XPS study of vanadium surface oxidation by oxygen ion bombardment

Oxidation of vanadium metal surfaces at room temperature by low-energy oxygen ion beams is investigated by X-ray photoelectron spectroscopy (XPS). It is observed that ion-beam irradiation of clean V results in formation of thin oxide layer containing vanadium in oxidation states corresponding to VO, V₂O₃, VO₂ and V₂O₅ oxides. The composition of the products of ion-beam oxidation depends markedly on oxygen ion fluence. The results of angle-resolved XPS measurements are consistent with a structure of oxide film with the outermost part enriched in V₂O₅ and VO₂ oxides and with V₂O₃ and VO oxides located in the inner region of the oxide layer.     

Ion-beam reduction of the surface of higher niobium oxide

X-ray photoelectron spectroscopy is used to study the process of reduction of the surface of the higher oxide Nb₂O₅ upon bombardment with inert gas ions (Ar⁺) and reactive gas ions (O₂⁺) with an energy of 1 and 3 keV in high vacuum at room temperature. It is found that, upon bombardment with Ar⁺ ions, the lower oxide NbO and the intermediate oxide NbO₂ are formed in the surface layers of the oxide Nb₂O₅. Bombardment with O₂⁺ ions leads to the formation of an extremely insignificant amount of the intermediate oxide NbO₂ in the surface layers of the oxide Nb₂O₅. It is revealed that the process of ion-beam reduction of the surface of the oxide Nb₂O₅ depends on the ion type, dose, and energy of exposure.     

ESCA studies on changes in surface composition under ion bombardment

The influence of ion bombardment on the composition of surfaces was investigated by means of ESCA. The bombardment of metal oxides with inert gas ions results, not only in sputtering of the surface, but also in reduction of the oxides. The rate of reduction is particularly high when the oxide/metal interface is within the range of the bombarding ions. Ion induced reduction was found in oxide layers, thinner than the escape depth of the photoelectrons, on Mo, W, Nb, Ta, Ti, Zr, Si, and Bi. The relationship between reduction phenomena, on the one hand, and the ion energy, angle of incidence, mass of the gas used for bombardment, and ion current density, on the other hand, was investigated in the case of the Mo/Mo-oxide system. Ion bombardment of surfaces may also result in the formation of new compounds. Two examples of this are the formation of carbides through the bombardment of contaminated surfaces and the ion induced formation of C-F compounds from a mixture of K₂SiF₆ and carbon.     

Simulation of processes on a substrate in the case of ion-assisted formation of coatings

The dynamics of sputtering and growth processes in the formation of coatings of low-energy metal ions under bombardment by ions of inert gases are considered. Simulation is based on the well-known equations of sputtering theory.     

Ion beam modification of surface properties of CR-39

The effects of ion-beam bombardment on the physical and chemical properties of poly(allyl diglycol carbonate) (CR-39) polymer have been investigated. CR-39 samples were bombarded with 320 keV Ar and 130 keV He ions at fluences ranging from 1 × 10¹³ to 2 × 10¹⁶ ions/cm². The nature and extent of radiation damage induced were studied by UV–VIS spectrometry, Fourier-transform infrared (FTIR) spectroscopy, X-ray diffraction (XRD) analysis, as well as Vickers' hardness measurements. In addition, the effect of ion fluence on the wetting properties of ion-beam bombarded CR-39 polymer was determined by measuring the contact angle for distilled water. UV–VIS spectra of bombarded samples reveal that the optical band gap decreases with increasing ion fluence for both Ar and He ions. In the FTIR spectra, changes in the intensity of the bands on irradiation relative to pristine samples occurred with the appearance of new bands. XRD analyses showed that the degree of ordering of the CR-39 polymer is dependent on the ion fluence. Changes of surface layer composition and an increase in the number of carbonaceous clusters produced important change in the energy gap and the surface wettability. The surface hardness increased from 10.54 MPa for pristine samples to 28.98 and 23.35 MPa for samples bombarded with Ar and He ions at the highest fluence, respectively.     

SIMS,EID and flash-filament investigation of O2, H2, (O2 + H2) and H2O interaction with vanadium

Comparative investigations of secondary ion emission, electron induced ion emission and flash filament signals from polycrystalline vanadium surfaces exposed to well-defined O₂, H₂, H₂O and (O₂ + H₂) doses (<500 L) have been carried out. The vanadium target could be heated and bombarded by either electrons (300 eV) or ions (3 keV) under ultra high vacuum conditions (<10^?10 Torr). The investigations were carried out with a computer controlled ultra high vacuum mass spectrometer. The experimental results establish exact reproducible spectra of well defined surface layers. They give detailed insight into the reactions between H₂, O₂ H₂O and vanadium, and some interactions between these species. They further indicate the importance of bulk and surface diffusion as well as the influence of the probing ion and electron bombardment. A clear distinction between bulk oxygen, surface oxides, and adsorbed oxygen for the vanadium-oxygen interaction at room temperature could be established. For the interaction of hydrogen with clean and oxygen covered vanadium surfaces the formation of adsorbed hydrogen, bulk solution of hydrogen, and the formation of OH groups and H₂O could be demonstrated. A detection limit below 10^?5 of one single monolayer for metal bonded hydrogen could be established.     

Ion-beam reduction of the surface of tantalum higher oxide

The process of reduction of the surface of higher oxide Ta₂O₅ under irradiation by inert gas (Ar⁺) and chemically active gas (O₂⁺) ions with an energy of 3 keV in high vacuum is investigated by X-ray photoelectron spectroscopy at room temperature. It is found that intermediate oxide TaO₂, lower oxide TaO, and metallic Ta form in the surface layers of Ta₂O₅ under Ar⁺ ion bombardment. An insignificant amount of intermediate oxide TaO₂ forms in the surface layers of Ta₂O₅ under O₂⁺ ion bombardment. Ion-beam-induced reduction of the Ta₂O₅ surface is shown to depend on the type of ion and irradiation dose.     

X-ray photoelectron spectroscopy characterization of oxidated Si particles formed by pulsed ion-beam ablation

X-ray photoelectron spectroscopy (XPS) is used to probe oxidation states of Si species in particles deposited using a pulsed ion-beam evaporation method. The effects of He ambient gas, ion beam intensity and post-treatments on the oxides composition and oxygen content have been studied. It is found that presence of He ambient gas led to a profound oxidation of Si species as compared to that prepared in vacuum at the same ion-beam ablation energy, i.e. both increase of SiO₂ component and oxygen concentration in the oxides coverage. The deposition in He also resulted in an increase of oxygen concentration even under lower ablation intensity, but a higher Si suboxides concentration. It is revealed that the reaction between Si and O was controlled by the ion beam intensity (temperature of Si plasma) and the gas ambient (collision probability of Si and O species). The difference in structure of oxide layers for samples obtained under various conditions is discussed based on the results of XPS analyses.     

Surface modifications of PADC polymeric material by ion beam bombardment for high technology applications

Surface modification of Poly (allyl diglycol carbonate) (PADC) is induced by 150 keV Ag ions of different fluences. The pristine as well as bombarded samples were investigated by UV–Vis spectroscopy, Fourier transform-infrared analysis (FTIR) and micro-hardness tester. The variations of wettability and surface free energy were determined by the contact angle measurements. The obtained results showed that ion beam bombardment induced increase in the absorption spectra of the UV–Vis with increase of ion fluence as well. The direct and indirect optical band gap decreased from 4.2 to 3.6 eV for pristine sample to 3.2 and 2.5 eV for those bombarded with Ag ion beam at the highest fluence, respectively. Changes in chemical properties were observed by Fourier transform infrared spectroscopy. Increase in the wettability, surface free energy and work of adhesion with increase the ion fluence were observed. Ion bombardment inducing increasing in a micro-hardness surface due to the high carbon surface concentration and cross-linking effects in the polymeric chains. The bombarded PADC surfaces may find special applications to the field of the micro-electronic devices and printing process.     

Ion-beam reduction of the surface of higher oxides of molybdenum and tungsten

The process of reduction of the surface of oxides MoO₃ and WO₃ under irradiation by Ar⁺ and O ₂ ⁺ ions with an energy of 3 keV in high vacuum is investigated by X-ray photoelectron spectroscopy. It is shown that upon irradiation by Ar⁺ ions, lower and intermediate oxides and unoxidized metals are formed in the surface layers of higher oxides. Irradiation by O ₂ ⁺ ions mainly leads to formation of intermediate oxides with an insignificant content of lower oxides. It is found that the process of ion-beam reduction of the surface of oxides MoO₃ and WO₃ substantially depends on the ion type, irradiation dose, and difference in energy of the metal-oxygen bond in oxides.     

Surface composition modification of tungsten higher oxide under He<Superscript>+</Superscript> ion bombardment

The surface reduction of higher oxide WO₃ under irradiation by He⁺ ions with the energies 1 and 3 keV in a high vacuum is investigated by X-ray photoelectron spectroscopy. It is found that lower WO₂ and intermediate WO _x (2 < x < 3) oxides form first in WO₃ surface layers under He⁺ ion bombardment, and with an increase in the irradiation dose metallic tungsten forms. It is shown that the degree of irradiated oxide surface metallization increases with an increase in the energy of the bombarding He⁺ ions. A comparison of WO₃ oxide surface composition modification under He⁺ and Ar⁺ ion irradiation is presented.     

Superficial defects induced by argon and oxygen bombardments on (110) TiO2 surfaces

Compositional and chemical changes of titanium dioxide monocrystalline surfaces induced by bombardment with 4 keV argon and oxygen ions have been studied by AES, XPS and AFM. Argon ion bombardment induced strong changes in the composition and chemical state of the surface: loss of oxygen due to preferential sputtering occurred, and, related to this, Ti⁴⁺ species were reduced to Ti³⁺ and Ti²⁺. During oxygen bombardment, competition between preferential sputtering of oxygen ions of the oxide surface and oxygen implantation was observed. This phenomenon was found to be strongly dependent upon the incidence angle of the oxygen ions. Moreover, an oxygen bombardment with normal incidence of the surface that had been previously submitted to an argon ion bombardment led to a restoichiometrization of the surface: no further Ti³⁺ or Ti²⁺ was found by XPS, only Ti⁴⁺.     

Effect of oxide surface metallization under ion-beam irradiation

Changes in the surface chemical composition of WO₃, Ta₂O₅, MoO₃, and Nb₂O₅ oxides after Ar⁺ ion irradiation and those of the WO₃ surface after He⁺ ion irradiation under high vacuum were investigated by X-ray photoelectron spectroscopy. Upon Ar⁺ ion irradiation with an energy of 3 keV, the pronounced effect of ion-beam metallization was observed on the WO₃ oxide surface; a moderate effect was found for the Ta₂O₅ oxide surface; a weak one for the MoO₃ oxide surface; and no effect was discovered for the Nb₂O₅ oxide surface. At the saturation dose, 44 at % W, 12 at % Ta, and 2 at % Mo form on the oxide surfaces. Irradiation by light He⁺ ions with energies of 1 and 3 keV results in WO₃ surface metallization. At the saturation dose, 2 and 10 at % W (at 1 and 3 keV, respectively) forms on the oxide surface. The nature, mechanisms, and features of the oxide surface metallization effect induced by ion-beam irradiation are discussed.     

Photon studies of ion induced Ta continuum emission

Photon emission from Ta metal bombarded with 55 keV Ar⁺ is investigated under both ultra high vacuum and oxygen rich environments. It is shown that oxygen is necessary to produce broad band continuum emission and that Ta oxide molecules are most probably the origin of this emission.     

The surface oxidation of ion-bombarded NiMn alloy

Surface oxidation of thin foils of NiMn alloy has been studied by transmission electron microscopy and electron diffraction. The surface was oxidized during bombardment with 50 keV protons at a residual pressure of 5 × 10^?6 Torr at room temperature. In the first stage of oxidation small islands of MnO were formed on the surface of NiMn alloy. The oxide islands are irregularly distributed on both surfaces of the foil and are coherent with the NiMn base. Subsequent heating of the bombarded specimens was accompanied by formation of tetragonal MnO_1.88 in an orientation where (110) MnO_1.88z.dfnc; (101) NiMn. Comparison has been made with “normal” oxidation caused by heating of the specimens in approximately the same atmosphere.     

K9和石英玻璃基片上Au膜真空紫外反射特性研究

采用离子束溅射法,分别在经过不同前期清洗方法处理过的K9及石英玻璃光学基片上,选择不同的镀膜参量,镀制了多种厚度的Au膜。对镀制的Au膜在真空紫外波段较宽波长范围内的反射率进行了连续测量。测试结果表明:辅助离子源的使用方式、Au膜厚度对反射镜的反射率有重大影响。基片材料、镀前基片表面清洗工艺等对反射率也有一定影响。采用镀前离子轰击,可显著提高Au膜反射率及膜与基底的粘合力;获得最高反射率时的最佳膜厚与基片材料、镀膜工艺密切相关。对经过离子清洗的石英基片,膜厚在30 nm左右反射率最高;比较而言,石英基片可获得更高的反射率;辅助离子源的使用还显著影响获得最高反射率时对应的最佳膜厚值,且对K9基片的影响更显著。     

The influences of plasma ion bombarded on crystallization, electrical and mechanical properties of Zn-In-Sn-O films

The quality of co-sputtering derived Zn-In-Sn-O (ZITO) film was adjusted by different gas (oxygen and argon) induced plasma ions bombarding (PIB) treatment. The result showed that the film conductivity could be improved after plasma bombardment. The increment of oxygen vacancies and plasma bombard-induced thermal energy were main reasons. Notably, the efficiency of Ar plasma bombarded for improved conductivity not only was better but also had a smoother surface morphology. Due to Ar ions will not react with metal atoms to form oxide and possessed a higher momentum. In addition, the O-rich layer on the ultra-surface not only was removed but also enhanced film reliability by plasma bombarded that could enhance the performance of optoelectronic devices.     

XPS study of ion-induced chemical effect on β-bismuth molybdate catalyst

Ar ion-induced chemical effect on MoO₃, Bi₂O₃, and β-Bi₂O₃·2MoO₃ has been studied by ESCA. It was found that the reduction behavior of Mo(VI) and Bi(III) in the complex oxide is quite different from that in the single oxides. A relative oxygen enrichment of the ion-bombarded and reduced surface was observed. It has been shown that the oxygen on the bombarded surface is in a special chemical state and incapable of reoxidizing the reduced low valent metal ion. But, exposing to air leads to the reoxidation of the reduced surface and leaves the lattice oxygen anion as the only surface oxygen species. The reduction behavior of β-Bi₂O₃·2MoO₃ under Ar ion bombardment seems to be similar to its redox behavior in butene catalytic oxidation. It was suggested that both of them should reflect the effect of crystal structure on the redox potential of the oxides.     

Luminescence effects of ion-beam bombardment of CdTe surfaces

In the present work, we report the effect of low-energy ion bombardment on CdTe surfaces. The effect is revealed by FESEM images and photoluminescence (PL) measurements carried out before and after irradiation of CdTe polycrystals by means of an ion-beam sputtering (IBS) system. An important improvement in the luminescence of CdTe was observed in the irradiated areas, related to defect-free surfaces.