ZrO2/SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响

ZrO2/SiO2多层膜由相同沉积条件下的电子束蒸发方法制备而成,通过改变多层膜中高(ZrO2)、低(SiO2)折射率材料膜厚组合周期数的方法,研究了沉积在熔石英和BK7玻璃基底上多层膜中残余应力的变化.用ZYGO光学干涉仪测量了基底镀膜前后曲率半径的变化,并确定了薄膜中的残余应力.结果发现,该多层膜中的残余应力为压应力,随着薄膜中膜厚组合周期数的增加,压应力值逐渐减小.而且在相同条件下,石英基底上所沉积多层膜中的压应力值要小于BK7玻璃基底上所沉积多层膜中的压应力值.用x射线衍射技术测量分析了膜厚组合周期数不同的ZrO2/SiO2多层膜微结构,发现随着周期数增加,多层膜的结晶程度增强.同时多层膜的微结构应变表现出了与所测应力不一致的变化趋势,这主要是由多层膜中,膜层界面之间复杂的相互作用引起的.     

Influence of the SiO thickness on the photoluminescence properties of Er-doped SiO/SiO2 multilayers

Er-doped SiO single layer and Er-doped SiO/SiO₂ multilayers with different SiO thicknesses were prepared by evaporation. In the as-deposited samples, the erbium ions exhibit a very weak photoluminescence emission at 1.54 μm. This luminescence is strongly enhanced after annealing treatments between 500 and 1050 °C, with an optimal annealing temperature which is dependent from the SiO thickness. For the SiO single layer, this optimal temperature is around 700 °C while it is shifted at highest temperature for the multilayers. The origin of the higher luminescence intensity in the SiO layer is also discussed.     

Annealing effects on residual stress of HfO2/SiO2 multilayers

HfO2/SiO2 multilayer films were deposited on BK7 glass substrates by electron beam evaporation method.The effects of annealing at the temperature between 200 and 400℃ on residual stresses have been studied.It is found that the residual stress of as-deposited HfO2/SiO2 multilayers is compressive.It becomes tensile after annealing at 200℃,and then the value of tensile stress increases as annealing temperature increases.And cracks appear in the film because tensile stress is too large when the sample is annealed at 400℃.At the same time,the crystallite size increases and interplanar distance decreases with the increase of annealing temperature.The variation of residual stresses is corresponding with the evolution of structures.     

层间热处理对SiO2/ZrO2双层膜的影响

 以正硅酸乙酯和丙醇锆为前驱体,用溶胶-凝胶法在K9基片上提拉镀制SiO₂/ZrO₂双层膜。采用不同实验步骤制备了2个样品,样品1镀完SiO₂后直接镀ZrO₂ ,样品2镀完SiO₂经热处理后再镀ZrO₂。采用原子力显微镜、椭偏仪、紫外-可见分光光度计对薄膜进行表征。针对SiO₂/ZrO₂双层膜,考虑到膜间渗透的影响,采用３层Cauchy模型进行椭偏模拟,椭偏参数的模拟值曲线与椭偏仪的测量值曲线十分吻合,进而发现热处理可以使SiO₂/ZrO₂双层膜之间的渗透减少近23 nm,从而提高其峰值透射率。利用输出波长1.064 mm,脉宽8.1 ns的激光束对样品进行了损伤阈值的测试,用光学显微镜观察损伤形貌,结果发现两者损伤阈值分别为13.6 J/c2和14.18 J/cm²,均为膜的本征损伤。     

Poole-Frenkel conduction in Al/ZrO2 /SiO 2 /Si structures

Leakage currents through Al/ZrO₂/SiO₂/n-Si metal-insulator-semiconductor (MIS) capacitors were studied. Thin SiO₂ films were chemically grown on monocrystalline phosphorous doped silicon wafers. Zirconia films with thicknesses of 15 and 50 nm were deposited by radio frequency (rf) magnetron sputtering and, then, annealed in oxygen ambient at 850 ^○C, for 1 h. The dielectric constant of the sputtered and annealed ZrO₂ layer was of about 17.8. The equivalent oxide thickness (EOT) of the stack 15 nm and 50 nm-ZrO₂/SiO₂ structure was estimated to be 3.2 nm and 10.7 nm, respectively. The temperature dependence of the leakage currents was explained by Poole-Frenkel (PF) conduction mechanism. Shallow trap levels in the studied structure of about 0.2 eV and 0.46 eV were calculated. The existence of A and D-defects, due to the sputtering and high temperature annealing in oxygen, was suggested.     

Optical properties of ZnO thin films on SiO2 substrates deposited by radio frequency magnetron sputtering

The optical properties of both the annealed and as-deposited ZnO thin films by radio frequency (RF)magnetron sputtering on SiO2 substrates were studied. In the annealed films, two pronounced well defined exciton absorption peaks for the A and B excitons were obtained in the absorption spectra, a strong free exciton emission without deep-level emissions was observed in the photoluminescence (PL) spectra at room temperature. It was found that annealing the films in oxygen dramatically improved the optical properties and the quality of the films.     

nc-Si/SiO2多层膜的制备及蓝光发射

在等离子体增强化学气相淀积(PECVD)系统中，采用a-Si∶H层淀积与原位等离子体氧化相结合的逐层生长的方法成功制备出a-Si∶H/SiO2多层膜 (ML)；利用限制性结晶原理通过两步退火处理使a-Si∶H层晶化获得尺寸可控的nc-Si/SiO2 ML，并观察到室温下的蓝光发射；结合Raman散射和剖面透射电子显微镜技术分析了nc-Si/SiO2 ML的结构特性；通过对晶化样品光致发光谱和紫外-可见光吸收谱的研究，探讨了蓝光发射的起源. 关键词： 纳米硅多层膜 等离子体氧化 蓝光发射 热退火     

ZrO2/ SiO2多层膜的化学法制备研究

 分别以ZrOCl₂·8H₂O 和正硅酸乙酯为原料,采用溶胶-凝胶工艺制备了性能稳定的ZrO₂和SiO₂溶胶。用旋转镀膜法分别在K9玻璃和单晶硅片上制备了ZrO₂/ SiO₂多层膜。采用溶剂替换和紫外光处理等手段,有效地解决了ZrO₂/SiO₂多层膜中膜层开裂和膜间渗透等问题。应用扫描电子显微镜观测了薄膜的表面和剖面微观形貌,并用椭偏仪测得薄膜的厚度和折射率,研究了薄膜厚度、折射率与热处理温度、紫外光处理时间的关系,对所获得薄膜的紫外-可见、红外光谱进行了分析。用输出波长1064nm ,脉宽15ns 的电光调Q光系统产生的强激光进行了单层膜的辐照实验,结果发现溶剂替换后激光损伤阈值有所提高。     

Interfacial phenomena and magnetic properties of Fe/Al multilayers of different thickness

Fe/Al thin film multilayers, differing in the thickness of Fe films (30÷10 Å, were electron-beam evaporated in ultra-high vacuum. Interdiffusion and reaction phenomena occurring during deposition at interfaces were studied by means of conversion electron Mössbauer spectroscopy and Auger electron spectroscopy depth-profiling. Magnetic behavior was investigated by alternating force gradient magnetometry. The formation of Fe–Al solid solution and intermetallic compound is observed. Multilayers are ferromagnetic with magnetization in the film plane for iron film thickness ?15 Å, while exhibiting a superparamagnetic behavior at 10 Å.     

Specific features of magnetooptical spectra of Co/SiO2 hybrid multilayers

Magnetooptical spectra of Co(x)/SiO₂(y) bilayers and [Co(x)/SiO₂(y)]_n hybrid multilayers (x and y are the layer thicknesses) are studied in the range 1.5–4.0 eV. In these layers, the ultrathin ferromagnetic layers are not continuous but consist of ellipsoidal Co nanoparticles with a concentration near the percolation threshold. It is found that (a) the sign, magnitude, and spectral shape of the magnetooptical signal depend strongly on the Co particle size; (b) the signal for the [Co(1.6 nm)/SiO₂(3.0 nm)]₆ multilayers at 3.0 eV has a record-high magnitude for Co-based structures, 3×10^?2, which exceeds that for bulk Co about fivefold and about 50-fold that for a uniform Co film of an equivalent thickness; (c) the magnetooptical signal of multilayers depends non-linearly on the number of periods and the thickness of the dielectric layer y; and (d) the dependence of the signal of bilayers and multilayers with x=1.3 and 1.6 nm on the wavelength is nonmonotonic and exhibits clearly pronounced extrema. The data obtained for bilayers are attributed to the strong influence of percolation on the optical and magnetooptical parameters of the structure and interpreted in the framework of the effective medium approximation and macroscopic Fresnel magnetooptics.     

Dispersion control over the ultraviolet-visible-near-infrared spectral range with HfO2/SiO2-chirped dielectric multilayers

We report the first realization, to the best of our knowledge, of a chirped multilayer dielectric mirror providing dispersion control over the spectral range of 300-900 nm and the first use of hafnium oxide in a chirped mirror. The technology opens the door to the reliable and reproducible generation of monocycle laser pulses in the blue-violet spectral range, will benefit the development of optical waveform and frequency-comb synthesizers over the ultraviolet-visible-near-infrared spectral range, and permits the development of ultrabroadband-chirped multilayers for high-power applications.     

Measurement of the thickness of thin films deposited on smooth non-planar substrates.

A simple Tolansky interferometer has been built under a low power microscope for measuring the thickness of thin films. A new procedure of evaluating the interferograms has been developed which is applicable whenever the substrate carrying the film is not plane but smoothly curved.     

Silicon nanoparticles formation in annealed SiO/SiO2 multilayers

We present a study on amorphous SiO/SiO₂ superlattice performed by grazing-incidence small-angle X-ray scattering (GISAXS). Amorphous SiO/SiO₂ superlattices were prepared by high-vacuum evaporation of 3 nm thin films of SiO and SiO₂ (10 layers each) onto Si(1 0 0) substrate. After the deposition, samples were annealed at 1100 °C for 1 h in vacuum, yielding to Si nanocrystals formation. Using a Guinier approximation, the shape and the size of the crystals were obtained. The size of the growing nanoparticles in the direction perpendicular to the film surface is well controlled by the bilayer thickness. However, their size varies more significantly in the direction parallel to the film surface.     

不连续Co/SiO2多层膜的结构及其输运性质的研究

用射频磁控溅射方法制备了系列Co/SiO2不连续磁性金属绝缘体多层膜（DMIM） .经研究发现：对［SiO2(2.4 nm)/Co(t)］20体系，在Co层厚度小于2.5 nm时，Co层由连续变为不连续；Co层不连续时，其导电机理为热激发的电子隧穿导电，lnR与T-1/2接近正比关系; 隧道磁电阻（TMR）在Co层厚度为1.4 nm时出现极大值-3%.DMIM 的性质 不仅与磁性金属层厚度密切相关，而且与绝缘层厚度有密切的关系.在固定Co层厚度为 1.9 nm的情况下，研究了TMR随SiO2层厚度的变化 关键词： 不连续磁性金属/绝缘体多层膜 隧道磁电阻效应     

Modeling and analysis of birefringence in magneto-optical thin film made by SiO2/ZrO2 doped with ferrite of cobalt

We report the device characteristics of the metal–dielectric high-reflectivity (HR) coated 1.55 μm laterally coupled distributed feedback (DFB) laser with metal surface gratings by using holographic lithography. The HR coating films are composed of Au/Ti/SiO₂. It provides a variety of advantages compared to the uncoated DFB laser on the same processed wafer while there is no degradation on current–voltage characteristics. For 3 μm wide and 300 μm long HR coated DFB laser, it exhibits a maximum output power of ∼17 mW and a threshold current of 14.2 mA at 20°C under continuous-wave mode. It is clear that the threshold current and slope efficiency are improved by 36% and 96%, respectively, due to the reduction of mirror loss. The metal–dielectric HR coating on one facet of DFB laser is found to have significantly increased characteristic temperature (i.e., T ₀∼88 K). Furthermore, the stable single-mode operation with an increased single-mode suppression ratio was achieved.     

Thin SiO2 films on GaAs substrates

The formation of thin dielectric SiO₂ films on n-type GaAs substrates and obtained results on the investigation of their physical and chemical parameters are described. The SiO₂ films are produced by low-temperature deposition of tetraethoxisilane in the continuous flow system with argon as a carrier gas. Some of the technological aspects of this preparation (as the growth conditions and proper apparatus) are discussed in great detail. For improvement of some typical parameters (infrared spectra, etch rate and permitivity) a suitable thermal treatment is recommended. From the results we have achieved, the potential possibilities for construction of various types of electronic devices are also proposed.The authors wish to thank Ing. I.Srb for infrared spectra measurements. The technical assistance of Mrs. O.Janouková is also greatly appreciated.     

Surface electronic structure of binary metal oxide catalyst ZrO2/SiO2

The surface electronic structure of the binary metal oxide ZrO₂/SiO₂ was studied by means of XPS and the decrete variational (DV) Xα cluster model calculation. The results show that when ZrO₂, was supported on SiO₂, the SiO bond of SiO₂, neighboring ZrO₄, became stronger and that the Brönsted acid site H which is located on the SiO₄ unit exhibits stronger acidity.     

ZrO2/ SiO2多层膜的化学法制备研究

分别以ZrOCl2·8H2O 和正硅酸乙酯为原料,采用溶胶-凝胶工艺制备了性能稳定的ZrO2和SiO2溶胶。用旋转镀膜法分别在K9玻璃和单晶硅片上制备了ZrO2/ SiO2多层膜。采用溶剂替换和紫外光处理等手段,有效地解决了ZrO2/SiO2多层膜中膜层开裂和膜间渗透等问题。应用扫描电子显微镜观测了薄膜的表面和剖面微观形貌,并用椭偏仪测得薄膜的厚度和折射率,研究了薄膜厚度、折射率与热处理温度、紫外光处理时间的关系,对所获得薄膜的紫外-可见、红外光谱进行了分析。用输出波长1064nm ,脉宽15ns 的电光调Q光系统产生的强激光进行了单层膜的辐照实验,结果发现溶剂替换后激光损伤阈值有所提高。     

溶胶-凝胶法制备ZrO2/SiO2双层减反硬膜

以锆酸丙酯[Zr(OPr)4]、正硅酸乙酯(TEOS)为原料, 用溶胶-凝胶(sol-gel)提拉法涂膜, 制备高透过的λ/ 4～λ/ 4型ZrO2/SiO2双层减反膜.该减反膜的表面均匀, 均方根(RMS)粗糙度为1.038 nm, 平均粗糙度(RA)为0.812 nm.制备的双层减反膜具有很好的减反效果, 在石英玻璃基片二面涂膜, 在激光三倍频波长351 nm处透射比达到99.41%, 比未涂膜石英玻璃基片的透射比提高了6.14%;在基频波长1053 nm处透射比达到99.63%, 比未涂膜K9光学玻璃基片的透射比提高了7.67%.膜层具有较高的激光损伤阈值, 在激光波长为1053 nm, 脉冲宽度为1 ns时, 薄膜的激光损伤阈值达到16.8 J/cm2.膜层具有良好的耐擦除性能.