Experimental determination of the rates of the excited muonic hydrogen charge exchange on helium

The data of the experiment with the H₂+⁴He mixture are analyzed in order to estimate muon transfer rates from the excited states of p atoms to helium. Experimental data turned out to be insensible to the transfer rates from the metastable 2s state. The rates forn=3, 4, 5 were found to be: ⁽³⁾=(2±7)×10¹⁰ s^–1, ⁽⁴⁾=(16±13)×10¹¹ s^–1, ⁽⁵⁾=(75±60) ×10¹¹ s^–1, respectively.     

Behavior of copper in gallium arsenide with high tin concentration

Investigations were made of the electrical properties, the cathodolumiescence and photoconductivity spectra, and the temperature dependence of the majority carrier lifetime in gallium arsenide with a high concentration of tin (n=2·10¹⁸ cm^–3, 1.5·10¹⁷ cm^–3) that was doped with copper under different diffusion regimes. Measurements of the Hall effect revealed centers with an ionization energy 0.175 ± 0.005 eV, their concentration depending on the rate of cooling of the samples. The cathodoluminescence and Hall effect data suggest that the cathodoluminescence band observed at 1.35 eV in GaAsSnCu is associated with radiative transitions of electrons to centers with _a =E_v + 0.175 eV. The hole lifetime in GaAsSnCu has a complicated temperature dependence which can be explained qualitatively by the presence of two types of capture center.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 58–63, September, 1980.     

Behavior of copper in gallium arsenide with a high concentration of tellurium

The photoelectric properties of gallium arsenide with a high concentration of tellurium (n=2· 10¹⁸ cm^–3) alloyed with copper are investigated for different conditions of diffusion. From the photoconductivity spectrum, the position of the impurity centers with an ionization energy of (E_v+0.6) eV is determined, the concentration of which depends on the vapor pressure of arsenic. The lifetime of the holes in the material studied is determined. Its magnitude and temperature dependence is explained by the presence of certain recombination channels.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 11–15, September, 1979.     

Recombination of nonequilibrium current carriers in n-InAs1−x−ySbxPy

The stationary photoconductivity, the photomagnetic effect, and the relaxation kinetics of photoconductivity in n-InAs_1–x–ySb_xP_y crystals (x=0.06, y=0.11) with n₀ = 8·10¹⁵ and 3·10¹⁶ cm^–3 were measured and the lifetimes of nonequilibrium current carriers in the temperature interval T=78–295 K were determined. The possible mechanisms of recombination, which limit the lifetimes (radiative _R, Auger recombination _A, and recombination through centers with E_f=0.13 eV), which, as is demonstrated, are determined by interband recombination processes with _RA = _RA/(_R + _A), are calculated theoretically. The contribution of the 0.13 eV recombination centers can be significant when n₀10¹⁴ cm^–3.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 4, pp. 52–54, April, 1991.     

Diffusion of Al in ion-implanted Pd and Pt

The diffusion coefficients of aluminium have been measured in polycrystalline fcc Pd and Pt. The Al-implanted palladium and platinum samples were annealed at 400°–800 °C and 450°–900 °C, respectively. The aluminium profiles were probed using the nuclear resonance broadening (NRB) technique. Values of (1.41±0.09) and (1.38±0.09) eV for the activation energy and (1.5 _–1.0 ⁺⁵ )×10^–6 and (4 _–3 ⁺¹⁰ )×10^–7cm²/s for the frequency factor were obtained for Al in Pd and Pt, respectively. These anomalous results, compared to the normal impurity diffusion, were checked using also Al-evaporated samples.     

Saturation of ionization edge absorption by donors in germanium

A study of saturation of the absorption and photoconductivity of Sb and P donors in Ge for radiation of 90 m wavelength, i.e., of energy very closely above their ionization edges is presented at T=9.3 K. Under these conditions negligible heating by the excess radiation energy is expected, which provides a convenient opportunity to study the kinetics of photoionization and recombination. From these measurements we have determined the donor capture cross section of electrons at 9.3 K to be _c=(1.2±0.7)×10^–12cm^–2, and the relaxation time from the 2s to the ground state as ₂₁=(5.8±1.0)×10^–10s. The saturation intensity of the absorption coefficient is around three orders of magnitude higher than the saturation intensity of the photoconductivity. We explain the nonlinear photoconductivity by the Debye-Conwell dependence of the mobility on the number of photoionized donors and compensating acceptors.     

Influence of the overall pressure on electrical conductivity of the amorphous semiconductor Ge15Te81S2As2

The experimental results obtained with the chalcogenide glass Ge₁₅Te₈₁S₂As₂ with imposed overall pressure up to 700 MPa are presented. The material exhibits the switching effect and the memory effect. It is shown that the overall pressure changes remarkably d.c. electrical conductivity of the amorphous semiconductor. It is assumed that the changes in conductivity are caused by changes in activation energy. The changes in activation energy within the range of considered pressures are, as follows from our measurements, E/p–10·95×10^–5 eV/MPa +p × 10·41 W 10^–7 eV/MPa². The assumption of the activation energy dependence on pressurep are confirmed also by measurements of dependence In vs. 1/T at various pressures.     

The role of the emitter on the diffusion current inn + p-junctions

On three different samples of crystallinep-siliconn ⁺ p-junctions have been prepared by coating the surface with a phosphorous glass and a subsequent diffusion at 915°C for 30 min. From the measurement of the short circuit current density and the open circuit voltage under high illumination conditions the diffusion current of the solar cells has been determined as a function of the temperature between 77K and 300 K. The contribution of the emitter and the base region to the diffusion current was examined. Under the assumption of Auger recombination governing the hole lifetime in the emitter the narrowing of the mobility bandgap due to the high density of states within the bandgap of the emitter was determined. A shrinkage as high as 0.18 eV was observed in the case of a 0.2 cm sample of lower purity. For high purity 6 cm silicon the reduction of the mobility bandgap was determined as 0.10 eV. A polycrystalline sample exhibits a shrinkage of 0.15 eV. The reduction of the mobility bandgap was found to determine the lower limit of the current losses due to carrier diffusion in our solar cells at current densities around 1×10^–7 Am^–2.     

Some photoelectric and electrical properties of copper-doped gallium arsenide

A study has been made of the conditions for the formation of impurity centers having an ionization energy E _v + 0.1 eV in copper-doped gallium arsenide. Photoconductivity is demonstrated at 10.6 . The results of the photoconductivity study are used to calculate the absorption coefficient and cross section for photon capture by these impurity centers.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 40–44, September, 1970.The authors thank V. N. Detinko, A. S. Petrov, and A. P. Vyatkin for constant interest in this study.     

Shallow acceptor population and free hole concentration in Si: In and Si:Ga with IR-photoexcitation

Hall measurements at low temperaturesT<50 K have been performed on Si:In (N _In10¹⁷ cm^–3) and Si:Ga (N _Ga10¹⁸ cm^–3) with infrared photoexcitation of holes into the valence band. It is shown in quantitative agreement with a theoretical model that the population of shallow acceptors, e.g. B and Al, which are present as impurities in concentrations ofN _B,Al10¹²-10¹⁴ cm^–3 strongly affects the photoexcited hole concentration. Photo-Hall measurements can, therefore, serve as a tool for the determination of low impurity acceptor concentrations in the case of high In- or Ga-doping. Hole capture coefficientsB _In=6×10^–4 (T/K)^–1,8 cm³ s^–1 andB _Ga=2×10^–4 (T/K)^–1 cm³ s^–1 have been determined.     

Volume and grain boundary diffusion of implanted 113Sn in aluminium

Volume and grain boundary diffusion of ¹¹³Sn in aluminium was investigated with the radiotracer method. The implantation technique was used for tracer deposition to avoid problems of tracer hold-up caused by the oxide layer always present on aluminium. The diffusion penetration was chosen large enough to permit serial sectioning of samples with the aid of a microtome.The temperature dependence of the volume diffusivity was determined as D(T)=4.54×10^–5×exp[–(114.5±1.2)kJmol^–1/RT] m ² s ^–1. This confirms previous measurements from our group which already showed that Sn is the fastest foreign metal diffusor so far investigated in aluminium.Grain boundary diffusion of ¹¹³Sn in Al polycrystals was measured in the type-B kinetic regime. The grain boundary diffusion product P=sD _gb (s=segregation factor, =grain boundary width, D _gb=grain boundary diffusivity) was found to be strongly affected by the impurity content of aluminium. For Al polycrystals of 99.9992% nominal purity we obtained P _5N(T)=1.08×10^–8exp [–(96.9±7.5) kJ mol^–1/RT] m³ s^–1 and for less pure Al polycrystals of 99.99% nominal purity P _4N(T)=3.0×10^–10 exp [–(90.1±4.2) kJ mol^–1/RT] m³ s^–1 was determined. The grain boundary diffusion product in the purer material is more than one order of magnitude higher than in the less pure material. Very likely this is an effect of co-segregation of non-diffusant impurities into the grain boundaries.     

The behavior of copper impurity in CdSnAs2

Single crystals of n-type CdSnAs₂ with a carrier concentration of 2 ·10¹⁷–4 ·10¹⁸ cm^–3 and mobility (3 to 6) · 10³ cm²/V ·sec were copper doped by diffusion saturation at temperatures from 400 to 570C. As a result of the study of the electrical properties of the doped crystals it was established that the copper in CdSnAs₂ is a fast-diffusing acceptor impurity. The solubility of Cu depends primarily on the donor-center concentration and has clearly a retrograde character. Low-temperature heat treatment (over the 200–400C range) of the Cu-doped specimens results in an increase in the acceptor concentration. The form of the log R(10³/T) curve indicates the existence of acceptor centers with an ionization energy of 0.05 eV in the Cu-doped CdSnAs₂ specimens.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, Vol. 16, No. 7, pp. 39–44, July, 1973.     

Short-term electrical relaxation in alkaline halide crystals

The temperature dependence of total conductivity in KCl and NaCl monocrystals with calcium impurity in the audio frequency range is studied, It is established that in the temperature range 50–350°C only one of the observed relaxation processes is described by the dipole relaxation mechanism with characteristic time = ₀exp (E/T); the values ₀ = 10^–14sec, E = 0.65eV, and ₀ = 10^–14sec, E = 0.7eV are obtained for KCl and NaCl respectively. Relaxations with values of ₀ and E differing from those above which were observed in the given temperature and frequency range are produced by resistance of the near electrode region.Translated from Izvestiya VUZ. Fizika, No. 6, pp. 101–106, June, 1973.     

Multi-exponential analysis of DLTS

Deep-level transient spectroscopy (DLTS), which is widely used to characterize deep impurity centers in semiconductors, assumes a single exponential wave form for the transient junction capacitance. When there are several closely spaced energy levels this assumption is no more valid, and the conventional DLTS may lead to errorneous results. To overcome this difficulty we propose here a novel method which we call the multi-exponential DLTS(MEDLTS). The transient wave form of the junction capacitance is directly analysed into multi-exponential compouents using the nonlinear least-squares analysis program DISCRETE developed by Provencher. The resolved time constants of these components are then displayed in the form of aT ²–1/T plot. According to the results of simulation with various parameters MEDLTS is shown quite effective to resolve closely spaced energy levels which can not be resolved by the conventional DLTS. As an example of the application of this method deep levels in Si: Au were investigated. The results have shown that a single peak in conventional DLTS actually consists of two adjacent levels with activation energies and capture cross-sectionsE _B1=0.49 eV, _B1=1.1×10^–14cm² andE _B2=0.46 eV, _B2=1.3×10^–15 cm² and with amplitude ratio 11.     

Annealing of radiation-induced defects in ion-implanted AIIBVI single crystals

The basic characteristics of annealing of implanted layers of A^II-B^VI compounds are studied. The equilibrium, quasiequilibrium, and nonequilibrium methods of annealing were employed. Equilibrium annealing was conducted in the saturated vapor of the metalloid at temperatures below the critical temperature, above which intense self-compensation processes start (T_cr 450–500°C for ZnS and ZnSe). If T_ann must be higher than T_cr owing to radiation-induced damage that is difficult to anneal, than the method of annealing under an active protective film was employed. For ZnSe and ZnS with an implanted acceptor impurity the protective film consisted of gold or silver sputtered on the crystal prior to annealing. Thus implantation of ions enabled obtaining layers of p-type ZnS with resistivities of 10²–10³ ·cm. The ZnSe layers with hole conductivity were also obtained with electron annealing under a protective gold film with weak-current beams with durations of several seconds. Quasiequilibrium annealing was conducted in the activated vapor of the metalloid. The vapor was activated by a high-frequency discharge in the vapor of the metalloid. This method of annealing gave sharp p-n junctions on implanted ZnSe. Pulsed electron beams were employed for nonequilibrium annealing.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 3, pp. 51–56, March, 1989.     

Influence of annealing on the conductivity and photoconductivity of p-type CdTe

On annealing p-type CdTe, considerable change in conductivity takes place. Samples of high resistivity were used for the measurements. Each of a set of samples was annealed at different temperature. After annealing, the temperature dependence of the conductivity and the relaxation curves of the photoconductivity were measured. Analysis of the first set of curves yielded value of energyE _a corresponding to the level occurring in given samples. It was established that this acceptor level is due to V^cd, or V^cd complexes, and is situated at 0.3 eV above the valence band edge. Concentration of these levels is increased by annealing. Furthermore, an energy value ofH=0.79 eV was found, corresponding very probably to the formation energy of a vacancy V^cd.Analysis of the relaxation curves yielded the temperature dependence of _S , _T and the energy distanceE _M of the impurity level that is responsible for photoconductivity. A value of (E _g -E _M )=0.09–0.12 eV was found for all samples studied. This level therefore lies below the conduction band edge and its concentration amounts to 10¹⁴–10¹⁵ cm^–3. The level is probably due to foreign impurities.Two sets of samples were used: both as-grown and Sb-doped. The results for both sets were not much different from each other.Ke Karlovu 3, Praha 2, Czechoslovakia.     

Infrared absorption of silane,ammonia, acetylene and diborane in the range of the CO2 laser emission lines: Measurements and modelling

Absorption spectra of the gases SiH₄, NH₃, C₂H₂ and of SiH₄/Ar and SiH₄/B₂H₆ mixtures have been measured in the spectral range of the CO₂ laser from 9.2 to 10.8 µm. In agreement with literature, silane shows the highest absorption (absorption coefficient = 3.3 × 10^–2 Pa^–1 m^–1). The deviation of the measured absorption behaviour of silane from literature, as far as the pressure dependence is concerned, can be explained by the enhanced spectral energy density in our experiment. This is confirmed by a rate-equation model involving the basic mechanisms of V-V and V-T energy transfer between vibrationally excited silane molecules. In contrast to silane, the absorption coefficient of NH₃ at the 10P(20) laser line is 4.5 × 10^–4 Pa^–1 m^–1 atp = 20 kPa and has its maximum of 4.5 × 10^–3 Pa^–1 m^–1 at the 10R(6) laser line. For C₂H₂ and B₂H₆, is even less ( 2.1 Ò 10^–5 Pa^–1 m^–1 for C₂H₂).     

Investigation of intrinsic defect-related deep centers in ZnSe

We have studied deep centers in highly resistive ( 10¹² ·cm) ZnSe, containing intrinsic impurities and defects, by means of nonequilibrium photoconductivity, photoluminescence, and wavelength-modulated transmission spectroscopy. We have determined the energy positions of photosensitive deep acceptors with ionization energies of 0.10, 0.18, 0.23, 0.27, 0.34, and 0.47 eV, as well as of radiative and nonradiative recombination centers.ted from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 3, pp. 42–46, March, 1989.The authors consider it a pleasant duty to thank M. K. Sheinkman for his interest in This work and S. S. Ostapenko for his help in PL measurements and helpful discussions.     

Low-Temperature Midinfrared Absorption in GaSe

We report the measurement of the temperature dependence of the absorption spectra of - GaSe over the temperature range 300 K to 5 K. Measurements have been made for both the e-ray (polarized parallel to the crystals c-axis) and the o-ray (polarized perpendicular to the c-axis), over the spectral range 4000 to 10 cm^–1. Nine absorption lines at 417, 440, 499, 546, 891, 945, 1015, 1093, 1270 cm^–1 were recorded at 300 K for the e- ray spectra. Some of these lines were identified using the results of a modified single layer, linear chain model of GaSe. The lines at 417, 440 and 499 cm^–1 were assigned to local impurity absorption originating from N, Mg and O, respectively. The weak lines at 945, 1015 and 1093 cm^–1 were assigned to hole transitions from the acceptor levels to the top of the valence band. Two absorption lines at 891 cm^–1 and 1270 cm^–1 were assigned to hole transitions from the quasi-local acceptor levels to the double degenerate valence sub-bands ₅ or ₆. The origin of lines recorded in the far IR absorption spectra at 20, 37 cm^–1 and 362 cm^–1 were also identified.     

Photothermal ionization spectroscopy for shallow impurities in ultra-pure silicon

We report the comprehensive results obtained in our group and last few years for the shallow impurities in ultrapure silicon by use of photothermal ionization spectroscopy. The new results reported here include the discovery and investigation of new shallow impurity centers in Si, the detection for the compensation of different types of impurities, the accurate determination for the spin-orbit splitting . of valence band for Si, and the phonon duplicates and Fano resonance for the transitions of shallow impurities in Si. In addition it is also shown experimentally that the sensitivity of the photothermal ionization spectroscopy as used for detecting the concentration of shallow donors in Si can reach as high as 10⁸ cm^–3, much higher than that reported in the literatures up to date, and line width for the sharpest spectral lines in the spectrum is about 0.08 cm^–1, that is, 10 eV.