Sc、Ce掺杂CrSi2的电子结构与光学性质的第一性原理

采用基于密度泛函理论的第一性原理赝势平面波方法对Sc、Ce单掺和共掺后CrSi₂的几何结构、电子结构、复介电函数、吸收系数和光电导率进行了计算。结果表明:Sc、Ce掺杂CrSi₂的晶格常数增大,带隙变小。本征CrSi₂的带隙为0.386 eV,Sc、Ce单掺及共掺CrSi₂的禁带宽度分别减小至0.245 eV、0.232 eV、0.198 eV,费米能级均向低能区移动进入价带。由于Sc的3d态电子和Ce的4f态电子的影响,Sc、Ce掺杂的CrSi₂在导带下方出现了杂质能级。掺杂后的CrSi₂介电函数虚部第一介电峰峰值增加且向低能方向移动,说明Sc、Ce掺杂使得CrSi₂在低能区的光跃迁强度增强,Sc-Ce共掺时更明显。Sc、Ce掺杂的CrSi₂吸收边在低能方向发生红移,在能量大于21.6 eV特别是在位于31.3 eV的较高能量附近,本征CrSi₂几乎不吸收光子,Sc单掺和Sc-Ce共掺CrSi₂吸收光子的能力有所增强,并在E=31.3 eV附近形成了第二吸收峰。说明掺杂Sc、Ce改善了CrSi₂对红外和较高能区光子的吸收。在小于3.91 eV的低能区掺杂后的CrSi₂光电导率增加。在20.01 eV<E<34.21 eV时,本征CrSi₂光电导率为零,但Sc、Ce掺杂后的体系不为零,掺杂拓宽了CrSi₂的光响应范围。研究结果为CrSi₂基光电器件的应用与设计提供了理论依据。     

砷锗镉晶体的生长和变温霍尔效应研究

采用温度振荡法和改进的布里奇曼法进行了CdGeAs₂多晶合成与单晶生长,生长出ϕ28 mm×65 mm完整无开裂的CdGeAs₂单晶体。用金刚石外圆切割机切割出CdGeAs₂晶片,采用X射线衍射(XRD)和X射线能量色散谱仪(EDS)对合成的多晶粉末和切割出的晶片进行表征。结果表明,合成产物为单相四方黄铜矿结构的CdGeAs₂多晶,晶片的原子百分比接近于理想化学计量比。经傅里叶变换红外分光光度计测试发现,初生长的CdGeAs₂晶体在11.3 μm处的吸收系数为0.117 cm^-1,经过拟合计算得出禁带宽度为0.52 eV。通过变温(110~300 K)霍尔效应测试表明,CdGeAs₂晶体在110~300 K温度范围内都为p型导电,载流子浓度p_H和霍尔系数R_H随温度的升高分别升高和下降,而霍尔迁移率μ_H几乎不变。拟合计算出晶体中受主电离能E_A=0.305 eV,并进一步分析了生长晶体中可能存在的受主缺陷。     

Boron-doped a-SiOx:H films prepared by photo-CVD technique

The optoelectronic and structural properties of p-type a-SiO_x:H films have been studied. The deposition parameters e.g. chamber pressure and diborane to silane ratio are optimized to get a film with dark conductivity (σ_d) 7.9×10⁻⁶ S cm⁻¹ and photoconductivity 9.3×10⁻⁶ S cm⁻¹ for an optical gap (E₀₄) of 1.94 eV. The decrease of optical gap accompanied by the increase of conductivity is due to less oxygen incorporation in the film, which is substantiated by the decrease of the intensity of SiO absorption spectra. The properties are very much effected by the chamber pressure and diborane to silane ratio.     

Studies of the optical properties of sodium copolyphosphate glasses

A number of samples of glassy sodium polyphosphate and copolyphosphates of sodium — cobalt, sodium — copper, sodium — nickel, sodium-manganese and sodium — calcium were prepared and their optical properties were investigated. The ultraviolet and visible spectra of these glasses were recorded at the room temperature. It was found that the fundamental absorption edge of these glasses usually occurs in the ultraviolet — visible region. The optical absorption edges (E₀) were calculated by using the relation h ν = B (hν − E₀)² where B is constant. The linear variation of (hν)^1/2 with hν where is the absorption coefficient and hν is the incident photon energy, is taken as evidence of non-direct interband transitions. The E₀ values obtained for copolyphosphate glasses appeared to depend on the size of the counter cation. The infrared spectra of all these glasses appeared to be almost the same, indicating the presence of characteristic P --- O --- P linkages of linear polyphosphate chains and two non bridging oxygen atoms bonded to phosphorus atoms O --- P --- O (PO₂) units in the polyphosphate tetrahedra.     

Thin layers deposited from V2O5 gels: II. An optical absorption study

Absorption spectra of V₂O₅ layers deposited from gels of various V⁴⁺ contents C were studied from near UV down to near IR. The high absorption region due to the charge transfer transition extends above ≈ 2 eV. Whatever C the optical gap is ≈ 2.25 eV. On the low energy side an Urbach tail is observed whose slope increases with C. In the near infrared absorption is related to the V⁴⁺ ions and increases linearly with C. The absorption band due to the optically induced polaron hopping is detected. The corresponding maximum E_max suffers a red shift when C increases. The experimental E_max data are very close to the values predicted from the polaron and disorder energies as deduced from the conductivity study in an earlier paper. The slight difference between the two sets of data allowed us to estimate the transfer integral J ≈ 0.015 eV.     

α相和β相BiNbO4∶Eu3+的荧光性能

采用高温固相法合成出正交相和三斜相结构的BiNbO₄∶Eu³⁺样品,利用X 射线衍射(XRD)、拉曼光谱、吸收光谱和荧光光谱对样品的结构和光学性能进行了研究。结果表明:900 ℃合成样品为正交相结构α-BiNbO₄,而1 200 ℃得到三斜相结构β-BiNbO₄。吸收光谱得到α相和β相BiNbO₄的光学带隙分别为2.69 eV和2.96 eV,与第一性原理的理论结果2.640 eV和3.032 eV相吻合。Eu³⁺掺杂诱导二者的光学带隙蓝移至2.89 eV和3.05 eV,有效改变了其光响应范围。荧光光谱表明:Eu³⁺在两种结构的最强荧光峰均来自⁵D₀→⁷F₂电偶极跃迁,最强荧光峰分别位于615 nm和611 nm。Eu³⁺在β-BiNbO₄中的荧光强度更高,而且其⁵D₀→⁷F₂和⁵D₀→⁷F₁的荧光强度比值更大。与Eu³⁺相似,Er³⁺在β-BiNbO₄中具有更高的上转换荧光强度,其强度约是在α-BiNbO₄中荧光的近40倍,说明三斜结构BiNbO₄更适合做稀土离子的基质材料。     

Fe掺杂α-Bi2O3光电性质的第一性原理研究

采用第一性原理杂化泛函HSE06方法对Fe掺杂α-Bi2 O3的电子结构和光学性质进行了计算研究.结果表明,Fe掺杂α-Bi2 O3体系有较小的结构变形,本征α-Bi2 O3的禁带宽度为2.69 eV,Fe掺杂使α-Bi2 O3的禁带宽度减小(约为2.34 eV).对其光学性质研究得出Fe掺杂扩展了α-Bi2 O3对可...     

Absorption spectra of GaN: film characterization by Urbach spectral tail and the effect of electric field

The absorption tail of undoped and Si-doped GaN films was investigated at different temperatures and under applied electric field. It was found that the spectral dependence of logarithm of absorption coefficient is combined of two linear functions: ln[(hν)]=C₁+(hν−E_g)/U₁ for hν<3.42 eV and ln[(hν)]=C₂+(hν−E_g)/U₂ for 3.44<hν<3.5 eV with Urbach energies U₁=400–470 meV and U₂=10–20 meV. The influence of an electric field effect on the absorption spectra follows the Dow and Redfield theory. It was shown that the intrinsic electric field about 10⁵ V/cm exists in our samples. The implemented analysis of the absorption spectra gives the qualitative method of film characterization.     

Growth and energy band gap of CaSeS thin films prepared by hot-wall epitaxy

This paper investigates preparation of CaSeS thin films using hot-wall epitaxy. These films can be grown epitaxially on cleaved BaF₂(1 1 1) at a substrate temperature of 873 K by tailoring the VI/II flux ratio vaporized from Ca and SeS resources. The optical absorption edge of these films thus tailored can be observed clearly, shifting toward higher photon energy with increasing S content. In particular, the energy band gap of CaSe_0.66S_0.34, capable of lattice-matching to InP was found to be 4.69 eV, producing considerably large band gap difference of 3.34 eV between the CaSe_0.66S_0.34 and InP.     

P和As掺杂Mn4Si7第一性原理计算

采用第一性原理计算方法,对本征Mn₄Si₇以及P和As掺杂的Mn₄Si₇的电子结构和光学性质进行计算解析。计算结果表明本征Mn₄Si₇是带隙值为0.810 eV的间接带隙半导体材料,P掺杂Mn₄Si₇的带隙值增大为0.839 eV,As掺杂Mn₄Si₇的带隙值减小为0.752 eV。掺杂使得Mn₄Si₇的能带结构和态密度向低能方向移动,同时使得介电函数的实数部分在低能区明显增大,虚数部分几乎全部区域增加且8 eV以后趋向于零。此外掺杂还增加了高能区的消光系数、吸收系数、反射系数以及光电导率,明显改善了Mn₄Si₇的光学性质。     

应变对Mo2C(001)表面电子结构及光学性质的影响

采用第一性原理方法研究应变对Mo₂C(001)表面电子结构及光学性质的影响。研究表明,在应变作用下Mo₂C(001)表面均为间接带隙半导体,带隙随着压应变和拉应变的增加而减小。当应变为-20%时,Mo₂C(001)表面由间接带隙半导体转变为金属性质。当应变为-20%、-15%、-10%、-5%、0%、5%、10%、15%、20%时,其带隙分别为0 eV、0.162 eV、0.376 eV、0.574 eV、0.696 eV、0.708 eV、0.604 eV、0.437 eV、0.309 eV。带隙变化的原因主要是Mo 4p、4d、5s态电子和C 3p态电子对应变敏感,在应变作用下受激发,活性增强导致价带顶在布里渊区G、A、L、M点之间变化,导带底在K、H点之间变化;当应变由-15%逐渐变化到20%时,吸收谱的第一峰逐渐减弱,并且第一峰对应的光电子能量减小,吸收带边向低能方向移动,表明光吸收随着压应变增大而增加,吸收带边随着拉应变增加向低能方向移动。其他光学性质表现出类似的变化规律,光学性质计算结果表明应变能够有效调节光吸收特性,增强光学利用率,研究结果为Mo₂C(001)作为新型光电子材料的应用提供理论支撑。     

Structure and properties of the pure and Pr-doped Ge25Ga5Se70 and Ge30Ga5Se65 glasses

The Ge₂₅Ga₅Se₇₀ and Ge₃₀Ga₅Se₆₅ pure and Pr³⁺-doped glasses were prepared by direct synthesis from elements and PrCl₃. It was found that up to 1 mol% PrCl₃ can be introduced in the Ge₂₅Ga₅Se₇₀ and Ge₃₀Ga₅Se₆₅ glasses. Both types of glasses with overstoichiometric and substoichiometric content of Se were homogeneous and of black color. The optical energy gap is E^opt_g=2.10 eV, and the glass transition temperature is T_g=543 K for Ge₂₅Ga₅Se₇₀ and T_g=633 K for Ge₃₀Ga₅Se₆₅. The long-wavelength absorption edge is near 14 μm and it corresponds to multiphonon processes. Doping by Pr³⁺ ions creates absorption bands in transmission spectra, which can be assigned to the electron transitions from the ground ³H₄ level to the higher energy levels of Pr³⁺ ions ³H₅, ³H₆, ³F₂, ³F₃ and ³F₄, respectively. By excitation with YAG:Nd laser line (1064 nm), two intense luminescence bands (1343 and 1601 nm) were excited. The first band can be ascribed to electron transitions between ¹G₄ and ³H₅ energy levels of Pr³⁺ ions. Full width at half of maximum (FWHM) of the intensity of luminescence was found to be 70 nm for (Ge₂₅Ga₅Se₇₀)_1 − x(PrCl₃)_x and (Ge₃₀Ga₅Se₆₅)_1 − x(PrCl₃)_x glasses. The FWHM in selenide glasses is lower than in halide and sulphide glasses. The second luminescence band (1601 nm) can be probably ascribed to the transitions between ³F₃ and ³H₄ energy levels of Pr³⁺ ions. The absorption and luminescence spectra of Pr³⁺ ions in studied glasses are slightly influenced by stoichiometry of glassy matrix. The Raman spectra of studied glasses were deconvoluted and assignment of Raman bands to individual vibration modes of basic structural units was suggested. The structure of studied glasses is mainly formed by corner-sharing and edge-sharing GeSe₄ tetrahedra. The vibration modes of Ga-containing structural units were not found, they are apparently overlapping with Ge-containing structural units due to small difference between atomic weights of Ge and Ga. In the glasses with substoichiometry of Se, the Ge–Ge bonds of Ge₂Se₆ structural units were found. In Se-rich glasses the Se–Se vibration modes were found. In all studied glasses also ‘wrong' bonds between like atoms were found in small amounts. Maximum phonon energy of studied glasses is 320 cm⁻¹.     

Carbon doping into GaAs using combined ion beam and molecular beam epitaxy method

Carbon (C) doping by combined ion beam and molecular beam epitaxy (CIBMBE) was investigated. In this technique, mass-analyzed C ions (¹²C⁺) are accelerated at low energies of 30 to 1000 eV and are irradiated onto growing GaAs substrate. Doping concentration control in CIBMBE can be very stably accomplished by simply adjusting the ion beam current density, which is independent of growth conditions of host materials. Experiments on systematic variation of C⁺ ion acceleration energy (E_C+) indicated that, in the energy range of E_C+<170 eV, net hole concentration (|N_A-N_D|) increases slightly as E_C+ increases. The highest |N_A-N_D| is obtained at E_C+ = 170 eV under the constant C⁺ ion beam current density. For E_C+>170 eV, |N_A-N_D| decreases dramatically with increasing E_C+, which can be explained in terms of enhanced sputtering effect. Although no evidence of damages induced by ion irradiation is shown for low E_C+ range of ≤170 eV, trace of damages is apparently observed for E_C+>170 eV.     

Nd掺杂Mg2Si电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理赝势平面波方法,探究了未掺杂Mg₂Si以及Nd掺杂Mg₂Si的能带结构、态密度和光学性质。计算结果表明: Nd掺杂Mg₂Si后,Mg₂Si禁带宽度从0.290 eV降低到0 eV,导电性能提升;未掺杂的Mg₂Si,当光子能量大于0.9 eV时,才开始慢慢具备吸收能力,掺杂Nd之后的Mg₂Si对能量为0.2 eV的光子就开始吸收,大大改善了Mg₂Si对红外光电子的吸收。掺杂后的光吸收系数和反射率都变小,表明掺杂后的Mg₂Si对光的穿透率增大。计算结果为Mg₂Si材料在光电器件方面的应用提供了理论依据。     

Study of group-III binary and ternary nitrides using X-ray absorption fine structure measurements

It is demonstrated that the NEXAFS spectra are a “fingerprint” of the symmetry and the composition of the binary nitrides GaN, AlN and InN, as well as of their ternary alloys In_0.16Ga_0.84N and Al_yGa_1−yN. From the angular dependence of the N-K-edge NEXAFS spectra, the hexagonal symmetry of the under study compounds is deduced and the (p_x, p_y) or p_z character of the final state is identified. The energy position of the absorption edge (E_abs) of the binary compounds GaN, AlN and InN is found to red-shift linearly with the atomic number of the cation. The E_abs of the Al_yGa_1−yN alloys takes values in between those corresponding to the parent compounds AlN and GaN. Contrary to that, the E_abs of In_0.16Ga_0.84N is red-shifted relative to that of GaN and InN, probably due to ordering and/or phase separation phenomena. The EXAFS analysis results reveal that the first nearest-neighbour shell around the N atom, which consists of Ga atoms, is distorted in both GaN and Al_xGa_1−xN for x<0.5.     

Y掺杂WS2二维材料的第一性原理研究

WS₂由于其优异的物理和光电性质引起了广泛关注。本研究基于第一性原理计算方法,探索了本征单层WS₂及不同浓度W原子替位钇(Y)掺杂WS₂的电子结构和光学特性。结果表明本征单层WS₂为带隙1.814 eV的直接带隙半导体。进行4%浓度(原子数分数)的Y原子掺杂后,带隙减小为1.508 eV,依旧保持着直接带隙的特性,随着Y掺杂浓度的不断增大,掺杂WS₂带隙进一步减小,当浓度达到25%时,能带结构转变为0.658 eV的间接带隙,WS₂表现出磁性。适量浓度的掺杂可以提高材料的导电性能,且掺杂浓度增大时,体系依旧保持着透明性并且在红外光和可见光区对光子的吸收能力、材料的介电性能都有着显著提高。本文为WS₂二维材料相关光电器件的研究提供了理论依据。     

Optical Investigation of Defects in p-type CuInSe2 Single Crystals

Optical absorption spectra in the photon energy range from 0.03 to 1.1 eV and photoreflectance spectra in the range of the fundamental edge are measured on p-type CuInSe₂ single crystals. Besides a dominant contribution to the absorption coefficient due to intervalence band transitions below about 0.75 eV the spectra revealed five additional structures that can be ascribed to defect induced optical transitions with characteristic energies between 0.48 and 0.72 eV. Based on a comparison of the near-edge optical absorption and photoreflectance spectra a shallow defect (donor or acceptor) with an ionisation energy of about 46 meV was identified.     

Physical properties of amorphous Ge20Sb25−xBixSe55 thin films

The influence of substitution of Sb atoms by Bi atoms on the electrical and optical properties of thin films of the Ge₂₀Sb_25−xBi_xSe₅₅ [0x15] system are reported. Results of dc conductivity and thermoelectric power measurements between 150 and 450 K show that the Ge---Sb---Se system is chemically modified by addition of large concentrations of Bi atoms between X=5 and X=10 at.%). A transition from p-type for Sb-doped to n-type for Bi-doped films and a decrease of resistivity is observed. The absorption edge shifts to shorter wavelength, thereby decreasing the optical band gap of the system. Compositional dependences of electrical conductivity, thermoelectric power, and the appearance of n-type conduction are discussed from the stand point of chemical bonds formed in the films and related to the defect states produced due to incorporation of Bi atoms in high concentrations. The coexistence of band and hopping conduction is proposed. The ac conductivity in 0.1–10.0 kHz frequency and 150–450 K temperature range was found to obey a power law σ(ω, T) = Aω^s. The results were interpreted in terms of Elliott's theory, which assumes correlated barrier hopping (CBH) between the charged defect centres. It was found that computed results from the CBH model and experimental one are qualitative agreement for the present materials.     

(La,Y)掺杂AlN的电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的平面波超软赝势方法对纯AlN、(La,Y)单掺杂以及La-Y共掺杂AlN 超胞进行几何结构优化,计算了稀土元素(La,Y)掺杂前后体系的能带结构、态密度和光学性质。结果表明:未掺杂的AlN是直接带隙半导体,带隙值为E_g=4.237 eV,在费米能级附近,态密度主要由Al-3p、N-2s电子轨道贡献电子,光吸收概率大,能量损失较大;掺杂后使得能带结构性质改变,带隙值降低,能带曲线变密集,总态密度整体下移;在光学性质中,稀土元素掺杂后均提高了静态介电常数、光吸收性能,增强了折射率和反射率,减小了电子吸收光子概率及能量损失;其中La-Y共掺体系变化得较为明显。     

Semiconducting TiO2SiO2 glasses (I): Electronic conductivity

Semiconducting glasses, 70% TiO₂-30% SiO₂, with a Ti³⁺ content varying from zero to 7.8%, have been prepared by rf sputtering in argon/oxygen/hydrogen gas mixtures. Conduction in the Ti³⁺-containing glasses is by small polarons hopping adiabatically. The disorder energy is small (0.05 eV) compared to the hopping energy (0.37–0.51 eV). The variation of the hopping energy with Ti³⁺ content and temperature is ascribed to a polaron overlap effect and to effects arising from the random glass structure, respectively. At low temperatures conduction is a percolation process. The conduction in Ti³⁺-free glasses is not due to polarons; at low temperature these glasses exhibit variable-range hopping.