Structural stability of heat-treated CoN/CN soft X-ray multilayers fabricated by dual-facing-target sputtering

286 , 176 (1996)]. (1) The interdiffusion critical wavelengths were calculated as 2.00–2.04 nm at temperatures ranging from 473 to 523 K, which is equal to those of Co/C multilayers within the experimental error, indicating that the interdiffusion behaviours in the CoN/CN multilayers are still decided by the thermodynamic properties of the Co-C system. (2) The effective interdiffusivities and macroscopic diffusion coefficients are smaller. (3) The activation energy for diffusion is larger. The features imply that it is possible to improve the thermal stability of Co/C multilayers by doping with N atoms. The high-temperature annealing results imply that the destructive threshold of the CoN/CN multilayers is 100–200 °C higher than that of Co/C multilayers. The small-angle X-ray diffraction of CoN/CN soft X-ray multilayers indicates that the period expansion of the multilayers is only 4% at 400 °C, and the interface pattern still exists even if they were annealed at 700 °C. The large-angle X-ray diffraction and transmission electron microscopy analysis reveal that the crystalline process is significantly retarded if doped with N atoms, leading to a smaller grain size at higher annealing temperatures. The significant improvement of the thermal stability can be interpreted with Raman spectroscopy and X-ray photoelectron spectroscopy analysis. The Raman spectra give the evidence that the formation of the sp³ bonding in the CN sublayers can be suppressed effectively by doping with N atoms, and thus the period expansion resulting from the changes in the density of CN layers can be decreased considerably. The X-ray photoelectron spectra give information about existence of the strong covalent bonding between N atoms and the ionic bonding between Co and N atoms, which can slow down the tendency of the structural relaxation. The interstitial N atoms decrease the mobility of Co atoms, and thus the fcc Co and hcp Co coexist even though the annealing temperature is much higher than the phase transformation temperature of 420 °C, leading to the suppression of the grain growth. Received: 29 May 1997/Accepted: 8 September 1997     

Characterization of heat-treated CN films fabricated by dual-facing-target sputtering for soft X-ray multilayer mirrors

The structural characterization of heat-treated CN films fabricated by dual-facing-target sputtering for soft X-ray multilayer mirrors was performed by means of X-ray diffraction (XRD), Raman spectroscopy (RS) and X-ray photoelectron spectroscopy (XPS). The XRD analyses indicate a graphization process in the CN films during thermal annealing. The Raman analyses imply that the primary bonding in the CN films is sp². In other words, the formation of the sp³ bonding in the CN films can be suppressed effectively by doping with N atoms, and thus the thickness expansion resulting from the changes in the density of CN films during annealing can be decreased considerably. This result is also clarified by the increased conductivity measured. The XPS results give the information of the existence of the strong covalent bonding between N and C atoms, which can slow down the tendency of the structural relaxation during annealing. These results suggest that CN films suitable for soft X-ray multilayers used at high-temperature environments can be obtained by reactive dual-facing-target sputtering. With the low-angle X-ray diffraction measurements, we do observe the enhanced thermal stability of CoN/CN multilayers. Received: 2 October 1998 / Accepted: 21 April 1999 / Published online: 23 September 1999     

Co/C and W/Si multilayers deposited by ion-beam sputtering for the soft X-ray range

We deposited Co/C multilayer mirrors for a wavelength of 4.77 nm and W/Si multilayer mirrors for a wavelength of 1.77 nm by use of ion-beam sputtering. The small-angle diffraction spectrum was used to analyze the structure of the multilayers. With a combination of the experimental diffraction spectra and Apeles’ theory for calculation of the interfacial roughnesses of the multilayers, the interfacial roughnesses of Co/C and W/Si are 0.80 nm and 0.60 nm, respectively, which are lower than that of the substrate. The reflectivity of the Co/C multilayer is measured to be about 20% and that of the W/Si multilayer about 1% at the grazing incidence angle of about 12°. Received: 30 May 2000 / Accepted: 1 August 2000 / Published online: 11 February 2002     

Investigation of ultra-short-period W/C multilayers for soft X-ray optics

Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system.     

磁控溅射制备极紫外高反射率多层膜应力研究

为制备硼边附近6.7 nm波长的极紫外高反射率多层膜反射镜,研究了Mo2C/B4C,Mo/B4C周期多层膜,重点解决薄膜应力难题。采用直流磁控溅射技术制备了膜层厚度为30 nm的Mo,Mo2C,B4C单层膜,周期厚度为3.5 nm,30对的Mo2C/B4周期多层膜。利用台阶仪测试了镀膜前后基底面形,计算并比较了不同薄膜样品的应力值。结果表明Mo2C/B4C多层膜压应力要远小于Mo/B4C多层膜,且成膜质量与Mo/B4C相当。因此Mo2C/B4C是应用于6.7 nm反射镜较好的多层膜材料组合。C,Mo/B4C     

磁控溅射制备极紫外高反射率多层膜应力研究

为制备硼边附近6.7 nm波长的极紫外高反射率多层膜反射镜,研究了Mo_2C/B_4C,Mo/B_4C周期多层膜,重点解决薄膜应力难题。采用直流磁控溅射技术制备了膜层厚度为30 nm的Mo,Mo_2C,B_4C,单层膜,周期厚度为3.5 nm,30对的Mo_2C/B_4C,Mo/B_4C周期多层膜。利用台阶仪测试了镀膜前后基底面形,计算并比较了不同薄膜样品的应力值。结果表明Mo_2C/B_4C多层膜压应力要远小于Mo/B_4C多层膜,且成膜质量与Mo/B_4C相当。因此Mo_2C/B_4C是应用于6.7 nm反射镜较好的多层膜材料组合。     

Mo/Si软X射线多层膜的界面粗糙度研究

用磁控溅射法分别制备了以Mo膜层和Si膜层为顶层的Mo/Si多层膜系列, 利用小角X射线衍射确定了各多层膜的周期厚度。以不同周期数的Mo/Si多层膜的新鲜表面近似等同于同一多层膜的内界面,通过原子力显微镜研究了多层膜界面粗糙度随膜层数的变化规律。并在国家同步辐射实验室测量了各多层膜的软X射线反射率。研究表明：随着膜层数的增加,Mo膜层和Si膜层的界面粗糙度先减小后增加然后再减小,多层膜的峰值反射率先增加后减小。     

Mo/Si软X射线多层膜的界面粗糙度研究

 用磁控溅射法分别制备了以Mo膜层和Si膜层为顶层的Mo/Si多层膜系列, 利用小角X射线衍射确定了各多层膜的周期厚度。以不同周期数的Mo/Si多层膜的新鲜表面近似等同于同一多层膜的内界面,通过原子力显微镜研究了多层膜界面粗糙度随膜层数的变化规律。并在国家同步辐射实验室测量了各多层膜的软X射线反射率。研究表明：随着膜层数的增加,Mo膜层和Si膜层的界面粗糙度先减小后增加然后再减小,多层膜的峰值反射率先增加后减小。     

Structural and magnetic properties of Pt in Co/Pt multilayers

[Co(30 Å)/Pt(x Å)]₂₀ multilayers with the Pt layer thicknesses varying from 5 Å to 20 Å were characterized structurally by high angle X-ray diffraction, X-ray reflectivity, X-ray absorption spectroscopy and magnetically by X-ray magnetic circular dichroism. It is found that the structure and magnetic properties of Pt have a strong correlation with the Pt layer thickness. The 20 Å thickness Pt layer is not almost influenced by the adjacent Co layer and the nearest neighbors are dominated by Pt-Pt shells. With decreasing Pt layer thickness, the nearest neighbors are gradually dominated by Pt-Co shells and the Pt-Co intermixing regions also remarkable increase at the interfaces, especially for the 5 Å thickness Pt layer. The orbital and spin magnetic moments as well as the ratio m_orb/m_spin all decrease systematically with increasing Pt layer thickness, indicating that the interface atoms are polarized by direct Pt-Co hybridization, but that the adjacent layers are polarized by Pt-Pt interactions.     

Influence of background pressure on the microstructure and optical properties of Mo/Si multilayers fabricated by magnetron sputtering

Mo/Si multilayers were fabricated by using magnetron sputtering method at different background pressures:6×10-5 Torr,3×10-5 Torr,and 3×10-6 Torr.The reflectivity of the Mo/Si multilayers increased from 1.93% to 16.63%,and the center wavelength revealed a blue shift to 0.12 nm with the decrease of background pressure.Grazing incident X-ray diffraction(GIXRD) indicated that multilayers fabricated at high background pressure possessed better periodic structure and thinner Mo-on-Si interlayers.Low crystallization degree in(110) preferred the orientation of Mo layers and serious interdiffusion in the Mo/Si multilayers fabricated at low background pressure were observed by transmission electron microscopy(TEM).According to quantitative analysis of microstructural parameters,the Mo layers thickness and thickness ratio of Mo/Si multilayers both decreased and approached the design value gradually by the decrease of background pressure.In addition,the thicknesses of Mo-on-Si and Si-on-Mo interlayers were 1.17 nm and 0.85 nm respectively.It is suggested that the influence of background pressures on the microstructure has a critical role in determining the optical properties of Mo/Si multilayers.     

均匀软X射线多层膜制备方法研究

介绍了基于速度调制技术的均匀软X射线多层膜制备方法,并采用该方法在直径为150mm的平面硅基板上制备出Mo/Si多层膜,其中心波长为13.5nm,膜厚空间非均匀性优于1％,较转盘匀速溅射方法制备的多层膜膜厚空间均匀性提高了近6倍。     

均匀软X射线多层膜制备方法研究

 介绍了基于速度调制技术的均匀软X射线多层膜制备方法，并采用该方法在直径为150mm的平面硅基板上制备出Mo/Si多层膜，其中心波长为13.5nm，膜厚空间非均匀性优于1％，较转盘匀速溅射方法制备的多层膜膜厚空间均匀性提高了近6倍。     

RF magnetron sputtering induced the perpendicular magnetic anisotropy modification in Pt/Co based multilayers

We demonstrate that radio frequency(RF)magnetron sputtering technique can modify the perpendicular magnetic anisotropy(PMA)of Pt/Co/normal metal(NM)thin films.Influence of ion irradiation during RF magnetron sputtering should not be neglected and it can weaken PMA of the deposited magnetic films.The magnitude of this influence can be controlled by tuning RF magnetron sputtering deposition conditions and the upper NM layer thickness.According to the stopping and range of ions in matter(SRIM)simulation results,defects such as displacement atoms and vacancies in the deposited film will increase after the RF magnetron sputtering,which can account for the weakness of PMA.The amplitude changes of the Hall resistance and the threshold current intensity of spin orbit torque(SOT)induced magnetization switching also can be modified.Our study could be useful for controlling magnetic properties of PMA films and designing new type of SOT-based spintronic devices.     

直流磁控溅射Si和玻璃衬底Fe/Co多层膜的磁性能比较

对直流磁控溅射Si和玻璃衬底［Co_t/Fe_3t］₅(t=2, 3, 4, 5nm)多层膜的磁性能进行了比较.对于t相同但衬底不同的样品,实验发现饱和磁化强度相差很小,但是矫顽力却相差很大.对矫顽力差异的理论分析表明,多层膜的粗糙度和畴壁类型是引起这种差异的主要原因. 关键词： Fe/Co多层膜 磁性能 矫顽力     

直流磁控溅射Si和玻璃衬底Fe/Co多层膜的磁性能比较

对直流磁控溅射Si和玻璃衬底［Co_t/Fe_3t］₅(t=2, 3, 4, 5nm)多层膜的磁性能进行了比较.对于t相同但衬底不同的样品，实验发现饱和磁化强度相差很小，但是矫顽力却相差很大.对矫顽力差异的理论分析表明，多层膜的粗糙度和畴壁类型是引起这种差异的主要原因.     

磁控溅射制备Ni/Ti多层膜表面粗糙度

采用磁控溅射方法制备了周期数分别为10,30,50和75的Ni/Ti多层膜,利用X射线掠入射反射测量了多层膜表面和界面的状态,并用原子力显微镜测量了多层膜的表面粗糙度,研究了不同周期数的Ni/Ti多层膜表面粗糙度的变化规律。结果表明：Ni/Ti多层膜表面粗糙度随着膜层数增加而增加,当Ni/Ti多层膜的周期数从10变化到75时,其表面粗糙度由0.80 nm增大到1.69 nm。实验数据拟合表明：Ni/Ti多层膜表面粗糙度与周期数成3次方关系;但在周期数较小时,粗糙度与周期数成线性关系。     

磁控溅射制备Ni/Ti多层膜表面粗糙度

采用磁控溅射方法制备了周期数分别为10,30,50和75的Ni/Ti多层膜,利用X射线掠入射反射测量了多层膜表面和界面的状态,并用原子力显微镜测量了多层膜的表面粗糙度,研究了不同周期数的Ni/Ti多层膜表面粗糙度的变化规律。结果表明:Ni/Ti多层膜表面粗糙度随着膜层数增加而增加,当Ni/Ti多层膜的周期数从10变化到75时,其表面粗糙度由0.80 nm增大到1.69 nm。实验数据拟合表明:Ni/Ti多层膜表面粗糙度与周期数成3次方关系;但在周期数较小时,粗糙度与周期数成线性关系。     

Spin reorientation transition in Fe/CeH2 multilayers probed by soft X-ray resonant magnetic scattering

The magnetic domain configurations of Fe 3d spins in Fe/CeH₂ multilayers were measured by soft X-ray resonant magnetic scattering. The interface region could be probed by setting up X-ray standing waves due to the multilayer periodicity. By resolving first- and second-order magnetic scattering contributions, we show that the latter probe directly the magneto-crystalline anisotropy which is dominated by the Fe interface layers causing a spin reorientation transition when the temperature is lowered. Received: 30 May 2001 / Accepted: 4 July 2001 / Published online: 5 October 2001