Electronic band transformation from indirect gap to direct gap in Si-H compound

The electronic band structures of periodic models for Si-H compounds are investigated by the density functional theory.Our results show that the Si-H compound changes from indirect-gap semiconductor to direct-gap semiconductor with the increase of H content.The density of states,the partial density of states and the atomic charge population are examined in detail to explore the origin of this phenomenon.It is found that the Si-Si bonds are affected by H atoms,which results in the electronic band transformation from indirect gap to direct gap.This is confirmed by the nearest neighbour semi-empirical tight-binding (TB) theory.     

The optical transition in porous Si: The effects of quantum confinement,surface states and hydrogen passivation

Summary We present a theoretical study of two infinite wires of Si with a different lateral size. The analysis is based on the linear muffin tin orbitals method in the atomic sphere approximation (LMTO-ASA). We consider free, partially and totally H-covered [001] Si quantum wires with rectangular cross-section. The results of this investigation prove the quantum wire nature of porous Si and interpret many of its physical features. In particular we show thata) as expected quantum confinement originates the opening of the LDA gap;b) the gap opening effect is asymmetric: 1/3 of the widening is in the valence band, while 2/3 in the conduction band;c) the near band gap states originate from Si atoms located at the center of the wire;d) the confinement is enhanced in the case of free surfaces;e) the imaginary part of the dielectric function shows a low-energy side structure strongly anisotropic, identified as responsible of the luminescence transition;f) the presence of dangling bonds destroys the luminescence properties;g) in spite of featurec), all Si atoms are collectively involved in the luminescence transition;h) the shift detected by the Si L_{2, 3}VV Auger signal is due to H-interaction effect and is not a measure of the quantum confinement effect;i) the Si atoms probed by the Si L_{2, 3}VV Auger are bonded with H and H₂. Paper presented at the III INSEL (Incontro Nazionale sul Silicio Emettitore di Luce), Torino, 12–13 October 1995.     

5d过渡金属原子掺杂氮化铝纳米管电子结构、磁性性质的第一性原理计算

采用基于密度泛函理论(DFT)的第一性原理计算方法, 研究了5d过渡金属原子(Lu、Hf、Ta、W、Re、Os、Ir、Pt、Au、Hg)取代AlN纳米管(AlNNTs)中的铝原子或氮原子时体系的几何结构、电子结构和磁性性质; 并且以理想AlN纳米管(AlNNTs)、Al缺陷体系(VAl)和N缺陷体系(VN)的结果作为对比. 研究发现: 5d 原子取代Al(Al5d)时体系的局域对称性接近于C3v, 但是取代N(N5d)时体系的局域对称性偏离C3v对称性较大; 当掺杂的5d元素相同时, Al5d的成键能比N5d的成键能大; 当掺杂体系相同时(Al5d或N5d), 其成键能基本上随着5d原子的原子序数的增大而降低; 掺杂体系中出现了明显的杂质能级, 给出了态密度等结果; 不同掺杂情况的磁矩不同, 总磁矩呈现出较强的规律性. 利用C3v对称性和分子轨道理论解释了过渡金属原子取代Al时杂质能级的产生和体系磁性的变化规律.     

5d过渡金属原子掺杂氮化铝纳米管电子结构、磁性性质的第一性原理计算

采用基于密度泛函理论(DFT)的第一性原理计算方法, 研究了5d过渡金属原子(Lu、Hf、Ta、W、Re、Os、Ir、Pt、Au、Hg)取代AlN纳米管(AlNNTs)中的铝原子或氮原子时体系的几何结构、电子结构和磁性性质; 并且以理想AlN纳米管(AlNNTs)、Al缺陷体系(VAl)和N缺陷体系(VN)的结果作为对比. 研究发现: 5d 原子取代Al(Al5d)时体系的局域对称性接近于C3v, 但是取代N(N5d)时体系的局域对称性偏离C3v对称性较大; 当掺杂的5d元素相同时, Al5d的成键能比N5d的成键能大; 当掺杂体系相同时(Al5d或N5d), 其成键能基本上随着5d原子的原子序数的增大而降低; 掺杂体系中出现了明显的杂质能级, 给出了态密度等结果; 不同掺杂情况的磁矩不同, 总磁矩呈现出较强的规律性. 利用C3v对称性和分子轨道理论解释了过渡金属原子取代Al时杂质能级的产生和体系磁性的变化规律.     

First-principles investigations of low-coverage Ca-induced reconstructions on the Si(001) surface

Using the pseudopotential method and the local density approximation of density functional theory we have investigated the stability, atomic geometry, and electronic states for low-coverage Ca adsorbates on the Si(001) surface within the (2 × n) reconstructions with n = 2, 3, 4, 5. Our total energy calculations suggest that the (2 × 4) phase represents the most energetically stable structure with the Ca coverage of 0.375 ML. Within this structural model, each Ca atom is found to form a bridge with the inner two Si–Si dimers. The inner Si–Si dimers become elongated and symmetric (untilted). The band structure calculation indicates that the system is semiconducting with a small band gap. Significant amount of charge transfer from the Ca atoms to neighbouring Si atoms has been concluded by analysing the electronic charge density and simulation of scanning tunnelling microscopy images. The highest occupied and lowest unoccupied electronic states are found to arise from the inner and outer Si–Si dimer components, respectively.     

Zn吸附到含有氧空位(VO)以及羟基(-OH)的锐钛矿相TiO2(101)表面电子结构的第一性原理计算

基于密度泛函理论的第一性原理平面波超软赝势方法, 计算了Zn吸附到TiO₂(101)清洁表面、含有氧空位(V_O)的缺陷表面以及既含有氧空位(V_O)又含有羟基(-OH)表面的能量、Mulliken重叠布居数以及电子结构, 并找到了Zn在每种表面的最稳定结构(分别为模型(c), 模型(aI)以及模型(aII)). 通过对三种表面稳定结构的分析、对比发现: 首先, Zn原子吸附到清洁TiO₂(101)表面上, 主要与表面氧相互作用, 形成Zn–O共价键; 其次, 当Zn原子吸附到缺陷表面时, 吸附能减小到-1.75 eV, 说明Zn更容易吸附到氧空位上(模型(aI)); 最后, 纵观表面模型的能带结构以及态密度图发现, -OH的引入并没有引进新的杂质能级, Zn吸附此表面, 即Zn-TiO₂-V_O-OH, 使得禁带宽度缩短到最小(1.85 eV), 从而有望提高TiO₂的光催化活性. 关键词： 密度泛函理论 氧空位 羟基 Zn原子     

Low-dimensional electronic states at silicon surfaces

Self-assembled atomic chains can be triggered at stepped Si(111) surfaces by adding sub-monolayer amounts of metals, such as gold, silver, platinum, alkali metals, alkaline earths, and rare earths. A common feature of all these structures is the honeycomb chain, a graphitic strip of Si atoms at the step edge that is lattice matched in the direction parallel to the edge but completely mismatched perpendicular to it. This honeycomb chain drives one-dimensional surface reconstructions even on the flat Si(111) surface, breaking its three-fold symmetry. Particularly interesting are metallic chain structures, such as those induced by gold. The Au atoms are locked rigidly to the Si substrate but the electrons near the Fermi level completely decouple from the substrate because they lie in the band gap of silicon. The electronic structure of one-dimensional electrons is predicted to be qualitatively different from that of higher dimensions, since electrons cannot avoid each other when moving along the same line. The single-electron picture has to be abandoned, making way for collective excitations, such as spinons and holons, where the spins and charges of electrons become separated. Although such excitations have yet to be confirmed definitively, the band structure seen in angle-resoled photoemission exhibits a variety of unusual features, such as a fractional electron count and a doublet of nearly half-filled bands. Chains of tunable spins can be created with rare earths. The dimensionality can be controlled by adjusting the step spacing with intra- and inter-chain coupling ratios from 10:1 to >70:1. Thus, metal-induced chain structures on stepped silicon provide a versatile class of low-dimensional materials for approaching the one-dimensional limit and exploring the exotic electronic states predicted for one dimension. PACS 73.20.At; 71.10.Pm; 79.60.Jv; 81.07.Vb; 73.21.Hb     

Progressive changes in atomic structure and gap states on Si(0 0 1) by Bi adsorption

From ab initio studies employing the pseudopotential method and the density functional scheme, we report on progressive changes in geometry, electronic states, and atomic orbitals on Si(0 0 1) by adsorption of different amounts of Bi coverage. For the 1/4 ML coverage, uncovered Si dimers retain the characteristic asymmetric (tilted) geometry of the clean Si(0 0 1) surface and the Si dimers underneath the Bi dimer have become symmetric (untilted) and elongated. For this geometry, occupied as well as unoccupied surface states are found to lie in the silicon band gap, both sets originating mainly from the uncovered and tilted silicon dimers. For the 1/2 ML coverage, there are still both occupied and unoccupied surface states in the band gap. The highest occupied state originates from an elaborate mixture of the p_z orbital at the Si and Bi dimer atoms, and the lowest unoccupied state has a ppσ* antibonding character derived from the Bi dimer atoms. For 1 ML coverage, there are no surface states in the fundamental bulk band gap. The highest occupied and the lowest unoccupied states, lying close to band edges, show a linear combination of the p_z orbitals and ppσ* antibonding orbital characters, respectively, derived from the Bi dimer atoms.     

Ab initio calculations of surface structure and electronic properties caused by adsorption of Ca atoms on a Si(1 1 0) surface

The adsorption of Ca metals onto a Si(1 1 0) surface has been theoretically investigated by first-principle total-energy calculations. We employed a local density approximation of the density functional theory as well as a pseudopotential theory to study the atomic and electronic properties of the Ca/Si(1 1 0) structure. The (1×1) and (2×1) surface structures were considered for Ca coverages of 0.5 and 0.25 ML, respectively. It is found that the (1×1) phase is not expected to occur even for rich Ca regime. It was found that Ca adatoms are adsorbed on top of the surface and form a bridge with the uppermost Si atoms. The most stable structure of Ca/Si(1 1 0)-(2×1) surface produces a semiconducting surface band structure with a direct band gap that is slightly smaller than that of the clean surface. We have observed one filled and two empty surface states in the gap region. These empty surface states originated from the uppermost Si dangling bond states and the Ca 4s states. Furthermore, the Ca-Si bonds have an ionic nature with almost complete charge transfer from Ca to the surface Si atoms. The structural parameters of the ground state atomic configuration are detailed and compared with the available results of metal-adsorbed Si(1 1 0) surface, Ca/Si(0 0 1), and Ca/Si(1 1 1) structures.     

Electron transport through molecular wire: effect of isomery

We report the electronic transport property of molecular wires by an ab inito molecular orbital theory on the basis of the first-principle density functional theory (DFT) and the non-equilibrium Green's function (NEGF) formalism. The wires consist of three kinds of isomer molecules (pyrimidine, pyrazine and pyridazine, shown in the first figure) which are attached to the atomic scale gold electrodes. Our calculation reveal: (1) the relative position of the double nitrogen atoms in the molecular rings can significantly affect the transport behavior due to change in the electronic structure of the molecule and (2) the conductance of pyrazine exhibits an ohmic character on a large range.     

Ab-initio study of electronic properties of Si(C) honeycomb structures

In this work, the electronic structures of pure and concentrated graphene and Silicene have been studied by performing first-principles pseudo potential plane-wave calculations. The concentrated structures have been obtained by the substitution of Si(C) atoms in the graphene (silicene), respectively. Firstly, the calculations are performed for pure graphene and continued for its concentrations. The concentrated graphene is obtained by substitution of Si atoms (with: 12.5, 25, 37.5 and 50 mol percentage) at different positions in the unit cell of graphene. Similar to graphene, the same calculations are performed for pure silicene as well as for silicene after substitution of C atoms. We have modeled the lattice constant, the band structure and its directivity, while the position and mole fractions of the substituted atoms are changed in the unit cell of the studied compound. Our results showed that: the total energy, the density of States (DOS), the charge density (CD), the opening of the band gap and its directivity are strongly dependent both on the position and mole fraction of the substituted Si(C) atoms. As an interesting result, we found an indirect open band gap, as large as 2.53 eV for silicon doped graphene. Also, it was found that both the elemental concentration and unit cell geometry could offer remarkable advantages for band splitting and band gap opening in these graphene like structures, which have known as ideal structures with many promising potential applications in the electronic, optoelectronic and spintronic.     

双氮协同钴掺杂锐钛矿相二氧化钛电子结构的第一性原理研究

采用基于密度泛函理论的第一性原理计算了双氮原子协同钴原子共掺杂TiO2的几何结构和电子结构. 计算结果发现: 双氮原子掺杂引起的双空穴位与钴原子形成了较强的耦合作用, 并引起晶格结构发生明显变化. 共掺杂的协同效应引起TiO2禁带宽度变窄,在价带顶和导带底出现大量杂质能级, 从而引起吸收带边发生明显红移. 该掺杂方式对调制TiO2禁带宽度有明显的效果, 有望指导后续的实验合成.     

镍掺杂硅纳米线电子结构和光学性质的第一性原理研究

利用基于密度泛函理论的第一性原理计算,对镍掺杂硅纳米线的结构稳定性、电子与光学性质进行了研究.结果表明:Ni容易占据硅纳米线表面的替代位置.镍掺杂后的硅纳米线引入了杂质能级,杂质能级主要来源于Ni的3d电子的贡献.由于Ni的3d态和Si的3p态的耦合作用,使禁带宽度变窄.掺杂后的硅纳米线在低能区出现了一个较强的吸收峰,且吸收带出现宽化现象. 关键词： 硅纳米线 掺杂 电子结构 光学性质     

外来原子替代碳的氟化石墨烯的磁性和电子性质

采用基于自旋极化密度泛函理论的第一性原理计算,研究了在氟化石墨烯中少量C原子被M原子(M=B,N,Si,P)替代后原子片的磁性和电子性质.结果表明:不同原子掺杂后的氟化石墨烯的电子结构会发生很大的变化,并有很大的不同.掺杂B和P原子后,纳米原子片由半导体转变为金属,并且由非磁性转变为磁性;掺杂N原子后,材料则仍为半导体,但具有磁性;进一步讨论了掺杂原子浓度与磁性的关系.对于Si原子掺杂的氟化石墨烯原子片,其半导体性质不变,但禁带宽度也会发生改变.     

Electronic and atomic structures of the isomers of endohedral and exohedral fullerene complexes with two lithium atoms

The electronic structures of all the possible isomers of endohedral and exohedral C₆₀ fullerene complexes with two lithium atoms are theoretically investigated. It is found that the electronic structures of these compounds are characterized by an impurity filled-level state determining the band gap. The location of the impurity state and, correspondingly, the band gap of the exohedral fullerene complexes depend on the coordination mode and the distance between the alkali metal ions. A similar dependence is observed for the total energy of the exohedral fullerene complex under investigation.     

Role of defects on the electronic and magnetic properties of CrAs, CrSe and CrSb zinc-blende compounds

We present an extended study of single impurity atoms and atomic swaps in half-metallic CrAs, CrSb and CrSe zinc-blende compounds. Although the perfect alloys present a rather large gap in the minority-spin band, all defects under study, with the exception of void impurities at Cr and sp sites and Cr impurities at sp sites (as long as no swap occurs), induce new states within the gap. The Fermi level can be pinned within these new minority states depending on the lattice constant used for the calculations and the electronegativity of the sp atoms. Although these impurity states are localized in space around the impurity atoms and very fast we regain the bulk behavior, their interaction can lead to wide bands within the gap and thus loss of the half-metallic character.     

Ni-C共掺杂AgSnO2触头材料电性能第一性原理计算

采用基于密度泛函理论的第一性原理分析方法的CASTEP软件,计算了Ni、C单掺杂和共掺杂SnO₂的晶格参数、能带结构、电子态密度和布局,结果表明:单掺杂和共掺杂均使得晶胞体积略微增大,禁带减小,且仍属于直接带隙半导体,在价带顶和导带底产生杂质能级,其中Ni-C共掺杂时禁带最小,杂质能级最多,电子跃迁需要的能量更小,导电性也就最好.共掺杂时费米能级附近的峰值有所减小,局域性降低,原子间的成键结合力更强,使得SnO₂材料也更加稳定.     

Al-doped ZnO: Electronic, electrical and structural properties

Changes in structural, electrical and electronic properties of zinc oxide (ZnO) due to Al doping are studied using a quantum-chemical approach based on the Hartree-Fock theory. A periodic supercell of 128 atoms has been exploited throughout the study. The atomic parameters for Zn atom were obtained by reproducing the main properties of ZnO crystal as well as the first three ionization potentials of Zn atom. The perturbation imposed by Al atom incorporation leads to the atomic relaxation, which is computed and discussed in detail. A novel effect of electron density redistribution between different atomic orbitals within the same atom has been found. This phenomenon influences atomic rearrangement near Al impurity. The Al doping generates a free electron in the conduction band, which can be considered as a large radius electron polaron increasing the n-type electrical conductivity in the crystal in agreement with the known experimental data. The obtained small increase in the band-gap width due to the impurity incorporation resolves existing experimental debates on this point.     

关于Xα-SW自洽计算中原子半径的确定

本文利用SCF-X_α-SW原子集团(Cluster)方法研宄了半导体硅中杂质的电子结构。研究表明,硅中杂质电子态与Cluster中原子球半径的选取密切相关。本文提出两条原则来确定原子球的半径:1)调节Cluster中基质原子球的半径大小应以晶体能带结构的特点为标准,2)Cluster总能量极小原理可以精确决定杂质原子球的半径。对硅中浅杂质锑和深杂质钯的电子结构计算表明上述原则是正确的。     

Si中掺Er的原子构型与电子特性

采用定域密度泛函-离散变分方法(LDF-DVM)计算了Si中掺Er的原子构型与电子特性，并计算了O共掺杂对Si中掺Er体系的原子构型与电子特性的影响.结果表明，在没有O共掺杂时，Er处于四面体间隙位置时能量最低，此时Er的5d轨道在Si的导带中引入浅的共振态.处于替代位置的Er形成能略高，Er的5d轨道在Si的导带顶附近引入了受主态.当有O存在时，体系的形成能降低，能量最低的构型是Er处于六角形间隙位置，周围有6个O，此时Er的5d轨道在Si的导带下约为0.3eV处引入杂质态.从而解释了Si中掺Er体系在 关键词：