InxGa1-xN量子阱蓝光LED光电特性与量子阱束缚态能级的关系

运用软件模拟和理论计算的方法分析了量子阱宽度的变化对量子阱束缚态能级与光电性能产生的影响,建立了束缚态分裂能级理论模型。分析结果表明:当量子阱宽较窄时,极化效应导致的能带弯曲是光谱红移的主要原因,而电子泄漏是导致效率下降的主要原因;当阱宽较大时,能级填充是导致光谱红移的主要原因,俄歇复合与载流子离域是导致效率下降的主要原因。由本文得出,当量子阱宽为2.5～3.5 nm时,InGaN/GaN发光二极管获得最大内量子效率与发光效率。     

In组分渐变提高InGaN/GaN多量子阱发光二极管发光性能

利用金属有机物化学气相沉积系统在蓝宝石衬底上通过有源层的变温生长,得到In组分渐变的量子阱结构,从而获得具有三角形能带结构的InGaN/GaN多量子阱发光二极管(LED)(简称三角形量子阱结构LED).变温光致发光谱结果表明,相对于传统具有方形能带结构的量子阱LED(简称方形量子阱结构LED),三角形量子阱结构有效提高了量子阱中电子和空穴波函数的空间交叠,从而增加了LED的内量子效率;电致发光谱结果表明,三角形量子阱结构LED器件与传统结构LED器件相比,明显改善了发光峰值波长随着电流的蓝移现象.通过以上     

AlxGa1-xN/GaN双量子阱的结构和掺杂浓度对子带间跃迁波长和吸收系数的影响

用薛定谔方程和泊松方程自洽计算的方法研究了Al_0.75Ga_0.25N/GaN对称双量子阱(DQWs)中子带间跃迁(ISBT)的波长和吸收系数对中间耦合势垒高度、中间耦合势垒宽度、势阱宽度和势垒掺杂浓度的依赖关系.研究发现,第一奇序子带S_1ood与第二偶序子带S_2even ISBT波长随着中间耦合势垒高度的降低而变短.当中间耦合势垒高度高于0.62 eV时,S_{1odd< 关键词： 自洽 x}Ga_1-xN/GaN双量子阱')" href="#">Al_xGa_1-xN/GaN双量子阱 子带间跃迁     

极化诱导的内建电场对Mn δ掺杂的GaN/AlGaN量子阱居里温度的调制

采用传输矩阵方法分析极化诱导的内建电场对Mn δ掺杂的GaN/Al_xGa_1-xN量子阱居里温度(T_C)的调制作用.通过解薛定谔方程计算出在不同的内建电场条件下半导体量子阱局域态内的基态空穴能级和波函数分布情况，并在此基础上确定量子阱内Mn δ掺杂情况下T_C随内建电场的变化趋势，分析了不同量子阱结构引起的内建电场分布变化及其对T_C的影响.在耦合双量子阱中通过调节左右阱的不对称性可以得到T_C近3倍的增长. 关键词： GaN 量子阱 内建电场 居里温度     

垒掺In提高InGaN/GaN多量子阱发光特性

利用金属有机物化学气相淀积技术在蓝宝石衬底上生长InGaN/GaN多量子阱结构.对多量子阱垒层掺In和非掺In进行了比较研究，结果表明，垒掺In 的样品界面质量变差，但明显增加了光致发光谱的峰值强度和积分强度，带边峰与黄光峰强度之比增大，降低了表面粗糙度.利用这两种结构制备了相应的发光二极管(LED)样品.通过电荧光测量可知，垒掺In的LED比非掺In的LED有较高的发光强度和相对均匀的波长，这主要是由于垒掺In后降低了阱与垒之间晶格失配的应力，从而降低了极化电场，提高了辐射复合效率. 关键词： InGaN/GaN多量子阱 X射线双晶衍射 原子力显微镜 光致发光     

InxGa1-xAs-GaAs应变层量子阱结构的流体静压光荧光研究

本文报道了对分子束外延(MBE)生长的In_0.25Ga_0.75As-GaAs应变层量子阱结构在77K下的压力光荧光(PL)研究的结果。流体静压力从0到50kbar.,给出了In_0.25Ga_0.75As-GaAs应变层量子阱的Γ谷压力系数,实验观察到了量子阱中能级与势垒GaAs中X谷的能级交叉。通过对其压力行为的分析,给出了In_0.25Ga_0.75As-GaAs异质结的导带与价带跃变比:Q_c=△E_c:△E_v=0.68:0.32。对(InGa)As-GaAs应变量子阱常压下的理论分析与实验符合很好。本文也对Al_0.3Ga_0.70As-GaAs量子阱进行了讨论。 关键词：     

InGaN/GaN多量子阱热退火的拉曼光谱和荧光光谱

通过拉曼光谱及荧光光谱测量研究了采用低压金属有机化学沉积(MOCVD)方法生长的InGaN／GaN多量子阱高温快速热退火处理对量子阱光学性质的影响。观测到退火后InGaN／GaN量子阱的拉曼光谱E2,A1(LO)模式的峰位置出现了红移,而且该振动峰的半高宽也有微小变化。温度升高退火效果更明显。退火使量子阱内应力部分消除,同时In,Ga原子扩散出现相分离使拉曼谱表现出变化。在常温和低温下的光荧光谱表明,退火处理的量子阱发光主峰都出现了红移;而且低温退火出现红移,退火温度升高相对低温退火出现蓝移;同时在低温荧光光谱里看到经过退火处理后原发光峰中主峰旁边弱的峰消失了。讨论了退火对多量子阱光学性质的影响。     

InGaN/GaN多量子阱LED载流子泄漏与温度关系研究

通过测量光电流,直接观察了InGaN/GaN量子阱中载流子的泄漏程度随温度升高的变化关系。当LED温度从300K升高到360K时,在相同的光照强度下,LED的光电流增大,说明在温度上升之后,载流子从量子阱中逃逸的数目更多,即载流子泄漏比例增大。同时,光电流的增大在激发密度较低的时候更为明显,而且光电流随温度的增加幅度与激发光子的能量有关。用量子阱-量子点复合模型能很好地解释所观察到的实验现象。实验结果直接证明,随着温度的升高,InGaN/GaN量子阱中的载流子泄漏将显著增加,而且在低激发密度下这一效应更为明显。温度升高导致的载流子泄漏增多是InGaN多量子阱LED发光效率随温度升高而降低的重要原因。     

InGaN/GaN多量子阱蓝光发光二极管老化过程中的光谱特性

系统地研究了小注入电流(＜4 mA)下InGaN/GaN多量子阱结构蓝光发光二极管的发光光谱特性在老化过程中的变化。对比老化前后的电致发光(EL)光谱,发现在注入电流1 mA下的峰值波长(peak wavelength)和半高宽(FWHM)随老化时间增加而减小,变化过程分两个阶段：前期(＜100 h)减小速度较快,而后逐渐变缓,呈现出与LEDs的发光光功率一致的变化规律,说明LEDs的等效极化电场在老化过程中减弱,这一变化和量子阱内缺陷的增加有明确的关系。通过电学特性测量发现同一结电压(V_j=1.8 V)下的结电容C_j和由交流小信号I—V方法计算得到的注入电流1 mA下的结电压V_j随老化时间增加而增大,明确了在同等小注入电流下量子阱内的载流子浓度随老化过程增加。分析表明在老化过程中InGaN/GaN 多量子阱结构蓝光发光二极管量子阱内的缺陷及其束缚的载流子数量增加,形成了增强的极化电场屏蔽效应,减弱的等效极化电场导致了量子阱的能带倾斜变小,带边辐射复合能量增大,能态密度增多,对应的发光过程的峰值波长变短(蓝移),半高宽变窄。     

垒层厚度对InGaN/GaN多量子阱电注入发光性能的影响及机理

研究了不同垒厚对InGaN/GaN多量子阱电注入发光性能的影响及机理。实验发现,当GaN垒层的厚度从6 nm增大到24 nm时,垒厚的样品发光强度更强,而且当注入电流增加时,适当增加垒厚,可以更显著增加发光强度。进一步结合发光峰位和光谱宽度的研究表明,由于应力和极化效应的存在,当垒层厚度在6~24 nm范围内时,适当增加垒层厚度不仅会使得能带的倾斜加剧,减少电子泄露,而且也会增加InGaN阱层的局域态深度,从而改善量子阱的发光性能。     

Structural and optical properties of Al1-xInxN epilayers on GaN template grown by metalorganic chemical vapor deposition

This paper reports that Al1 xInxN epilayers were grown on GaN template by metalorganic chemical vapor de-position with an In content of 7%-20%. X-ray diffraction results indicate that all these Al1 xInxN epilayers have a relatively low density of threading dislocations. Rutherford backscattering/channeling measurements provide the exact compositional information and show that a gradual variation in composition of the Al1 xInxN epilayer happens along the growth direction. The experimental results of optical reflection clearly show the bandgap energies of Al1 xInxN epilayers. A bowing parameter of 6.5 eV is obtained from the compositional dependence of the energy gap. The cathodoluminescence peak energy of the Al1 xInxN epilayer is much lower than its bandgap, indicating a relatively large Stokes shift in the Al1 xInxN sample.     

AlxGa1-xN/GaN异质结构中Al组分对二维电子气性质的影响

通过用数值计算方法自洽求解薛定谔方程和泊松方程，研究了Al组分对Al_xGa1-xN/GaN异质结构二维电子气性质的影响，给出了Al_xGa_{1-x< /sub>N/GaN异质结构二维电子气分布和面密度，导带能带偏移以及子带中电子分布随AlxGa 1-xN势垒层中Al组分的变化关系，并用AlxGa1-xN/GaN 异质结构自发极化与压电极化机理和能 关键词： x}Ga_1-xN/GaN异质结构')" href="#">Al_xGa_1-xN/GaN异质结构 二维电子气 自发极化 压电极化     

用肖特基电容电压特性数值模拟法确定调制掺杂AlxGa1-xN/GaN异质结中的极化电荷

研究发展了用肖特基电容电压特性数值模拟确定调制掺杂Al_xGa_1-xN/GaN异质结中极化电荷的方法.在调制掺杂的Al_0.22Ga_0.78N/GaN异质结上制备了Pt肖特基接触,并对其进行了C-V测量.采用三维费米模型对调制掺杂的Al_0.22Ga_0.78N/GaN异质结上肖特基接触的C-V特性进行了数值模拟,分析了改变样品参数对C-V特性的影响.利用改变极化电荷、n-AlGaN 关键词： xGa_1-xN/GaN异质结')" href="#">Al_xGa_1-xN/GaN异质结 极化电荷 电容电压特性 数值模拟     

Pressure influence on the Stark effect of impurity states in a strained wurtzite GaN/AlxGa1-xN heterojunction

A variational method is adopted to investigate the properties of shallow impurity states near the interface in a free strained wurtzite GaN/AlxGa1-xN heterojunction under hydrostatic pressure and external electric field by using a simplified coherent potential approximation. Considering the biaxial strain due to lattice mismatch or epitaxial growth and the uniaxial strains effects, we investigated the Stark energy shift led by an external electric field for impurity states as functions of pressure as well as the impurity position, Al component and areal electron density. The numerical result shows that the binding energy near linearly increases with pressure from 0 to 10 GPa. It is also found that the binding energy as a function of the electric field perpendicular to the interface shows an un-linear red shift or a blue shift for different impurity positions. The effect of increasing x on blue shift is more significant than that on the red shift for the impurity in the channel near the interface. The pressure influence on the Stark shift is more obvious with increase of electric field and the distance between an impurity and the interface. The increase of pressure decreases the blue shift but increases the red shift.     

硒化前后电沉积贫铜和富铜的Cu(In1-xGax)Se2薄膜成分及结构的比较

采用电沉积法获得了接近化学计量比的贫铜和富铜的Cu（In_1-xGa_x）Se₂（CIGS）预置层,研究比较了两种预置层及其硒化处理后的成分和结构特性.得到了明确的实验证据证明,硒化后富铜薄膜中的Cu_xSe相会聚集凝结成结晶颗粒分散在表面.研究表明：在固态源硒化处理后,薄膜成分基本不变;当预置层中原子比Cu/（In+Ga）<11时,硒化后薄膜表面存在大量的裂纹;而当Cu/（In+Ga） >12时,可以消除裂纹的产生,形成等轴状小晶粒;富铜预置层硒化时蒸发沉积少量In,Ga和Se后,电池效率已达到68%;而贫铜预置层硒化后直接制备的电池效率大于2%,值得进一步深入研究. 关键词： 1-xGa_x）Se₂薄膜')" href="#">Cu（In_1-xGa_x）Se₂薄膜 电沉积 硒化处理 贫铜或富铜薄膜     

Photoluminescence and transmission spectra of nanocrystalline GaAs（1-x）Sbx embedded in silica films

The composite films of the nanocrystMline GaAs（1-x）Sbx-SiO2 have been successfully deposited on glass and GaSb substrates by radio frequency magnetron co-sputtering. The 10K photoluminescence （PL） properties of the nanocrystalline GaAs（1-x）Sbx indicated that the PL peaks of the GaAs（1-x）Sbx nanocrystals follow the quantum confinement model very closely. Optical transmittance spectra showed that there is a large blue shift of optical absorption edge in nanocrystMline GaAs（1-x）Sbx-SiO2 composite films, as compared with that of the corresponding bulk semiconductor, which is due to the quantum confinement effect.     

Metal Precursor Influence on Performance of CuIn1-xGaxSe2 Films

在镀有Mo的纳钙玻璃衬底上顺序溅射沉积CuGa/In/CuGa层,然后在真空下520 oC硒化40 min,制备成CIGS薄膜. 通 过调整预制层的底层和表层的溅射沉积CuGa层的厚度比,制备不同的CIGS薄膜. 通过X射线衍射谱、拉曼谱、电子能谱、平面和断面SEM的分析, 揭示出CIGS薄膜是黄铜矿相的结构, 晶粒0.5～2 μm,且由硒化CuGa/In/CuGa厚度比为7:20:3的金属预制层后的CIGS薄膜的结晶性最好. 拉曼光谱表明,没有In-Se二元化合物相和有序缺陷化合物相.     

Composition-induced structural modifications in the quaternary CuIn1-xGaxSe2 thin films： bond properties versus Ga content

In this paper the dependence of structural properties of the quaternary CuIn1-xGaxSe2 films with tetragonal structure on the Ga content has been systematically investigated by Raman scattering and x-ray diffraction spectra. The shift of the dominant A1 mode, unlike the lattice constants, does not follow the linear Vegard law with increasing Ga content x, whereas exhibits approximately polynomial change from 174 cm^-1 for CuInSe2 to 185 cm^-1 for CuGaSe2. Such behaviour should be indicative of presence of the asymmetric distribution of Ga and In on a microscopic scale in the films, due to Ga addition. The changes in the tetragonal distortion η lead to a significant variation in the anion displacement parameter U, which should be responsible for the evolution of bond parameters and resultant Raman bands with x.     

The optical properties of MgxZnl-xO thin films

Mg_xZn_1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of Mg_xZn_1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400--760\,nm at the incident angle of 70℃. Both absorption coefficients and optical band gaps of Mg_xZn_1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of Mg_xZn_1-xO films shift to higher energies and band gaps linearly increase from 3.24.eV at x=0 to 3.90\,eV at x=0.30. These results provide important information for the design and modelling of ZnO/ Mg_xZn_1-xO heterostructure optoelectronic devices.     

The Investigation of Bulk and Surface Polariton Modes in Ga1?xNxAs by Using Infrared Magneto Spectroscopy

We present and discuss infrared magnetoplasma reflectivity and surface polariton modes in Ga_1–xN_xAs. It assumed that the sample is characterized by a magnetoplasma dielectric tensor. Surface polariton dispersion for two component magnetoplasma was calculated from reflectivity spectra data. We detect transverse optic phonon of GaN sublattice in 470 cm^-1. The origin of sharp feature in p-polarization reflectivity about 300 cm^–1 as well as LO phonon frequency of GaAs sublattice is due to Brewster mode. An interesting feature of surface modes in Voigt geometry is nonreciprocalicity, which means that the frequency changes when the direction of propagation is reversed. Also, the infrared magnetoplasma reflectivity of GaNAs should be providing determination of the electrons and heavy holes effective mass and carrier's concentration.