高能氩离子辐照硅产生的缺陷研究

在室温下750MeV氩离子对本征单晶硅进行辐照,通过用正电子湮没寿命测量技术、电子顺磁共振技术以及红外光吸收方法研究了辐照产生的缺陷.结果表明:电中性双空位是辐照产生的主要空位团;在4.3×10¹⁴ions/cm²的高剂量下未见样品发生非晶化转变;虽然在离子射程末端双空位的浓度随剂量的增加而显著增大,但在以电离激发过程为主要能损方式的区域里双空位的浓度基本不变.据此可以认为,电子能损过程对辐照产生的缺陷有退人作用.     

快重离子辐照聚酰亚胺潜径迹的电子能损效应

快重离子辐照聚合物材料时，由于密集电离激发在其路径上产生几纳米直径的潜径迹，径迹形貌受离子种类、离子能量等多种因素的影响.为了研究电子能损对径迹形成所起的作用，利用1.158GeV 的Fe⁵⁶离子和 1.755GeV Xe¹³⁶离子在室温真空环境下辐照叠层聚酰亚胺(PI)薄膜，结合傅里叶转换红外光谱(FTIR)分析技术对辐照引起的化学变化进行了测量.聚酰亚胺官能团的降解及炔基的生成是离子辐照聚合物的主要特征，在注量1×10¹¹到6×10¹²/cm²范围及较宽的电子能损(dE/dX)_e范围 (Fe⁵⁶ 离子：2.2 到 5.2 keV/nm， Xe¹³⁶ 离子：8.6 到 11.3 keV/nm)对官能团的断键率及炔基生成率进行了研究. 红外结果显示在实验涉及的能损范围都有炔基生成，应用径迹饱和模型对实验结果进行拟合，不同能损下的平均损伤径迹半径及炔基生成径迹半径被得到，通过热峰模型对实验结果拟合，给出了离子在聚酰亚胺中产生潜径迹的能损阈值，实验给出的径迹形貌的电子能损效应曲线与热峰模型预言走势基本一致. 关键词： 离子辐照 潜径迹 红外光谱 热峰模型     

keV质子辐照Kapton/Al的能量传输过程

采用TRIM和SRIM2003软件模拟计算了10—300keV能量区间质子辐照Kapton/Al的能量传输过程. 依据模拟结果选取了辐照能量参数, 在室温真空条件下, 采用空间综合辐照设备对Kapton/Al进行了质子辐照. 借助于表面红外光谱技术, 对Kapton的重要官能团特征峰做了定量分析, 通过特征峰处吸光度的变化得到了典型分子键的损伤截面. 平均损伤截面和电子能损的强烈依赖关系及TRIM计算结果一致说明keV质子辐照Kapton/Al的辐照损伤主要来自电子能损效应. 太阳吸收比的变化趋势和模拟结果都表明在入射能量80keV附近, 质子辐照Kapton/Al的辐照效应最大.     

低能离子在C60薄膜中引起的辐照效应

用Raman(拉曼)散射技术分析了120keV的H,Ar和Fe离子在C₆₀薄膜中引起的辐照效应,主要指由晶态向非晶态的转变.分析结果表明,在Fe和Ar离子辐照的C₆₀薄膜中,核碰撞主导了由晶态向非晶态的转变过程.而在H离子辐照的情况下,电子能损起主导作用,并发现在H离子辐照过程中,电子能损有明显的退火效应,致使由晶态向非晶态转变的过程中,经历了一个石墨化的中间过程.     

645 MeV Xe35+离子辐照SiO2在线光发射的研究

离子辐照可以改变二氧化硅(SiO₂)的晶体结构和光学性质.采用645 MeV Xe³⁵⁺离子辐照SiO₂单晶,在辐照过程中,利用光栅光谱仪测量在200—800 nm范围内的光发射.在发射光谱中,观测到中心位于461和631 nm的发射带.这些发射带是弗伦克尔激子辐射退激产生的,其强度与辐照离子能量和辐照离子剂量密切相关.实验结果表明:发射光强随离子在固体中的电子能损呈指数增加.由于离子辐照对晶体造成损伤,发射光谱强度随辐照剂量的增加而降低.文中讨论了这些与晶体结构有关的发射带,结合能量损失机制讨论了激子形成和退激过程.快重离子辐照过程中发射光谱的原位测量对研究辐照改性具有重要意义,有助于揭示离子辐照引起晶体损伤的物理机制.     

近玻尔速度Ne2+离子穿过碳膜引起的电子发射

本文测量了入射能为2–25 keV/u的Ne²⁺离子穿过不同厚度碳膜诱导的前向、后向 (分别对应出射表面和入射表面) 电子发射产额. 实验中通过改变炮弹离子的能量, 系统的研究了势能沉积、电子能损以及反冲原子对前向、后向电子发射产额的贡献. 结果表明, 离子的势能沉积只对后向电子发射有贡献, 前向、后向电子发射产额分别与Ne²⁺离子在薄膜出射、入射表面的电子能损近似成正比关系, 其中电子能损很低 (对应于离子能量很低) 的时候, 反冲原子对电子发射的贡献不能忽略. 关键词： 近玻尔速度 电子发射 电子能损 反冲原子     

重离子辐照SiO2通过能量损失产生发光色心的研究

通过红外光谱和荧光发射光谱分别对600 keV、4 MeV和5 MeV Kr离子辐照的SiO2进行发光特性的研究。在低能量辐照体系中,简单色心(F2色心)的形成在损伤过程中占据主导地位,其主要诱发蓝光发射带;在高能离子辐照条件下,离子径迹上的能量密度较大,因此缺陷浓度的增大产生了一些缺陷团簇和离子径迹,形成了复杂的色心(F2+和F3+色心等)并诱发了强烈的绿光发射带和红光发射带。该实验结果与能量损失过程中统一热峰理论模型(一个综合的基于电子能损与核能损的非弹性碰撞模型和弹性碰撞模型)的模拟结果能够很好地吻合,表明在keV～MeV能区上存在电子能损过程与核能损过程的协同效应。     

高能Ar离子辐照PET引起的光吸收变化研究

采用紫外–可见光吸收技术分析和研究了35MeV/uAr离子辐照聚酯膜引起的光吸收改性.结果表明,Ar离子轰击聚酯膜时引起了碳键的共轭体系形成,从而导致了紫外–可见光区域中光吸收明显增加,光吸收增加的幅度依赖于离子的照射剂量、离子在样品中的平均电子能量损失以及光的波长,剂量越高,电子能损越大,光吸收增幅越大;而光的波长越长,光吸收的增加则越不明显.利用测量到的光吸收曲线,同时还定量地研究了各种辐照条件下聚酯膜的光能隙和碳原子团的尺寸.     

22 MeV/u的Fe离子在PET 膜中引起的辐照效应研究

用能量为22 MeV/u的 Fe离子在室温和真空条件下辐照了多层堆叠的半晶质聚酯膜, 采用傅里叶转换红外吸收光谱、 紫外/可见吸收光谱 和X射线衍射技术分析测量了辐照后聚酯膜的微观结构所发生的变化, 详细研究了分子结构的变化和非晶化转变与离子剂量、 离子在样品中的平均电子能损以及吸收剂量的依赖关系． 分析结果表明: 辐照导致化学键的断裂、 新化学键的形成和非晶化转变． 非晶化效应和化学键的断裂随离子剂量和电子能损的增加而增大, 但变化的总量仅依赖于总的吸收剂量, 表明在所涉及的能损范围里, 辐照产生的变化与辐照离子的种类和能量没有直接的关系, 而只决定于材料对辐照离子能量的吸收程度． Semicrystalline polyethylene terephthalate (PET) film stacks were irradiated with 22 MeV/u Fe ions at room temperature under vacuum. Ion beam induced microscopic structural modifications and amorphous transformation were investigated by means of Fourier transform infrared spectrosocopy (FTIR), ultraviolet visible absorption spectrosocopy (UV/Vis) and X ray diffractometer (XRD). It was found that irradiation induces bond breaking, formation of new free radiculs and amorphous transformation. These effects were found to depend on ion fluence , the electronic energy loss and aborbed dose. The creation of alkyne groups was found only at the aborbed dose higher than 5.0 MGy.     

快重离子辐照对非晶态SiO2薄膜光致发光谱的影响

用湿氧化法在单晶硅表面生长了非晶态SiO2薄膜,再用高能Pb和Xe离子对薄膜进行辐照,最后用荧光光谱分析了辐照参数(剂量、电子能损值)与发光特性改变的相关性.研究发现,快重离子辐照能显著影响薄膜的发光特性,进一步分析显示,辐照导致了SiO2薄膜内O-Si-O缺陷、缺氧缺陷和非桥式氧空位缺陷的产生,且缺氧缺陷和非桥式氧空...     

Electronic Energy Loss Effects in Polystyrene Irradiated with High Energy Argon Ions

Stacked polystyrene films of about 53μm in thickness were irradiated with 1.4GeV argon ions at room temperature and in vacuum. The radiation induced Chemical changes of each film were studied by the Fourier-transform infrared (FT-IR) and ultraviolet/visible (UV/VIS) spectroscopies. It is found that the material is seriously degraded after irradiation and the chemical modifications depend strongly on electronic energy loss. Significant degradation of the material occurs above about 0.77keV/nm at the dose of 5.5×10¹² ions/cm² corresponding to an energy deposition of 6. 4MGy. The main chains of PS as well as the phenyl ring are destroyed in the track core simultaneously. Damage cross sections Of alert 29urn2 are found for phenyl ring and the -CH2- group. Aldynes are produced above an energy loss of 0.77keV/nm .     

Energy loss of charged particles in matter

A new method of determining the differential energy loss of charged excited nuclei in matter is described. The method is based on the velocity dependence of the Doppler shift of the gamma quanta emitted by moving nuclei. No theoretical assumptions concerning the velocity dependence of atomic or nuclear collisions are necessary. The method and mathematical analysis, described in detail, are applied to the energy loss of Li ions emitting gamma quanta of 477 keV in the kinetic energy range between 100 and 800 keV. It is found that the energy loss of Li ions is linearly proportional to the velocity within 2% for several substances ofZ=1 to 74. The small limits of error, which can be obtained, allow an application of this method to questions as e.g. theZ-dependence of the stopping power on the nuclear charge of the stopping material, chemical binding effects, the time dependence of the adjustment of the equilibrium charge of the projectile after nuclear reactions, or the determination of nuclear angular correlations.     

Energy and charge distributions of fast hydrogen ions and atoms reflected from Cu in the case of grazing incidence

The energy and charge distributions of protons and hydrogen atoms reflected from the Cu surface in the case of grazing incidence angles are measured at energies of incident particles (H⁺ and H⁰) of 200 and 250 keV. The charged fractions of reflected particles are analyzed. A weak dependence of the neutral fraction of reflected particles on the scattering angle is discovered for incidence angles of 1°–2° and an energy of scattered particles of 60 keV or less. It is shown that the neutral fraction of reflected particles with an energy of 60–80 keV or more is independent of the scattering angle and is determined by the ratio of the cross sections for the electron capture and loss by ions in the material.     

团簇离子在固体中能损的非线性效应

研究了每核子能量为 2 6 0— 4 5 0keV的H₊2,H₊3,H₊4 H₊5和H₊7团簇离子在金膜中的能损 .发现团簇离子中平均每个质子的能损大于相同速度的单质子能损 ,即能损比大于 1,且随团簇离子的大小和速度的增加而增加. The energy losses of cluster ions H₊2,H₊3,H₊4 H₊5 and H₊7with energy of 260-450 keV/p in solid films have been measured. It has been found that the energy loss per proton in clusters is larger than that of single proton with the same velocity as clusters, that is, the energy ratio is larger than 1. Energy ratio increases with increasing the cluster size and velocity.     

六方相LaOF纳米体系中Sm3+/Eu3+的能量转移效应

为了探讨Sm3+/Eu3+共掺体系的荧光光谱特性和能量转移机理,采用水热-烧结法制备了Sm3+/Eu3+共掺LaOF纳米晶体颗粒,并用X射线衍射和透射电子显微镜对纳米晶体颗粒进行了表征.结果显示,所制备的纳米晶体颗粒呈六方相,均匀性和分散性良好,平均粒径为70 nm左右.通过442 nm连续光激发,在六方相LaOF:Sm3+/Eu3+纳米体系中实现了Sm3+离子向Eu3+离子的能量转移,观测到了因能量转移效应而产生的Eu3+离子5D0能级的荧光发射谱线.光谱学研究发现,能量转移源于Sm3+离子4G5/2能级向Eu3+离子5D0能级的弛豫过程,并且随着受主离子Eu3+浓度的增加,能量转移效率也随之提高.     

GeV能量的Fe离子在C60薄膜中的辐照效应研究

利用傅立叶转换红外光谱和Raman谱仪分析了0.98 GeV的Fe离子在电子能损Se为3.5 keV/nm时， 不同辐照剂量（5×1010 —8×1013 ions/cm2)下， 在C60薄膜中引起的辐照损伤效应。 分析表明， Fe离子辐照引起了C60分子的聚合与损伤。 在辐照剂量达到一中间值1×1012 ions/cm2， C60分子的损伤得到部分恢复， 归因于电子激发引起的退火效应。 通过对Raman数据的拟合分析， 演绎出Fe离子辐照在C60材料中形成的潜径迹截面或引起损伤的截面约为1.32×10-14 cm2。     

基于合作能量传递的Sm~(2+)离子上转换发光

报道了Sm~(2+)离子的上转换发光。在实验上证明了变价镧系离子同样可以作为上转换材料的发光中心。在近红外光的激发下,复合Ba FCl_(0.5)Br_(0.5)∶1%Sm~(2+)-Ca F_2∶1%Yb~(3+)化合物发出红色上转换发光。上转换发射光谱中位于631,644,665,689,704,729 nm的特征发射分别来自于样品中Sm~(2+)的~5D_i(i=0,1)→~7F_j(j=0,1,2)特征跃迁。根据动力学分析及光子数拟合的结果,我们将二价Sm离子的上转换过程归因于合作能量传递,即:两个同时被激发的Yb~(3+)离子合作将能量传递给一个Sm~(2+)离子。     

Ion implantation induced by Cu ablation at high laser fluence

High energy laser plasma-produced Cu ions have been implanted in silicon substrates placed at different distances and angles with respect to the normal to the surface of the ablated target. The implanted samples have been produced using the iodine high power Prague Asterix Laser System (PALS) using 438 nm wavelength irradiating in vacuum a Cu target. The high laser pulse energy (up to 230 J) and the short pulse duration (400 ps) produced a non-equilibrium plasma expanding mainly along the normal to the Cu target surface. Time-of-flight (TOF) technique was employed, through an electrostatic ion energy analyzer (IEA) placed along the target normal, in order to measure the ion energy, the ion charge state, the energy distribution and the charge state distribution. Ions had a Boltzmann energy distributions with an energy increasing with the charge state. At a laser fluence of the order of 6 × 10⁶ J/cm², the maximum ion energy was about 600 keV and the maximum charge state was about 27+.In order to investigate the implantation processes, Cu depth profiles have been performed with Rutherford backscattering spectrometry (RBS) of 1.5 MeV helium ions, Auger electron spectroscopy (AES) with 3 keV electron beam and 1 keV Ar sputtering ions in combination with scanning electron microscopy (SEM). Surface analysis results indicate that Cu ions are implanted within the first surface layers and that the ion penetration ranges are in agreement with the ion energy measured with IEA analysis.     

Application of spectroscopic ellipsometry to the investigation of the optical properties of cobalt-nanostructured silica thin layers

Spectroscopic ellipsometry is used to investigate optical properties of cobalt-implanted silica thin films. The films under investigation are 250 nm thick thermal SiO₂ layers on Si substrates implanted with Co⁺ ions at energy of 160 keV and at fluences of 10¹⁷ ions/cm² for different temperatures of substrate during implantation (77 and 295 K). Changes due to Co⁺ implantation are clearly observed in the optical response of the films. Optical behaviours are furthermore different for the three implantation temperatures. To understand the optical responses of these layers, the ellipsometric experimental data are compared to different models including interference effects and metal inclusions effects into the dielectric layer. The simulated ellipsometric data are obtained by calculating the interferences of an inhomogeneous layer on a Si substrate. The material within this layer is considered as an effective medium which dielectric function is calculated using the Maxwell-Garnett effective medium approximation. We show that although the structures of these layers are very complicated because of ion-implantation mechanisms, quite simple models can provide relatively good agreement. The possibilities of ellipsometry for the study of the optical properties of such clusters-embedded films are discussed. We especially provide the evidence that ellipsometry can give interesting information about the optical properties of nanostructured layers. This is of special interest in the field of nanostructured layered systems where ellipsometry appears to be a suitable optical characterization technique.