量子阱垒层掺杂变化对双波长LED调控作用研究

采用APSYS软件研究了InGaN/GaN量子阱垒层掺杂变化对双波长 发光二极管发光光谱的调控问题. 在不同掺杂类型和浓度下对器件电子空穴浓度分布、 载流子复合速率、 能带结构、 发光光谱进行分析, 结果表明, 调节量子阱垒层n型和p型的掺杂浓度可以精确而有效地根据需要调控发光光谱, 解决发光光谱调控难的问题. 这些现象归因于掺杂的量子阱垒层对电子空穴分布的调控作用.     

单向瞬态电压抑制二极管的参数提取

在半导体器件高功率电磁脉冲效应数值模拟中,真实器件的物理模型构建较为困难。为了解决这一问题,以某型单向瞬态电压抑制(TVS)二极管为例,对其进行测试获取建模所需的参数信息。通过X光成像、扫描电子显微镜（SEM）及杂质染色等技术手段,获得了该器件PN结正对面积大小、PN结深度等结构参数。通过实验测量了二极管的反向击穿电压和电容曲线,结合数值计算,推导出了二极管的杂质浓度。利用本次实验获得的参数,结合数值计算的结果,建立了该型号二极管的真实半导体物理模型。对该模型进行了数值仿真,计算了器件的伏安响应曲线并与实验值进行了比对,计算结果与实验值吻合较好。本次的方法除了可以直接用于PN结型器件的建模外,也为其他器件物理模型的建立提供了参考,可在半导体器件效应数值模拟研究中得到应用。     

Numerical simulation of the magnetoresistance effect controlled by electric field in p–n junction

The magnetoresistance effect of a p–n junction under an electric field which is introduced by the gate voltage at room temperature is investigated by simulation. As auxiliary models, the Lombardi CVT model and carrier generationrecombination model are introduced into a drift-diffusion transport model and carrier continuity equations. All the equations are discretized by the finite-difference method and the box integration method and then solved by Newton iteration.Taking advantage of those models and methods, an abrupt junction with uniform doping is studied systematically, and the magnetoresistance as a function of doping concentration, SiO_2 thickness and geometrical size is also investigated. The simulation results show that the magnetoresistance(MR) can be controlled substantially by the gate and is dependent on the polarity of the magnetic field.     

Determination of the influence of doping profile on the performance of mm-wave gunn elements by using an efficient physical simulator

The influence of the doping profile on the performance of mm-wave Gunn elements is studied by applying an enhanced hydrodynamic model (HDM). According to intensive simulation results, any increase in efficiency must by attributed to a changed domain dynamic and not to a more favorable temperature distribution what had been supposed in experimental works. The results further demonstrate how to optimize the doping profile and thus give hints for an optimum design.     

Analytical models of lateral power devices with arbitrary vertical doping profiles in the drift region

By solving the 2D Poisson's equation, analytical models are proposed to calculate the surface potential and electric field distributions of lateral power devices with arbitrary vertical doping profiles. The vertical and the lateral breakdown voltages are formulized to quantify the breakdown characteristic in completely-depleted and partially-depleted cases. A new reduced surface field (RESURF) criterion which can be used in various drift doping profiles is further derived for obtaining the optimal trade-off between the breakdown voltage and the on-resistance. Based on these models and the numerical simulation, the electric field modulation mechanism and the breakdown characteristics of lateral power devices are investigated in detail for the uniform, linear, Gaussian, and some discrete doping profiles along the vertical direction in the drift region. Then, the mentioned vertical doping profiles of these devices with the same geometric parameters are optimized, and the results show that the optimal breakdown voltages and the effective drift doping concentrations of these devices are identical, which are equal to those of the uniform-doped device, respectively. The analytical results of these proposed models are in good agreement with the numerical results and the previous experimental results, confirming the validity of the models presented here.     

量子点场效应单光子探测器二维电子气载流子浓度研究

设计了一种基于场效应晶体管的量子点场效应单光子探测器(quantum dot field effect transistor,QDFET),建立了二维电子气(two-dimensional electron gas,2DEG)的薛定谔方程和泊松方程,通过对薛定谔方程和泊松方程的自洽求解,对2DEG的载流子浓度进行了模拟。模拟结果显示,AlGaAs的Al组分、δ掺杂层的掺杂浓度以及隔离层的厚度对于2DEG的载流子浓度均有影响。为了使2DEG具有较高的载流子浓度,AlGaAs的Al组分应为0.2~0.4,δ掺杂浓度应为6~8×10~(13)/cm~2,隔离层厚度应在50nm以下。通过对2DEG的载流子浓度进行研究,可以掌握2DEG载流子浓度的影响因素,从而通过优化QDFET结构,可提高2DEG的载流子浓度。这对于高灵敏度QDFET的制备具有重要的意义和应用价值。     

基于ITO/聚甲基丙烯酸甲酯/Al的有机阻变存储器SPICE仿真

探索了ITO/PMMA/Al器件的阻变机理及其SPICE电路仿真, 通过优化聚甲基丙烯酸甲酯(PMMA)层退火温度, 器件可实现连续擦-读-写-读操作. 基于不同退火温度PMMA薄膜的表面形貌研究, 构建了单层有机阻变器件的非线性电荷漂移模型, 以及描述该模型掺杂区界面移动的状态方程, 并通过反馈控制积分器建立了SPICE仿真电路. 最后, 代入器件实际测量参数, 得到与器件实际结果基本一致的电流-电压模拟曲线. 结果验证了单层有机器件的阻变机理, 说明该非线性电荷漂移模型的SPICE仿真在有机阻变器件仿真中同样适用. 关键词： 有机阻变存储器 非线性电荷漂移 SPICE仿真     

极化效应对AlGaN/GaN异质结p-i-n光探测器的影响

基于等效薄层电荷近似模拟表征极化电荷的作用, 通过自洽求解Poisson-Schrödinger方程以及求解载流子连续性方程, 计算并且讨论了p-AlGaN层掺杂浓度和界面极化电荷对AlGaN/GaN异质结p-i-n紫外探测器能带结构和电场分布以及光电响应的影响. 结果表明, 极化效应与p-AlGaN层掺杂浓度相互作用对探测器性能有较大影响. 其中, 在完全极化条件下, p-AlGaN层掺杂浓度越大, p-AlGaN层的耗尽区越窄, i-GaN层越容易被耗尽, 器件光电流越小. 在一定掺杂浓度条件下, 极化效应越强, p-AlGaN层的耗尽区越宽, 器件的光电流越大. 最后还分析了该结构在不同温度下的探测性能, 证明了该结构可以在高温下正常工作.     

The effects of different doping patterns on the lattice thermal conductivity of solid Ar

In order to investigate the effects of doping patterns on phonon transport, equilibrium molecular dynamics method is performed to calculate the lattice thermal conductivity of solid argon doped with krypton atoms in different geometrical distribution modes. Four different patterns are introduced through replacing Ar atoms with the same amount of Kr atoms in different volume and positions. The simulation results demonstrate that the impurity volume and distribution have significant effects on phonon transport in a crystal structure. The lowest thermal conductivity among the four doping patterns is achieved by introducing the impurity in a nanometer size cubic pattern distributed in the Ar matrix, which is roughly two times lower than that of pure argon at 17 K. The impurity strength on phonons is estimated through comparing the simulation results with those calculated from the Callaway model.     

Spin-Hall transport in a two-dimensional electron system with magnetic impurities

The spin Hall transport properties in a two-dimensional electron system with both Rashba spin-orbit coupling (SOC) and magnetic impurities are investigated. Electrons are scattered by impurities through an exchange interaction that leads to spin flip-flop processes and so changes the spin Hall effect induced by the SOC. The spin Hall conductance is calculated in a 4-terminal system using the Landauer-Buttiker formula and Green function approach. In comparison with the simulation results on nonmagnetic impurities doping systems, our results reveal that the spin Hall conductance is still nonzero in a system with a large density of magnetic impurities and a finite intensity of the exchange interaction between the electrons and impurities, and its sign may be altered when the doping density and interaction strength are large enough.     

梯度掺杂对n型异质结太阳能电池性能的影响

通过仿真软件AFORS-HET对a-Si:H(p)/i-a-Si:H/c-Si(n)异质结太阳能电池的光伏特性进行分析及优化,主要对比了a-Si:H(p)层的均匀掺杂和表面掺杂浓度D₁=1×10²⁰ cm^-3>界面掺杂浓度D₂=4×10¹⁹ cm^-3的梯度掺杂情况时的光伏特性,实现了在梯度掺杂时22.32%的光电转换效率。与均匀梯度掺杂相比,发射层的梯度掺杂除了引入一个附加电场,还优化了能带结构、光谱响应、表面复合速率。结果表明,梯度掺杂可以有效地改善电池的光电转换性能。     

Equivalent Method of Solving Quantum Efficiency of Reflection-Mode Exponential Doping GaAs Photocathode

The mathematical expression of the electron diffusion and drift length LDE of exponential doping photocathode is deduced. In the quantum efficiency equation of the reflection-mode uniform doping cathode, substituting LDE for LD, the equivalent quantum efficiency equation of the reflection-mode exponential doping cathode is obtained. By using the equivalent equation, theoretical simulation and experimental analysis shows that the equivalent index formula and formula-doped cathode quantum efficiency results in line. The equivalent equation avoids complicated calculation, thereby simplifies the process of solving the quantum efficiency of exponential doping photocathode.     

22 nm工艺超薄体全耗尽绝缘体上硅晶体管单粒子瞬态效应研究

利用计算机辅助设计技术数值仿真工具, 研究22 nm工艺技术节点下超薄体全耗尽绝缘体上硅晶体管单粒子瞬态效应, 系统地分析了掺杂地平面技术、重离子入射位置、栅功函数和衬底偏置电压对于单粒子瞬态效应的影响. 模拟结果表明, 掺杂地平面和量子效应对于单粒子瞬态效应影响很小, 重离子入射产生大量电荷, 屏蔽了初始电荷分布的差异性. 单粒子瞬态效应以及收集电荷和重离子入射位置强相关, 超薄体全耗尽绝缘体上硅最敏感的区域靠近漏端. 当栅功函数从4.3 eV变化到4.65 eV时, 单粒子瞬态电流峰值从564 μA减小到509 μA, 收集电荷从4.57 fC减小到3.97 fC. 超薄体全耗尽绝缘体上硅器件单粒子瞬态电流峰值被衬底偏置电压强烈调制, 但是收集电荷却与衬底偏置电压弱相关. 关键词： 超薄体全耗尽绝缘体上硅 单粒子瞬态效应 电荷收集 数值仿真     

GaAs光电阴极激活后的表面势垒评估研究

根据阴极制备过程中单独Cs激活和Cs-O交替激活两个阶段产生的光电流的峰值比,结合对电子穿过表面单势垒和双势垒后能量分布的理论曲线,提出了一种评估NEA GaAs光阴极表面势垒参数的新方法.利用该方法研究的结果完全符合双偶极层模型理论,并且和对实测阴极电子能量分布曲线拟合的结果非常一致.该方法简单、有效,在不增加测试手段的前提下,丰富了对NEA GaAs光电阴极激活效果及表面特征评价的方法和途径. 关键词： GaAs 光电阴极 表面势垒 能量分布     

Influences of polarization effect and p-region doping concentration on the photocurrent response of solar-blind p–i–n avalanche photodiodes

The influences of polarization and p-region doping concentration on the photocurrent response of Al0.4Ga0.6N/Al0.4Ga0.6N/Al0.65Ga0.35N p–i–n avalanche photodetector are studied in a wide range of reverse bias voltages.The simulation results indicate that the photocurrent under high inverse bias voltage decreases with the increase of polarization effect,but increases rapidly with the increase of effective doping concentration in p-type region.These phenomena are analyzed based on the calculations of the intensity and distribution of the electric field.A high p-region doping concentration in the p–i–n avalanche photodetector is shown to be important for the efficient compensation for the detrimental polarization-induced electrostatic field.     

Atomistic simulation of Mn-site substitution in multiferroic h-YMnO3

Atomistic simulation has been performed to systematically investigate the Mn-site doping of h-YMnO(3) (hexagonal yttrium manganese oxide). It is found that tetravalent dopants are the most energetically favorable for incorporation into a crystal lattice. For divalent dopants, hole compensation is the more likely charge compensation mechanism, whereas for dopants with mixed valence, the divalent state is the energetically preferred form. Structural and local polarization changes caused by Mn-site doping are also investigated. The tilting angle of the MnO(5) trigonal bipyramid is suppressed for all of the dopants investigated, with the reduction dependent on the dopant ion radius, while the influence on buckling is closely related to the valence of the dopants. Our results reveal that both electrostatic and size effects play important roles in the ferroelectric polarization of h-YMnO(3).     

GaAs光电阴极激活时Cs的吸附效率研究

从NEA GaAs光电阴极的激活光电流曲线发现,当系统真空度不很高时,在首次Cs激活阶段,表面掺杂浓度较低的阴极材料,其光电流产生需要的时间也较长.同时,随着系统真空度的提高,这种时间上的差异又变得不再明显.该现象表明,Cs原子在阴极表面的吸附效率同表面层掺杂浓度以及系统真空度之间有直接的联系.为定量分析这种关系,本文根据实验数据建立了Cs在阴极表面吸附效率的数学模型,利用该模型仿真的结果同实验现象非常符合.该研究对进一步开展变掺杂阴极结构设计和制备工艺研究具有重要的价值和意义. 关键词： GaAs光电阴极 吸附效率 真空度 表面掺杂浓度     

Low specific on-resistance GaN-based vertical heterostructure field effect transistors with nonuniform doping superjunctions

A novel Ga N-based vertical heterostructure field effect transistor(HFET) with nonuniform doping superjunctions(non-SJ HFET) is proposed and studied by Silvaco-ATLAS,for minimizing the specific on-resistance(R_(on)A) at no expense of breakdown voltage(BV).The feature of non-SJ HFET lies in the nonuniform doping concentration from top to bottom in the n-and p-pillars,which is different from that of the conventional Ga N-based vertical HFET with uniform doping superjunctions(un-SJ HFET).A physically intrinsic mechanism for the nonuniform doping superjunction(non-SJ) to further reduce R_(on)A at no expense of BV is investigated and revealed in detail.The design,related to the structure parameters of non-SJ,is optimized to minimize the R_(on)A on the basis of the same BV as that of un-SJ HFET.Optimized simulation results show that the reduction in R_(on)A depends on the doping concentrations and thickness values of the light and heavy doping parts in non-SJ.The maximum reduction of more than 51% in R_(on)A could be achieved with a BV of 1890 V.These results could demonstrate the superiority of non-SJ HFET in minimizing R_(on)A and provide a useful reference for further developing the Ga N-based vertical HFETs.     

应变Si NMOSFET阈值电压集约物理模型

本文采用渐变沟道近似和准二维分析的方法, 通过求解泊松方程, 建立了应变Si NMOSFET阈值电压集约物理模型. 模型同时研究了短沟道, 窄沟道, 非均匀掺杂, 漏致势垒降低等物理效应对阈值电压的影响. 采用参数提取软件提取了阈值电压相关参数, 通过将模型的计算结果和实验结果进行对比分析, 验证了本文提出的模型的正确性. 该模型为应变Si超大规模集成电路的分析和设计提供了重要的参考. 关键词： 应变Si NMOSFET 阈值电压 集约物理模型     

Power dissipation characteristics of great power and super high speed semiconductor switch

The power dissipation characteristics of pulsed power switch reversely switched dynistors （RSDs） are investigated in this paper. According to the expressions of voltage on RSD, derived from the plasma bipolar drift model and the RLC circuit equations of RSD main loop, the simulation waveforms of current and voltage on RSD are acquired through iterative calculation by using the fourth order Runge-Kutta method, then the curve of transient power on RSD versus time is obtained. The result shows that the total dissipation on RSD is trivial compared with the pulse discharge energy and the commutation dissipation can be nearly ignored compared with the quasi-static dissipation. These characteristics can make the repetitive frequency of RSD increase largely. The experimental results prove the validity of simulation calculations. The influence factors on power dissipation are discussed. The power dissipation increases with the increase of the peak current and the n-base width and with the decrease of n-base doping concentration. In order to keep a low power dissipation, it is suggested that the n-base width should be smaller than 320μm when doping concentration is 1.0×10^14cm^-3 while the doping concentration should be higher than 5.8×10^13cm^-3 when n-base width is 270μm.