高电荷态离子束的应用(摘要)

The ECR ion sources have mainly been used until now for injection of cyclotrons and a large number of these sources are presently in operation through the world.Most cyclotrons are used today for nuclear physics researches but an increasing number of these accelerators are now devoted to medical applications.The ECR ion sources have also been extensively used for producing low energy beams for academic researches in atomic and surface physics.These studies led to very encouraging results opening the way to industrial applications. In this talk some of the most promising applications of HCI beams will be reviewed.The development of these applications will require some important improvements of the ECR sources which will be discussed.A special emphasis will be given to the respective roles of ECR and EBIS ion sources in these industrial applications, and some economic and market considerations discussed.     

The Development and Application of Low Temperature Plasma Technology

The development and applications of low temperature plasma technology used in surface modification of materials are presented in this paper. Based on plasma sources and ion sources technology, multi-functions ion implantation and deposition technologies were developed and the related processes are also used to treat different products. The related technologies were translated into industrial productions supported by national research projects. Following the last development of international plasma researches, the standardization and internationalization processes of plasma technologies are executed in our center.     

Laser electron acceleration beyond 100 GeV

Nowadays there is great progress on laser-driven plasma-based accelerators by exploiting petawatt-class lasers, where for one aspect electron beams can be accelerated to multi-GeV energy in a centimeter-scale plasma due to laser wakefield acceleration mechanism. While to date, worldwide researches on laser-plasma accelerators are focused to create compact particle and radiation sources for applications in a wide range of sciences, including basic, medical and industrial sciences, there are great interests in applications for high energy physics and astrophysics that explore unprecedented high-energy frontier phenomena, for which laser plasma accelerator concepts provide us with promising tools. Here, our endeavors toward “extreme light” in the IZEST are envisaged for the next 30 years perspective and issues on laser plasma electron acceleration beyond 100 GeV and furthermore toward the TeV regime, aiming at high energy physics applications.     

New aspects of micromachining and microlithography using 157-nm excimer laser radiation

The use of F₂ excimer laser sources, emitting at 157 nm, constitutes a new promising tool for scientific, industrial and lithography applications. The 157-nm laser emission enables high-resolution processes and the high photon energy offers the unique possiblity of photoionizing molecules in a single step. Therefore a lower fragmentation or thermal loading takes place. The 157-nm radiation will enable fundamental research and development for deep UV (DUV) high-resolution optical microlithography in the manufacturing of integrated circuits. This is the next step from the technology of ArF lasers at 193 nm. Furthermore, benefits are expected for key technologies requiring high-resolution processing and the micromachining of tough materials like Teflon or fused silica for micro-optics fabrication. Such applications require F₂ excimer laser sources with high performance, reliability and efficiency. The world of nanotechnology is just beginning to reveal its potential.     

LZ-50离子注入装置及其在材料表面改性中的应用

本文叙述了LZ-50离子注入装置及其在材料表面改性中的应用。该装置离子能量80keV,氮离子束流强～10mA,注入面积～200cm~2,性能稳定,重复性好,可长期稳态运行。利用该装置对硬质合金、工具钢、钛合金、陶瓷及其它有色金属材料进行了氮离子注入实验,并取得了一些有应用价值的工艺结果,如离子注入使Co-WC机械夹固刀片的耐磨性能提高2—4倍。     

Macrosonics in industry: 4. Chemical processing

Acoustic irradiation can result in increased inter-phase mass and heat transfer rates. The second-order acoustic effects of cavitation, interfacial instability, radiation pressure and acoustic streaming are responsible for the enhancement in these rate processes. The application of sonic and ultrasonic energy in industrial processing is reviewed. A number of units using acoustic energy to enhance rates of conventional unit processes, for example, drying, solid-liquid extraction, etc, are described. In addition, new applications in waste water treatment and oil-water emulsion fuels are described. The development of newer, more efficient generators should lead to a greater use of acoustic energy for large-scale industrial processing.     

Recent development and application of Li4Ti5O12 as anode material of lithium ion battery

Lithium-ion batteries with both high power and high energy density are one of the promising power sources for electric devices, especially for electric vehicles (EV) and other portable electric devices. One of the challenges is to improve the safety and electrochemical performance of lithium ion batteries anode materials. Li₄Ti₅O₁₂ has been accepted as a novel anode material of power lithium ion battery instead of carbon because it can release lithium ions repeatedly for recharging and quickly for high current. However, Li₄Ti₅O₁₂ has an insulating character due to the electronic structure characterized by empty Ti 3d-states, and this might result in the insufficient applications of LTO at high current discharge rate before any materials modifications. This review focuses first on the present status of Li₄Ti₅O₁₂ including the synthesized method, doping, surface modification, application and theoretical calculation, then on its near future development.     

宽束冷阴极和部端霍尔离子源对薄膜透过率和应力影响的比较

在宽束冷阴极离子源和端部霍尔离子源辅助沉积情况下，利用南光ZZS700 1/G箱式镀膜机，通过实验分别验证了这两种离子束辅助沉积对光学膜层透过率和应力的影响。通过对大量实验数据进行分析，得出利用低能量和大电流离子束辅助沉积光学薄膜时，膜层性能优于高能量离子束辅助沉积膜层。分析了膜层特性改变的原因，并提出了合理的工艺参数。实验结果表明，低能量、大电流的离子束辅助沉积使光学薄膜的性能更佳。     

Intense beam production with ECR ion sources

Electron cyclotron resonance ion sources are now able to attain a beam current as high as some milliamperes, which until a few years ago was obtained only for pulsed laser ion sources with a much higher emittance and energy spread, by keeping also the possibility to produce high charge states close to electron beam ion sources, at much higher intensity. They usually operate at frequencies up to 18 GHz, but now many sources are able to operate or will be able, at 28 GHz frequency or more, with plasma density of the order of 10¹³ cm^?3, much higher than any other source of the previous generation. The state-of-the-art technique will be described along with the major characteristics of the upcoming sources.     

Miniature electron bombardment evaporation source: evaporation rate measurement

Miniature electron beam evaporation sources which operate on the principle of vaporization of source material, in the form of a tip, by electron bombardment are produced by several companies specialised in UHV equipment. These sources are used primarily for materials that are normally difficult to deposit due to their high evaporation temperature. They are appropriate for special applications, like heteroepitaxial thin films growth that require very low and well controlled deposition rate. We propose a simple and easily applicable method of evaporation rate control. The method is based on the measurement of ion current produced by electron bombardment of evaporated atoms. In order to be able to determine the ion current – evaporation flux calibration curves we measured the absolute values of evaporation flux by means of Bayard-Alpert ion gauge.     

Physics and applications of charged particle beam sources

The authors review the physics and a few applications of charged particle beam sources, most of which originate from, propagate through, or use as a target, a partially ionized plasma. The authors present the plasma phenomena and plasma conditions which are general to most of the charged particle sources, but also other approaches and the current status of the research. The authors describe the applications of charged particle beam sources using partially ionized plasmas in accelerators and ion implantation. The applications covered are those of accelerator sources and ion implantation     

Cathode-lifetime and stability problems in arc-dischargetype heavy ion sources

The last few years have seen ion implantation become a widely used industrial method. This has resulted in increasing importance being attached to the reliability of implanters and to a satisfactory working time/maintenance relation and other factors which are in some way connected with reproducibility and homogeneity. With these viewpoints in mind, ion sources seem to be the most sensitive components of implanters. Besides the normal ion source operations such as changing feeding material or gas, etc., ion sources need care in the maintenance. Ion source lifetime and reliability problems are of special consequence in the case of heavy-current machines. The excellent, mechanically scanned target chambers have made possible the use of higher and higher currents, but at the same time these currents can cause lifetime problems which affect the profit of expensive high current machines.     

Pulsed intense electron beams generated in transient hollow cathodedischarges: fundamentals and applications

For the commercial application of pulsed power, material processing with intense pulsed particle beams is a very interesting subject. Recently, high-voltage (1-70 kV), low-pressure (1-100 Pa) transient hollow-cathode discharges turned out to be sources for pulsed intense electron beam generation suitable for this application. The remarkable parameters of these electron beams-beam currents of 50-1000 A (10-30% of the maximum discharge current) with a high energy component (mean energy of about 0.25-0.75 of maximum applied voltage) of 20-70% of the maximum beam current, power density up to 10 W/cm², beam diameters of 0.1-3 mm, beam charge efficiency of 3-5%-captured the attention not only of the scientific community in the last decade. The electron beam is emitted during the early phases of the discharge, and only weak dependence of the high energetic peak of the beam current was found on the external capacity, which determine the development of the later high-current phases. However, the beam parameters depend on the breakdown voltage, gas pressure, and discharge geometry (including self-capacity). In this paper, the characteristics of the pulsed intense electron beams generated in two configurations-multigap pseudosparks and preionization-controlled open-ended hollow-cathode transient discharges (PCOHC)-are described. Such electron beams already were used successfully in a variety of pulsed power applications in material processing, deposition of superconducting (YBaCuO) and diamond-like thin films, microlithography, electron sources for accelerators, and intense point-like X-ray sources, and some preliminary experiments revealed new potential applications such as pumping of short-wavelength laser active media. These pulsed electron beams could be used further in any kind of pulsed power applications that require high-power density, small or high electron energy, and small-beam diameters     

Observations of resonant modes formation in microwave generated magnetized plasmas

Ion sources have a significant number of applications in accelerator facilities and in industrial applications. In particular, the electron cyclotron resonance ion sources (ECRIS) are nowadays the most effective devices that can feed particle accelerators in a continuous and reliable way, providing high current beams of low and medium charge state ions and lower, but still remarkable, beam current for highly charged ions. In recent years several experiments have shown that the current, the charge states and even the beam shape change by slightly varying the microwave frequency (the so-called frequency tuning effect – FTE). The theoretical explanation of these results is based on the difference in the electromagnetic field pattern over the resonance surface, i.e. that region where the electrons resonantly interact with the incoming wave. In order to be consistent with the experiments, this model requires that standing waves are formed also in presence of a dense plasma. The proof was sought by means of a series of measurements performed with a network analyzer and with a plasma reactor operating at 2.45 GHz, according to the principles of the microwave discharge ion sources (MDIS). The measurements have been carried out with the aim to achieve the electromagnetic characterization of the plasma chamber in terms of possible excited resonant modes with and without plasma, and they reported that resonant modes are excited inside the cavity even in presence of a dense plasma. It was observed that the plasma dynamics strongly depends on the structure of the standing waves that are generated. The measurement of the eigen-frequencies' shifts were carried out for several values of pressure and RF power, thus linking the shift with the plasma density measured by a Langmuir probe. The changes in plasma shape, density and electron temperature have been also monitored for different operating conditions. A strong variation of plasma properties has been observed as a consequence of the introduction of the Langmuir probe inside the resonant cavity, thus demonstrating that the standing wave can be strongly perturbed even by means of relatively small metallic electrodes. The measurements reported hereinafter are relevant also for ECRIS, because they confirm the validity of the theoretical model that describes the frequency tuning.     

Electro-nuclear neutron generator — XADS at ITEP

In this report, the purpose and status of the currently constructed ITEP experimental accelerator driven system (XADS) are discussed. This hybrid electro-nuclear facility of moderate power integrates the pulse proton linac (36 MeV, 0.5 mA) and heavy water sub-critical blanket assembly (heat power of 100 kW). Most parts of the equipment units are ordered for industrial manufacturing and some are under development. The facility is supposed to be used for investigations of a wide range of problems concerning both the target-blanket assembly and the accelerator-driver and at the same time explore the dynamical processes arising during their combined operation. Some other applications of the proton beam and neutron source are also discussed. It is possible in future to increase the current and energy of proton or heavy ion beam.      

高重复频率脉冲功率技术及其应用:(6)代表性的应用

综合介绍了高重复频率脉冲功率在材料、环保、生物·医疗、光源和高能加速器领域的代表性应用。采用脉冲功率的离子注入和表面改性已经被用于工业产品。废气和废液处理的研究成果正在向实用化接近。使用脉冲电场的杀菌和癌症治疗正在吸引很多学者和厂家,因此脉冲功率在生物医学领域的应用前景是非常乐观的。另外,决定未来集成电路工艺标准的极紫外光源已逐步走向生产线。高能加速器上的闸流管会渐渐被功率半导体器件取代。     

第四代ECR离子源的主要概念(摘要)

To go beyond the present and planned third generation ECR ion sources operating at microwave frequencies between 20 and 30GHz to a fourth generation of sources operating above 50GHz offers new oppor- tunities and challenges.Based on the experimentally demonstrated frequency scaling,a doubling in operating frequency could provide more intense high charge state beams with higher charge states.The technical chal- lenges include the development of magnetic structures capable of producing 8T solenoid field and 4T sextupole fields,production and coupling of high power microwave power to heat the plasma,extraction of intense mul- tiple charge ion beams from a region of strong magnetic field and shielding of bremstrahlung from the hot electrons.In this paper,the status of high field superconducting magnets now under development for acceler- ator applications,gyrotrons for microwave power and other technical aspects that would be incorporated into a fourth generation ECR ion source are explored and applied to a conceptual design.     

Environmental and industrial applications of pulsed power systems

The technology base formed by the development of high peak power simulators, laser drivers, free electron lasers, and inertial confinement fusion drivers from the early 60's through the late 80's is being extended to high average power short-pulse machines with the capabilities of performing new roles in environmental cleanup applications and in supporting new types of industrial manufacturing processes. In this paper we briefly discuss a new class of short-pulse high average power accelerators, now operating in laboratory environments, using semiconductor and magnetic switches to achieve megavolt electron and ion beams with 10's of kiloamperes of current and average power levels in excess of 100 kW. The technology is modular, robust in concept, and appears to be suitable for extension to the megawatt power level. The modularity allows the same technology to accelerate electron and ion beams with pulses a few 10's of nanoseconds wide with potentials of one to 10's of MeV's and, by using fewer compression stages, also to drive applications requiring pulse widths of 100 nanoseconds to microseconds at accelerating potentials of 250 keV or more. The longer pulse applications, such as drivers for pulsed corona reactors for flue gas cleanup, require high average power and also benefit from the long life, high efficiency pulse compression technology. After a brief introduction to the technology, the paper then concentrates on specific application areas that are being explored because of the availability of the high specific energies and high average powers attainable with this new family of short-pulse machines     

多靶强流铯溅射离子源的研制

多靶强流铯溅射离子源是多种加速器中常用的离子源之一,在科学研究和工业生产领域的应用十分广泛。但是,目前商业化应用的该种离子源由欧美几个国家垄断,国内还没有厂家能够生产。为了提高加速器运行和建造中的自主化水平,研制了一种多靶强流铯溅射离子源。该离子源主要由离子源腔、换靶装置、冷却系统、控制箱等组成,根据功能需求对其关键部件进行结构设计,采用了全新的伺服电机驱动换靶方式,提供靶位微调功能和远程控制模式,并使用Opera-3D软件模拟优化结构参数和束流光路。经过测试,该离子源在中国原子能科学研究院的400 kV小型加速器质谱(AMS)装置上应用情况良好,换靶定位精准,供束稳定,束流参数达到进口离子源的参数指标,实现了预期目标。     

大功率半导体激光合束进展

经过近30年的发展,半导体激光器已由信息器件逐步发展成为能量器件,特别是大功率高光束质量半导体激光器,已从泵浦光源过渡成为直接作用光源,并部分应用在加工及国防领域。本文介绍了大功率半导体激光单元发展现状,分析讨论了各种激光合束技术及相应的合束光源,介绍了长春光机所在激光合束方面所做的部分工作,提出了我国半导体激光产业建设及发展的几点建议,并对半导体激光技术的发展新动向进行了展望。随着单元亮度的提升和合束技术的成熟,大功率半导体激光源作为间接光源和直接作用光源将在国防和工业领域大放异彩。