03 V与0.34 V和0.16 V与0.49 V;硅薄膜表现出很高比容量和充放电效率,其可逆比容量和库仑效率分别为3134.4 mAh/g和87.1％;硅薄膜具有优异的循环性能,在0.5C倍率下200次循环后容量保持率为92.2%. 关键词： 硅薄膜 离子束辅助沉积 锂离子电池 负极材料     

离子推力器束流引出状态对栅极刻蚀的影响

为了研究30 cm离子推力器束流引出状态对栅极刻蚀的影响,建立了束流引出模型,并采用PIC-MCC方法对CEX离子造成的栅极腐蚀速率进行了计算,最后将计算结果与1500 h寿命试验结果进行比对分析。结果显示：束流正常聚焦时,在3 kW和5 kW两种工作模式下,加速栅和减速栅的质量刻蚀速率分别为(1.11～1.72)×10⁻¹⁵ kg/s及(1.22～1.26)×10⁻¹⁷ kg/s。在5 kW工况下,当屏栅上游等离子体密度达到4.03×10¹⁷ m⁻³时,束流出现欠聚焦现象,此时加速栅和减速栅的最大离子刻蚀速率分别为4.33×10⁻¹⁵ kg/s和4.02×10⁻¹⁵ kg/s;在3 kW工况下,当屏栅上游等离子体密度达到0.22×10¹⁷ m⁻³时,束流出现过聚焦现象,此时加速栅和减速栅的最大离子刻蚀速率分别为3.24×10⁻¹⁵ kg/s和5.01×10⁻¹⁵ kg/s。寿命试验结果表明,加速栅孔质量刻蚀速率的计算值与试验值比对误差较小,而由于束流离子对减速栅孔的直接轰击,导致减速栅孔刻蚀速率的计算值和试验值差异极大。经研究认为,对屏栅小孔采用变孔径设计,是降低当束流处于欠聚焦或过聚焦状态下,CEX离子造成加速栅孔和减速栅孔刻蚀速率,并提升推力器工作寿命的有效措施。     

强脉冲离子束辐照薄金属靶的热力学过程研究

在回顾和总结现有强脉冲离子束诊断技术和能量沉积模型的基础上, 结合红外成像诊断分析, 基于能量平衡, 提出了强脉冲离子束在固体靶中功率密度分布模型, 并采用蒙特卡罗方法对其进行计算. 以该功率密度模型作为源项, 使用有限元分析方法模拟强脉冲离子束入射100 μm不锈钢靶后内部温度场在毫秒时间范围内的分布和演化. 结果显示, 在微秒时间范围内, 热场以存在于近表面区域数倍于离子射程范围内的冲击热场为主要特征; 而在毫秒时间范围内, 靶的前后表面(纵向)已达到温度平衡, 且靶后表面温度场和入射前表面的离子束横截面能量密度具有空间分布的相似性. 这证明了, 在采用具有毫秒响应速度的红外拍摄系统的情况下, 背面红外诊断技术可以实现以较高的精度对强脉冲离子束横截面的能量分布进行诊断和分析.     

宽束冷阴极离子源分时中和技术的研究

离子束辅助镀膜沉积过程中,绝缘薄膜表面的电荷积累效应严重影响了薄膜质量。通过对宽束冷阴极离子源引出栅部分的改进,采用分时引出电子和离子方法,使正负电荷中和,以消除薄膜表面的放电现象,并对引出电子束的束流密度、能量、发射角等参数进行了测试。实验结果表明：在引出电压为600V时,电子的平均能量为100eV左右;引出电子束的发射角可以达到±40°,在±15°范围内的束流密度波动小于±5%。引出电子的束流密度较同参数下的离子束流密度小,通过调节脉冲电源的占空比,可达到很好的中和效果。     

射频离子源离子束成分光谱测量

为HL-2A 装置中性束注入器研制了引出束功率为1MW 的射频离子源。在测试平台上,实验离子源已经成功引出了束能量和束电流分别为35keV 和12.4A、束质子比为79%、脉宽为100ms 的氢离子束,达到了设计束功率要求的44%。在射频离子源实验平台上,利用多普勒频移光谱方法测量了离子源引出束流成分比例,对比了束流成分和射频离子源引出束流之间的关系。实验数据分析表明,在10A 引出束流的情况下,离子流成分 H⁺ ₁、H⁺ ₂ 和H⁺ ₃ 分别为75%、18%和7%。并且当引出束流从3.3A 升至10.4A 时,H⁺ ₁ 从37%升至78%,而H⁺ ₃ 则从19%降至9%。     

离子束刻蚀软X射线透射光栅实验研究

利用全息-离子束刻蚀方法研制出了聚酰亚胺薄膜为衬底的金软X射线透射光栅.研究了光栅制作中曝光量、显影条件和离子束刻蚀工艺等因素对光栅参数的影响,并给出了在惯性约束激光核聚变实验研究中的应用结果,     

强流脉冲离子束辐照靶及其喷发的数值研究

利用拟合实测的TEMP Ⅱ型加速器磁绝缘二极管(MID)电压波形及其焦点附近束流密度曲线，建立了Gaussian分布模型，据此计算了与靶作用的离子的能量及数量，采用Monte Carlo(MC)方法计算了沉积在靶内的能量.并以此作为热源，与流体动力学(HD)模型相结合，对不同的靶状态采用相应的状态方程，模拟计算了靶内压力演化情况; 同时对烧蚀产生的等离子体采用理想气体状态方程, 结合HD方程组, 模拟计算了喷发过程中压力的空间演化过程. 关键词： 强流脉冲离子束 Gaussian模型 HD方程 数值研究     

Simulation of ion beam extraction and focusing system

The characteristics of ion beam extraction and focused to a volume as small as possible were investigated with the aid of computer code SIMION 3D version 7.This has been used to evaluate the extraction characteristics(accel-decel system)to generate an ion beam with low beam emittance and high brightness.The simulation process can provide a good study for optimizing the extraction and focusing system of the ion beam without any losses and transported to the required target.Also,a study of a simulation model for the extraction system of the ion source was used to describe the possible plasma boundary curvatures during the ion extraction that may be affected by the change in an extraction potential with a constant plasma density meniscus.