用于并行激光直写的连续深浮雕衍射透镜阵列研究

研究了一种用于并行激光直写的连续深浮雕衍射透镜阵列方法.该方法采用连续浮雕衍射透镜阵列替换传统并行激光直写中的物镜阵列,在兼顾系统分辨力基础上,克服了波带片等衍射透镜阵列衍射效率低的缺点;同时因采用深浮雕结构优化环带宽度,可降低阵列的制作难度.针对并行激光直写系统阵列F/#小的特点,在建立连续深浮雕衍射透镜阵列非旁轴近似聚焦模型基础上,设计、制作和测试了波长为441.6 nm,F/#为7.5的连续深浮雕衍射透镜阵阵列.测试结果表明:该阵列的衍射效率优于70%,远高于波带片阵列的40%.     

用于并行激光直写的连续深浮雕衍射透镜阵列研究

研究了一种用于并行激光直写的连续深浮雕衍射透镜阵列方法.该方法采用连续浮雕衍射透镜阵列替换传统并行激光直写中的物镜阵列,在兼顾系统分辨力基础上,克服了波带片等衍射透镜阵列衍射效率低的缺点|同时因采用深浮雕结构优化环带宽度,可降低阵列的制作难度.针对并行激光直写系统阵列F/#小的特点,在建立连续深浮雕衍射透镜阵列非旁轴近似聚焦模型基础上,设计、制作和测试了波长为441.6 nm,F/#为7.5的连续深浮雕衍射透镜阵阵列.测试结果表明：该阵列的衍射效率优于70%,远高于波带片阵列的40%.     

激光直写制作的小F数连续浮雕衍射透镜轴向聚焦特性分析

为确定卷积效应以及深度制作误差对小F数连续浮雕衍射透镜(DOE)轴向聚焦特性影响,基于瑞利-索末菲衍射理论建立了激光直写制作的连续浮雕衍射透镜非旁轴近似轴向光强分布模型.该模型考虑了连续浮雕衍射透镜的轴向衍射聚焦特性与透镜结构参数、写入光斑尺寸和扫描间距以及深度制作误差的关系,克服了傍轴近似条件下传统模型的不精确性.为验证模型的正确性,用激光直写制作了设计波长为441.6 nm,F数为4以及相位匹配因子为3的连续浮雕衍射透镜,并测试了波长441.6 nm激光入射时透镜的轴向聚焦特性.实验与分析表明,该模型分析结果与实验测试结果符合,从而证实模型的有效性,为激光直写制作的小F数连续浮雕衍射透镜的应用提供了理论依据.     

连续型平面衍射聚光透镜掩模的制作

针对目前二元光学元件掩模制作工艺过程的诸多不足,对连续型平面衍射聚光透镜掩模的激光直写制作工艺进行了研究。基于基尔霍夫标量衍射理论,采用光线追迹法设计了连续型平面衍射聚光透镜掩模。采用激光直写技术,利用CLWS 300M／C极坐标激光直写设备、S1830光刻胶和MICROPOSIT 351显影液,进行了刻写实验。实验表明,激光能量、预烘烤温度、显影液浓度以及预曝光对掩模微结构的制作均有影响。最后制作了掩模。与二元光学元件掩模的制作工艺相比,该技术具有工艺简单、制作周期短且易于操作的优点。     

一种二元整形元件激光直写方法的实验研究

为了实现具有复杂位相结构的二元光束整形元件,提出了采用方光点的激光直写系统来逐点光刻浮雕位相结构的方法,通过双远心投影缩微光路获得5-20μm方点,光点尺寸对应于最小位相单元,从而获得了位相结构的高质量直写.分析了高斯光点和方光点位相单元结构对二元整形元件衍射效率的影响,方形两台阶二元整形元件的+1级衍射效率达到31%,给出了实验结果.     

极坐标激光直写系统原点定位的实验研究

分析了旋转线性光栅法对准光轴与旋转机械轴中心的理论准确度,实验研究了极坐标激光直写系统的原点定位.在极坐标激光直写系统下进行了圆环线条写入实验,得出了原点定位的准确度,原点定位准确度优于0.5 μm,实验与理论定位准确度基本一致.     

激光直写制作高阶螺旋相位板及其性能

将拓扑荷为4的螺旋相位光束与平面光干涉的计算全息图输入到空间光调制器中,得到含有多个衍射级次的高阶涡旋光束。为提高衍射效率,利用激光直写技术制作拓扑荷为4的高阶螺旋相位板,经测定,相位板深度理论数值为1.073 m,测量数值为1.082 m,相位板制作误差在0.83%以内。平行光束通过此相位板时,在夫琅和费衍射场获得一个高质量的高阶光学涡旋,光强分布与理论数值基本吻合,衍射效率达到86%。     

直角坐标和极坐标系一体的激光直写设备

介绍了具有直角坐标和极坐标写入系统的激光直写设备,给出了该设备制作衍射光学元件的光刻特点.     

离焦激光直写的线宽稳定方法

为了提高激光直写加工衍射光学元件时的线条质量,提出一种离焦激光直写的线宽稳定方法.该方法通过同时调节激光功率和离焦量,使光刻胶的曝光阈值处于线宽对曝光量的变化率较小位置,从而可以弱化线宽对实际曝光量或光刻胶阈值等变化的敏感度,提高利用离焦方法进行衍射光学元件制作时的线宽稳定性.推导了稳定线宽后的光功率控制模型和线宽模型,模型中的变量仅为离焦量,降低了光功率控制的复杂性.利用632.8 nm的He-Ne激光和NA-0.1的物镜在CCD上对采用该方法后的离焦线宽模型进行验证,实验结果与理论模型吻合较好.该方法对于线宽稳定度较高的衍射光学元件制作具有重要价值.     

低空频模板实现微光变图像的激光直写方法

提出一种采用低空频模板实现微光变图像(micro-optical variable device)的激光直写方法。低空频模版由6×6个不同取向线条状单元图形构成，单元图形由空间光调制器输入，经精缩投影光学系统缩微，在光刻胶面上逐单元曝光。控制单元图形的结构取向能够实现各种复杂设计和特性的微光变图像。在低频光栅模板的基础上，给出了定向散斑结构输入模板的设计方法，它可进一步改进图像的非彩色效果。采用自行研制的SVG-LDW04型激光直写系统制作了微光变图像，其结构特征线度为4μm～100μm。该方法无需机械旋转机构，为实现微光变图像提供了一种便捷有效的手段。     

飞秒激光直写生物凝胶模板原位合成纳米粒子

为了制备具有可控复杂形状和特定化学性质的聚合物微结构,提出了一种飞秒激光直写生物凝胶模板原位合成纳米粒子的方法。首先,采用飞秒激光直写技术加工带有COOH基团的复杂三维结构的生物凝胶模板,用氢氧化钠处理使COOH基团离子化为COO^-基团;然后,用金属盐溶液处理,使金属离子与COO^-基团螯合,形成纳米粒子结晶核。通过多次循环盐溶液处理步骤,控制模板中纳米粒子的粒径与含量。实验结果表明：所制备的生物凝胶模板具有亚100 nm分辨率和10 μm量级尺寸,纳米粒子含量高达9%。该法简单高效,具有很好的应用前景。     

Second harmonic generation by femtosecond Yb-doped fiber laser source based on PPKTP waveguide fabricated by femtosecond laser direct writing

The frequency doubling of femtosecond pulses from an Yb-doped fiber laser source was demonstrated in a PPKTP waveguide fabricated by femtosecond laser direct writing. The PPKTP waveguide contains a fixed period of 8.9 μm and the feomtosecond fundamental pulses have a central wavelength of 1044 nm. A maximum SHG power of 406 mW was produced, yielding a conversion efficiency of 5.6%. Numerical simulations were carried out to investigate the property of frequency doubling for femtosecond pulses. The results show that the SHG process proceeds even the quasi-phase-matching (QPM) condition is not well satisfied, which is significantly different from that of “long” pulses or CW light and is accorded with the experimental results.     

Low cost fabrication of SiO2 optical waveguides by laser direct writing on Ti-doped Sol-Gel films

A commercial direct laser writing (DLW) system operating at 1070 nm was used to fabricate SiO₂ optical waveguides on silicon wafers. A Ti-doped SiO₂ Sol-Gel film was deposited on the SiO₂/Si substrate by the dip-coating technique, based on which SiO₂ optical waveguides were patterned by DLW using a Ytterbium fiber laser and followed by chemical etching. The effects of laser parameters and the preheated temperature of Sol-Gel films on the dimensions of optical waveguides were studied systematically. The differences of etching rate between laser irradiated and non-irradiated areas in Sol-Gel films preheated at various temperatures are characterized by measuring the thickness of the films. Results demonstrate that the available laser power density range for laser densification and the width of the patterned optical waveguides are influenced strongly by the preheated temperature of the Sol-Gel films. The width of the optimized optical waveguide in this work is 25 μm. The minimum propagation loss of the fabricated optical waveguides is 1.7 dB cm⁻¹ at the wavelength of 1550 nm.     

3D integration of microcomponents in a single glass chip by femtosecond laser direct writing for biochemical analysis

3D integration of microcomponents in a single glass chip by femtosecond laser direct writing followed by post annealing and successive wet etching is described for application to biochemical analysis. Integration of microfluidics and microoptics realized some functional microdevices like a μ-fluidic dye laser and a biosensor. As one of practical applications, we demonstrate inspection of living microorganisms using the microchip with 3D microfluidic structures fabricated by the present technique.     

Model analysis of effect of diffraction focus characteristics of microlens arrays on parallel laser direct writing quality

In order to study the effect of diffraction focusing characteristics of microlens arrays on the parallel laser direct writing quality, we use nonparaxial approximation to analyze the diffraction focus characteristic of a single microlens, take into consideration the cross-talk effect of a number of microlenses on the diffraction focusing characteristics of an array, and establish a theoretical focusing intensity model of a microlens array to describe the influence of a change in F-number and/or center distance on the diffraction focusing characteristics of a parallel laser direct writing system while incident writing laser is normal. Numerical simulation results indicate that there is a cross-talk effect among microlenses which increases as the F-number increases when the center distance is the same as the smaller aperture, and parallel writing quality can be improved by reducing or totally eliminating the cross-talk effect by reducing F-number and/or increasing center distance.     

Surface characteristics of SiO2-TiO2 strip fabricated by laser direct writing

SiO2-TiO2 sol-gel films axe deposited on SiO2/Si by dip-coating technique.The SiO2-TiO2 strips are fabricated by laser direct writing using an ytterbium fiber laser and followed by chemical etching.Surface structures,morphologies and roughness of the films and strips are characterized.The experimental results demonstrate that the SiO2-TiO2 sol-gel film is loose in structure and a shrinkage concave groove forms if the film is irradiated by laser beam.The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time.But the roughness of laser irradiated area increases more than thalt of non-irradiated area under the same etching time.After being etched for 28 s,the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.     

An azobenzene functionalized polymer for laser direct writing waveguide fabrication

We report on non-lithographic laser direct writing fabrication of optical waveguides by using a 4′-hydroxy-4-nitroazobene dye-functionalized polymer film. The polymer film reveals permanent change of refractive index at high laser illumination intensity. A focused continuous wave low power green laser beam at 532 nm wavelength is used to directly write waveguide structures on the polymer film. The magnitude of refractive index increase at film surface is about 0.006. One-step laser writing results in graded index waveguides in film depth direction under ambient conditions without pre- and post-processing. As a by-product, the laser writing also results in a very small air valley at the boundary between the laser written and non-written regions which may contribute in part although minimal to the waveguide lateral confinement and can be used for visual observation of waveguide patterns. The fabricated waveguide is found to be stable and easily reproducible.     

Laser writing techniques for photomask fabrication using a femtosecond laser

Photomasks are the backbone of microfabrication industries. Currently they are fabricated by a lithographic process, which is very expensive and time consuming since it is a multi-step process. These issues can be addressed by fabricating photomasks by direct femtosecond laser writing, which is a single-step process and comparatively cheaper and faster than lithography. In this paper we discuss our investigations on the effect of two types of laser writing techniques, namely front- and rear-side laser writing, with regard to the feature size and the edge quality of a feature. It is proved conclusively that for the patterning of masks, front-side laser writing is a better technique than rear-side laser writing with regard to smaller feature size and better edge quality. Moreover the energy required for front-side laser writing is considerably lower than that for rear-side laser writing. Received: 22 May 2001 / Accepted: 14 September 2001 / Published online: 17 October 2001     

Influence of scanning velocity on femtosecond laser direct writing lines on FOTURAN glass

Lines are induced on the surface of a photosensitive (FOTURAN) glass by focused femtosecond laser transverse writing with scanning velocity in a wide range of 40- 1800μm/s. The formed lines are analyzed using scanning electron microscope (SEM) and optical microscope (OM). It is observed that three distinct morphologies of lines are produced depending on the scanning velocity. Lines written in low velocity level (40 - 100 μm/s) and high velocity level (1000 - 1800 μm/s) are uniform and regular, while those written in moderate velocity level (150 - 600 μm/s) are rough. The influence of scanning velocity is explained based on different pulses overlapping or cumulative dose of laser exposure in irradiated area. Fabrication of shallow groove on the surface is also demonstrated.