Characteristic modification by inserted metal layer and interface graphene layer in ZnO-based resistive switching structures

ZnO-based resistive switching device Ag/ZnO/TiN, and its modified structure Ag/ZnO/Zn/ZnO/TiN and Ag/graphene/ZnO/TiN, were prepared. The effects of inserted Zn layers in ZnO matrix and an interface graphene layer on resistive switching characteristics were studied. It is found that metal ions, oxygen vacancies, and interface are involved in the RS process. A thin inserted Zn layer can increase the resistance of HRS and enhance the resistance ratio. A graphene interface layer between ZnO layer and top electrode can block the carrier transport and enhance the resistance ratio to several times. The results suggest feasible routes to tailor the resistive switching performance of ZnO-based structure.     

含有AlGaAs插入层的InAs/GaAs三色量子点红外探测器

本文报道了采用分子束外延技术制备的三色InAs/GaAs量子点红外探测器. 器件采用nin型结构, 吸收区结构是在InGaAs量子阱中生长含有AlGaAs插入层的InAs量子点, 器件在77 K下的红外光电流谱有三个峰值: 6.3, 10.2和11 μm. 文中分析了它们的跃迁机制, 并且分别进行了指认. 因为有源区采用了不对称结构, 所以器件在外加偏压正负方向不同时, 光电流谱峰值的强度存在一些差异. 不论在正偏压或者负偏压下, 当偏压达到较高值, 再进一步增大偏压时, 都出现了对应于连续态的跃迁峰强度明显下降的现象, 这是由量子点基态与阱外连续态的波函数交叠随着偏压进一步增大而迅速减小导致的.     

Enhanced performance of AlGaN-based ultraviolet light-emitting diodes with linearly graded AlGaN inserting layer in electron blocking layer

The conventional stationary Al content Al GaN electron blocking layer(EBL) in ultraviolet light-emitting diode(UV LED) is optimized by employing a linearly graded Al Ga N inserting layer which is 2.0 nm Al_(0.3) Ga_(0.7) N/5.0 nm Alx Ga_(1-x) N/8.0 nm Al_(0.3) Ga_(0.7) N with decreasing value of x. The results indicate that the internal quantum efficiency is significantly improved and the efficiency droop is mitigated by using the proposed structure. These improvements are attributed to the increase of the effective barrier height for electrons and the reduction of the effective barrier height for holes,which result in an increased hole injection efficiency and a decreased electron leakage into the p-type region. In addition,the linearly graded AlGaN inserting layer can generate more holes in EBL due to the polarization-induced hole doping and a tunneling effect probably occurs to enhance the hole transportation to the active regions, which will be beneficial to the radiative recombination.     

Electrical conduction and bipolar switching properties in transparent vanadium oxide resistive random access memory (RRAM) devices

In this study, the electrical conduction and bipolar switching properties in transparent vanadium oxide thin films are investigated and discussed. (110)-oriented vanadium oxide thin films were well deposited onto transparent ITO substrates for the possible development of applications in the structure of system-on-panel devices. For the as-deposited vanadium oxide thin films, they were prepared for 1 h by a rf magnetron sputtering method of rf power 130 W, chamber pressure 10 mTorr, substrate temperature 550 °C, and different oxygen concentrations. In addition, the Al/V₂O₅/ITO device presents reliable and bipolar switching behavior. The on/off ratio and switching cycling of two stable states are found and discussed. We suggest that the current–voltage characteristics are governed by ohmic contact and Poole?Frankel emission transport model mechanisms in low- and high-voltage regions, respectively.     

大功率高光斑均匀性半导体激光复合光源

 为了获得具有更高输出功率和良好光斑分布均匀性的半导体激光光源,根据半导体激光优良的偏振特性,利用偏振分光棱镜将2束大功率激光束合成为一束更大功率的光束,通过一个发射系统投射。在光束合成前采用非球面光学系统对每个激光器慢轴方向的光束进行扩束,使其与快轴方向光束发散角基本一致。实验证明,此种半导体激光复合光源具有良好的光斑均匀性,其输出功率是2个半导体激光器输出功率之和,完全满足激光制导等军用系统对激光功率和光斑均匀性的要求。     

Non-Volatile Threshold Adaptive Transistors with Embedded RRAM

We propose a novel nonvolatile threshold adaptive transistor （TAT） for neuromorphic circuits. The threshold adaptive transistor is achieved by embedding a resistive random-access memory （RRAM） material stack between the gate electrode and gate dielectric. During operation, the embedded RRAM device is kept at a high resistance state, which makes it act as a nonvolatile capacitor. The threshold could be nonlinearly adjusted by the voltage pulses applied on the gate of the transistor. We quantitatively estimate the range of the capacitance variation of the RRAM device. The threshold voltage of the TAT is simulated and shows expected variation. The simulated output of an inverter using a TAT shows a nonlinear adaptive behavior.     

Biodegradable and flexible l-carrageenan based RRAM with ultralow power consumption

Transient memories, which can physically disappear without leaving traceable remains over a period of normal operation, are attracting increasing attention for potential applications in the fields of data security and green electronics. Resistive random access memory(RRAM) is a promising candidate for next-generation memory. In this context, biocompatible l-carrageenan(l-car), extracted from natural seaweed, is introduced for the fabrication of RRAM devices(Ag/l-car/Pt).Taking advantage of the c...     

Fluorine deficient layer at the surface of transparent glass-ceramics with CaF2 nanocrystals

Optically transparent glass-ceramics with CaF₂ nanocrystals (diameter: ～30 nm) for 25CaF₂–5CaO–20Al₂O₃–50SiO₂ were fabricated using a conventional glass crystallization method in an electric furnace in air and the dispersion state of CaF₂ nanocrystals at the surface was examined from transmission electron microscope observations combined with focused ion beam sample preparations. It was demonstrated that a fluorine deficient layer of about 150–200 nm is formed during the heating at temperatures above the glass transition temperature in the surface region and thus CaF₂ nanocrystals are not present in the surface region. The reason for the formation of such fluorine deficient layers is due to the removal of some fluorine from the surface of bulk glass during heating. The present study gives new information on the crystal growth behavior of fluoride nanocrystals in oxyfluoride glass-ceramics.     

冷冻靶校准误差和烧蚀层粗糙度对氘氚层均匀性的影响

理论分析了氘氚层外表面的温差与其粗糙度间的关系;以法国兆焦激光装置LMJ为原型,利用计算流体力学程序Fluent,分别模拟了靶丸轴向偏离黑腔中心不同尺度和烧蚀层存在不同大小的非均匀厚度对氘氚层温度分布的影响,求得了这两种误差引起氘氚层厚度的非均匀度。结果表明：为了满足点火靶的要求,靶丸轴向偏离腔体中心的尺度须在8.5 μm内,烧蚀层轴向粗糙度则应控制在0.72 μm内。     

冷冻靶校准误差和烧蚀层粗糙度对氘氚层均匀性的影响

 理论分析了氘氚层外表面的温差与其粗糙度间的关系;以法国兆焦激光装置LMJ为原型,利用计算流体力学程序Fluent,分别模拟了靶丸轴向偏离黑腔中心不同尺度和烧蚀层存在不同大小的非均匀厚度对氘氚层温度分布的影响,求得了这两种误差引起氘氚层厚度的非均匀度。结果表明：为了满足点火靶的要求,靶丸轴向偏离腔体中心的尺度须在8.5 μm内,烧蚀层轴向粗糙度则应控制在0.72 μm内。     

Enhanced quantum efficiency in polymer electroluminescence devices by inserting an ultrathin PMMA layer

We report an increase of electroluminescence (EL) efficiency by about two times for poly(2-methoxy-5-(2′-ethylhexyloxy)-1,4-phenylene vinylene) (MEH-PPV) based polymer light-emitting diodes (PLED) while employing an ultrathin layer of poly(methyl methacrylate) (PMMA) between a hole injection layer, polyethylenedioxythiophenne:polystyrenesulfonate (PEDOT:PSS) and an emitting layer, MEH-PPV. The peak power efficiency of the control device (ITO/MEH-PPV/LiF/Al) was 0.42 lm/W with a current efficiency of 0.66 cd/A. The device with the optimized thickness of PMMA interface layer shows the highest power efficiency of 1.15 lm/W at a current efficiency exceeding 1.83 cd/A. The significant improvement in the device performance is attributed to the decrease of holes injection and the promotion of electrons injection, which cause the balance of the carriers within the emitting layer.     

High mobility In2O3:H transparent conductive oxides prepared by atomic layer deposition and solid phase crystallization

The preparation of high‐quality In₂O₃:H, as transparent conductive oxide (TCO), is demonstrated at low temperatures. Amorphous In₂O₃:H films were deposited by atomic layer deposition at 100 °C, after which they underwent solid phase crystallization by a short anneal at 200 °C. TEM analysis has shown that this approach can yield films with a lateral grain size of a few hundred nm, resulting in electron mobility values as high as 138 cm²/V s at a device‐relevant carrier density of 1.8 × 10²⁰ cm^–3. Due to the extremely high electron mobility, the crystallized films simultaneously exhibit a very low resistivity (0.27 mΩ cm) and a negligible free carrier absorption. In conjunction with the low temperature processing, this renders these films ideal candidates for front TCO layers in for example silicon heterojunction solar cells and other sensitive optoelectronic applications. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Improvement of electron injection of organic light-emitting devices by inserting a thin aluminum layer into cesium carbonate injection layer

We investigate the electron injection effect of inserting a thin aluminum(Al) layer into cesium carbonate(Cs2CO3)injection layer. Two groups of organic light-emitting devices(OLEDs) are fabricated. For the first group of devices based on Alq3, we insert a thin Al layer of different thickness into Cs2CO3 injection layer, and the device's maximum current efficiency of 6.5 cd/A is obtained when the thickness of the thin Al layer is 0.4 nm. However, when the thickness of Al layer is 0.8 nm, the capacity of electron injection is the strongest. To validate the universality of this approach, then we fabricate another group of devices based on another blue emitting material. The maximum current efficiency of the device without and with a thin Al layer is 4.51 cd/A and 4.84 cd/A, respectively. Inserting a thin Al layer of an appropriate thickness into Cs2CO3 layer can result in the reduction of electron injection barrier, enhancement of the electron injection, and improvement of the performance of OLEDs. This can be attributed to the mechanism that thermally evaporated Cs2CO3 decomposes into cesium oxides, the thin Al layer reacts with cesium oxides to form Al–O–Cs complex, and the amount of the Al–O–Cs complex can be controlled by adjusting the thickness of the thin Al layer.     

Resistive switching characteristic and uniformity of low-power HfO_x-based resistive random access memory with the BN insertion layer

In this letter,the Ta/HfO_x/BN/TiN resistive switching devices are fabricated and they exhibit low power consumption and high uniformity each.The reset current is reduced for the HfO_x/BN bilayer device compared with that for the Ta/HfO_x/TiN structure.Furthermore,the reset current decreases with increasing BN thickness.The HfO_x layer is a dominating switching layer,while the low-permittivity and high-resistivity BN layer acts as a barrier of electrons injection into TiN electrode.The current conduction mechanism of low resistance state in the HfO_x/BN bilayer device is space-chargelimited current(SCLC),while it is Ohmic conduction in the HfO_x device.     

Pyramidal quantum dots: High uniformity and narrow excitonic emission

We report on the optical properties of site-controlled InGaAs dots in GaAs barriers grown in pre-patterned, large pitch, pyramidal recesses by metalorganic vapour phase epitaxy. The inhomogeneous broadening of excitonic emission from an ensemble of quantum dots is found to be extremely narrow, with a standard deviation of 1.19 meV. A dramatic improvement in the spectral purity of emission lines from individual dots is also reported (18–30 μeV ) when compared to the state-of-the-art for site controlled quantum dots.     

基于铝浸润层的超薄银透明导电薄膜研究北大核心CSCD

超薄银薄膜具有高柔韧性和优良的光电性能,是用于透明导电电极的潜在材料。通过电阻热蒸发技术以金属铝作为浸润层制备超薄银透明导电薄膜。引入铝浸润层降低银薄膜的阈值厚度,使银薄膜在K9玻璃基底上以尽可能低的厚度达到连续。对不同厚度铝浸润层上银薄膜方块电阻进行测试,经SEM图像验证后得出,1 nm铝浸润层对银薄膜具有较好的浸润效果。随后采用相同的工艺在1 nm铝浸润层上制备了不同厚度的银薄膜,透过率和方阻测试结果表明,1 nm铝浸润层上制备的10 nm银薄膜方阻值可达到13Ω/,其在0.4μm~2.5μm波段内透过率可达到50%以上。