外加磁场对碰撞射频鞘层离子能量分布的影响

采用双流体模型,数值研究入射到射频鞘层偏压电极上的离子能量分布.研究结果表明：磁场在改变离子运动状态的同时,调控着基板上的离子能量分布,使之在垂直基板方向和平行基板方向间转移. 关键词： 等离子体 射频 鞘层 磁场     

双频容性耦合CF4等离子体放电的二维混合模拟

研究了等离子体反应装置内的等离子体密度、粒子能量与角度分布等参量在装置径向与轴向上的分布特性。在研究过程中应用二维混合模型对CF4气体放电进行模拟。计算结果显示:在电极表面与侧壁附近的鞘层区特性有明显的区别。由于装置侧壁处受电源产生的射频电场的影响较小,侧壁处的鞘层主要由双极扩散机制形成,其产生的径向电场强度较弱,鞘层厚度也较薄。而在电极附近,由于受到射频电场的影响,鞘层的厚度显著增加,指向电极方向的轴向电场强度也远大于指向侧壁方向的径向电场强度。在电极区域内,离子通量分布均匀;在电极边缘与侧壁的间隙内,因电场强度减小,离子通量则发生迅速衰减。在射频电极覆盖的范围内离子能量分布大体上保持不变,电极与侧壁的交界处,由于受到侧壁处径向电场的影响,离子能量分布略有不同。在放电装置的中心区域,入射到电极上的离子角度分布基本保持一致,而在电极边界与装置侧壁的交界处,由于径向电场的影响,离子的垂直入射角增加,以大角度轰击电极的离子数量也显著增加。     

蒙特卡罗模拟在辉光放电鞘层离子输运研究中的应用

利用蒙特卡罗方法模拟氩气直流辉光放电鞘层内离子的运动过程.模拟基于离子与中性原子的电荷转移和弹性散射两种主要的散射过程，考虑了碰撞截面与能量相关和不相关两种情况，在弹性散射中采用了势场相互作用模型和刚性球碰撞两种模型.通过模拟得到不同气压和不同放电电压下离子入射阴极的能量分布和角度分布，并对几种模型的模拟结果进行了比较和讨论. 关键词： 辉光放电 等离子体鞘层 蒙特卡罗模拟     

碰撞对非对称射频鞘层特性的影响

对于大多数活性射频等离子体刻蚀工艺，由于放电室中两个电极的面积不等，使得两个电极附近的等离子体鞘层是非对称性的.考虑离子与中性粒子的碰撞效应，建立了一种描述这种非对称射频鞘层动力学特性的自洽动力学模型.数值结果显示碰撞效应对极板上的瞬时电压降、瞬时电子鞘层厚度、鞘层内的离子密度和动能的空间分布以及两个极板上电压之差等物理量的影响. 关键词： 射频鞘层 非对称电极 碰撞效应 离子     

斜磁场作用下的射频等离子体平板鞘层结构

建立一个一维坐标空间、三维速度空间的斜磁场作用下的射频等离子体平板鞘层模型，讨论了磁场对射频鞘层结构及其参数特性的影响.研究结果表明：磁场对鞘层结构有不可忽略的影响，特别是能够使鞘层边界附近的离子速度分布和密度分布产生明显的变化.此外，虽然磁场不能改变离子总的能量密度分布，却能改变离子的运动状态，并同时影响着基板上离子在各个方向上的能量分布和入射偏移角度. 关键词： 射频 鞘层 磁场     

ICP等离子体鞘层附近区域发光光谱特性分析

为了独立控制鞘层附近区域离子密度和离子能最分布,采用光发射谱(OES)测量技术,对不同射频功率、放电气压和基底偏压下感应耦合等离子体鞘层附近区域辉光特性进行了研究.原子谱线和离子谱线特性分析表明,在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度.改变放电气压和射频功率,对得到的光谱特性分析表明,鞘层附近区域离子密度随射频功率的增大而线性增大,在低压下随气压的升高而增大.低激发电位原子谱线强度增加迅速,高激发电位原子谱线强度增加缓慢,而离子谱线强度增加很不明显.改变基底直流偏压,对得到的发射光谱强度变化分析表明,谱线强度随基底正偏压的增加而增大.随着基底负偏压的加入,谱线强度先减小而后增大;直流偏压为-30 V时,光谱强度最弱.快速离子和电子是引起Ar激发和电离过程的主要能量来源.     

气体放电阴极鞘层氩离子的自洽蒙特卡罗模拟

建立了气体放电阴极鞘层离子的自洽蒙特卡罗模拟模型,考虑了离子与中性原子的电荷交换碰撞和弹性散射,用到了精确依赖于离子能量的电荷交换和动量输运截面。模拟了氩离子在阴极鞘层中的运动,得到了不同气压下自治电场分布,离子的能量分布和角分布,发现:离子由鞘层边界向阴极运动过程中,离子能量分布的高能部分逐渐增大,角分布向小角度部分压缩,鞘层中的强电场加速和聚焦了离子;在鞘层边界附近的电场呈非线性。     

射频辉光放电CH4等离子体中电子的能量分布

通过求解Lorentz简化的玻尔兹曼方程,得到射频放电CH₄等离子体中电子的能量分布函数.求解过程中使用一个简化的射频电场模型代替泊松方程求解放电电场.共计包含6类环境气体及27种电子碰撞反应.通过EEDF对等离子体中的电子反应率系数、电子平均能量、电子的传输率系数等进行求解分析.结果表明,在等离子体鞘层区域电子能量具有Maxwell分布形式,在正柱区域具有Druyvesteyn分布形式.最高电子能量和最大反应率系数出现在鞘层区域.电子的迁移率系数和扩散率系数随射频周期的演化时空分布不均匀.     

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开发了氢气甚高频(60MHz)容性耦合放电的PIC/MC模型.在模型中考虑了带电粒子(e,H+,H2+,H3+)与H2的21种碰撞反应过程,模拟了氢气甚高频放电射频电场和电势分布以及电子和氢离子(H+,H2+,H3+)粒子密度和平均能量分布,并与频率为13.56MHz的放电结果进行了比较.结果表明,相对于频率13.56MHz的放电,氢气甚高频放电等离子体电势增高,导致两电极附近的电场增强;另外,两鞘层厚度变窄并且电子和H3+离子平均能量减小,其总密度却增加.H3+离子为氢气甚高频放电空间的主要离子,H2+离子密度比H3+离子小约2～3个数量级.     

等离了体源离子注入球靶的蒙特—卡罗模拟

建立了在球形靶鞘层中蒙特－卡罗模拟模型，考虑了离子与中性粒子的电荷交换碰撞和弹性散射，以及精确依赖于入射离子能量的电荷交换碰撞截面和动量输运截面。模拟了不同气压下，在鞘层扩展过程中，氮离子Ｎ＾＋２到达靶表面的能量分布和入射分布，研究了它们的变化规律。     

气体放电空心阴极鞘层氩离子的蒙特-卡罗模拟研究

建立了气体放电空心圆筒阴极鞘层离子的自洽蒙特-卡罗模拟模型,对鞘层区内离子的输运过程进行了研究。考虑了离子与中性原子的电荷交换碰撞和弹性散射,用到了精确依赖于离子能量的电荷交换和动量输运截面。模拟了氩离子在空心阴极鞘层中的运动,得到了不同放电条件下自洽电场分布,离子的能量分布,角分布以及电子密度分布和离子密度分布。计算结果表明:离子在由鞘层边界向阴极运动过程中,离子能量分布的高能部分逐渐增大,角分布向小角度部分压缩,鞘层中的强电场对离子起加速和聚焦作用;在鞘层内离子密度分布比较均匀,只是在鞘层边界附近变化 关键词：     

Sputtered atom transport processes

It is noted that the transport of sputtered atoms can be described in terms of three pressure regimes: low pressure, where no collisions occur during the trajectory of the atom; intermediate pressure, where the atom undergoes perhaps several collisions but does not completely thermalize; and high pressure, where the sputtered atom effectively stops and begins a density-gradient-driven conventional gas-phase diffusion process. The intermediate region is the most complicated to model, given the dependence of the energy on the collision cross-section, the various distributions in energy and angle of the sputtered atoms, and the extended nature of most sputtering sources. Experimental studies reported here have measured the transport probability by observing the distribution of atoms around a chamber following sputtering. The transport is found to be quite dependent on the mass of both the sputtered atom and the background gas, as well as the particle density and geometry of the vacuum system. A strong effect of sputtered-atom-induced gas rarefaction has also been observed. This results in power-dependent transport of sputtered atoms, and as a result may also lead to power-dependent compositional variation in alloy depositions. The general result is that high discharge powers tend to correlate with lower power operation at a significantly lower operating pressure than had been assumed     

Study of the angular and energy distributions of Na+ and K+ ions which have passed through thin copper films

The angular and energy distributions of alkaline Na⁺ and K⁺ ions which have passed through thin Cu films in different crystal states are studied. The ion energy E₀ is varied from 10 to 40 keV, and the incidence angle. ranges from 0° to 60°. The angular aperture of the detector is ～0.5°, which allows the form of the angular distribution of ions which have passed through the solid thin films as a function of the energy, the angle of primary-ion beam incidence, and the layer thickness to be studied in detail. It is shown that, in the range E₀ = 10.40 keV, the energy loss ΔE of those ions that have passed increases linearly as the energy of incident ions increases. The energy loss increases with increasing ion mass in the case of singly charged ions. The surface amorphization of single- and polycrystalline films leads to an increase (by 150–200 eV) in the energy loss caused by the diffuse propagation of ions and to loss-peak broadening. It is probable that surface amorphization is accompanied by an increase in the number of atoms experiencing multiple collisions with atoms of the film, which leads to an increase in the average energy loss by ions that have passed through films.     

On the coupling of electron energy distribution function and excited state distributions in pulsed microwave H$\mathsf{_{2}}$ plasmas

Time evolution of vibrationally and electronically excited states and their coupling with the electron energy distribution function (EEDF) were calculated for microwave pulsed discharges. Different situations have been considered by changing the period and the duty cycle, and considering different pressure values.The main result of this study was to evidence the change in the non-equilibrium character and dynamics of the different distributions depending on the pressure and the pulse period. In particular EEDF strongly deviating from the Maxwell behaviour appear as a consequence of inelastic and superelastic collisions at relatively high pressure and long period. Also, strong oscillation appears on the tail of the H₂ vibrational distribution at high pressure discharge conditions. At low pressure, the effect of superelastic and inelastic collisions appears to be less significant and most of the plasma characteristics may be deduced from a time averaged electron energy distribution function.Received: 15 January 2004, Published online: 29 June 2004PACS: 52.25.Dg Plasma kinetic equations - 52.20.Hv Atomic, molecular, ion, and heavy-particle collisions - 52.27.Cm Multicomponent and negative-ion plasmas     

Effects of post-desorption collisions on the energy distribution of SiCl molecules pulsed-laser desorbed from Cl-covered Si surfaces: Monte-Carlo simulations compared to experiments

Si surfaces covered with up to a monolayer of chlorine by exposure to a low chlorine pressure have been irradiated with nanosecond excimer-laser pulses at a fluence just large enough to melt the surface. Angle-resolved time-of-flight (TOF) distributions and surface temperatures have been measured as a function of chlorine dose between laser pulses. The TOF distributions can be fitted well by Maxwell-Boltzmann (MB) distributions for all coverages and at all desorption angles. With increasing coverage, the intensity and kinetic energy distributions become increasingly peaked along the surface normal. Monte-Carlo simulations of the effect of post-desorption collisions, occurring when many molecules are desorbed within a very short time, reproduce the experimental results quite well. It is shown that just a few collisions per molecule are sufficient to convert any initial desorption distribution into a MB one.     

Autoionization of Ne projectiles in collisions with surfaces

We have measured the energy distributions of Ne autoionization electrons produced in collisions of 0.5–3 keV Ne⁺ ions with Al surfaces. We have found a strong broadening and a weak energy shift of the lines with increasing projectile energy. We have also identified the autoionization transitions leading to these lines.     

微空心阴极放电的流体模型模拟

采用流体模型研究了微空心阴极放电(MHCD)的特点，对放电中电场的形成，电子和离子的密度分布，电子能量分布进行了数值模拟.该计算是针对高气压，圆筒形阴极结构下的He放电.结果表明放电中存在空心阴极效应，从电子能量分布可以看出，放电中存在高能电子，放电空间的电场分布主要表现为径向电场.此外，通过改变气压，阴极孔径等参数计算出它们对放电的影响.分析表明减小孔径有利于负辉区更充分的重合.提高气压将缩短阴极位降区. 关键词： 微空心阴极放电 流体模型     

Theoretical analysis of ion kinetic energies and DLC film deposition by CH4＋ Ar （He） dielectric barrier discharge plasmas

The kinetic energy of ions in dielectric barrier discharge plasmas are analysed theoretically using the model of binary collisions between ions and gas molecules. Langevin equation for ions in other gases, Blanc law for ions in mixed gases, and the two-temperature model for ions at higher reduced field are used to determine the ion mobility. The kinetic energies of ions in CH4 ＋ Ar（He） dielectric barrier discharge plasma at a fixed total gas pressure and various Ar （He） concentrations are calculated. It is found that with increasing Ar （He） concentration in CH4 ＋ Ar （He） from 20% to 83%, the CH4＋ kinetic energy increases from 69.6 （43.9） to 92.1 （128.5）eV, while the Ar＋ （He＋） kinetic energy decreases from 97 （145.2） to 78.8 （75.5）eV. The increase of CH4＋ kinetic energy is responsible for the increase of hardness of diamond-like carbon films deposited by CH4 ＋ Ar （He） dielectric barrier discharge without bias voltage over substrates.