电源向负载输出最大功率条件的另两种数学推导方法

在纯电阻电路中,电源向负载输出最大功率的条件,通常采用配方的方法进行推导的。笔者现结合数学上的不等式及几何结论,给出另外两种推导方法。     

硅异质结太阳能电池工艺优化

硅异质结太阳能电池的制作过程中,所有工艺步骤都会影响其性能.通过扫描电镜、反射率、量子效率及少子寿命测试,逐步优化硅异质结太阳能电池的性能.结果表明,单晶硅片钝化的最佳锥体尺寸约为6～9μm.利用高质量的本征氢化非晶硅(a-Si:H)薄膜钝化硅片,获得了超过5 ms的少数载流子寿命.采用大带隙p型a-SiCx:H薄膜替...     

谈电路中的最大功率问题

最大功率,原则上是指电源输出的最大功率,即负载消耗最大功率,从而来实现负载与电源匹配．但实际电路中电源通常无法达到理论上的最大功率输出状态,且有时我们并不是求电源的输出最大功率,而是求某一负载消耗的最大功率,因而使得问题复杂化．     

"比例因子法"分析负载获得最大功率

负载上获得最大功率的问题是讨论输出功率时常遇到的．若电源电动势为L，内阻为r，负载是纯电阻，阻值为R，（如图1），负载电阻R获得最大功率：     

对最大输出功率的说明

1 问题的提出 电源电动势为E,内阻为r,外电路为一滑动变阻器R外. 试分析:外电阻为多大时,电源输出功率最大?     

超声波电发生器的最大输出功率和效率

本文从电路理论中的最大功率传输定理出发，分析了超声波电发生器与普通电源的异同，提出了最大功率传输定理的扩展条件，从而将一般电源的匹配和超声波发生器的匹配这两种概念统一起来。文章应用扩展后的最大功率传输定理，从一个新的角度对超声波电发生器的最大输出功率和效率进行了分析，得到与图解法等其他方法相同的结果。     

两种非纯电阻电路的最大输出功率

给出了含电动机、变压器两类非纯电阻电路最大输出功率的求法,以便使学生能加以比较,从而灵活处理电源最大输出功率问题.     

减小边缘复合助力28%效率的四端钙钛矿/硅叠层太阳能电池

钙钛矿/硅叠层太阳能电池由于能突破单结太阳能电池的效率极限而吸引了广泛的研究兴趣.然而,在将商业化的大面积硅电池切割为实验室所需的平方厘米级的小面积电池时,会造成显著的效率下降,限制了叠层电池的性能.为了消除传统的激光切割法造成的热损伤和热传导,减少切割后的异质结硅电池的非辐射复合,本工作采用砂轮划片这一冷加工方法,对异质结硅电池进行切割.与采用激光切割法得到的器件相比,冷加工法得到的异质结硅电池的截面损伤小,非辐射复合得到显著抑制,器件的开路电压和填充因子均得到提高,平均光电转换效率提高了1%.将得到的硅电池与正式半透明钙钛矿太阳能电池进行机械堆叠,获得了效率超过28%的四端钙钛矿/硅叠层太阳能电池.     

非晶硅太阳能电池

 能源是人类生存不可缺少的重要资源。随着世界人口爆涨,能量消耗急骤增长,人们为了求得生存和发展,都在竭尽全力开发现有的常规能源（煤、石油、天然气等）,同时也不断寻找新型能源。     

探究不同波长的光对太阳能电池功率的影响

介绍了利用自制的太阳能电池特性测试装置和不同颜色的滤光片探究不同波长的光对太阳能电池功率的影响.当波长较长的光照射时,电池片的功率相对较高;而在光波长较短的范围内,电池片功率相对较低.     

钙钛矿/晶硅叠层太阳能电池的研究进展

有机—无机杂化钙钛矿电池因其禁带宽度可调、光吸收系数高、光电转化效率高、制备成本低等优点而被用于硅基叠层太阳能电池中,使得太阳能电池的转换效率提高,生产成本降低,应用范围也更为广泛。文章介绍了钙钛矿吸收材料和钙钛矿/晶硅叠层电池的工作原理,对钙钛矿/晶硅叠层电池的类别、影响其性能的主要因素进行了归纳综述,对钙钛矿/晶硅叠层电池未来发展进行了展望。     

光管理在晶体硅电池中的应用

光管理是提高晶体硅太阳能电池光吸收和短路电流（Jsc）进而提高转换效率的重要因素之一。本文回顾了最常见的光管理方式,包括表面抗反射、散射以及陷光等。为了降低晶体硅电池的表面反射损失,开发了多种表面抗反射结构。例如,仿生蛾眼结构利用渐变折射率实现了宽光谱低反射率,其表面反射率可达1％以下。随着晶体硅电池衬底减薄,光管理要求更加严格,除了在更宽波长范围内达到超低反射率外,还需要在更高的入射角范围内实现低反射率。此外,利用前表面散射以及背表面陷光结构提高红外光的吸收光程对于晶体硅电池特别是薄衬底晶体硅电池的有效光吸收具有重要意义。     

减反膜对单晶硅太阳能电池性能的影响分析

在太阳能电池效率的评价中,电池材料、掺杂浓度、扩散长度等都是比较重要的参数,合理地改变相关参数可以优化太阳能电池的性能,提高电池效率。此外,在太阳能电池表面镀一层具有减反作用的光学薄膜（简称减反膜）也是提高电池效率的重要手段。以提高电池效率为目标,对单晶硅太阳能电池的掺杂浓度和扩散长度等微观参数进行计算优化,分析了掺杂浓度和扩散长度变化对电池效率的影响。并在此基础上分析了不同类型的减反膜对于电池效率的影响,给出了最佳减反膜材料及其膜系厚度,并且结合镀膜后电池量子效率的变化验证了其准确性。结果表明,在优化电池掺杂浓度和扩散长度的基础上,选择合适的减反膜,电池效率最高可达20.35%,相比于优化前提高了8.25%。     

Effect of temperature on crystalline silicon solar cells processed from chemical and metallurgical route

Effect of temperature on monocrystalline and multicrystalline silicon solar cells processed from chemical (EG-Si) and metallurgical (SoG_M-Si) routes was investigated in the range of 280–350 K. The temperature coefficients of important parameters related with the cell property were discussed. Experimental results indicate that the T-coefficient of conversion efficiency (η) of multicrystalline EG-Si cell processed from chemical is only 68% that of the monocrystalline EG-Si cell. Furthermore, the η of both types of SoG_M-Si cells decrease much less than that of the EG-Si cells with the increase in temperature. Additionally, the recombination fraction, the minority carrier lifetime, the carrier mobility decrease and the band-gap shrinkage were also investigated to reveal the intrinsic temperature dependence mechanism. In order to confirm the results, we used numerical simulation software AMPS-1D (analysis of microelectronic and photonic structure in one dimension program) to simulate the temperature dependence of solar cell performances. The results of numerical simulation were basically consistent with the experimental results.     

Amorphous/crystalline silicon heterojunction solar cells with black silicon texture

Excellent passivation of black silicon surfaces by thin amorphous silicon layers deposited with plasma enhanced chemical vapor deposition is demonstrated. Minority charge carrier lifetimes of 1.3 milliseconds, enabling an implied open‐circuit voltage of 714 mV, were achieved. The influence of amorphous silicon parasitic epitaxial growth and thickness, as well as of the texture depth is investigated. Furthermore, quantum efficiency gains for wavelengths above 600 nm, as compared to random textured solar cells, are demonstrated in 17.2% efficient amorphous–crystalline silicon heterojunction solar cells with black silicon texture. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Improved performance of solar cell based on porous silicon surfaces

Porous silicon (PS) surfaces were fabricated by electrochemical etching for both sides of the Si wafer. The objective of the present study is to investigate the PS effect on performance of silicon solar cells. Moreover, enhancement of solar cell efficiency can be obtained by manipulating of the reflected mirrors, and the process is very promising for solar cells manufacturing due to its simplicity, lower cost and suitability for mass production. The surface of PS is observed to have been discrete pores with smooth walls, and with short branches pores for the polished wafer side. In contrast, the etched backside of the wafer was observed to have bigger pore size than the etched polished side, and pores on the surface are in random location. PS formed on the both sides has lower reflectivity value in comparison to the other researcher group. The increase in efficiency of solar cell fabricated with PS formed on both sides of the wafer were extremely observed in comparison to one side PS and bulk silicon solar cells respectively. Solar cell fabricated shows that the conversion efficiency increased to 14.5% in comparison to unetched sample. The porous surface texturing properties could enhance and increased the conversion efficiency of silicon solar cells, these results also showed that the efficiency with this procedure is more promising in comparison to other solar cells, which are fabricated under similar conditions.     

Improved performance of a crystalline silicon solar cell based on ZnO/PS anti-reflection coating layers

A porous silicon (PS) layer was prepared by photoelectrochemical etching (PECE), and a zinc oxide (ZnO) film was deposited on a PS layer using a radio frequency (RF) sputtering system. The surface morphology of the PS and ZnO/PS layers was characterised using scanning electron microscopy (SEM). Nano-pores were produced in the PS layer with an average diameter of 5.7 nm, which increased the porosity to 91%. X-ray diffraction (XRD) of the ZnO/PS layers shows that the ZnO film is highly oriented along the c-axis perpendicular to the PS layer. The average crystallite size of the PS and ZnO/PS layers are 17.06 and 17.94 nm, respectively. The photoluminescence (PL) emission spectra of the ZnO/PS layers present three emission peaks, two peaks located at 387.5 and 605 nm due to the ZnO nanocrystalline film and a third located at 637.5 nm due to nanocrystalline PS. Raman measurements of the ZnO/PS layers were performed at room temperature (RT) and indicate that a high-quality ZnO nanocrystalline film was formed. Optical reflectance for all the layers was obtained using an optical reflectometer. The lowest effective reflectance was obtained for the ZnO/PS layers. The fabrication of crystalline silicon (c-Si) solar cells based on the ZnO/PS anti-reflection coating (ARC) layers was performed. The I–V characteristics of the solar cells were studied under 100 mW/cm² illumination conditions. The ZnO/PS layers were found to be an excellent ARC and to exhibit exceptional light-trapping at wavelengths ranging from 400 to 1000 nm, which led to a high efficiency of the c-Si solar cell of 18.15%. The ZnO/PS ARC layers enhance and increase the efficiency of the c-Si solar cell. In this paper, the fabrication processes of the c-Si solar cell with ZnO/PS ARC layers are an attractive and promising technique to produce high-efficiency and low-cost of c-Si solar cells.     

晶体硅太阳电池表面纳米线阵列减反射特性研究

为增强晶体硅太阳电池的光利用率, 提高光电转换效率, 研究了硅纳米线阵列的光学散射性质. 运用严格耦合波理论对硅纳米线阵列在310—1127 nm波段的反射率进行了模拟计算, 用田口方法对硅纳米线阵列的表面传输效率进行了优化. 结果表明, 当硅纳米线阵列的周期为50 nm, 占空比为0.6, 高度约1000 nm时减反射效果最佳; 该结构在上述波段的平均反射率约为2%, 且在较大入射角度范围保持不变. 采用金属催化化学腐蚀法, 于室温、室压条件下在单晶硅表面制备周期为60 nm,占空比为0.53, 高度为500 nm的硅纳米线阵列结构, 其反射率的实验测试结果与计算模拟值相符, 在上述波段的平均反射率为4%—5%, 相对于单晶硅35%左右的反射率, 减反射效果明显. 这种减反射微结构能够在降低太阳电池成本的同时有效减小单晶硅表面的光反射损失, 提高光电转换效率.     

Research on the optimum hydrogenated silicon thin films for application in solar cells

Hydrogenated silicon (Si:H) thin films for application in solar cells were deposited by using very high frequency plasma enhanced chemical vapour deposition (VHF PECVD) at a substrate temperature of about 170℃. The electrical, structural, and optical properties of the films were investigated. The deposited films were then applied as i-layers for p-i-n single junction solar cells. The current--voltage (I-V) characteristics of the cells were measured before and after the light soaking. The results suggest that the films deposited near the transition region have an optimum properties for application in solar cells. The cell with an i-layer prepared near the transition region shows the best stable performance.