Ba deposition and oxidation on theta-Al2O3/NiAl(100) ultrathin films. Part I: Anaerobic deposition conditions

Room-temperature Ba deposition on an oxygen-terminated theta-Al(2)O(3)/NiAl(100) ultrathin film substrate under ultrahigh vacuum (UHV) conditions is studied using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and temperature programmed desorption (TPD) techniques. In addition, Ba oxidation by the ions of the alumina substrate at 300 K < T < 1200 K in the absence of a gas-phase oxidizing agent is investigated. Our results indicate that at room temperature Ba grows in a layer-by-layer fashion for the first two layers, and Ba is partially oxidized. Annealing at T < 700 K results in further oxidation of the Ba species, whereas annealing at higher temperatures leads to loss of Ba from the surface via desorption and subsurface diffusion.     

Low temperature H2O and NO2 coadsorption on theta-Al2O3/NiAl(100) ultrathin films

The coadsorption of H(2)O and NO(2) molecules on a well-ordered, ultrathin theta-Al(2)O(3)/NiAl(100) film surface was studied using temperature programmed desorption (TPD), infrared reflection absorption spectroscopy (IRAS), and X-ray photoelectron spectroscopy (XPS). For H(2)O and NO(2) monolayers adsorbed separately on the theta-Al(2)O(3)/NiAl(100) surface, adsorption energies were estimated to be 44.8 and 36.6 kJ/mol, respectively. Coadsorption systems prepared by sequential deposition of NO(2) and H(2)O revealed the existence of coverage and temperature-dependent adsorption regimes where H(2)O molecules and the surface NO(x) species (NO(2)/N(2)O(4)/NO(2)(-),NO(3)(-)) form segregated and/or mixed domains. Influence of the changes in the crystallinity of solid water (amorphous vs crystalline) on the coadsorption properties of the NO(2)/H(2)O/theta-Al(2)O(3)/NiAl(100) system is also discussed.     

Interaction of water with ordered theta-Al(2)O(3) ultrathin films grown on NiAl(100)

The structure of an ordered, ultrathin theta-Al(2)O(3) film grown on a NiAl(100) single-crystal surface was studied by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and low-energy electron diffraction (LEED), and its interaction with water was investigated with temperature programmed desorption (TPD) and XPS. Our results indicate that H(2)O adsorption on the theta-Al(2)O(3)/NiAl(100) surface is predominantly molecular rather than dissociative. For theta(H)()2(O) < 1 ML (ML = monolayer), H(2)O molecules were found to populate Al(3+) cation sites to form isolated H(2)O species aligned in a row along the cation sites on the oxide surface with a repulsive interaction between them. For theta(H)()2(O) > 1 ML, three-dimensional ice multilayers were observed to form, which then desorb during TPD with approximate zero-order kinetics as expected. A small extent of H(2)O dissociation was observed to occur on the theta-Al(2)O(3)/NiAl(100) surface, which was attributed to the presence of a low concentration of oxygen atom vacancies. Titration of these defect sites with adsorbed H(2)O molecules revealed an estimated defect density of 0.05 ML for the theta-Al(2)O(3)/NiAl(100) system consistent with the ordered nature of the synthesized oxide film.     

NO2 adsorption on ultrathin theta-Al2O3 films: formation of nitrite and nitrate species

Interaction of NO2 with an ordered theta-Al2O3/NiAl(100) model catalyst surface was investigated using temperature programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS). The origin of the NO(x) uptake of the catalytic support (i.e., Al2O3) in a NO(x) storage catalyst is identified. Adsorbed NO2 is converted to strongly bound nitrites and nitrates that are stable on the model catalyst surface at temperatures as high as 300 and 650 K, respectively. The results show that alumina is not completely inert and may stabilize some form of NO(x) under certain catalytic conditions. The stability of the NO(x) formed by exposing the theta-Al2O3 model catalyst to NO2 adsorption increases in the order NO2 (physisorbed or N2O4) < NO2 (chemisorbed) < NO2- < NO3-.     

Growth of Co clusters on thin films Al2O3NiAl(100)

We present a scanning tunnel microscopy study of Co clusters grown through vapor deposition on Al(2)O(3) thin films over NiAl(100) at different coverages and temperatures. Formation of Co clusters was observed at 90, 300, 450, and 570 K. At the three lower temperatures, we find narrow cluster size distributions and the mean sizes (with a diameter of 2.6 nm and a height of 0.7 nm) do not change significantly with the coverage and temperature, until the clusters start to coalesce. Even on 3-4-nm-wide crystalline Al(2)O(3) strips where the deposited Co atoms are confined, the same features sustain. Only at 570 K the normal growth mode where the cluster size increases with the deposition coverage is observed, although the data are less conclusive. A simple modeling of kinetic surface processes on a strip confirms the normal growth mode, but fails to show a favored size unless additional energetic constraints are applied on the cluster sizes. Increasing Co coverages to cluster coalescence, a larger preferable size (mean diameter of 3.5 nm and height of 1.4 nm) appears for growth at 450 K. These two sizes are corroborated by morphology evolution of high Co coverages deposited at 300 K and annealed to 750 K, in which the coalescence is eliminated and the two preferable geometries appear and coexist.     

Preparation and characterization of ultrathin [Ru(CO)3Cl2]2 and [BMIM][Tf2N] films on Al2O3/NiAl(110) under UHV conditions

Towards a better understanding of the interface chemistry of ionic liquid (IL) thin film catalytic systems we have applied a rigorous surface science model approach. For the first time, a model homogeneous catalyst has been prepared under ultrahigh vacuum conditions. The catalyst, di-μ-chlorobis(chlorotricarbonylruthenium) [Ru(CO)(3)Cl(2)](2), and the solvent, the IL 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide [BMIM][Tf(2)N], have been deposited by physical vapor deposition onto an alumina model support [Al(2)O(3)/NiAl(110)]. First, the interaction between thin films of [Ru(CO)(3)Cl(2)](2) and the support is investigated. Then, the ruthenium complex is co-deposited with the IL and the influence of the solvent on the catalyst is discussed. D(2)O, which is a model reactant, is further added. Growth, surface interactions, and mutual interactions in the thin films are studied with IRAS in combination with density functional (DFT) calculations. At 105 K, molecular adsorption of [Ru(CO)(3)Cl(2)](2) is observed on Al(2)O(3)/NiAl(110). The IRAS spectra of the binary [Ru(CO)(3)Cl(2)](2) + [BMIM][Tf(2)N] and ternary [Ru(CO)(3)Cl(2)](2) + [BMIM][Tf(2)N] + D(2)O show every characteristic band of the individual components. Above 223 K, partial decomposition of the ruthenium complex leads to species of molecular nature attributed to Ru(CO) and Ru(CO)(2) surface species. Formation of metallic ruthenium clusters occurs above 300 K and the model catalyst decomposes further at higher temperatures. Neither the presence of the IL nor of D(2)O prevents this partial decomposition of [Ru(CO)(3)Cl(2)](2) on alumina.     

Temperature-dependent structuring of Au-Pt bimetallic nanoclusters on a thin film of Al2O3/NiAl(100)

Au-Pt bimetallic nanoclusters on a thin film of Al(2)O(3)/NiAl(100) undergo significant structural evolution on variation of the temperature. Au and Pt deposited sequentially from the vapor onto thin-film Al(2)O(3)/NiAl(100) at 300 K form preferentially bimetallic nanoclusters (diameter ≦ 6.0 nm and height ≦ 0.8 nm) with both Au and Pt coexisting at the cluster surface, despite the order of metal deposition. These bimetallic clusters are structurally ordered, have a fcc phase and grow with their facets either (111) or (001) parallel to the θ-Al(2)O(3)(100) surface. Upon annealing the clusters to 400-500 K, the Au atoms inside the clusters migrate toward the surface, resulting in formation of a structure with a Pt core and an Au shell. Annealing the sample to 500-650 K reorients the bimetallic clusters--all clusters have their (001) facets parallel to the oxide surface--and induces oxidation of Pt. Such annealed bimetallic clusters become encapsulated with the aluminium-oxide materials and a few Au remain on the surface.     

Photochemistry on ultrathin metal films: strongly enhanced cross sections for NO2 on Ag/Si(100)

The surface photochemistry of NO(2) on ultrathin Ag(111) films (5-60 nm) on Si(100) substrates has been studied. NO(2), forming N(2)O(4) on the surface, dissociates to release NO and NO(2) into the gas phase with translational energies exceeding the equivalent of the sample temperature. An increase of the photodesorption cross section is observed for 266 nm light when the film thickness is decreased below 30 nm despite the fact that the optical absorptivity decreases. For 4.4 nm film thickness this increase is about threefold. The data are consistent with a similar effect for 355 nm light. The reduced film thickness has no significant influence on the average translation energy of the desorbing molecules or the branching into the different channels. The increased photodesorption cross section is interpreted to result from photon absorption in the Si substrate producing electrons with no or little momenta parallel to the surface at energies where this is not allowed in Ag. It is suggested that these electrons penetrate through the Ag film despite the gap in the surface projected band structure.     

Agglomeration, sputtering, and carbon monoxide adsorption behavior for Au/Al(2)O(3) prepared by Au(n)(+) deposition on Al(2)O(3)/NiAl(110)

Size-selected gold clusters, Au(n)(+) (n = 1, 3, 4), were deposited on an ordered Al(2)O(3) film grown on NiAl(110), and changes in morphology and electronic properties with deposition/annealing temperature and cluster size were investigated by X-ray photoelectron spectroscopy (XPS) and ion-scattering spectroscopy (ISS). Extensive agglomeration was observed by ISS for annealing temperatures above 300 K, accompanied by large shifts in the Au XPS binding energy. Agglomeration is more extensive in room-temperature deposition, compared to samples prepared by low-temperature deposition, then annealed to room temperature. Agglomeration is also observed to be dependent on deposited cluster size. CO adsorption was studied by ISS and temperature-programmed desorption, and we looked for CO oxidation under conditions where substantial activity is seen for Au(n)/TiO(2). No activity was observed for Au(n)/Al(2)O(3). The differences between the two systems are interpreted in terms of the nature of the metal-support interactions.     

Enhanced selectivity towards O(2) and H(2) dissociation on ultrathin Cu films on Ru(0001)

The reactivity of Cu monolayer (ML) and bilayer films grown on Ru(0001) towards O(2) and H(2) has been investigated. O(2) initial sticking coefficients were determined using the King and Wells method in the incident energy range 40-450 meV, and compared to the corresponding values measured on clean Ru(0001) and Cu(111) surfaces. A relative large O(2) sticking coefficient (～0.5-0.8) was measured for 1 ML Cu and even 2 ML Cu/Ru(0001). At low incident energies, this is one order of magnitude larger than the value observed on Cu(111). In contrast, the corresponding reactivity to H(2) was near zero on both Cu monolayer and bilayer films, for incident energies up to 175 meV. Water adsorption on 2 ML Cu/Ru(0001) was found to behave quite differently than on the Ru(0001) and Cu(111) surfaces. Our study shows that Cu/Ru(0001) is a highly selective system, which presents a quite different chemical reactivity towards different species in the same range of collision energies.     

Spectroscopy of ultrathin epitaxial rutile TiO(2)(110) films grown on W(100)

Epitaxial ultrathin titanium dioxide films of 0.3 to approximately 7 nm thickness on a metal single crystal substrate have been investigated by high resolution vibrational and electron spectroscopies. The data complement previous morphological data provided by scanned probe microscopy and low energy electron diffraction to provide very complete characterization of this system. The thicker films display electronic structure consistent with a stoichiometric TiO(2) phase. The thinner films appear nonstoichiometric due to band bending and charge transfer from the metal substrate, while work function measurements also show a marked thickness dependence. The vibrational spectroscopy shows three clear phonon bands at 368, 438, and 829 cm(-1) (at 273 K), which confirms a rutile structure. The phonon band intensity scales linearly with film thickness and shift slightly to lower frequencies with increasing temperature, in accord with results for single crystals.     

Vibrational spectroscopy study of H2O on Pd/MgO(100) films

A study of water on Pd/MgO(100) films prepared in situ upon Mo(100) single crystals has been performed by using low-energy electron diffraction, high-resolution electron energy-loss spectroscopy, and ultraviolet photoelectron spectroscopy in an ultrahigh vacuum system. The results show that the adsorption of water on MgO(100) film surfaces is enhanced significantly owing to the presence of Pd particles. The formation of a hydroxyl group suggests a dissociation of the water. The size and density of Pd particles on the substrate of MgO(100) films play an important part in the adsorption of water.     

Aerosol assisted chemical vapor deposition of In2O3 films from Me3In and donor functionalized alcohols

The reaction of Me3In and ROH (R = CH2CH2NMe2, CH(CH3)CH2NMe2, C(CH3)2CH2OMe, CH2CH2OMe) in toluene under aerosol assisted chemical vapor deposition (AACVD) conditions leads to the production of indium oxide thin films on glass. The indium oxide films were deposited at 550 degrees C and analyzed by scanning electron microscopy (SEM), X-ray powder diffraction, wavelength dispersive analysis of X-rays (WDX), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. This CVD technique offers a rapid, convenient route to In2O3, which presumably involves the in situ formation of dimethylindium alkoxides, of the type [Me2InOR]2. In order to identify compounds present in the aerosol mist, the solution-phase reaction between Me3In and ROH (R = CH2CH2NMe2, C(CH3)2CH2OMe, CH(CH3)CH2NMe2, CH(CH2NMe2)2) at room temperature in toluene was carried out. Dimeric indium alkoxides, of the type [Me2In(OR)]2, were isolated, and their structures were determined by X-ray crystallography.     

Cyanide-bridged NiCr and alternate NiFe-NiCr magnetic ultrathin films on functionalized Si(100) surface

Sequential growth in solution (SGS) was performed for the magnetic cyanide-bridged network obtained from the reaction of Ni(H(2)O)(2+) and Cr(CN)(6)(3-) (referred to as NiCr) on a Si(100) wafer already functionalized by a Ni(II) complex. The growth process led to isolated dots and a low coverage of the surface. We used the NiFe network as a template to improve the growth of the magnetic network. We elaborated alternate NiFe (paramagnetic)-NiCr (ferromagnetic) ultrathin films around 6 nm thick. The magnetic behaviour confirmed the alternate structure with the ferromagnetic zones isolated between the paramagnetic ones since the evolution of the blocking temperature is consistent with the evolution of the layers' thickness expected from the SGS process.     

Low-temperature decomposition of methanol on Au nanoclusters supported on a thin film of Al2O3/NiAl100

With a variety of surface probe techniques, we investigated low-temperature decomposition of methanol on Au nanoclusters formed by vapor deposition onto an ordered Al(2)O(3)/NiAl(100) thin film. Upon adsorption of methanol on the Au clusters (with mean diameter 1.5-3.8 nm and height 0.45-0.85 nm) at 110 K, some of the adsorbed methanol dehydrogenates directly into carbon monoxide (CO); the produced hydrogen atoms (H) begin to desorb near 125 K whereas most of the CO desorbs above 240 K. The reaction exhibits a significant dependence on the Au coverage: the produced CO increases in quantity with the Au coverage, reaches a maximum at about 1.0-1.5 ML Au, whereas decreases with further increase of the Au coverage. The coverage-dependence is rationalized partly by an altered number of reactive sites associated with low-coordinated Au in the clusters. At least two kinds of reactive sites for the low-temperature decomposition are distinguished through distinct C-O stretching frequencies (2050 cm(-1) and 2092 cm(-1)) while the produced CO co-adsorbs with H and methanol.     

高度(100)取向的Ba_(0.8)Sr_(0.2)TiO_3/LaNiO_3周期薄膜的制备及薄膜铁电性能研究

近年来,多层铁电薄膜的研究越来越引人注目.由于薄膜的电学性能受界面耦合和层与层间相互作用影响很大,因此,通过多层膜的构造引入界面,可显著调节铁电材料的电学性能.     

Epitaxial growth of single-crystalline Al(2)O(3) films on Cr(2)O(3)(0001)

Thin, crystallographically oriented single-crystalline Al2O3 films can be grown epitaxially on Cr2O3(0001) by codeposition of Al vapor and O2 at a substrate temperature of 825 K. The properties and growth of these films were monitored by Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), low-energy ion scattering (LEIS), and X-ray photoelectron spectroscopy (XPS). Two routes of preparation were investigated: (i) stepwise growth by alternating deposition of Al at room temperature and subsequent exposure to O2 at elevated temperatures; (ii) codeposition of Al and O2 at T > 800 K. The first route was consistently found to result in the growth of a complex interfacial oxide followed by the growth of polycrystalline Al2O3. The second mode of preparation provided homogeneous and ordered, probably (0001)-oriented, films of Al2O3 that maintained a LEED pattern up to a thickness around 10 A. The surface sensitive Cr MVV Auger transition at 34 eV was completely attenuated once the Al2O3 layer had reached a thickness of 6 A, pointing to film homogeneity at an early stage. This was confirmed by the absence of a significant Cr signal in LEIS spectra.     

钡改性的Ni/γ- Al2O3催化剂用于甲烷部分氧化的研究

800 ℃、80 000 h－1、CH4/O2/N2=14/7/79下比较了质量分数20%的Ni/γ- Al2O3和Ba改性的Ni/γ- Al2O3催化剂，用于甲烷部分氧化反应的活性和选择性。结果表明，Ba的添加提高了镍基催化剂的活性和稳定性。BET和XRD表明，Ba的加入有利于高温焙烧下抑制大颗粒的Ni Al2O4的形成，保持了高比例的活性镍组分，提高了催化剂催化活性。常压下，xCH4接近100%，sCO、sH2达到92.2%和98.1%，催化剂15 h内活性稍微下降。Ba的加入使Al2O3的晶型转化温度由800 ℃提高到900 ℃，提高了载体的稳定性。     

Ba2[Pd(HS2O7)2(S3O10)2]: A Heteroleptic Polysulfatopalladate

The oxidation of elemental palladium with oleum (65 % SO₃) in the presence of barium carbonate in torch‐sealed glass ampoules at 180 °C leads to yellow single crystals of the heteroleptic palladate Ba₂[Pd(HS₂O₇)₂(S₃O₁₀)₂] (triclinic, P ; Z=1; a=884.18(3), b=927.68(3), c=938.77(4) pm; α=60.473(1), β=80.266(2), γ=87.746(2)°). The crystal structure shows the Pd²⁺ ions in a square‐planar coordination of oxygen atoms of two hydrogendisulfate as well as of two trisulfate anions. The compound is the first example of the rarely seen S₃O₁₀^2? and HS₂O₇^? anions acting as ligands in a complex anion and, moreover, the first heteroleptic polysulfatometallate known so far. The complex formation leads to a stabilization of the trisulfate anion relative to its uncoordinated congener. Ba₂[Pd(HS₂O₇)₂(S₃O₁₀)₂] has been further characterized by vibrational spectroscopy and quantum chemical calculations. Thermal analyses by means of thermogravimetric/differential thermal analysis (TG/DTA) measurements show that the compound decomposes to yield elemental palladium and BaSO₄.