Formation of AlxGa1−xAs periodic array of micro-hexagonal pillars and air holes by selective area MOVPE

A two-dimensional (2D) periodic array having air/semiconductor interfaces can be applied to photonic crystals (PCs), which are expected to control spontaneous emission and optical transports in the next-generation devices. In this paper, we report on the selective area metal-organic vapor phase epitaxial (SA-MOVPE) growth of a Al_xGa_1−xAs 2D periodic array on a GaAs (1 1 1)B substrate for application to 2DPCs having GaAs/AlGaAs heterostructures. Al_xGa_1−xAs (x=0, 0.25 and 0.50) growth was carried out on triangular lattice array of hexagonal GaAs openings and hexagonal SiN_x masks. A uniform Al_0.50Ga_0.50As hexagonal pillar array and a GaAs hexagonal air-hole array with a 1 μm-period were successfully obtained. The important growth parameter for uniform 2DPC structure formation by SA-MOVPE was clarified. Furthermore, we describe the successful demonstration of a 400 nm-period pillar array and an air-hole array, which corresponds to the optical communication wavelength λ=1.3–1.55 μm. The results indicate that SA-MOVPE method is very promising for the formation of uniform semiconductor 2DPCs without the occurrence of process-induced damages.     

Fractal dimension study of polaron effects in cylindrical GaAs/AlxGa1−xAs core–shell nanowires

Polaron effects in cylindrical GaAs/Al_xGa_1−xAs core–shell nanowires are studied by applying the fractal dimension method. In this paper, the polaron properties of GaAs/AlxGa1-xAs core–shell nanowires with different core radii and aluminum concentrations are discussed. The polaron binding energy, polaron mass shift, and fractal dimension parameter are numerically determined as functions of shell width. The calculation results reveal that the binding energy and mass shift of the polaron first increase and then decrease as the shell width increases. A maximum value appears at a certain shell width for different aluminum concentrations and a given core radius. By using the fractal dimension method, polaron problems in cylindrical GaAs/Al_xGa_1-xAs core–shell nanowires are solved in a simple manner that avoids complex and lengthy calculations.     

内嵌InAs量子点的δ掺杂GaAs/AlxGa1-xAs二维电子气特性分析

采用分子束外延技术对δ掺杂GaAs/Al_xGa_1-xAs二维电子气(2DEG)样品进行了生长. 在样品生长过程中, 分别改变掺杂浓度(N_d)、空间隔离层厚度(W_d) 和Al_xGa_1-xAs中Al组分(x_Al)的大小, 并在双温(300 K, 78 K)条件下对生长的样品进行了霍尔测量; 结合测试结果, 分别对N_d, W_d及x_Al与GaAs/Al_xGa_1-xAs 2DEG的载流子浓度和迁移率之间的关系规律进行了细致的分析讨论. 生长了包含有低密度InAs量子点层的δ掺杂GaAs/Al_xGa_1-xAs 2DEG 样品, 采用梯度生长法得到了不同密度的InAs量子点. 霍尔测量结果表明, 随着InAs量子点密度的增加, GaAs/Al_xGa_1-xAs 2DEG的迁移率大幅度减小, 实验中获得了密度最低为16×10⁸/cm²的InAs量子点样品. 实验结果为内嵌InAs量子点的δ掺杂GaAs/Al_xGa_1-xAs 2DEG的研究和应用提供了依据和参考. 关键词： 二维电子气 InAs量子点 载流子浓度 迁移率     

Interface-related effects on confined excitons in GaAs/AlxGa1−xAs single quantum wells

Confined excitons in non-abrupt GaAs/Al_xGa_1−xAs single quantum wells are studied. The graded interfaces are described taking into account fluctuations in their thickness a and positioning with respect to the abrupt interface picture. Numerical results for confined (0,0),(1,1) and (0,2) excitons in GaAs/Al_0.3Ga_0.7As quantum wells show that while the interfacial fluctuations produce small changes (<0.5 meV) in the exciton binding energies, the confined exciton energies can be red- or blue-shifted as much as 25 meV for wells with mean width of 50 Å and 2 ML wide interfaces.     

Physical characterization of OMVPE-grown AlxGa1-xAs multi-layer films by means of non-destructive optical reflectometry

A novel Fourier transform technique which was developed by us previously, is applied in this work for non-destructive determination of thickness and refractive index steps of experimental multilayer heteroepitaxial structures. No time consuming least-squares curve-fits are required and theoretically there is no limit on the number of layers which can be analyzed. In order to demonstrate the above method experimentally, multilayer structures of Al_xGa_1-xAs containing up to five layers on GaAs substrates, were grown by organometallic vapour phase epitaxy (OMVPE). For calibration purposes, initial experiments involved the growth of Al_xGa_1-xAs single epilayers on GaAs substrates by the same technique. Layers were grown at five different compositions from x = 0.1 to x = 0.5. Both photoluminescence (at 12 K) and double-crystal X-ray diffraction measurements were undertaken on the single layers in order to establish the composition of the material. The results show excellent correspondence with each other. These results were also compared to secondary ion mass spectrometry data. The agreement between the optical technique developed by us and the other analytical methods was excellent.     

GaAs薄膜的有效量子限制长度及其极化子特性

本文用分数维方法研究Al_xGa_1-xAs衬底上GaAs薄膜中的极化子特性, 提出了确定GaAs薄膜的有效量子限制长度的一个新方法, 解决了原来方法中在衬底势垒处有效量子限制长度发散的困难, 得到了Al_xGa_1-xAs衬底上GaAs薄膜中的极化子的维数和结合能. 关键词： 分数维方法 极化子 GaAs薄膜     

Fractional-dimensional approach for excitons in GaAsfilms on AlxGa1-xAs substrates

Binding energies of excitons in GaAs films on Al_xGa_1-xAs substrates are studied theoretically with the fractional-dimensional approach. In this approach, the real anisotropic “exciton+film” semiconductor system is mapped into an effective fractional-dimensional isotropic space. For different aluminum concentrations and substrate thicknesses, the exciton binding energies are obtained as a function of the film thickness. The numerical results show that, for different aluminum concentrations and substrate thicknesses, the exciton binding energies in GaAs films on Al_xGa_1-xAs substrates all exhibit their maxima with increasing film thickness. It is also shown that the binding energies of heavy-hole and light-hole excitons both have their maxima with increasing film thickness.     

全光固体条纹相机的理论及其静态实验研究

全光固体条纹相机采用空间调制抽运光激发平板波导光偏转器,通过精确控制抽运光和信号光之间的时间延迟,实现对入射到波导芯层信号光的偏转扫描.它能有效解决传统变像管条纹相机因空间电荷效应造成的动态范围降低以及光电阴极材料在红外波段探测受限等问题,且结构简单,系统稳定性高,理论时间分辨率可达皮秒甚至亚皮秒量级.本文围绕全光固体条纹相机的核心部件—–AlxGa1-xAs/GaAs/AlxGa1-xAs平板波导光偏转器,研究了在带填充效应、带隙收缩效应以及自由载流子吸收效应作用下GaAs折射率的变化情况;在GaAs折射率变化达到0.01量级,信号光束斑大小和波导宽度之比p=0.5时,得到系统的理论时间分辨率为2 ps;按照静态实验条件求得的理论空间分辨率为17 lp/mm,实验结果显示其值为9 lp/mm.     

Characteristics of cylindrical surrounding-gate GaAs_xSb_(1-x)/In_yGa_(1-y)As heterojunction tunneling field-effect transistors

A Ⅲ-Ⅴ heterojunction tunneling field-effect transistor(TFET) can enhance the on-state current effectively,and GaAs_xSb_1_x/In_yGa_1_yAs heterojunction exhibits better performance with the adjustable band alignment by modulating the alloy composition.In this paper,the performance of the cylindrical surrounding-gate GaAs_xSb_1_x/In_yGa_1_yAs heterojunction TFET with gate-drain underlap is investigated by numerical simulation.We validate that reducing drain doping concentration and increasing gate-drain underlap could be effective ways to reduce the off-state current and subthreshold swing(SS),while increasing source doping concentration and adjusting the composition of GaAs_xSb_1_xIn_yGa_1_yAs can improve the on-state current.In addition,the resonant TFET based on GaAs_xSb_1_x/In_yGa_1_yAs is also studied,and the result shows that the minimum and average of SS reach 11 mV/decade and 20 mV/decade for five decades of drain current,respectively,and is much superior to the conventional TFET.     

Electrically-manipulable electron-momentum filter based on antiparallel asymmetric double δ-magnetic-barrier semiconductor microstructure

We theoretically investigate the wave-vector filtering(WVF) effect for electrons in an antiparallel asymmetric doubleδ-magnetic-barrier microstructure under a bias, which can be fabricated experimentally by patterning two asymmetric ferromagnetic(FM) stripes on the top and the bottom of GaAs/Al_xGa_(1-x) As heterostructure, respectively. It is found that an appreciable WVF effect appears because of an essentially two-dimensional(2D) process for electrons across this microstructure. WVF effect is found to be sensitive to the applied bias. WVF efficiency can be tuned by changing bias,which may lead to an electrically-controllable momentum filter for nanoelectronics device applications.     

不同散射机理对 Al2O3/InxGa1-xAs nMOSFET 反型沟道电子迁移率的影响

通过考虑体散射、界面电荷的库仑散射以及 Al₂O₃/In_xGa_1-xAs 界面粗糙散射等主要散射机理, 建立了以 Al₂O₃为栅介质In_xGa_1-xAs n 沟金属-氧化物-半导体场效应晶体管 (nMOSFETs) 反型沟道电子迁移率模型, 模拟结果与实验数据有好的符合. 利用该模型分析表明, 在低至中等有效电场下, 电子迁移率主要受界面电荷库仑散射的影响; 而在强场下, 电子迁移率则取决于界面粗糙度散射. 降低界面态密度, 减小 Al₂O₃/In_xGa_1-xAs 界面粗糙度, 适当提高In含量并控制沟道掺杂在合适值是提高 InGaAs nMOSFETs 反型沟道电子迁移率的主要途径. 关键词： InGaAs MOSFET 反型沟道电子迁移率 散射机理     

First-principles calculations of structural and electronic properties of Tl_xGa_(1-x)As alloys

The zincblende ternary alloys Tl_xGa_(1-x) As(0 x 1) are studied by numerical analysis based on the plane wave pseudopotential method within the density functional theory and the local density approximation. To model the alloys,16-atom supercells with the 2 × 2 × 2 dimensions are used and the dependency of the lattice parameter, bulk modulus,electronic structure, energy band gap, and optical bowing on the concentration x are analyzed. The results indicate that the ternary Tl_xGa_(1-x) As alloys have an average band gap bowing parameter of 4.48 eV for semiconductor alloys and 2.412 eV for semimetals. It is found that the band gap bowing strongly depends on composition and alloying a small Tl content with GaAs produces important modifications in the band structures of the alloys.     

Valuing of the critical layer thickness from the deading time constant of RHEED oscillation in the case of InxGa1−xAs/GaAs heterojunction

In this work, we have looked for the correlation between the observed decay of reflection high-energy electron diffraction intensity oscillation and the critical layer thickness in the case of strained In_xGa_1−xAs/GaAs heterojunctions. The value of deading time constant of oscillation depends on the mismatch and on growth parameters, too. The decay of oscillation was described by two deading time constants which are responsible for the influences of the parameters mentioned above. The critical layer thickness was valued from the deading time constant responsible for the influence of mismatch only. The critical layer thickness determined this way shows good agreement with the theoretical model.     

GaAs/Al0.23Ga0.77As双量子阱的带边不连续性和阱间耦合

本文报道在300和77K对一组具有不同垒宽L_b0.23Ga_0.77As双量子阱样品的光调制反射谱(PR)的研究结果。除观察到11H,11L和22H等容许跃迁外,同时还识别一个从Al_0.23Ga_0.77As价带顶至量子阱第一电子束缚能级的跃迁,另一个从量子阱第一轻空穴束缚能级至Al_0.23Ga_0.77As导带底的跃迁。利用这些跃迁确定导带边不连续性为0.63。对L_{b关键词：}     

BxGa1-xAs合金电子结构与光学性质的第一性原理计算

基于密度泛函理论的第一性原理和特殊准随机近似方法,建立64原子的超胞并且对结构进行几何优化.计算和讨论具有闪锌矿结构的三元合金B_xGa_1-xAs的结构参数、电子结构和光学性质.结果表明：B_xGa_1-xAs的晶格常数与使用Vegard定理计算得到的值有微弱的偏离,键长存在明显的弛豫;计算得到的合金带隙弯曲参数变化较小（2.57 eV-5.01 eV）而且对组分变化的依赖很弱;最后分析硼的并入对GaAs光学参数包括介电函数、反射率、折射率、吸收系数和能量耗散函数的影响.     

Interband Stark effects in InxGa1−xAs/InyAl1−yAs coupled step quantum wells

The effects of an electric field on the interband transitions in In_xGa_1−xAs/In_yAl_1−yAs coupled step quantum wells have been investigated both experimentally and theoretically. A In_xGa_1−xAs/In_yAl_1−yAs coupled step quantum well sample consisted of the two sets of a 50 Å In_0.53Ga_0.47As shallow quantum well and a 50 Å In_0.65Ga_0.35As deep step quantum well bounded by two thick In_0.52Al_0.48As barriers separated by a 30 Å In_0.52Al_0.48As embedded potential barrier. The Stark shift of the interband transition energy in the In_xGa_1−xAs/In_yAl_1−yAs coupled step quantum well is larger than that of the single quantum well, and the oscillator strength in the In_xGa_1−xAs/In_yAl_1−yAs coupled step quantum well is larger than that in a coupled rectangular quantum well. These results indicate that In_xGa_1−xAs/In_yAl_1−yAs coupled step quantum wells hold promise for potential applications in optoelectron devices, such as tunable lasers.     

缓冲层InxGa1-xAs组分对In0.82Ga0.18As结晶质量和表面形貌的影响

采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In_0.82Ga_0.18As材料.研究缓冲层In_xGa_1-xAs的In组分对In_0.82Ga_0.18As结晶质量和表面形貌的影响.X射线衍射(XRD)用于表征材料的组分和结晶质量.用扫描电子显微镜(SEM)观察样品的表面形貌.实验结果表明,低温生长的缓冲层In_xGa_1-xAs的In组分影响高温生长的外延层In_0.82Ga_0.18As的结晶质量和表面形貌.测量得到四个样品的外延层In_0.82Ga_0.18As的X射线衍射谱峰半峰全宽(FWHM)为0.596°,0.68°,0.362°和0.391°,分别对应缓冲层In组分x=0.28,0.53,0.82,0.88,当缓冲层In组分是0.82时,FWHM最窄,表明样品的结晶质量最好.SEM观察四个样品的表面形貌,当缓冲层In组分是0.82时,样品的表面平整,没有出现交叉平行线或蚀坑等缺陷,表面形貌最佳.     

Scattering-controlled recombination of Δ2-light-hole indirect excitons and apparently enhanced quantum confined Stark effect in tensilely strained Si1−yCy/Si (0 0 1) quantum wells

Anomalies are found in the near-band-edge luminescence properties of Δ₂-light-hole indirect excitons in Si_1−yC_y-based tensilely strained quantum wells (QWs). The experimental spectra exhibit a clear signature of phonon-assisted transitions on the lower energy side of the “no-phonon” transition, which indicates the relevance of “virtual” indirect valleys and in-plane k-dispersion, as opposed to the theoretical prediction that the zone-centered Δ₂ valleys take over the conduction band edge. Intervalley scattering between [0 0 1]-Δ₂ valleys and in-plane Δ₄ valleys is suggested as the underlying mechanism. On the other hand, the experimental evidence was found for “apparently enhanced” quantum-confined Stark red shifts for Si_1−yC_y-based QWs. However, quantitative estimates are in conflict with the experimental results and predict a blue shift due to exciton weakening which masks the Stark effect as in the case of Δ₄-heavy hole excitons in Si_1−xGe_x-based QWs.     

Characterization of alloy composition in Ga1-xAlxAs/GaAs structures: comparison of photovoltage, X-ray, SIMS and RHEED techniques

A comparative study of techniques for the characterization of alloy composition in Ga_1-xAl_xAs/GaAs single and multilayer structures has been carried out. Good agreement (x ± 0.015) is demonstrated between double-crystal X-ray diffraction and photovoltage spectroscopy measurements using the generally accepted calibration of Casey and Panish. A slightly modified form of the band gap versus composition curve is presented which further improves the agreement to x±0.005. Profiling conditions achieving linear SIMS Al profiles are reported, yielding compositions in agreement with PVS and X-ray within x+-0.01 (when calibrated at a single composition). A systematic discrepancy between results from the above techniques and in-situ RHEED oscillation measurements is reported.     

Manipulation of a temporal electron-spin splitter via a δ-potential in an embedded magnetic-electric-barrier microstructure

We theoretically explore the manipulation of a temporal electron-spin splitter by a δ-potential in an embedded magnetic-electric-barrier microstructure (EMEBM), which is constructed by patterning a ferromagnetic stripe and a Schottky-metal stripe on the top and bottom of an InAs/Al_xIn_1−xAs heterostructure, respectively. Spin polarization of the dwell time remains, even though a δ-potential is inserted by atomic-layer doping. Both the magnitude and sign of the spin-polarized dwell time can be manipulated by changing the weight or position of the δ-potential. Thus, a structurally controllable temporal electron-spin splitter can be obtained for spintronics device applications.