Nanocrystalline ZnO film deposited by ultrasonic spray on textured silicon substrate as an anti-reflection coating layer

A ZnO thin film was successfully synthesized on glass, flat surface and textured silicon substrates by chemical spray deposition. The textured silicon substrate was carried out using two solutions (NaOH/IPA and Na₂CO₃). Textured with Na₂CO₃ solution, the sample surface exhibits uniform pyramids with an average height of 5 μm. The properties and morphology of ZnO films were investigated. X-ray diffraction (XRD) spectra revealed a preferred orientation of the ZnO nanocrystalline film along the c-axis where the low value of the tensile strain 0.26% was obtained. SEM images show that all films display a granular, polycrystalline morphology. The morphology of the ZnO layers depends dramatically on the substrate used and follows the contours of the pyramids on the substrate surface. The average reflectance of the textured surface was found to be around 13% and it decreases dramatically to 2.57% after deposition of a ZnO antireflection coating. FT-IR peaks arising from the bonding between Zn–O are clearly represented using a silicon textured surface. A very intense photoluminescence (PL) emission peak is observed for ZnO/textured Si, revealing the good quality of the layer. The PL peak at 380.5 nm (UV emission) and the high-intensity PL peak at 427.5 nm are observed and a high luminescence occurs when using a textured Si substrate.     

Characterization of N-doped ZnO layers grown on (0 0 0 1) GaN/Al2O3 substrates by molecular beam epitaxy

We investigated the optical properties and electrical properties of N-doped ZnO layers grown on (0 0 0 1) GaN/Al₂O₃ substrates by molecular beam epitaxy, employing 10 K photoluminescence (PL) measurements, current–voltage (IV) measurements, capacitance–voltage (CV) measurements, and 100 K photocapacitance (PHCAP) measurements. 10 K PL spectra showed that excitonic emission is dominant in N-doped ZnO layers grown after O-plasma exposure, while overall PL emission intensity is significantly reduced and deep level emission at around 2.0 2.2 eV is dominant in N-doped ZnO layers grown after Zn exposure. IV and CV measurements showed that N-doped ZnO layers grown after Zn exposure have better Schottky diode characteristics than O-plasma exposed samples, and an N-doped ZnO layer grown at 300 °C after Zn exposure has best Schottky diode characteristics. This phenomenon is presumably due to lowered background electron concentration induced by the incorporation of N. PHCAP measurements for the N-doped ZnO layer revealed several midgap trap centers at 1.2 1.8 eV below conduction band minimum.     

Effect of ZnO sacrificial layer thickness on the structure and optical properties of GaN nanoparticles prepared by RF magnetron sputtering

GaN nanoparticles were prepared on sapphire (0001) substrates with ZnO sacrificial layers by self assembly of Ga₂O₃ films in their reaction with NH₃. ZnO sacrificial layers with different thicknesses and Ga₂O₃ films were deposited on sapphire substrates in turn by a radio frequency (RF) magnetron sputtering system. Nitridation of the Ga₂O₃ films was then carried out in a quartz tube furnace. The effect of ZnO sacrificial layer thickness on the structure and optical properties of nanoparticles prepared by RF magnetron sputtering were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and photoluminescence (PL). GaN nanoparticles with ZnO sacrificial layers of different thicknesses possess hexagonal wurtzite crystal structure and have a preferred orientation with c axis perpendicular to the sapphire substrates. XRD, SEM, and AFM results reveal that the better-crystallinity, uniform, and well-dispersed GaN nanoparticles (～30 nm) without agglomeration were obtained with a ZnO sacrificial layer 300-nm thick. The PL result reveals that the optical properties of the GaN nanoparticles are improved with a ZnO sacrificial layer 300-nm thick. Therefore, we suggest that a ZnO sacrificial layer 300-nm thick is the most suitable condition for obtaining better-quality GaN nanoparticles with good luminescence performance. Moreover, the mechanism of the formation of GaN nanoparticles with ZnO sacrificial layers is also discussed.     

Effects of annealing on the structure and photoluminescence of ZnO-sputtered coaxial nanowires

We reported the preparation and annealing effects of Zinc oxide ZnO/SiO_x core-shell nanowires, in which ZnO shell layers were deposited by sputtering. Based on scanning electron microscopy, transmission electron microscopy, X-ray diffraction, and photoluminescence (PL) investigations, we monitored structural and optical changes with respect to the post-annealing process. The samples were mostly amorphous with some crystalline ZnO structure, whereas annealing at 900-1000 °C reduced the amount of Zn elements. Thermal annealing induced change in the shape of the PL emission spectra.     

Preparation of cytocompatible luminescent and magnetic nanohybrids based on ZnO, Zn0.95Ni0.05O and core@shell ZnO@Fe2O3 polymer grafted nanoparticles for biomedical imaging

ZnO, Zn_0.95Ni_0.05O and core@shell ZnO@??-Fe₂O₃ nanoparticles (NPs) have been prepared by forced hydrolysis in polyol medium and then coated via the ??grafting from?? approach with poly(sodium-4-styrenesulfonate) and poly(sodium-4-styrenesulfonate?Cco?Csodium methacrylate) in the case of ZnO. The surface-initiated atom transfer radical polymerization occurred from the surface-functionalized NPs with ??-bromoisobutyric acid as initiator. The polymer chains were grown from the surface to yield hybrid NPs with a 1?C3-nm thick organic shell. FT-IR, TGA and electron microscopy evidenced the presence of a polymer layer on the surface of NPs. Magnetic and optical properties of bare and coated NPs have been measured. Eventually, the weak cytotoxicity of coated NPs on human endothelial cell allows considering their potentialities as new tools for nanomedicine and biomedical imaging.     

Nondestructive interface construction for CdS-buffered ZnO nanorod/Cu<Subscript>2</Subscript>O composite structure solar cells

In this work, ZnO nanorod/Cu₂O composite nanostructure solar cells were prepared using hydrothermal growth and electrodeposition. The CdS layer was added between ZnO and Cu₂O to suppress carrier reverse recombination. Nondestructive interface deposition methods were employed to prepare CdS and Cu₂O functional layers. The CdS layers were unconventionally deposited in non-alkaline solution, which can inhibit etching on the ZnO surface, and Cu₂O layers were electrodeposited in ZnO-buffered alkaline solution which can also inhibit etching on the ZnO surface. Finally, the performance of solar cells was improved by adding a highly resistive CdS intermediate layer between ZnO and Cu₂O layers. This work demonstrated the nondestructive interface approach of chemical solution deposition of functional layers on ZnO and possibilities for further improvements to the performance of Cu₂O-based nanostructure solar cells with the addition of an intermediated layer.     

Observations of energy transfer and anisotropic behavior in ZnO nanoparticles surface-modified by liquid-crystalline ligands

Here we report the fabrication of a novel nano-level hybrid of ZnO nanoparticles (NPs) and liquid crystals (LCs) by the attachment of organic LC molecules with a mercapto moiety, namely, 4′-n-(6-mercaptohexyloxy)-4-cyanobiphenyl (6CNBP-SH), to the surface of ZnO nanoparticles. The dispersion of modified ZnO NPs (6CNBP-SH@ZnO) is greatly improved by the surface modification of 6CNBP-SH ligands. The photoluminescence (PL) measurement shows that the ultra-violet emission of ZnO can be enhanced by the surface modification of 6CNBP-SH ligands and annealing at liquid crystal state temperature of 6CNBP-SH@ZnO (110 °C). Meanwhile, defect-related emission of ZnO in 6CNBP-SH@ZnO almost disappears. We attribute this observation to the energy transfer between the ZnO NPs and 6CNBP-SH, surface passivation of the ZnO and formation of ZnO nano-dispersing structure induced by 6CNBP-SH molecules. The anisotropic behavior of 6CNBP-SH@ZnO is also investigated. The results indicated that the 6CNBP-SH liquid-crystalline ligands could endow the 6CNBP-SH@ZnO hybrid obvious mesoscopic behavior. In addition, the increased optical anisotropy of 6CNBP-SH@ZnO is also observed upon thermal treatment at 110 °C.     

Excitonic photoluminescence characteristics of amorphous silicon nanoparticles embedded in silicon nitride film

We have investigated the photoluminescence (PL) properties of amorphous silicon nanoparticles (a-Si NPs) embedded in silicon nitride film (Si-in-SiN_x) grown by helicon wave plasma-enhanced chemical vapor deposition (HWP-CVD) technique. The PL spectrum of the film exhibits a broad band constituted of two Gaussian components. From photoluminescence excitation (PLE) measurements, it is elucidated that the two PL bands are associated with the a-Si NPs and the silicon nitride matrix surrounding a-Si NPs, respectively. The existence of Stokes shift between PL and absorption edge indicates that radiative recombination of carriers occurs in the states at the surface of the Si NPs, whereas their generation takes place in the a-Si NPs cores and the silicon nitride matrix, respectively. The visible PL of the film originates from the radiative recombination of excitons trapped in the surface states. At decreasing excitation energy (E_ex), the PL peak energy was found to be redshifted, accompanied by a narrowing of the bandwidth. These results are explained by surface exciton recombination model taking into account there existing a size distribution of a-Si NPs in the silicon nitride matrix.     

Dependences of the surface and the optical properties on the O2/O2 + Ar flow-rate ratios for ZnO thin films grown on ZnO buffer layers

ZnO active layers on ZnO buffer layers were grown at various O₂/O₂ + Ar flow-rate ratios by using radio-frequency magnetron sputtering. Atomic force microscopy images showed that the surface roughnesses of the ZnO active layers grown on ZnO buffer layers decreased with decreasing O₂ atmosphere, indicative of an improvement in the ZnO surfaces. The type of the ZnO active layer was n-type, and the resistivity of the layer increased with increasing O₂ atmosphere. Photoluminescence spectra from the ZnO active layers grown on the ZnO buffer layers showed dominant peaks corresponding to local levels in the ZnO energy gap resulting from oxygen vacancies or interstitial zinc vacancies, and the peak positions changed significantly with the O₂/O₂ + Ar flow rate. These results can help improve understanding of the dependences of the surface and the optical properties on the O₂/O₂ + Ar ratio for ZnO thin films grown on ZnO buffer layers.     

Photoluminescence and photoconductive characteristics of hydrothermally synthesized ZnO nanoparticles

In the present paper, ZnO nanoparticles (NPs) with particle size of 20–50 nm have been synthesized by hydrothermal method. UV-visible absorption spectra of ZnO nanoparticles show absorption edge at 372 nm, which is blue-shifted as compared to bulk ZnO. Photoluminescence (PL) and photoconductive device characteristics, including field response, light intensity response, rise and decay time response, and spectral response have been studied systematically. The photoluminescence spectra of these ZnO nanoparticles exhibited different emission peaks at 396 nm, 416 nm, 445 nm, 481 nm, and 524 nm. The photoconductivity spectra of ZnO nanoparticles are studied in the UV-visible spectral region (366–691 nm). In spectral response curve of ZnO NPs, the wavelength dependence of the photocurrent is very close to the absorption and photoluminescence spectra. The photo generated current, I_pc = (I_total - I_dark) and dark current I_dc varies according to the power law with the applied field I_pcαV^r and with the intensity of illumination I_pcαI_L ^r, due to the defect related mechanism including both recombination centers and traps. The ZnO NPs is found to have deep trap of 0.96 eV, very close to green band emission. The photo and dark conductivities of ZnO NPs have been measured using thick film of powder without any binder.     

Safety Issue of Changed Nanotoxicity of Zinc Oxide Nanoparticles in the Multicomponent System

When nanomaterials are exposed to complex systems, such as food, they may cause significant changes in physical and chemical properties and even toxicity. The toxicity evaluation of complex systems is urgent. Unfortunately, so far, there is no database established about the toxicity changes of nanoparticles in composite systems. In this paper, the changes and toxicity mechanism of zinc oxide nanoparticles (ZnO NPs) in a composite system are studied. The results show that the dissolution of zinc ions (Zn²⁺) in acidic systems (vitamin C, tartaric acid, or citric acid) increases the toxicity of ZnO NPs. However, the toxicity of ZnO NPs is reduced by the complexation effect with Zn²⁺ in phosphoric acid, phosphate, and glutathione systems. The influence of titanium dioxide nanoparticles (TiO₂ NPs) on the toxicity of ZnO NPs depends on size and surface properties. In brief, the intracellular Zn²⁺ homeostasis level is the decisive factor in determining the toxicity change in complex systems. The results indicate that the toxicity changes are very different in combined systems, which may have potential food safety issues, especially for unstable nanoparticles.     

m面蓝宝石上ZnO/ZnMgO多量子阱的制备及发光特性研究

利用等离子体辅助分子束外延设备(P-MBE)在m面的蓝宝石(m-Al₂O₃)衬底上制备了ZnO/Zn_0.85Mg_0.15O多量子阱.反射式高能电子衍射谱(RHEED)图样的原位观察表明,多量子阱结构是以二维模式生长的.从光致发光谱中可以看到ZnO/Zn_0.85Mg_0.15O多量子阱在室温仍具有明显的量子限域效应.在290 K时阱宽为3 nm的ZnO/Zn_{0.85关键词： 等离子体辅助分子束外延 ZnO多量子阱 光致发光}     

H<Subscript>2</Subscript>O<Subscript>2</Subscript>-molecular beam epitaxy of high quality ZnO

We have studied the growth and characterization of ZnO epilayers on (0001)-sapphire by H₂O₂-molecular beam epitaxy (MBE). A high temperature (HT) MgO buffer followed by a low-temperature ZnO buffer was introduced in order to accommodate the lattice mismatch between ZnO and sapphire. The surface morphology of the samples was studied using atomic force microscopy (AFM), and scanning electron microscopy (SEM). The crystalline quality of the layers was investigated by employing high resolution X-ray diffractometry (HRXRD) and high resolution transmission electron microscopy (HRTEM). The electrical properties of the grown ZnO layers were studied by Hall-effect measurements in a standard van der Pauw configuration. The measured surface roughness for the best layers is as low as 0.26 nm rms. HRXRD measurements of the obtained ZnO layers show excellent quality of the single crystalline ZnO heteroepitaxially grown on (0001)-sapphirewith a HT MgO buffer layers. The influence of the growth conditions on the crystalline quality is discussed. The FWHM of the HRXRD (0002) rocking curves measured for the 2-inch ZnO-on-sapphire is as low as 27 arcsec with a very high lateral homogeneity across the whole 2-inch ZnO epilayers. The results indicate that H₂O₂-MBE is a suitable technique to fabricate ZnO epilayers of very high quality. PACS 61.10.Nz; 68.37.Lp; 81.05.Dz; 81.15.Hi     

Well-aligned ZnO rod arrays grown on glass substrate from aqueous solution

Well-aligned ZnO rod arrays have been successfully synthesized on glass substrate from the aqueous solution of Zn(NO₃)₂·6H₂O and C₆H₁₂N₄ (HMT). Some critical issues such as seed layers, concentration and reaction time were investigated. The results show that ZnO seed layers were pre-requisite for the aligned growth of ZnO rod arrays. The length of rods is tunable in a range from 2 μm to 3 μm by varying the solution concentration and reaction time. X-ray diffraction results demonstrate that ZnO rods are wurtzite crystal structures preferentially orienting in the direction of the c-axis. Microstructure observation by scanning electron microscope confirms that ZnO rods grew up perpendicular to the substrate. Room-temperature photoluminescence (PL) spectrum of rod arrays shows a strong emission band at about 396 nm.     

Porous Silicon as an Intermediate Buffer Layer for Zinc Oxide Nanorods

Zinc thin films were deposited onto porous silicon (PSi) substrates by dc sputtering using a Zn target. These films were then annealed under flowing (6 l/min) oxygen gas environment in the furnace at 600°C for 2 h. Porous silicon is used as an intermediate layer between silicon and ZnO films and it provides a large area composed of an array of voids. The PSi samples were prepared using photoelectrochemical method on n-type silicon wafer with (111) and (100) orientation. To prepare porous structures, the samples were dipped into a mixture of HF:ethanol (1:1) for 5 min with current densities of 50 mA/cm², and subjected to external illumination with a 500 W UV lamp. The surface morphology and the nanorod structure of the ZnO films were characterized by scanning electron microscope (SEM) and X-ray diffraction (XRD). We synthesized the ZnO nanorods with diameter of 80–100 nm without any catalysts or templates. The XRD pattern confirmed that the ZnO nanorods were of polycrystalline structure. The surface-related optical properties have been investigated by photoluminescence (PL) and Raman measurements at room temperature. Micro-Raman results showed that A₁(LO) of hexagonal ZnO/Si(111) and ZnO/Si(100) have been observed at 522 cm^–1 and 530 cm^–1, respectively. PL spectra peaks are clearly visible at 366 cm^–1 and 368 cm^–1 for ZnO film grown on porous Si(111) and Si(100) substrates, respectively. The PL spectral peak position in ZnO nanorods on porous silicon is blue-shifted with respect to that in unstrained ZnO (381 nm).     

Issues in ZnO homoepitaxy

Zinc oxide (ZnO) bulk single crystals, which are of high purity and transparency with a large size of 2 in., are successfully grown by the hydrothermal method. The sliced substrates are chemomechanically polished to form an epi-ready surface. The impurities existing on the as-polished substrate surface are characterized before and after annealing by SIMS (secondary-ion mass spectroscopy), and a damaged surface layer due to chemomechanical polishing is evaluated by an optical method. We attempt to remove the layer damaged due to chemomechanical polishing with two approaches, chemical etching and thermal annealing in N₂, O₂ or high vacuum. The improvement of the surface morphology and crystallinity is evaluated by means of high resolution X-ray diffraction (XRD), photoluminescence (PL) and atomic force microscopy (AFM). In the PL measurements, the relative intensity of the first-order longitudinal optical phonon replica of the free exciton (FX-1LO) is compared against varying etching depth. The relative intensity becomes weak with increasing etch depth and finally saturates at the etch depth of 5 μm. After the annealing process, we grow ZnO thin films on these ZnO(0001) substrates by plasma-assisted molecular beam epitaxy. Films grown directly on the substrate show a 3D growth mode in the initial stage of growth with various surface treatments. To overcome this problem, we employ a low temperature grown ZnO buffer layer (LT-ZnO), and a two-dimensionally grown high quality ZnO film is attained.     

Nanocrystalline ZnO Film Grown on Porous SnO2/Si(111) Substrate

Porous tin oxide was prepared on silicon(111) substrate by the sol–gel route. Then, the samples were dried in air at 600°C for 30 min in an electric furnace. Scanning electron microscope (SEM) images indicated the high density of the pores. Circular microvoids formed by the rigid shaped microarray network of 200–300 nm sizes are clearly seen in the plan view SEM image. The high homogeneity and uniformity of the porous region could also be visualized by this easy method. Nanocrystalline zinc oxide (ZnO) thin films have been deposited onto porous SnO₂substrates at high growth rates by radio frequency (RF) sputtering using a ZnO target. The surface morphology of the nanocrystalline ZnO films was characterized by scanning electron microscope (SEM). Photoluminescence (PL) spectroscopy is a powerful, contactless and excellent nondestructive optical tool to study the acceptor binding energy of ZnO nanostructures. The PL measurements were also operated at room temperature. The peak luminescence energy in nanocrystalline ZnO on porous SnO₂ is blue-shifted with regard to that in bulk ZnO (381 nm). PL spectra peaks are distinctly apparent at 375 nm for ZnO film grown on porous SnO₂/Si(111) substrates.     

Controlling the orientation of ZnO nanorod arrays using TiO<Subscript>2</Subscript> thin film templates dip-coated by sol–gel

The oriented ZnO nanorod arrays have been synthesized on a silicon wafer that coated with TiO₂ films by aqueous chemical method. The morphologies, phase structure and the photoluminescence (PL) properties of the as-obtained product were investigated by field-emission scanning electron microscopy (FE-SEM), X-ray diffractometer (XRD), transmission electron microscope (TEM) and PL spectrum. The nanorods were about 100 nm in diameter and more than 1 μm in length, which possessed wurtzite structure with a c axis growth direction. The room-temperature PL measurement of the nanorod arrays showed strong ultraviolet emission. The effect of the crystal structure and the thickness of TiO₂ films on the morphologies of ZnO nanostructures were investigated. It was found that the rutile TiO₂ films were appropriate to the oriented growth of ZnO nanorod arrays in comparison with anatase TiO₂ films. Moreover, flakelike ZnO nanostructures were obtained with increasing the thickness of anatase TiO₂ films.     

Improved performance of a crystalline silicon solar cell based on ZnO/PS anti-reflection coating layers

A porous silicon (PS) layer was prepared by photoelectrochemical etching (PECE), and a zinc oxide (ZnO) film was deposited on a PS layer using a radio frequency (RF) sputtering system. The surface morphology of the PS and ZnO/PS layers was characterised using scanning electron microscopy (SEM). Nano-pores were produced in the PS layer with an average diameter of 5.7 nm, which increased the porosity to 91%. X-ray diffraction (XRD) of the ZnO/PS layers shows that the ZnO film is highly oriented along the c-axis perpendicular to the PS layer. The average crystallite size of the PS and ZnO/PS layers are 17.06 and 17.94 nm, respectively. The photoluminescence (PL) emission spectra of the ZnO/PS layers present three emission peaks, two peaks located at 387.5 and 605 nm due to the ZnO nanocrystalline film and a third located at 637.5 nm due to nanocrystalline PS. Raman measurements of the ZnO/PS layers were performed at room temperature (RT) and indicate that a high-quality ZnO nanocrystalline film was formed. Optical reflectance for all the layers was obtained using an optical reflectometer. The lowest effective reflectance was obtained for the ZnO/PS layers. The fabrication of crystalline silicon (c-Si) solar cells based on the ZnO/PS anti-reflection coating (ARC) layers was performed. The I–V characteristics of the solar cells were studied under 100 mW/cm² illumination conditions. The ZnO/PS layers were found to be an excellent ARC and to exhibit exceptional light-trapping at wavelengths ranging from 400 to 1000 nm, which led to a high efficiency of the c-Si solar cell of 18.15%. The ZnO/PS ARC layers enhance and increase the efficiency of the c-Si solar cell. In this paper, the fabrication processes of the c-Si solar cell with ZnO/PS ARC layers are an attractive and promising technique to produce high-efficiency and low-cost of c-Si solar cells.     

Enhancement of photoluminescence intensity from Si nanodots using Al2O3 surface passivation layer grown by atomic layer deposition

Temperature-dependent photoluminescence (PL) from Si nanodots with Al₂O₃ surface passivation layers was studied. The Si nanodots were grown by low pressure chemical vapor deposition and the Al₂O₃ thin films were prepared by atomic layer deposition (ALD), respectively. The BOE (Buffer-Oxide-Etch) treatment resulted in the damaged surface of Si nanodots and thus caused dramatic reduction in the PL intensity. Significant enhancement of the PL intensity from Si nanodots after the deposition of Al₂O₃ thin films was observed over a wide temperature range, indicating the remarkable surface passivation effect to suppress the non-radiative recombination at the surface of Si nanodots. The results demonstrated that the Al₂O₃ surface passivation layers grown by ALD are effectually applicable to nanostructured silicon devices.