多孔硅表面形貌的观测和探讨

一、引言多孔硅室温下较强的光致发光现象给全硅大规模光电集成电路和硅基发光器件的开发带来曙光，但要把它变为现实仍有许多问题要解决，就以发光机理为例，仍有不同意见[1].为此必须深入研究其特性，为探讨发光机理提供依据.已有作者观察到发光畴区[2]，测得多孔硅成分近于二氧化硅[3]，观察到快和慢的发光带[4]以及证实自然氧化引入新的表面态[5]等.但迄今为止测量的均为晾干后的多孔硅，而未深究在空气中贮存干燥过程中形貌的变化.本文对多孔硅在空气中贮存初期表面形貌的变化做了显微观测和探讨.还尝试测量了多孔硅／硅的界面特性.二…     

多孔硅的光生伏特效应

多孔硅(PS)的可见光致发光的发现[1],引起人们对PS的光电特性及其在光电器件上应用可能性的广泛探索.已报道用PS制成发出可见光的电致发光器件[2]及高灵敏的光探测器件[3].本文将报道PS层与金属接触,光照时能出现很强的光生伏特效应,利用这一特性有可能制成高效的光电转换器件.     

多孔硅的光学非线性效应

自从1990年英国皇家信号与雷达研究所的Canham发现了多孔硅的可见光发射现象以后[1],在国际上掀起了一股多孔硅发光研究的热潮.继光致发光以后,有好几个研究组已观察到多孔硅的固态电致发光[2],这是向多孔硅在光电子器件的应用方向迈出的一大步.对于多孔硅的发光机理,虽然多数人倾向于认为这是一种量子线或量子点结构的限制效应,但也有一些与之相矛盾的实验结果,以致提出了一些其他的可能机理,如 SiH2或Si6O2H5聚合物,a-St,应变和杂质的作用等.所以要最终确定多孔硅的发光究竟是否是一种量子限制效应,还有待于提供进一步的实验事实. 另一…     

利用共溅射方法实现硅基材料上的纳米Ge的可见光发射

如何实现硅基材料的发光,一直是很受重视的一个研究方向。以往是通过硅基外延生长直接带隙材料或锗硅超晶格的途径实现Si基材料发光。90年代初发倪的多孔硅发光[1],引起人们的广泛关注,对多孔硅的制备工艺、发光特性、机理和定性以及可能的应用等方面进行了广泛的研究。但至今尚没有阐明发光机理,而且多孔硅存在结构脆弱、对环境敏感、不易实现电注入等问题。     

多孔硅发光研究获新进展

最近,复旦大学应用表面物理实验室在多孔硅发光研究方面又取得两项新的进展,现介绍如下:1.电致发光的功耗低于文献报道的水平 目前,我们所制成的多孔硅电致发光样品,其发光的阈值电压和电流已减小到 6V,30mA/cm2,比国际上迄今所报道的功耗值都要低.从表1的比较可以看出,我们所获得的电致发光特性达到了文献报道的最好水平.2.光致发光获得迄今所报道的最短波长 由于多孔硅发光的波长与硅柱直径有关,当发光波长进入绿光范围时,硅柱孔径已很细,极易坍塌,使得更细的量子线结构很难实现.迄今国外文献所发表的光致发光谱其中心波长最短约为530nm(…     

多孔硅蓝光发射与发光机制

在制备出光致发光能量为２．７ｅＶ的发射蓝光多孔硅的基础上对它进行了较系统的研究：测量了它的光致发光时间分辨光谱，用傅里叶交换红外光谱分析了其表面吸附原子的局域振动模，研究了γ射线辐照对其发光的影响，并与发红、黄光的多孔硅作了对比，通过空气中长期存放、激光和紫外线照射的方法，研究了光致发光峰能量为２．７ｅＶ的多孔硅发光稳定性．我们及其它文献中报道的多孔硅蓝光发射的实验结果与量子限制模型矛盾，但能用量子限制／发光中心模型解释．我们认为多孔硅的２．７ｅＶ发光是多孔硅中包裹纳米硅的ＳｉＯ_x层中某种特征发光中心引起的． 关键词：     

发光多孔硅表面微结构及其晶格畸变的实验研究

用电化学方法制备了不发光多孔硅和发光多孔硅,用X射线双晶衍射对两类多孔硅表面进行了微结构分析和晶体质量表征,实验表明两类多孔硅的微结构间存在着很大差别。不发光多孔硅表面对X射线的双晶衍射摇摆曲线可解叠成两个峰,它们分别来自样品多孔层和单晶硅衬底,而发光多孔硅对X射线的双晶衍射摇摆曲线呈高斯对称分布,不可解叠。发光多孔硅比不发光多孔硅表面晶体质量差,且电化学腐蚀越严重,表面晶体质量下降也越严重。     

基于三层模型的多孔硅发光谱双峰结构的研究

基于Litovchenko提出的多孔硅三层模型和在此基础上由Li等人提出的多孔硅三层发光模型,利用半导体异质结理论导出了多孔硅芯部与夹层中载流子浓度、非平衡载流子数目、扩散电流密度、夹层与芯部发光强度的比值等关系式.结果表明:当Egint＞Egcore时,在0.2 eV＜ΔEv+ΔEc＜0.26 eV范围内发光谱将出现双峰,并在ΔEv+ΔEc＞0区域发光峰位不断向高能移动,发生蓝移现象;当Egint＜Egcore时,尽管芯部由于量子限制效应仍将导致发光峰蓝移,但芯部的发光相对夹层的发光相当弱,这时多孔硅发光谱呈现单峰.此模型定量地解释了多孔硅发光峰的蓝移起源于多孔硅量子限制效应,而发光出现发光双峰和发光峰位钉扎是由夹层物质决定,说明了多孔硅的发光存在多种发光机制.     

多孔硅的后处理及其发光特性

采用一种新颖而简便的方法,改善多孔硅的发光特性。该方法包括酸处理和阴极还原两步。实验证明通过对多孔硅进行酸处理,能有效提高多孔硅的发光强度;通过对多孔硅进行阴极还原处理,能明显改善多孔硅的发光稳定性,而且发光强度也得到了提高。综合酸处理和阴极还原两技术的特点,对所制备的多孔硅立即先进行酸处理,然后再对其进行阴极还原处理,结果表明该方法能较好地提高多孔硅的发光效率和发光稳定性。而且还对其发光机制进行了探讨。     

表面活性剂修饰多孔硅的光致发光光谱

分别利用4种不同的表面活性剂对多孔硅进行表面修饰,结果表明油酸钠溶液、CPB溶液和乳化剂OP溶液修饰的多孔硅样品发光减弱,SDS溶液修饰的多孔硅样品发光增强,不同浓度的SDS溶液的增强倍数也不同。这种现象不仅可以为研究多孔硅的发光机制提供新的依据,还为提高多孔硅的发光效率提供了一个新的有效途径。     

Characteristics of charged and metastable species in micro-discharges of AC- plasma display panel

The temporal effects of charged and metastable particles in the micro-discharges of an AC plasma display panel (AC-PDP) were investigated under actual driving conditions. The discharge gas used in the 4-in PDP was Neon + 4% Xenon. The discharge characteristics in terms of the time scale related to the space-charge decay, wall charge decay, metastable decay, and charge accumulation were investigated using a pulse technique. For Neon + 4% Xenon gas-mixture discharges of 500 torr, 4 /spl mu/s was related to the time scale of the space-charge decay and wall-charge accumulation time. The minimum sustain voltage started to dramatically increase at 20 /spl mu/s, which was related to the time scale of the metastable particles. Whereas, after 40 /spl mu/s, the minimum sustain voltage slowly increased with a slope of 0.01581, which was related to the inverse of the time scale of the wall charge decay.     

La0.88 Te0.12 MnO3/Si异质结的整流和光伏特性研究

采用脉冲激光沉积法制备了La_0.88Te_0.12MnO₃(LTMO)/Si异质结,该异质结具有光生伏特效应和良好的整流特性.光生电压在394 μs的时间内很快增加到最大值然后逐渐减小.在T=80 K时,光生电压的最大值大约是13.7 mV.随着温度的升高,热涨落致使光生电压最大值总体呈现减小趋势,而且是非线性减小,这主要是由LTMO层发生金属绝缘体转变而导致的LTMO层能带结构的变化引起的. 关键词： 异质结 光生伏特效应 电子掺杂     

Current transport in ZnO/Si heterostructure grown by laser molecular beam epitaxy

The n-ZnO/p-Si heterojunction was fabricated by depositing high quality single crystalline aluminium-doped n-type ZnO film on p-type Si using the laser molecular beam epitaxy technique. The heterojunction exhibited a good rectifying behavior. The electrical properties of the heterojunction were investigated by means of temperature dependence current density-voltage measurements. The mechanism of the current transport was proposed based on the band structure of the heterojunction. When the applied bias V is lower than 0.15 V, the current follows the Ohmic behavior. When 0.15V 0.6 V), the space charge limited effect becomes the main transport mechanism. The current-voltage characteristic under illumination was also investigated. The photovoltage and the short circuit current density of the heterojunction aproached 270 mV and 2.10 mA/cm 2 , respectively.     

Slow decay dynamics of visible photoluminescence from nanometer-size silicon crystallites

We have studied the decay dynamics of visible photoluminescence (PL) from nanometer-sized Si crystallites fabricated by electrochemical etching of single crystalline Si and laser-breakdown of SiH₄ gas. In two types of Si crystallites, the slow decay behavior of red PL is characterized by a stretched exponential function. The temperature dependence of the PL decay rate is similar to that of variable-range hopping of carriers in two-dimensional systems. It is concluded that the slow decay PL is caused by the hopping-limited recombination in surface states of nanocrystallines.PACS: 73.20.Dx; 78.66.-w; 78.90.+t     

厚度对非极性聚合物薄膜驻极体电荷储存及电荷动态特性的影响

以Du Pont公司的商用Teflon FEP A型薄膜为例，通过热脉冲技术、等温表面电位衰减测量和开路热刺激放电电流谱分析等实验结果，讨论了经常温和高温电晕充电后样品厚度对薄膜驻极体的沉积电荷密度、薄膜驻极体的内电场、体电导率以及电荷储存稳定性的影响.通过热脉冲技术组合电导率温度曲线的测量，研究了在不同温度条件下样品厚度对沉积电荷层的平均电荷重心移动的影响.结果表明：在充电参数一定的条件下，随着膜厚的降低，储存电荷密度上升，但电荷稳定性有所下降.因此，合理地调控薄膜厚度，可以有效地优化驻极体的电荷储存能 关键词： 厚度 驻极体 电荷储存能力 电荷稳定性     

Non-equilibrium surface state properties at clean cleaved silicon surface as measured by surface photovoltage

Surface photovoltage transients were measured at clean cleaved silicon (111) faces in ultrahigh vacuum. The temperature and doping of the samples, the intensity of the stimulating light pulses (energy less than band gap), and the surface coverage (clean and adsorbed water vapor) were varied systematically. The results yield information on the charge transfer at the surface and on surface recombination. The calculation of the surface photovoltage (using only the generation rates into and out of the surface states and data of thermal equilibrium) shows, that only one bulk band (conduction band for n-doped samples and valence band for p-doped samples) controls completely signal height and its relaxation via charge transfer to the surface states. The determined surface state parameters are: relaxation time constants, capture cross-sections for photons and transition probabilities. On the basis of the model all decay curves can be reproduced quantitatively.     

Study on crystalline properties of Er-Si-O compounds in relation to Er-related 1.54 μm photoluminescence and electrical properties

Er-Si-O crystalline compounds, which exhibit superlattice structures and sharp and strong Er-related 1.54 μm photoluminescence (PL) spectra at room temperature have been formed by self-assembling growth mechanism. Oxidation of the starting materials which have Si and Er at an atomic ratio of 2:1 are prepared and then oxidation and succeeding high-temperature annealing in Ar above 1250 °C cause a self-assembled superlattice-structured Er-Si-O crystalline compounds. The control of the ratio of Si and Er, as well as the following oxidation and annealing processes, is found to be sensitive to the crystalline properties, PL spectra and electrical properties. In this study, Er-Si-O crystalline thin films are formed on Si substrates by sol-gel and MOMBE methods, and their crystalline properties such as crystalline orientation and concentration ratio of Er, Si and O are investigated. Crystalline Er-Si-O films of high orientation are successfully grown on Si(1 0 0) and its inclined surface. The PL and excitation spectra, fluorescence decay and the electrical properties are found to be strongly related to the crystalline properties. Excess O causes a broader 1.54 μm PL spectra, slower fluorescence decay, lower carrier-mediated excitation and higher resistivity. A precise control of O is found to be necessary to grow superlattice-structured Er-Si-O compounds, which are semiconducting and are excitable via carrier-mediated excitation mechanism.     

Simple fabrication of nanostructured silicon and photoluminescence

Porous Si (PS) was fabricated simply by electrochemical anodic etching of a Si wafer. By a combination of SEM, EDX and infrared spectrum measurements hydrogen-terminated crystalline Si surfaces were identified. Transparent Si nanocolloids were obtained via thermally-initiated hydrosilation of the hydrogenated Si surfaces reaction with unsaturated 1-undecene. In contrast to weak luminescence in the hydrogenated PS dispersed in toluene, intense luminescence was observed in the Si nanocolloid. In the Si nanocolloid, both strong luminescence and long-term stability can be correlated with alkylated passivation, as formation of Si–C bonds identified in infrared spectrum. Additionally, the oxidation effect was noticeable in affecting the luminescence of nano-Si during the process.     

Rectifying and photovoltaic properties of ZnCo2O4/Si heterostructure grown by pulsed laser deposition

ZnCo2O4/Si heterostructures have been fabricated by a pulsed laser deposition method, and their transport behaviors and photovoltaic properties have been characterized. The ZnCo2O4/Si heterostructures show a good rectifying behavior at five different temperatures ranging from 50 K to 290 K. The measurements of the photovoltaic response reveals that a photovoltage of 33 mV is generated when the heterostructures are illuminated by a 532 nm laser of 250 mW/cm2and mechanically chopped at 2500 Hz. Both the photocurrent and the photovoltage clearly increase with the increase of the laser intensity at room temperature. However, the heterostructures' photovoltage peak decreases with the increase of the temperature. This work may open new perspectives for ZnCo2O4/Si heterostructure-based devices.     

强脉冲X射线辐照Si-SiO2界面对C-V 和I-V特性曲线的影响

 利用强脉冲X射线对Si-SiO₂界面进行了辐照，测量了C-V曲线和I-V曲线。实验发现，经过强脉冲X射线对Si-SiO₂界面进行的辐照，使C-V曲线产生了正向漂移，这一点与低剂量率辐射结果不同；辐射后，感生I-V曲线产生畸变；特别地，从I-V曲线上还反映出强脉冲X射线辐照的总剂量效应造成电特性 参数明显退化，最后甚至失效。讨论了强脉冲X射线辐照对Si-SiO₂界面产生损伤的机理，并对实验结果进行了解释。