Layer-by-layer epitaxial growth of polar FeO(111) thin films on MgO(111)

We report on the structural properties of epitaxial FeO layers grown by molecular beam epitaxy on MgO(111). The successful stabilization of polar FeO films as thick as 16 monolayers (ML), obtained by deposition and subsequent oxidation of single Fe layers, is presented. FeO/MgO(111) thin films were chemically and structurally characterized using low-energy electron diffraction, Auger electron spectroscopy and conversion electron Mössbauer spectroscopy (CEMS). Detailed in situ CEMS measurements as a function of the film thickness demonstrated a size-effect-induced evolution of the hyperfine parameters, with the thickest film exhibiting the bulk-wüstite hyperfine pattern. Ex situ CEMS investigation confirmed existence of magnetic ordering of the wüstite thin film phase at liquid nitrogen temperature.     

Dynamically stabilized growth of polar oxides: the case of MgO(111)

By using MgO(111) as a model system for polar oxide film growth, we show by first-principles calculations that H acts as a surfactant, i.e., the H changes its position and bonding during the growth process, remaining in the surface region. Continuous presence of H during the growth of MgO(111) film efficiently removes the microscopic dipole moment, thus enabling the growth of perfect fcc-ordered MgO(111) films. These theoretical predictions are confirmed experimentally by molecular beam epitaxy single crystal growth of MgO(111) on SiC(0001).     

Epitaxial growth and thermostability of cubic and hexagonal SrMnO3 films on SrTiO3(111)

The growth of SrMnO₃ films on SrTiO₃(111) substrates by pulsed laser deposition was studied and found to produce cubic and hexagonal (4H) structures in the SrMnO₃ films. By adjusting the substrate temperature and oxygen pressure, the stability of the two phases was fine-tuned, resulting in the growth of cubic-SrMnO₃(111) or 4H-SrMnO₃(0001) film, with the 4H phase being the more stable at room temperature and ambient pressure in the bulk form. The growth temperature of the cubic phase was also further lowered relative to the bulk thermodynamics by strain at the heterointerface, and once obtained, it was stable at temperatures of up to 800 °C.     

Characteristics of low-temperature-grown GaN films on Si(111)

In this paper, we report on the characteristics of GaN films grown on Si(111) at a low temperature (200 °C) by electron cyclotron resonance (ECR) plasma-assisted metalorganic chemical vapor deposition (PA-MOCVD). Structural analysis of the GaN films was performed by using scanning electron microscopy (SEM), atomic force miscroscopy (AFM), X-ray diffraction (XRD), energy dispersive X-ray analysis (EDX), and Rutherford backscattering spectrometry (RBS). Post deposition analysis revealed high quality crystalline GaN was obtained at this low temperature. Electrical analysis of the GaN films was done by using current-voltage (I-V) measurements where electrical characterizations were carried on GaN/Si heterojunction and Schottky barrier diodes. Rectification behaviour was observed for the isotype GaN/Si (n-n) heterojunction. Ideality factors and Schottky barrier heights for Ni and Cr Schottky barriers on GaN, were deduced to be 1.4 and 1.7; and 0.62 and 0.64 eV, respectively.     

Strain analysis of epitaxial ultrathin films on Pt(111)

X-ray photoelectron diffraction (XPD) measurements have demonstrated that Ni ultrathin films on Pt(111) exhibit a single domain fcc stacking pseudomorphic to the substrate, with a consequent trigonal distortion of the Ni unit cell in order to accommodate the in-plane expansion of the Ni lattice parameter of about 11% with respect to its bulk value. We show that the amount of interlayer contraction and the strain energy resulting form the trigonal distortion are very well predicted by a strain analysis in the framework of simple linear elasticity theory. Strain analysis also allows to discuss in some detail the controversial case of Co growth on the same substrate. Finally, we discuss the dependence of the strain energy of the overlayer on the substrate crystal orientation and its effects on chemisorption experiments performed on heteroepitaxial monolayers (HML).     

Characterization of epitaxial MgO growth on Si(001) surface

MgO epitaxial growth on a Si(001) surface by ultrahigh-vacuum molecular beam epitaxy was investigated. Epitaxial orientation and crystalline quality were characterized based on the three-dimensional reciprocal map obtained by Weissenberg RHEED. The epitaxial orientation and crystallinity were strongly dependent on the initial condition of the substrate. When MgO was deposited on a clean Si(001) surface at room temperature a MgO(001) film grew on the Si(001) substrate with two in-plane orientations:MgO[110]//Si[100] and MgO[100]//Si[100]. This is the first observation of MgO epitaxy with the former orientation, which has a smaller mismatch than the latter orientation. When the substrate was exposed to O₂ or thermally oxidized, the latterorientation predominantly grew on the substrate. Deposition of Mg on the substrate also produced the latter orientation. These results imply that nucleation sites on the initial substrate play an important role in determining the epitaxial orientation.     

Preparation and properties of GaN films on Si(111) substrates

High-quality gallium nitride (GaN) films were prepared on Si(111) substrates by sputtering post-annealing-reaction technique. XRD, XPS, and SEM measurement results indicate that polycrystalline GaN with hexagonal structure was successfully prepared. Intense room- temperature photoluminescence that peaked at 354 nm of the films is observed. The bandgap of these films has a blueshift with respect to bulk GaN.     

Temperature-dependent photoluminescence spectra of GaN epitaxial layer grown on Si(111) substrate

In this paper, the temperature-dependent photoluminescence(PL) properties of Ga N grown on Si(111) substrate are studied. The main emission peaks of Ga N films grown on Si(111) are investigated and compared with those grown on sapphire substrates. The positions of free and bound exciton luminescence peaks, i.e., FX A and D0 X peaks, of Ga N films grown on Si(111) substrates undergo red shifts compared with those grown on sapphire. This is attributed to the fact that the Ga N films grown on sapphire are under the action of compressive stress, while those grown on Si(111) substrate are subjected to tensile stress. Furthermore, the positions of these peaks may be additionally shifted due to different stress conditions in the real sample growth. The emission peaks due to stacking faults are found in Ga N films grown on Si(111) and an S-shaped temperature dependence of PL spectra can be observed, owing to the influence of the quantum well(QW) emission by the localized states near the conduction band gap edge and the temperature-dependent distribution of the photo-generated carriers.     

Surface electronic structure of polar NiO(111) films

The surface and electronic structure of polar NiO(111) films with or without facets, prepared on a Mo(110) substrate, were in situ studied using various surface analytical techniques. A new surface state located at 0.8–1.8 eV measured by electron energy loss spectroscopy was observed on faceted NiO(111) films, which is originated from surface Ni vacancies. This surface state is decreased by annealing or deposition of Ni atoms. The experimental results indicate that the charge transfer occurs between surface and bulk of the faceted NiO(111) films. Present work provides a model surface with polarity and facets, which can be used for further investigation on chemical adsorption of atoms or molecules as well as selective reaction.     

Auger line shape changes in epitaxial (111)Pd/(111)Cu films

Epitaxial Pd films ranging in thickness from a few tenths of a monolayer up to many monolayers were formed on (111)Cu substrate films at room temperature under UHV conditions. The growth of these Pd films was monitored in situ by Auger electron spectroscopy. The line profiles of the Cu MMM (61 eV) and Pd MVV (329 eV) AES doublets varied significantly with the amount of Pd deposited. A new measure of the AES doublet line profile, called the R-factor, was defined. A graph R_pd versus Pd film thickness shows a sharp decline with increasing thickness. Superimposed on the major trend is a cyclical variation. A corresponding periodicity in R_cu was observed for the Cu MMM (61 eV) AES doublet. The results suggest that the R-factor provides a direct measure of changes in the electronic structures of the overgrowth and substrate films as the former thickens by a layer-growth mechanism.     

Spin-dependent quantum interference from epitaxial MgO thin films on Fe(001)

Spin-dependent electron reflection from MgO thin films grown on Fe(001) was measured using spin-polarized low energy electron microscopy. The electron reflectivity exhibits quantum interference from which two MgO energy bands with Delta1 symmetry were determined in experiment. We found that a bulklike MgO energy gap is fully established for MgO film thicker than 3 atomic monolayers and that the electron reflectivity from the MgO/Fe interface exhibits a spin-dependent amplitude and a spin-independent phase change.     

Phase‐controlled epitaxial growth of iron oxide thin films on MgO(001) and LaAlO3(001) substrates

We have deposited epitaxial iron oxide thin films on MgO(001) and LaAlO₃(LAO)(001) substrates, resulting in different phase stabilities. Atomic force microscopy images revealed a smooth surface. Detailed X‐ray diffraction (XRD) measurements were performed to confirm the epitaxial growth and to analyze the atomic growth configuration. We found that (00l) oriented γ‐Fe₂O₃ was the stable phase on MgO(001) substrates, whereas $ (1\bar 102) $ oriented α‐Fe₂O₃ was stable on LAO(001). Magnetic hysteresis loop measurements revealed typical ferrimagnetic behavior for γ‐Fe₂O₃ on MgO, whereas the magnetization of α‐Fe₂O₃ on LAO was relatively small and consistent with an antiferromagnetic order. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth and structure of epitaxial diamond films grown on Si(111) single crystals

Experiments on growing single-crystal diamond films on silicon crystals with (111) surface orientation have been performed. Results attesting to the possibility of obtaining thin heteroepitaxial films are presented. Pis’ma Zh. éksp. Teor. Fiz. 65, No. 5, 414–418 (10 March 1997)     

The epitaxial growth of the chromium bcc (111) layers

Cr/Tb/Cr thin films have been obtained by pulsed laser deposition (PLD) on sapphire substrates. The crystal structure of the films was characterised in-situ by means of reflection high energy electron diffraction (RHEED) and Auger spectroscopy (AS) and ex-situ by X-ray grazing incidence diffraction (GID) and scanning tunnelling microscopy (STM). The deposition of chromium on the Tb(0001) layers at 300 °C was found to lead to the formation of three Cr(110) crystalline domains. Chromium deposited on Tb(0001) initially (first 50 Å) at room temperature and then at 300 °C grew epitaxially in the [111] direction and formed two Cr(111) crystalline domains shifted by 30°. Due to the lower density of the atoms in Cr(111) plane, compared to the Cr(110) and Cr(001) ones, this orientation is interesting for magnetic studies.     

Pulsed-laser-deposited epitaxial aluminum nitride films on (111) Si for surface acoustic-wave applications

Epitaxial (001) aluminum nitride (AlN) thin films on (111) Si substrates are prepared using pulsed-laser deposition. The epitaxial structure of the as-prepared thin films is characterized by checking the X-ray-diffraction θ-2 θ scan and pole-figure, using scanning electron microscopy, infrared radiation (IR) spectroscopy and Raman spectroscopy. The surface acoustic-wave resonance at 345 MHz for a 1.5 μm thick AlN film on a (111) Si substrate is observed using an inter-digital electrode. Received: 18 September 2001 / Accepted: 29 January 2002 / Published online: 3 June 2002 RID="*" ID="*"Corresponding author. Fax: +86-25/359-5535, E-mail: liujm@nju.edu.cn