Exclusive measurement of coherent η-photoproduction from the deuteron

Coherent photoproduction of η-mesons from the deuteron has been measured from threshold up to E _γ≈ 750 MeV using the photon spectrometer TAPS at the tagged photon facility at the Mainz microtron MAMI. For the first time, differential coherent cross-sections have been deduced from the coincident detection of the η-meson and the recoil deuteron. A missing-energy analysis was used for the suppression of background events so that a very clean identification of coherent η-photoproduction was achieved. The resulting cross-sections agree with previous experimental results except for angles around 90^° in the γd c.m. system where they are smaller. They are compared to various model calculations. Received: 5 April 2001 / Accepted: 3 September 2001     

Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition

The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by pulsed laser deposition on sapphire substrates at temperatures ranging from room temperature to 350 °C. Morphological and structural modifications have been followed by grazing-incidence and θ–2θ X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analyzed by electron probe microanalysis. The in-depth variation of composition has been studied by secondary neutral mass spectroscopy. We show that pulsed laser deposition at 275 °C makes the formation of a 1-μm-thick film of Ti-Ni-Zr quasicrystalline textured nanocrystallites possible. Received: 7 June 2001 / Accepted: 18 February 2002 / Published online: 3 June 2002 RID="*" ID="*"Corresponding author. Fax: +33-3/8357-6300, E-mail: brien@mines.u-nancy.fr     

Flexible ceramic–polymer composite films with temperature-insensitive and tunable dielectric permittivity

BaTiO₃–polymer composite layers have been produced by the spin-on technique (thickness 3–10 μm). The dielectric permittivity of the layers at room temperature can be tuned from 2.8 to approximately 33 by varying the ceramic filling from 0 to 60% by volume. The dielectric properties of the films are almost insensitive to temperature variations in the range 20–180 °C. Free-standing composite layers with ceramic content ≤50% are flexible without noticeable change of permittivity after repeated mechanical bending. Received: 22 November 2001 / Accepted: 24 November 2001 / Published online: 23 January 2002     

Fabrication and magnetic properties of highly ordered Co16Ag84 alloy nanowire array

Highly ordered Co-Ag alloy nanowire arrays embedded in the nanochannels of anodic alumina membranes (AAMs) were successfully fabricated using electrodeposition. Scanning electron microscopy and transmission electron microscopy observations revealed that the ordered Co-Ag alloy nanowires were uniformly assembled into the hexagonally ordered nanochannels of the AAMs. Magnetic measurements showed that the perpendicular coercivity (H_c⊥) of the ordered nanowire arrays increased dramatically as the annealing temperature (T_a) rose from 300 °C, reached its maximum (183 Oe) at 400 °C and then decreased sharply as T_a further increased beyond 400 °C. However, there was little change in the parallel coercivity (H_c∥) of the nanowire arrays during the annealing process. The mechanism of this phenomenon was attributed to the special structure of the AAMs and nanowires. Received: 27 November 2000 / Accepted: 3 May 2001 / Published online: 25 July 2001     

Structural, electrical, and surface characteristics of La0.5Sr0.5CoO3 thin films prepared by pulsed-laser deposition

A parametric study of the growth of La_0.5Sr_0.5CoO₃ (LSCO) thin films on (100) MgO substrates by pulsed-laser deposition (PLD) is reported. Films are grown under a wide range of substrate temperature (450–800 °C), oxygen pressure (0.1–0.9 mbar), and incident laser fluence (0.8–2.6 J/cm²). The optimum ranges of temperature, oxygen pressure, and laser fluence to produce c-axis oriented films with smooth surface morphology and high metallic conductivity are identified. Films deposited at low temperature (500 °C) and post-annealed in situ at higher temperatures (600–800 °C) are also investigated with respect to their structure, surface morphology, and electrical conductivity. Received: 20 November 1998 / Accepted: 6 July 1999 / Published online: 21 October 1999     

A microchip-laser-pumped DFB-polymer-dye laser

A miniaturized, high repetition rate, picosecond all solid state photo-induced distributed feedback (DFB) polymer-dye laser is described by applying a passively Q-switched and frequency-doubled Cr⁴⁺:Nd³⁺:YAG-microchip laser (pulse width Δτ=540 ps, repetition rate ν=3 kHz, pump energy E_pump=0.15 μJ) as a pump source. A poly-methylmethacrylate film doped with rhodamine B dye serves as active medium. The DFB-laser pulses are temporally and spectrally characterized, and the stability of the thin polymer/dye film at high repetition rates is analyzed. The shortest DFB-laser pulses obtained have a duration of 11 ps. After the emission of 350000 pulses the intensity of the DFB-laser output has decreased by a factor of two and the pulse duration has increased by a factor of 1.2. For single DFB-laser pulses of 20-ps duration the spectral bandwidth is measured to be Δλ=0.03 nm, which is only 0.005 nm above the calculated Fourier limit assuming a Gaussian profile for the temporal shape of the pulses. Coarse wavelength tuning of the DFB laser between 590 and 619 nm is done by turning the prism. Additionally, a fine tuning of the DFB-polymer-laser wavelength is achieved by changing the temperature of the polymer/dye layer (=-0.05 nm/°C) in the range from 20 to 40 °C. Received: 1 March 2001 / Revised version: 23 May 2001 / Published online: 18 July 2001     

ZrO2 films deposited by photo-CVD at low temperatures

Zirconium oxide layers have been successfully deposited by photo-CVD at low temperatures. ZrO₂ growth was observed at temperatures as low as 100 °C. When deposited at 250 °C and above, these films exhibited a polycrystalline structure with a mixture of different crystal phases. Deposition at 300 °C was found to form moisture-free ZrO₂ films with a high refractive index of 2.1, a very low effective density of trapped electrons of ∼8.8×10⁸ cm^-2 and an interface trap density of 6.6×10⁹ cm^-2 eV^-1 being readily obtained. Received: 17 December 2001 / Accepted: 6 January 2002 / Published online: 3 June 2002     

Substrate-step-induced effects on the growth of CaF2 on Si (111)

The growth of CaF₂ on vicinal Si (111) surfaces was studied by scanning tunneling microscopy (STM) and atomic force microscopy (AFM) for the temperature range from 300 to 750 °C. In the submonolayer range a transition from terrace to step nucleation is observed for increasing temperature. The first monolayer grows in the step-flow growth mode since second layer islands are not nucleated before completion of the wetting layer. For the subsequent growth of CaF₂ on the CaF interface layer, substrate-induced steps do not act as preferential nucleation sites, but rather as growth barriers. Thus CaF₂ films grow very inhomogeneously at high temperatures. At lower deposition temperatures, the film homogeneity increases due to the increased (homogeneous) nucleation rate on terraces. The lattice mismatch leads to (lateral) relaxation of thicker CaF₂ film close to substrate steps. In addition, CaF₂ self-decoration effects are caused by the relaxed regions close to the film steps at temperatures above 500 °C. Received: 7 August 2001 / Accepted: 23 October 2001 / Published online: 3 April 2002     

Preparation and characterisation of compositionally graded BaxSr1-xTiO3 thin films

Ba_xSr_1-xTiO₃ thin films with a compositional gradient of x=0.3 to 1 (in 0.1 mole fraction increments) were fabricated on Pt/Ti/SiO₂/Si substrates using a modified sol–gel technique. The graded film crystallised in a perovskite structure and consists of a uniform microstructure with comparatively larger grains. The room-temperature relative dielectric constant (ε_r) and dielectric loss (cosδ) at 100 kHz were found to be 305 and 0.03 respectively. Dielectric peaks were not observed in the temperature range from -20 °C to 120 °C. The dielectric constant and dielectric loss were almost independent of temperature. Polarisation–electric field measurements at room temperature revealed a saturated but slim hysteresis loop with a remanent polarisation (P_r) of 0.6 μC/cm² and a coercive field (E_c) of 2.4 kV/mm. The graded film behaves as a stack of Ba_xSr_1-xTiO₃ capacitors connected in series and hence the dielectric Curie peaks are removed. Received: 4 October 2001 / Accepted: 17 October 2001 / Published online: 23 January 2002     

Texture control and its impact on the properties of SrBi2Ta2O9 thin films prepared by pulsed laser deposition

SrBi₂Ta₂O₉ (SBT) ferroelectric thin films with different preferred orientations were deposited by pulsed laser deposition (PLD). Several methods have been developed to control the preferred orientation of SBT thin films. For SBT films deposited directly on Pt/TiO₂/SiO₂/Si substrates and in situ crystallized at the deposition temperature, the substrate temperature has a significant impact on the orientation and the remnant polarization (Pr) of the films; a higher substrate temperature benefits the formation of (115) texture and larger grain size. The films deposited on Pt/TiO₂/SiO₂/Si substrates at 830 °C are (115)-oriented and exhibit 2Pr of 6 μC/cm². (115)- and (200)-predominant films can be formed by using a La_0.85Sr_0.15CoO₃ (LSCO) buffer layer or by annealing amorphous SBT films deposited on Pt/TiO₂/SiO₂/Si substrates at 450 °C using rapid thermal annealing (RTA). These films exhibit good electric properties; 2Pr of the films are up to 12 μC/cm² and 17 μC/cm², respectively. The much larger 2Pr of the films deposited on the LSCO buffer layer and of the films obtained by RTA than 2Pr of the films deposited on Pt/TiO₂/SiO₂/Si substrates at 830 °C is attributed to a stronger (200) texture. Received: 30 January 2001 / Accepted: 30 May 2001 / Published online: 25 July 2001     

InGaP/GaAs heterojunction bipolar transistor grown by solid-source molecular beam epitaxy with a GaP decomposition source

Lattice-matched InGaP epilayers on GaAs (001) and InGaP/GaAs heterojunction bipolar transistors (HBTs) were successfully grown by solid-source molecular beam epitaxy (SSMBE) with a GaP decomposition source. A 3 μm thick InGaP epilayer shows that low temperature photoluminescence (PL) peak energy is as large as 1.998 eV, full width at half maximum (FWHM) is 5.26 meV, which is the smallest ever reported, and X-ray diffraction (XRD) rocking curve linewidth is as narrow as that of GaAs substrate. The electron mobilities at room temperature of nominally undoped InGaP layers obtained by Hall measurements are comparable to similar InGaP epilayer grown by solid-source molecular beam epitaxy (SSMBE) with other sources or other growth techniques. The large area InGaP/GaAs HBTs show very good Dc characteristics.     

Growth and evolution of epitaxial erbium disilicide nanowires on Si (001)

Sub-monolayer amounts of Er deposited onto Si (001)react with the substrate to form epitaxial nanowires of crystalline ErSi₂. The growth of uniaxial structures occurs because the different crystal structures of ErSi₂ and Si have a good lattice match along one Si<110> crystallographic axis but a significant mismatch along the perpendicular Si<110> axis. The nucleation, growth, and subsequent evolution of ErSi₂ nanowires were investigated as functions of erbium coverage on the Si (001) surface, annealing time, and annealing temperature. Low annealing temperatures (620 °C) and times (5 min) produced ErSi₂ nanowires with widths of a few nanometers, heights less than one nanometer, and lengths of several hundred nanometers. For longer annealing times at low temperature, the surface roughened without significant ripening of the wires. Annealing at intermediate temperatures (∼700 °C) caused stacking faults to form along the long axis of the nanowires and their lengths to ripen. At high temperature (800 °C), the wires broke apart into short segments with stacking faults. Received: 30 January 2002 / Accepted: 31 January 2002 / Published online: 3 May 2002     

Formation of high-conductivity NiSi2 layers on Si at zero-mismatch temperature by high-current Ni-ion implantation

2 and Si lattices at 380 °C, which was defined as zero-mismatch temperature. The implantation was conducted with a metal vapor vacuum arc (MEVVA) ion implanter at an extraction voltage of 45 kV. Based on a thermal conduction estimation, a temperature rise of 380 °C required the Ni-ion current density to be 35 μA/cm². For the Si(111) wafers, the high conducting NiSi₂ layers were indeed directly formed after Ni-ion implantation with this specific current density to a normal dose of 2×10¹⁷ ions/cm² and the resistivity was as low as 9 μΩ cm. For the Si(111) wafers pre-covered with a 10-nm Ni overlayer, the resistivity of the NiSi₂ layers obtained under the same conditions decreased down to about 6 μΩ cm. The superior electrical property of the NiSi₂ was thought to be related to its formation temperature, i.e. at a zero-mismatch temperature of 380 °C, which resulted in minimizing the stress and stress-induced defects involved in its formation as well as cooling process. Received: 27 April 1998 / Accepted: 26 October 1998     

η- mixing in U(3) chiral perturbation theory

We investigate η- mixing in infrared regularized U(3) chiral perturbation theory by calculating the η and masses up to one-loop order. From this analysis it becomes obvious that even at leading order η--mixing does not obey the usually assumed one-mixing-angle scheme if large N _c counting rules are not employed. Received: 12 March 2001 / Accepted: 4 July 2001     

Investigation of intracavity third-harmonic generation at 1.06 μm in YCa4O(BO3)3 crystals

Intracavity sum-frequency mixing of 1.06 μm and 532 nm in YCa₄O(BO₃)₃ (YCOB) crystals cut for different type-I phase-matching directions of (θ,ϕ)=(106°,77.2°), (111°, 79.6°) and (65°, 82.8°) was investigated in a compact diode-end-pumped acousto-optical Q-switched Nd:YVO₄/KTP laser formed with a three-mirror folded resonator. The maximum 355-nm average output power of 124 mW was obtained in the phase-matching direction of (106°, 77.2°) with a pump-to-ultraviolet conversion efficiency of 3.3% at the repetition frequency of 20 kHz. Received: 17 September 2001 / Revised version: 27 November 2001 / Published online: 17 January 2002     

Metal-induced solid-phase crystallization of hydrogenated amorphous silicon: dependence on metal type and annealing temperature

We report on metal (Cr, Ni, or Pd)-induced solid-phase crystallization (MISPC) of plasma-enhanced chemical-vapor-deposited hydrogenated amorphous silicon at annealing temperatures ≤600 °C. MISPC is found to significantly reduce the thermal budget of crystallization at annealing temperatures as low as ∼400 °C. The lowest achievable annealing temperature is found to depend on the metal type. The metal type is also found to influence grain size and the conductivity of the polycrystalline silicon. Received: 21 June 1999 / Accepted: 20 October 1999 / Published online: 23 February 2000     

Trap characterization for Bi4Ti3O12 thin films by thermally stimulated currents

Thermally stimulated current (TSC) measurements performed in the 100 K–400 K temperature range on Bi₄Ti₃O₁₂ (BiT) thin films annealed at 550 °C and 700 °C had revealed two trapping levels having activation energies of 0.55 eV and 0.6 eV. The total trap concentration was estimated at 10¹⁵ cm⁻³ for the samples annealed at 550 °C and 3×10¹⁵ cm⁻³ for a 700 °C annealing and the trap capture cross-section was estimated about 10⁻¹⁸ cm². From the temperature dependence of the dark current in the temperature range 20 °C–120 °C the conduction mechanism activation energy was found to be about 0.956–0.978 eV. The electrical conductivity depends not only on the sample annealing temperature but also whether the measurement is performed in vacuum or air. The results on the dark conductivity are discussed considering the influence of oxygen atoms and oxygen vacancies. Received: 28 January 1998 / Accepted: 8 January 1999 / Published online: 5 May 1999     

Dielectric relaxation study of sulfolane in carbon tetrachloride solution from microwave absorption data

The dielectric constant (ɛ′) and dielectric loss (ɛ″) for dilute solutions of sulfolane in carbon tetrachloride solution have been measured at 9.885 GHz at different temperatures viz. 25°C, 30°C, 35°C and 40°C by using standard microwave techniques. Following the single frequency concentration variational method, the dielectric relaxation time (τ) and dipole moment (μ) have been calculated. It is found that dielectric relaxation process can be treated as the rate process, just like the viscous flow. Based on the above studies, monomer structure of sulfolane in carbon tetrachloride has been inferred. Energy parameters (ΔH _g , ΔF _g , ΔS _g ) for dielectric relaxation process of sulfolane in carbon tetrachloride at 25°C, 30°C, 35°C and 40°C have been calculated and compared with the corresponding energy parameters (ΔH _η , ΔF _η , ΔS _η ) for the viscous flow.     

First measurement of the helicity-dependent γ p?pη differential cross-section

The helicity dependence of the γ p↦pη reaction has been measured for the first time at a center-of-mass angle θ^* _η = 70^° in the photon energy range from 780 MeV to 790 MeV. The experiment, performed at the Mainz microtron MAMI, used a 4π-detector system, a circularly polarized, tagged photon beam, and a longitudinally polarized frozen-spin target. The helicity 3/2 cross-section is found to be small and the results for helicity 1/2 agree with predictions from the MAID analysis. Received: 19 December 2002 / Accepted: 10 March 2003 / Published online: 20 May 2003