斜角入射沉积法制备渐变折射率薄膜的折射率分析

斜角入射沉积法是一种制备薄膜的新颖方法,它可以用来制备渐变折射率薄膜.本文首先探讨了膜料的沉积入射角为α,薄膜柱状生长倾斜角为β时的薄膜的填充系数;之后利用drude理论,分析研究了斜角入射沉积法制备渐变折射率薄膜的折射率与薄膜的入射角和生长方向的关系. 关键词： 斜角入射沉积 渐变折射率 填充系数     

辽东湾海冰反射特性

海冰反照率是研究海冰表面特性、海冰分布、海冰厚度和极地气候的重要光学量之一。将卫星于不同位置所测量到的海冰双向反射率准确地转化为相应的反照率的值,对于获得大规模海冰的时空特性是非常重要的。研究了辽东湾海冰反照率与海冰双向反射分布函数之间的相关关系。结果表明：(1)反照率与海冰组分密切相关,海冰表层颗粒物浓度越高,反照率α(λ)的值越小,气泡的含量越高,α(λ)越大;(2)当仪器探头天顶角θ为0°时,所测量的双向反射因子R_f与反照率α(λ)的值是相似的;随着θ的增大,R_f的值逐渐增大,且与探头方位角的相关性逐渐增强;当θ的值等于太阳天顶角63°时,R_f的值最大,且与探头方位角的相关性最强;(3)不同类型的冰具有不同的各向异性反射因子。     

GeC薄膜的射频磁控反应溅射制备及性质

用射频磁控反应溅射法在ZnS衬底上制备了GeC薄膜,研究了工艺参数对Ge靶溅射及GeC薄膜红外透射性能的影响.衬底温度较低时GeC薄膜中含有H,形成了CH₂,CH₃,Ge-CH₃等,使薄膜产生红外吸收;随衬底温度升高,薄膜红外吸收明显减小.靶基距、射频功率、Ar:CH₄气体流量比、总气压对靶面中毒及溅射影响较大,但对GeC薄膜红外吸收影响较小.靶面中毒严重时,所制备无氢GeC薄膜附着性能差,随靶中毒减弱薄膜附着性能变好.优化工艺后,在ZnS衬底上制备了附着性能良好的无氢GeC薄膜,其折射率约为1.78,薄膜中C的含量比Ge的大,二者主要形成了C—Ge键.所制备的GeC/GaP红外增透保护膜系对ZnS衬底有良好的增透效果. 关键词： GeC薄膜 红外透射光谱 射频磁控溅射 XPS     

轮烯衍生物电子结构及三阶非线性光学性质的理论研究

苯轮烯衍生物具有良好的非线性光学性质. 运用密度泛函理论在不同理论水平和不同基组下计算了轮烯衍生物的静态极化率α和静态第二超极化率γ. 采用含时密度泛函TD-B3LYP方法计算了轮烯分子的紫外吸收光谱. 结果发现: 弥散函数对静态线性极化率α和第二超极化率γ 的计算结果都有显著的影响; 共轭体系的大小和引入的推拉电子基团可以调节轮烯衍生物的第二超极化率. 添加推拉电子基团后不仅能得到更高的非线性光学系数, 也能保证有较好的透光性能, 表明轮稀分子兼具有较高的三阶非线性光学响应和在可见光波段具有良好的透光性的特性. 此外, 采用CAM-B3LYP方法计算了分子1-1和分子2-2的动态(超)极化率. 计算结果表明: 在近红外区, 随着入射光频率的增大, α (ω; ω), γ (-ω; ω, 0, 0) 和γ (-2ω; ω, ω, 0) 都随之增大, 出现近共振增强效应; 在远离共振条件下, α (ω; ω), γ (-ω; ω, 0, 0) 和γ (-2ω; ω, ω, 0) 变化平缓.     

光谱分析气体状态对近空间升华沉积CdTe多晶薄膜的影响

在CdTe多晶薄膜太阳电池制备中用近空间升华法生长了CdTe多晶薄膜,沉积工作气体的状态决定了薄膜的结构、性质。文章首先分析了近空间沉积的物理机制,测量了近空间沉积装置内的温度分布,使用氩氧混合气体为工作气体,其中重点讨论了该气体状态(包括气氛和气压)与薄膜的初期成核的关系,即择优取向程度和光能隙与气氛和气压的关系。结果表明,(1)不同气氛下沉积的CdTe薄膜均为立方相结构。随氧浓度的增加,σ增加,氧浓度为6%时,σ最大,之后随氧浓度增加,σ降低,在12%达到最小,然后随氧浓度的增加而增加, 在氧浓度为9%时沉积的结晶更完整。CdTe薄膜的光能隙为1.50～1.51 eV;(2)在氩氧气氛下氧浓度为9%,不同气压下制备的样品,均有立方相CdTe, 此外, 还有CdS和SnO₂:F衍射峰。CdTe晶粒随气压增加有减小趋势,随气压的增加,透过率呈下降趋势,相应的CdTe吸收边向短波方向移动;(3)在氩氧气氛下氧浓度为9%,采用衬底温度550 ℃,源温度620 ℃,沉积时间4 min时制备的CdTe多晶薄膜获得了转换效率优良的结构为SnO₂:F/CdS/CdTe/Au的集成电池。     

白碳纳米晶薄膜及其场致电子发射特性

利用微波等离子体化学气相沉积方法,以甲烷、氢混合气体为反应气体,具有钛镀层的玻璃作为衬底,制备了具有sp¹杂化结构的白碳纳米晶薄膜。利用X射线衍射、俄歇电子能谱,以及扫描电子显微镜对薄膜结构进行了表征。以白碳纳米晶薄膜为阴极,以镀有ITO透明导电薄膜玻璃为阳极,采用二极管结构,测试了白碳纳米晶薄膜的场致电子发射特性。开启电场为2.5 V/μm,在电场为5 V/μm时的电流密度为200μA/cm²。对白碳纳米晶薄膜生长机理,以及其场致电子发射机制进行了讨论。     

非线性漂移的Fokker-Planck方程的近似非定态解

研究了由高斯白噪声和色噪声作用下的非线性动力学系统的不稳定态演化问题. 在弱噪声极限下, 运用本征值本征矢理论得到了非定态解ρ(x, t)的近似表达式; 分析了色噪声自关联时间τ, 强度α对ρ(x, t)以及对一、二阶矩的影响. 数值模拟发现: 1)t在一定范围内, ρ(x, t)是变量x和t的单调函数, 且随τ的增大而增大, 反之, 随α的增大而减小; 2)一阶矩是τ和α的单调函数, 但二阶矩却是非单调函数, 在参数影响下发生了相变现象. 关键词： 奥恩斯坦-乌伦贝克过程 本征值 本征矢 非定态解     

衬底对PTCDA薄膜结构与电荷输运特性的影响

在不同导电衬底(Au,Al和ITO)上制备了PTCDA薄膜,用XRD和AFM技术研究了PTCDA薄膜的结构和表面形貌。结果表明,薄膜中的大部分PTCDA分子平面与衬底不平行,这表明薄膜垂直方向的电流传导将以电子传输为主;在ITO和Au衬底上生长的PTCDA薄膜晶粒排列规则,在薄膜垂直方向呈现出较好的电子传输性能;而在Al衬底上生长的PTCDA薄膜晶粒排列无序,电子传输性能差。通过制备单层结构有机薄膜器件,研究了PTCDA薄膜垂直方向的电子迁移率。综合应用金属-有机界面的热电子发射理论和有机层体内空间电荷限制传导理论,并考虑电场强度对迁移率变化的影响,对ITO/PTCDA/Al器件的电流密度-电压曲线进行拟合,得到ITO衬底上生长的PTCDA薄膜在垂直方向随电场强度变化的电子迁移率数值。     

分子束外延制备的垂直易磁化MnAl薄膜结构和磁性

系统地研究了利用分子束外延方法在GaAs(001) 衬底上外延生长的MnAl_x薄膜的结构和垂直易磁化特性随组分及生长温度的依赖关系. 磁性测试表明, 可在较大组分范围内 (0.4≤x≤1.2) 获得大矫顽力的垂直易磁化MnAl_x薄膜, 然而同步辐射X射线衍射和磁性测试发现当x≤0.6时MnAl薄膜出现较多的软磁相, 当x >0.9时, MnAl薄膜晶体质量和化学有序度逐渐降低, 组分为MnAl_0.9时制备的薄膜有最好的[001]取向. 随着生长温度的增加, MnAl_0.9薄膜的有序度、垂直磁各向异性常数、矫顽力和剩磁比均增加, 350℃时制备的MnAl_0.9薄膜化学有序度高达0.9, 其磁化强度、剩磁比、矫顽力和垂直磁各向异性常数分别为265emu/cm³、93.3%、8.3kOe (1 Oe=79.5775A/m)和7.74Merg/cm³ (1 erg=10^-7J). 不含贵金属及稀土元素、良好的垂直易磁化性质、 与半导体材料结构良好的兼容性以及磁性能随不同生长条件的可调控 性使得MnAl薄膜有潜力应用于多种自旋电子学器件. 关键词： 分子束外延 大矫顽力材料 磁各向异性     

柔性ITO衬底电化学沉积制备Cu/Cu2O薄膜

研究了使用电化学沉积法于碱性条件下在柔性ITO衬底上制备Cu/Cu₂O薄膜的方法。循环伏安曲线表明Cu₂O与Cu的阴极峰分别位于-500 mV(vs Ag/AgCl)和-800 mV(vs Ag/AgCl)附近。利用循环伏安法考察了生长温度和电解液pH值等对Cu₂O与Cu阴极峰电位的影响,阴极峰随生长温度的升高以及pH值的降低而略向阳极移动,沉积电流也随之相应增大。与弱酸性条件相比,上述两个阴极峰随pH值升高而移动的程度明显减小,这可能与碱性条件下C₃H₆O电离程度增大以及C₃H₆O根作为配体的过量程度有关。通过X射线衍射光谱和扫描电子显微镜的表征证实,在所研究的生长温度区间和pH值内可利用电化学沉积法在柔性ITO衬底上制备Cu/Cu₂O纳米混晶薄膜。在相同的生长温度和pH条件下,电化学沉积电位对样品表面形貌和晶体性质具有较大影响。     

Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering

Indium tin oxide (ITO) films with various thicknesses in range of 40-280 nm were prepared onto a plastic substrate (PMMA). Deposition was carried out with RF magnetron sputtering method and the substrate temperature was held at ∼70 °C, in lack of the thermal damage to the polymer substrate. Changes in microstructure and electrical properties of ITO films according to their thicknesses were investigated. It was found that amorphous layer with thickness of 80 nm was formed at the interface on the polymer substrate and polycrystalline ITO could be obtained above the thickness. Conductivity of ITO films was found to be strongly dependent on the crystallinity. Consequently, it is suggested that crystallinity of the deposited films should be enhanced at the initial stage of deposition and the thickness of amorphous region be reduced in order to prepare high quality ITO thin films on polymer substrates.     

Abnormal residual stress in nanostructured Al thin films grown on Ti/glass substrates

The residual stress and micro-structural properties of nanostructured Al thin films prepared by electron beam evaporator are studied. The films were grown on Ti/glass substrates at normal and oblique angles of inclination. The average aspect ratio of Al nanorods produced at an oblique angle of incidence of 85°, increased from 2.2 to 6.0, as the thickness of the films increased from 100 nm to 600 nm. The column tilt angle of Al nanorods was observed to be in close agreement with the theoretical value. The XRD pattern of nanostructured Al thin films showed (111) planes oriented parallel to the substrate surface. The crystallite size was observed to be ～9 nm for all the films produced at oblique angle deposition (OAD). Abnormal residual stresses were determined in the films produced at OAD. The nanocrystalline films produced at normal angle, exhibited tensile residual stress, while, the residual stresses in the films produced at oblique angles of inclination (α = 65°, 75°), were observed to be compressive. Residual stress-free nanocolumnar Al films (Al nanorod films) were observed, when they were grown at an oblique angle of inclination of 85°.     

The influence of the substrate nature on the iron repartition in the titania matrix

Fe-doped titania films were deposited by RF sputtering onto different substrates (glass and ITO/glass) in the same deposition run. The rutile nanocrystalline structure of Fe-doped thin films deposited on glass substrates and anatase nanocrystalline structure of Fe-doped thin films deposited on ITO/glass substrates were evidenced by XRD. SEM investigations showed a smooth surface with a dense nanostructure. XPS study evidenced an almost stoichiometric composition with different iron contents. EPR and XPS studies evidenced that iron entered into TiO₂ lattice by substitution, as isolated and dimer species. In Fe-doped thin films deposited on ITO/glass substrates the iron content is ten times higher than in Fe-doped thin films deposited on glass substrates and that a part of them entered as Fe²⁺.     

Effect of [Zn]/[S] ratios on the properties of chemical bath deposited zinc sulfide thin films

ZnS thin films have been prepared by chemical bath deposition (CBD) technique onto glass substrates deposited at about 80 °C using aqueous solution of zinc sulfate hepta-hydrate, ammonium sulfate, thiourea, ammonia and hydrazine hydrate. Ammonia and hydrazine hydrate were used as complexing agents. The influence of the ratio of [Zn]/[S] on formation and properties of ZnS thin films has been investigated. The ratio of [Zn]/[S] was changed from 3:1 to 1:9 by varying volumes and/or concentrations of zinc sulfate hepta-hydrate and thiourea in the deposition solution. The structural and morphological characteristics of films have been investigated by X-ray diffraction (XRD), scanning electron microscope and UV-vis spectroscopic analysis. ZnS films were obtained with the [Zn]/[S] ratio ranged from1:1 to 1:6. In the cases of [Zn]/[S] ratio ≥ 3:1 or ≤1:9, no deposition was found. Transparent and polycrystalline ZnS film was obtained with pure-wurtzite structure at the [S]/[Zn] ratio of 1:6. The related formation mechanisms of CBD ZnS are discussed. The deposited ZnS films show good optical transmission (80-90%) in the visible region and the band gap is found to be in the range of 3.65-3.74 eV. The result is useful to further develop the CBD ZnS technology.     

ZnS薄膜参数对有机/无机复合发光器件特性的影响

半导体量子点(QDs)具有发光效率高和发光波长可调等特点。采用胶体CdSe QDs作电致发光器件的有源材料,TPD(N,N′-biphenyl-N,N′-bis-(3-methylphenyl)-1,1′-biphenyl-4,4′-diamine)作空穴传输层,ZnS作电子传输层,研究了有机/无机复合发光器件ITO/TPD/CdSe QDs/ZnS/Ag的电致发光特性。TPD和CdSe QDs薄膜采用旋涂方法、ZnS薄膜采用磁控溅射方法沉积,器件表面平整。CdSe QDs的光致发光和电致发光谱峰位波长均位于～580 nm,属于量子点的带边激子发光。我们与以前的ITO/ZnS/CdSe QDs/ZnS/Ag发光器件结构进行了对比,发现新的器件结构的电致发光谱没有观察到QDs表面态的发光,而且新器件的发光强度是ITO/ZnS/CdSe QDs/ZnS/Ag结构的～10倍。发光效率的提高归因于碰撞激发与载流子注入两种发光机制并存的结果：一方面电子经过ZnS 层加速后,碰撞激发CdSe QDs发光;另一方面,空穴从TPD层注入CdSe QDs 与QDs中激发的电子复合发光。我们进一步研究了ZnS电子加速层厚度对发光特性的影响,选择ZnS薄膜的厚度分别是80,120 和160 nm,发现随着ZnS层厚度增大,器件启亮电压升高,EL强度增大,但是击穿电压降低。EL峰位随着ZnS厚度的减小发生明显蓝移,对上述实验现象进行了机理解释。     

Influence of substrate activation process on structural and optical properties of ZnS thin films

ZnS thin films were deposited on glass substrates by a chemical bath deposition method using a substrate activation process in which aluminum ions become “contaminants” that act as a nucleation center for active components within the deposition solution. The structure and morphology results demonstrate that the films have a ZnS sphalerite crystal structure with a particle size less than 15 nm, and the films consist of small homogeneous grains. The effects of the substrate activation process on the band gap energies and donor-acceptor pair luminescence process were also investigated. A green emission centered at 502 nm was produced due to donor-acceptor transitions from the aluminum acceptor to the ionized and substitution aluminum centers (Al³⁺).     

FTIR法研究BCN薄膜的内应力

采用射频磁控溅射技术,用六角氮化硼和石墨为溅射靶,以氩气(Ar)和氮气(N₂)为工作气体,在Si(100)衬底上制备出硼碳氮(BCN)薄膜。利用傅里叶变换红外光谱(FTIR)考察了不同沉积参数(溅射功率为80～130 W、衬底温度为300～500 ℃、沉积时间为1～4 h)条件下制备的薄膜样品。实验结果表明,所制备薄膜均实现了原子级化合。并且沉积参数对BCN薄膜的生长和内应力有很大影响,适当改变沉积参数能有效释放BCN薄膜的内应力。在固定其他条件只改变一个沉积参数的情况下,得到制备具有较小内应力的硼碳氮薄膜的最佳沉积条件：溅射功率为80 W、衬底温度为400 ℃、沉积时间为2 h。     

Investigation of structural,optical and electrical properties of ZnS thin films prepared by nebulized spray pyrolysis for solar cell applications

Zinc sulfide (ZnS) thin films have been deposited on microscopic glass and fluorine doped tin oxide substrates by nebulized spray pyrolysis technique with different substrate temperature and molar concentration. The structural, morphological, optical and electrical properties of the prepared ZnS thin films have been studied using X-ray diffraction (XRD), field emission scanning electronic microscopy (FESEM), UV–Vis spectrophotometer and Hall effect measurement. XRD patterns confirm that the prepared films are hexagonal wurtzite structure, with (100) as preferred orientation. The structural parameters such as crystallite size, dislocation density and microstrain have been calculated from XRD study. Hydrophilic and hydrophobic nature is revealed by contact angle measurements. FESEM image of the ZnS thin films show smooth and uniform spherical grains are uniformly arranged on the films surface. Optical transmittance spectrum illustrate that the ZnS films were high transparent in the visible region and gets absorbed in the UV region. The optical band gap value of the ZnS thin films decreased with the increasing substrate temperature. The average transmittance is found to be 82% and direct band gap value is 3.56 eV at 400 °C for set D. The Activation energy of the prepared ZnS films was determined from the graph between ln (ρ) versus temperature (K^?1) using a four-probe method.     

不同衬底和CdCl2退火对磁控溅射CdS薄膜性能的影响

在科宁7059玻璃, FTO, ITO, AZO四种衬底上磁控溅射CdS薄膜, 并在CdCl₂+干燥空气380 ℃退火, 分别研究了不同衬底和退火工艺对CdS薄膜形貌、结构和光学性能的影响. 扫描电子显微镜形貌表明: 不同衬底原位溅射CdS薄膜的形貌不同, 退火后相应CdS薄膜的晶粒度和表面粗糙度明显增大. XRD衍射图谱表明: 不同衬底原位溅射和退火CdS薄膜均为六角相和立方相的混相结构, 退火前后科宁7059玻璃, FTO, AZO衬底上CdS薄膜有 H(002)/C(111) 最强衍射峰, ITO衬底原位溅射CdS薄膜没有明显的最强衍射峰, 退火后出现 H(002)/(111) 最强衍射峰. 紫外-可见分光光度计分析表明: AZO, FTO, ITO, 科宁7059玻璃衬底CdS薄膜的可见光平均透过率依次减小, 退火后相应衬底CdS薄膜的可见光平均透过率增大, 光学吸收系数降低; 退火显著增大了不同衬底CdS薄膜的光学带隙. 分析得出: 上述结果是由于不同衬底类型和退火工艺对CdS多晶薄膜的形貌、结构和带尾态掺杂浓度改变的结果. 关键词： CdS薄膜 磁控溅射 退火再结晶 带尾态     

Green route fast synthesis and characterization of chemical bath deposited nanocrystalline ZnS buffer layers

Zinc sulphide (ZnS) thin films are deposited using chemical bath deposition method on the glass substrates in an aqueous alkaline reaction bath of zinc acetate and thiourea along with non-toxic complexing agent tri-sodium citrate at 95 °C. The results show noteworthy improvement in the growth rate of the deposited ZnS thin films and thickness of the film increases with the deposition time. From X-ray diffraction patterns, it is found that the ZnS thin films exhibit hexagonal polycrystalline phase reflecting from (101) and (0016) planes. The high resolution transmission electron microscopy studies confirmed the formation of hexagonal phase from the d-value calculation which was 0.3108 nm. X-ray photoelectron spectroscopy reveals that the Zn–S bonding energy is at 1022.5 and 162.1 eV for Zn 2p_3/2 and S 2p_1/2 states, respectively. Field emission scanning electron microscopy study shows that deposited thin films are highly uniform, with thin thickness and completely free from large ZnS clusters which usually form in aqueous solutions. Atomic force microscopy investigates that root mean square values of the ZnS thin films are from 3 to 4.5 nm and all the films are morphologically smooth. Energy dispersive spectroscopy shows that the ZnS thin films are relatively stoichiometric having Zn:S atomic ratio of 55:45. It is shown by ultraviolet–visible spectroscopy that ～90% transmittance and ～10% absorbance for the ZnS films in the visible region, which is significantly higher than that reported elsewhere and the band gap energy of the ZnS films is found to be 3.76, 3.74, and 3.71 eV, respectively.