Electric field enhancement in guided-mode resonance filters

Electric fields inside guided-mode resonance filters (GMRFs) may be intensified by resonance effects. The electric field enhancement is investigated in two GMRFs: one is resonant at normal incidence, the other at oblique incidence. It is shown that the two GMRFs exhibit different behaviors in their electric enhancement. Differences between the electric field distributions of the two GMRFs arise because coupling between counterpropagating modes occurs in the first case. It is also shown that the order of the electric field of maximum amplitude can be controlled by modulation of the dielectric constant of the grating.     

基于共振异常的消偏振型窄带滤波器分析

亚波长光栅因光栅参量的不同而具有不同的衍射特性,通过对亚波长光栅参量的合理设计来实现消偏振窄带滤波是一种新的方法与途径。首先分析了基于共振异常的窄带滤波的物理机制及存在条件,讨论了二维亚波长光栅实现消偏振窄带滤波的可能性。然后,利用严格模式理论进行了计算模拟,其计算结果与导波理论所得结果基本吻合,其衍射特性表现出周期性共振异常、敏感的角度依赖性和波长依赖性。最后,讨论了由工艺误差对滤波特性所带来的影响。为具体工艺制作提供了一定的指导。     

Nonpolarizing guide-mode resonance filter with ultra-narrow linewidth

Ultra-narrow linewidth,nonpolarizing guide-mode resonance (GMR) filters with single and double common resonance wavelengths are designed.The guide-mode resonance filters consist of a single grating layer with asymmetric profiles.By choosing appropriate parameters,same resonance wavelengths for both transverse electric (TE) and transverse magnetic (TM) polarizations can be achieved.Results show that high reflection (more than 99.9%) is obtained at every resonance wavelength,and the full-width at halfmaximums (FWHMs) of TEand TM-polarized light are only 0.008 and 0.215 nm,respectively.     

Optimization of a guided-mode resonance filter by varying the thickness of the buffer layer

In this Letter, we demonstrate that by adjusting the thickness of the buffer layer, the optical responses of a guided-mode resonance filter(GMRF) can be improved for sensor applications. The GMRF is fabricated using a replica molding with a plastic substrate and a UV-curable polymer. SiO_2 buffer layers of different thicknesses are deposited before the waveguide-layer deposition. The sensitivity of the GMRFs decreases slightly with increasing SiO_2 layer thickness. By contrast, the full width at half-maximum reduces substantially with increasing SiO_2 layer thickness, resulting in the improvement of the overall figure of merit.     

Spectral narrowing and stabilization of thulium fiber lasers using guided-mode resonance filters

We used guided-mode resonance filters (GMRFs), fabricated using thin-film deposition and chemical etching, as intracavity feedback elements to stabilize and narrow the output spectrum in thulium-doped fiber oscillators operating in the 2?μm wavelength regime, producing linewidths of <700?pm up to 10?W power levels. A Tm fiber-based amplified spontaneous emission source was used to characterize the reflective properties of the GMRFs. Linewidths of 500?pm and a 7.3?dB reduction in transmission were measured on resonances.     

Design of guided mode resonant filters for authentication applications through azimuthal angles varying

Guided mode resonant filters (GMRFs) for authentication application with low sideband reflection at O° and 90° azimuthal angles were designed. Using rigorous coupled-wave analysis, the diffractive characteristics of this kind device with different illumination angles, groove depths, and thicknesses of cover SiO<,2> layer were investigated. The structure of GMRF which satisfies the requirements for authentication applications was obtained. Illuminated at 30° for a definite polarization mode, the filter presents symmetrical reflectance shape, low sideband reflectance, two separate reflectance peaks, and definite full-width at half-maximum (FWHM) at O° and 90° azimuthal angles.     

Near-field optical properties of wide bandwidth metal multi-layer dielectric gratings for pulse compressor

Metal multi-layer dielectric gratings (MMDG) for pulse compressors in high-energy laser systems should provide broad bandwidth as well as high laser-induced damage thresholds. The non-uniform optical near-field distribution of MMDG is an important factor that limits damage resistant capabilities. MMDG for pulse compressors operating at 800 nm with a corrugated SiO₂ layer are designed by using a genetic algorithm and the Fourier mode method. The diffraction efficiency, bandwidth, and near-field distribution of the MMDG are theoretically investigated. For the single dielectric match layer grating, the bandwidth is 140 nm, if the thickness and refractive index of the match layer are changed, the maximum electric field in the grating ridge, match layer, and metal layer of the grating increases with the decrease in grating diffraction efficiency. For the multi-dielectric match layer grating, the bandwidth and the maximum electric field in the metal layer decrease with the increase in high- and low-index material pairs, and the maximum electric field in the grating ridge and match layer initially decreases and then increases. Over a wide wavelength range, the maximum electric field in the grating ridge, match layer, and metal layer is minimal near the central wavelength. Moreover, MMDG should be used at larger incident angles while keeping enough bandwidth to reduce the electric field in the grating.     

Fabrication of freestanding nanoscale gratings on silicon-on-insulator wafer

We report a bottom-up process for the fabrication of freestanding nanoscale gratings on silicon-on-insulator (SOI) wafer. Freestanding membrane devices suffer deflection due to the residual stress of the buried oxide layer of SOI wafer. The deflection will affect the device shape and result in the fracture problem for devices fabricated on thin silicon membrane. The bottom-up process is developed to overcome the fabrication issue for thin silicon membrane gratings. The silicon handle layer is removed through back wafer etching of silicon, where the buried oxide layer acts as an etch stop layer. The grating structures are then defined on thin silicon device layer by electron beam lithography and generated by fast atom beam etching. The grating structures are finally released in vapor HF to form the freestanding nanoscale gratings. The freestanding linear/circular gratings, 1,500-nm period grating with the grating width of 200- and 850-nm period grating with the grating width of 100 nm, are successfully achieved on 260-nm silicon device layer.     

前后光栅周期对于双光栅结构薄膜太阳能电池光俘获效应的影响

本文用时域有限差分法对硅层等效厚度为100 nm的具有不同前后光栅周期的介质/金属双光栅结构薄膜太阳能电池进行了模拟分析,比较了三角形最佳相同与不同周期光栅结构的吸收光谱特性,分析了光栅高度、填充比、硅吸收层厚度对最佳相同和不同周期光栅结构光吸收特性的影响,以及相应结构中导致光吸收增强的共振模式.结果表明前后光栅周期为1:1的共形双光栅结构中存在光泄漏现象,偏离1:1后的光栅结构可有效地抑制低级次衍射光的泄漏,前光栅周期小于后光栅周期的结构光吸收性能的提高来自于平面波导模式在吸收层中的有效激发和传播,而前光栅周期大于后光栅周期的结构光吸收性能的提高则来自于后光栅界面上所激发的等离子体极化模式.在较厚的硅吸收层厚度,前后光栅周期比为1:2和1:3的电池结构也会出现光泄漏现象,从而使具有最大光吸收效率的结构偏离这些周期比结构的位置.     

Nonpolarizing Interference Systems Containing Metallic Layers

Optics and Spectroscopy - The structure of nonpolarizing interference systems incorporating the layers manufactured from metallic materials is considered. The method of searching for the structures...     

多层介质膜脉冲压缩光栅近场光学特性分析

利用傅里叶模式理论分析了TE波自准直角入射的使用条件下，多层介质膜光栅的光栅区和多层膜区电场分布的特点.分别讨论了HfO₂和SiO₂为顶层光栅材料时，光栅结构参数对光栅脊峰值电场的影响，结果表明，对于不同膜厚的顶层材料，存在一个最佳膜厚度，使光栅脊峰值电场最小，并且当膜厚增大时，设计大高宽比的光栅可以降低该电场峰值.最后，在大角度条件下使用多层膜光栅也可以降低光栅脊处的峰值电场. 关键词： 衍射光学 多层介质膜光栅 模式理论 损伤阈值     

Development of a mirror backed volume phase grating with potential for large aperture and high damage threshold

The present paper proposes a new grating concept by which a volume phase grating is placed on top of a dielectric mirror stack. Instead of using a multilayer dielectric grating, wherein the uppermost layer of a thin film mirror is etched to create the desired binary phase grating we suggest to have an upper grating layer of a lower density gelatin-based volume phase grating in either sol–gel or dichromated gelatin. The key benefit is the elimination of the etching step which is the limiting factor in the production of large aperture gratings. We have investigated designs for s- and p-polarization as well as the necessary chemistry that is needed to achieve the required index modulations. Damage testing on dichromated gelatin and aerogel was performed and diffraction efficiencies for various prototypes were measured.     

光学系统的偏振效应研究

本文研究了光线经过光学系统时偏振度的变化,发现:对某一类非消偏振光学系统,部分偏振光经过它时偏振度降低.     

PDMS梯度光栅结构制备技术研究

由于传统方法制作的梯度光栅,工艺条件苛刻,制作过程复杂,难以控制,制作成本高,周期较长,提出了一种成本低、工艺简单、可大量制备梯度光栅的工艺方法,采用基于刚性薄膜/柔性衬底的自组装工艺和氧等离子体(Plasma)的方法制备了微米尺度的梯度光栅,利用Plasma时间的可控性和聚二甲基硅氧烷(PDMS)优异的弹性制得所需要尺寸的光栅。首先在聚乙烯对苯二酸脂(PET)薄膜上旋涂一层PDMS薄膜,待PDMS薄膜固化后将双层薄膜弯曲并用Plasma处理,在其表面生成一层刚性氧化层,借助柔性的PET对刚性层施加均匀应力,当应力超过临界值时,在PDMS基底上自组装形成光栅褶皱结构。由于弯曲时预应力的变化,所以在PDMS薄膜上会形成周期和高度呈阶梯状的的光栅褶皱,也就是梯度光栅。采用可见光作为梯度光栅的性能测试光源,选用一级衍射光作为检测对象,从图谱中可以看出以PDMS为基底制备的光栅具有很好的衍射效应,并可实现很好的分光效果。实验表明：梯度光栅具有明显的衍射现象,并且衍射角变化显著,可广泛用于应力测量。这种方法制备的柔性梯度光栅也可以作为微型应变装置来检测应力的变化,未来有望用于微型光谱仪、扫描仪、光通讯等领域中。     

All optical Flip-Flop based on a nonlinear DFB semiconductor laser: Theoretical study

A new design of an all optical Flip-Flop is proposed. It consists of a nonlinear distributed feedback (DFB) laser. The wave guiding layer of the DFB laser consists of linear grating section followed by a nonlinear one, and both sections are separated by a phase shift section. In the OFF-state, the real part of the refractive index in the wave guiding layer forms a Bragg grating. In the ON-state, it forms a Bragg grating with a phase shift section. Optical gain is achieved by current injection in the semiconductor active layer. Nonlinearity in the nonlinear layers of the semiconductor grating was achieved by direct absorption at the edge of the absorption band (Urbach tail). Numerical simulation shows that the device switches in a nanosecond time scale.     

光栅光阀器件的结构改进与制作工艺研究

根据光栅光阀的工作原理,在结构上对传统的光栅光阀器件进行了改进,分析了改进后光栅光阀器件的光学特性、结构特性,以及制作工艺流程.改进后的光栅光阀结构中硅基底上设有二氧化硅隔离层,隔离层上沉积无定形硅作为牺牲层,可动梁的材料是氮化硅,固定梁为蒸镀的金属铝层.通过离子刻蚀的方法刻蚀图形,用化学腐蚀方法掏空牺牲层得到所需桥梁状结构.研究表明改进后的器件黑区范围小,驱动电压较低,光学效率较高,具有潜在的应用前景.     

光栅光阀器件的结构改进与制作工艺研究

根据光栅光阀的工作原理,在结构上对传统的光栅光阀器件进行了改进,分析了改进后光栅光阀器件的光学特性、结构特性,以及制作工艺流程.改进后的光栅光阀结构中硅基底上设有二氧化硅隔离层,隔离层上沉积无定形硅作为牺牲层,可动梁的材料是氮化硅,固定梁为蒸镀的金属铝层.通过离子刻蚀的方法刻蚀图形,用化学腐蚀方法掏空牺牲层得到所需桥梁状结构.研究表明改进后的器件黑区范围小,驱动电压较低,光学效率较高,具有潜在的应用前景.     

High-resolution photorefractive gratings in nematic liquid crystals sandwiched with photoconductive polymer film

Photorefractive gratings with high grating resolution were observed in the 20 μm thick low-molar-mass nematic liquid crystal (NLC) cell with a separate photoconductive (PC) poly(N-vinylcarbazole) layer. An orientational grating with a grating spacing of 1.9 μm was produced. It is believed that a space–charge field with small fringe spacing forms in the PC layer and its evanescent component penetrates into the NLC layer. The penetrated evanescent field drives the NLC to reorient, and consequently the orientational grating forms. The model indicates that the modulated field exists in several hundred nanometers near the surface, and thus the orientational grating is not full of the NLC film, which is consistent with the observed phenomena of the multiple diffractions. Besides, asymmetric two-beam coupling of 11.2% was achieved for the grating with a grating spacing of 1.9 μm, and a net gain coefficient of larger than 62 cm⁻¹ was obtained.     

双层交叉叠合式共振亚波长光栅

提出了一种防伪光栅结构-双层交叉叠合式共振亚波长光栅,其特点是可以展宽共振亚波长光栅的共振波长宽度,使得当将其应用于防伪时能得到更佳的光变效果。分析了半峰全宽展宽的原理,指出共振宽度值的大小依赖于耦合到光栅波导层内一级衍射光的能量。优化设计了此种光栅的结构参量。用矢量衍射理论对该结构的共振特性和制作工艺误差进行了研究。研究表明：这种防伪光栅的共振光谱峰值并不随着入射角的改变而降低,共振半峰全宽最大值约为同等条件下基本共振光栅结构的7倍,该结构的共振性能对光栅制作误差不是很敏感,是一种应用价值较高的防伪光栅结构。     

表面等离子激元与F-P共振耦合平衡钙钛矿太阳能电池有源层内载流子产生速率

为提高有机-无机杂化钙钛矿太阳能电池（PSCs）光吸收效率、平衡有源层中载流子产生速率,将周期性纳米光栅结构引入到PSCs器件结构中。分析了光栅周期、光栅高度和有源层厚度对表面等离子激元（SPPs）与法布里-珀罗（F-P）共振耦合模式的影响。通过改变光栅周期,实现了SPPs与F-P共振耦合波长范围与钙钛矿材料的弱吸收光谱区域相重合,同时光栅高度的增加可以增大耦合模式的光谱宽度。SPPs与F-P共振耦合模式实现了金属电极与电子传输层（ETL）界面处的局域电场增强。结果表明:场增强效应扩展到有源区,有效提高了PSCs有源层远入射光侧在570~800 nm波长范围内的光吸收,进而提高了有源层远入射光区域的载流子产生速率。当光栅周期为250 nm、光栅高度为50 nm、源层厚度为300 nm时,PSCs在太阳光弱吸收光谱区域内的本征吸收提高了~12%,有源层远入射光侧载流子产生速率提高了~41%。