InAs/GaAs量子点1.3 μm单光子发射特性

采用双层耦合量子点的分子束外延生长技术生长了InAs/GaAs量子点样品,把量子点的发光波长成功地拓展到1.3 μm.采用光刻的工艺制备了直径为3 μm的柱状微腔,提高了量子点荧光的提取效率.在低温5 K下,测量得到量子点激子的荧光寿命约为1 ns;单量子点荧光二阶关联函数为0.015,显示单量子点荧光具有非常好的单光子特性;利用迈克耳孙干涉装置测量得到单光子的相干时间为22 ps,对应的谱线半高全宽度为30 μeV,且荧光谱线的线型为非均匀展宽的高斯线型.     

Continuous wavelength tuning of InAs quantum dots on InP (1 0 0) and (3 1 1)A substrates by chemical-beam epitaxy

The growth of InAs quantum dots (QDs) on InP (1 0 0) and (3 1 1)A substrates by chemical-beam epitaxy is studied. The InAs QDs are embedded in a GaInAsP layer lattice-matched to InP. We demonstrate an effective way to continuously tune the emission wavelength of InAs QDs grown on InP (1 0 0). With an ultra-thin GaAs layer inserted between the QD layer and the GaInAsP buffer, the peak wavelength from the InAs QDs can be continuously tuned from above 1.6 μm down to 1.5 μm at room temperature. The major role of the thin GaAs layer is to greatly suppress the As/P exchange during the deposition of InAs and subsequent growth interruption under arsenic flux, as well as to consume the segregated In layer floating on the GaInAsP buffer. Moreover, it is found that InP (3 1 1)A substrates are particularly promising for formation of uniform InAs QDs. The growth of InAs on InP (3 1 1)A consists of two stages: nanowire formation due to strain-driven growth instability and subsequent QD formation on top of the wires. The excellent size uniformity of the InAs QDs obtained on InP (3 1 1)A manifests itself in the narrow photoluminescence line width of 26 meV at 4.8 K.     

InAs/AlAs quantum dots with InGaAs insertion layer: dependence of the indium composition and the thickness

We have systematically studied the effect of an In_xGa_1−xAs insertion layer (IL) on the optical and structural properties of InAs quantum dot (QD) structures. A high density of 9.6×10¹⁰ cm⁻² of InAs QDs with an In_0.3Ga_0.7As IL has been achieved on a GaAs (1 0 0) substrate by metal organic chemical vapor deposition. A photoluminescence line width of 25 meV from these QDs has been obtained. We attribute the high density and high uniformity of these QDs to the use of the IL. Our results show that the InGaAs IL is useful for obtaining high-quality InAs QD structures for devices with a 1.3 μm operation.     

Numerical simulation of a coupling effect on electronic states in quantum dots

Lasers operating at 1.3 μm have attracted considerable attention owing to their potential to provide efficient light sources for next-generation high-speed communication systems. InAs/GaAs quantum dots (QDs) were pointed out as a reliable low-cost way to attain this goal. However, due to the lattice mismatch, the accumulation of strain by stacking the QDs can cause dislocations that significantly degrade the performance of the lasers. In order to reduce this strain, a promising method is the use of InAs QDs embedded in InGaAs layers. The capping of the QD layer with InGaAs is able to tune the emission toward longer and controllable wave-lengths between 1.1 and 1.5 μm. In this work, using the effective-mass envelope-function theory, we investigated theoretically the optical properties of coupled InAs/GaAs strained QDs based structures emitting around 1.33 μm. The calculation was performed by the resolution of the 3D Schrödinger equation. The energy levels of confined carriers and the optical transition energy have been investigated. The oscillator strengths of this transition have been studied with and without taking into account the strain effect in the calculations. The information derived from the present study shows that the InGaAs capping layer may have profound consequences as regards the performance of an InAs/GaAs QD based laser. Based on the present results, we hope that the present work make a contribution to experimental studies of InAs/GaAs QD based structures, namely the optoelectronic applications concerning infrared and mid-infrared spectral regions as well as the solar cells.     

Enhanced photoluminescence intensity of 1.3-μm multi-layer InAs/InGaAs dots-in-well structure using the high growth temperature spacer layer step

The effects of growth temperature of the GaAs spacer layers (SPLs) on the photoluminescence (PL) efficiency of multi-layer GaAs-based 1.3-μm InAs/InGaAs dots-in-well (DWELL) structures have been investigated. It is found that the PL intensity of DWELLs is enhanced by incorporating a high growth temperature step for GaAs SPLs. This improved PL efficiency could be understood in term of reducing the non-radiative recombination centers. An extremely low continuous-wave room-temperature threshold current density of 35 A/cm² is achieved for an as-cleaved 5-layer device with emission at 1.31 μm by using this growth technique.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

Strain interactions and defect formation in stacked InGaAs quantum dot and dot-in-well structures

The growth of high-quality stacked quantum dot (QD) structures represents one of the key challenges for future device applications. Electronic coupling between QDs requires closely separated electronic levels and thin barrier layers, requiring near identical composition and shape, despite strong strain interactions. This paper presents a detailed characterization study of stacked InGaAs QD and InAs/InGaAs dot-in-well (DWELL) structures using cross-sectional transmission electron microscopy. For In_.5Ga_.5As/GaAs QD structures we have observed optimized stacking using a barrier thickness 12 nm.We also report studies of stacking in DWELL laser structures. Despite reports of very low threshold currents in such lasers, designed for 1.3 μm emission, performance is limited by gain saturation and thermal excitation effects. We have explored solutions to these problems by stacking multiple DWELL layers of three, five and 10 repeats. Initial attempts at stacked multilayer structures, particularly samples with a large number of repeats, produced variable results, with a number of the final devices characterized by poor emission and electrical characteristics. Analysis by transmission electron microscopy has identified the presence of large defective regions arising from the complex interaction of dots on several planes and propagating threading dislocations into the cladding layers. The origin of this defect is identified as the coalescence of QDs at very high density and the resulting dislocation propagating to higher dot planes. An effective modified method to reduce the defect density by growing the barrier layer at higher temperature will be discussed. Finally, we report the growth of a stacked 10-layer structure using relatively thin barriers, grown using this technique.     

Structural and optical properties of In0.5Ga0.5As/GaAs quantum dots in an In0.1Ga0.9As well using repeated depositions of InAs/GaAs short-period superlattices for the application of optical communication

We report structural and optical properties of In_0.5Ga_0.5As/GaAs quantum dots (QDs) in a 100 Å-thick In_0.1Ga_0.9As well grown by repeated depositions of InAs/GaAs short-period superlattices with atomic force microscope, transmission electron microscope (TEM) and photoluminescence (PL) measurement. The QDs in an InGaAs well grown at 510 °C were studied as a function of n repeated deposition of 1 monolayer thick InAs and 1 monolayer thick GaAs for n=5–10. The heights, widths and densities of dots are in the range of 6–22.0 nm, 40–85 nm, and 1.6–1.1×10¹⁰/cm², respectively, as n changes from 5 to 10 with strong alignment along [1 −1 0] direction. Flat and pan-cake-like shape of the QDs in a well is found in TEM images. The bottoms of the QDs are located lower than the center of the InGaAs well. This reveals that there was intermixing—interdiffusion—of group III materials between the InGaAs QD and the InGaAs well during growth. All reported dots show strong 300 K-PL spectrum, and 1.276 μm (FWHM: 32.3 meV) of 300 K-PL peak was obtained in case of 7 periods of the QDs in a well, which is useful for the application to optical communications.     

InAs/GaAs柱形岛的制备及特性研究

利用固源分子束外延（MBE）的方法经SK模式自组装生长由多层InAs／GaAs量子点组成的柱形岛.具体分析了GaAs间隔层厚度，生长停顿时间以及InAs淀积量对发光峰波长的影响.原子力显微镜（AFM）结果显示柱形岛表面的形状和尺寸都比较均匀；室温下不同高度的柱形岛样品的发光波长分别达到1.32和1.4μm，而单层量子点的发光波长仅为1.1μm，充分说明了量子点高度对发光波长的决定性影响，这为调节量子点发光波长提供了一种直观且行之有效的方法. 关键词： 柱形岛 生长停顿 间隔层厚度 PL谱     

Dependence on temperature of homogeneous broadening of InGaAs/InAs/GaAs quantum dot fundamental transitions

We report systematic temperature-dependent measurements of photoluminescence spectra in self-assembled InGaAs/InAs/GaAs quantum dots (QDs). We have studied the rise in temperature of the ground-state homogeneous linewidth.A theoretical model is presented and accounts for the phonon-assisted broadening of this transition in individual QD. We have estimated the homogeneous linewidth of an individual QD from PL spectra of self-organized InAs/GaAs QDs by isolating the PL of each individual QD and fitting the narrow line associated with self-organized QDs through a Lorentzian convoluted by a Gaussian. We have observed a strong exciton–LO–phonon coupling (γ_LO) which becomes the dominating contribution to the linewidth above the temperature of 45 K. We have also derived the activation energy (ΔE) of the exciton–LO–phonon coupling, zero temperature linewidth (Γ₀) and the exciton-LA-phonon coupling parameter (γ_Ac). We report that our values are close to the values found in the literature for single InGaAs QD and InAs QD.     

Long-wavelength luminescence from GaSb quantum dots grown on GaAs substrates

Self-assembled GaSb quantum dots (QDs) with a photoluminescence wavelength longer than 1.3 μm were successfully grown by suppressing the replacement of As and Sb on the surface of the GaSb QDs. This result means that GaSb can thus join InAs or GaInAs as a suitable material for QD lasers for optical communications.     

Strong photoluminescence and laser operation of InAs quantum dots covered by a GaAsSb strain-reducing layer

GaAsSb strain-reducing layers (SRLs) are applied to cover InAs quantum dots (QDs) grown on GaAs substrates. The compressive strain induced in InAs QDs is reduced due to the tensile strain induced by the GaAsSb SRL, resulting in a redshift of photoluminescence (PL) peaks of the InAs QDs. A strong PL signal around a wavelength of 1.3 μm was observed even at room temperature. A laser diode containing InAs QDs with GaAsSb SRLs in the active region was fabricated, which exhibits laser oscillation in pulsed operation at room temperature. These results indicate that GaAsSb SRLs have a high potential for fabricating high efficient InAs QDs laser diodes operating at long-wavelength regimes.     

One-dimensional single (In,Ga)As quantum dot arrays formed by self-organized anisotropic strain engineering

Well-defined one-dimensional single (In,Ga)As quantum dot (QD) arrays have been successfully formed on planar singular GaAs (1 0 0) in molecular beam epitaxy by self-organized anisotropic strain engineering of an (In,Ga)As/GaAs quantum wire (QWR) superlattice (SL) template. The distinct stages of template formation, which govern the uniformity of the QD arrays, are directly imaged by atomic force microscopy (AFM). The AFM results reveal that excess strain accumulation causes fluctuations of the QWR template and the QD arrays. By reducing the amount of (In,Ga)As and increasing the GaAs separation layer thickness in each SL period, the uniformity of the QD arrays dramatically improves. The single QD arrays are straight over more than 1 μm and extended to 10 μm length. Capped QD arrays show clear photoluminescence emission up to room temperature.     

Selective growth of stacked InAs quantum dots by using the templates formed by the Nano-Jet Probe

We have demonstrated the selective area growth of stacked self-assembled InAs quantum dot (QD) arrays in the desired regions on a substrate and confirmed the photoluminescence (PL) emission exhibited by them at room temperature. These InAs QDs are fabricated by the use of a specially designed atomic force microscope cantilever referred to as the Nano-Jet Probe (NJP). By using the NJP, two-dimensional arrays with ordered In nano-dots are fabricated in the desired square regions on a GaAs substrate and directly converted into InAs QD arrays through the subsequent annealing by the irradiation of As flux. By using the converted QD arrays as strain templates, self-organized InAs QDs are stacked. These stacked QDs exhibit the PL emission peak at a wavelength of 1.02 μm.     

Growth of InAs/GaAs quantum dots on germanium-on-insulator-on-silicon substrate for silicon photonics

We report the growth of self-assembled InAs/GaAs quantum dots (QDs) on germanium-on-insulator-on-silicon (GeOI/Si) substrate by antimony-mediated metal organic chemical vapor deposition. The influence of various growth procedures for the GaAs buffer layer on the QD formation and optical quality was investigated. We obtained QDs with density above 10¹⁰ cm⁻², and ground state emission in the 1.3 μm band at room temperature. These results demonstrate the promising suitability of germanium-on-insulator for the monolithic integration of QD-based and other GaAs-based photonic devices on silicon.     

Molecular beam epitaxy growth and characterization of self-assembled InAs quantum dots on (1 0 0) InAlAs/InP substrates

Self-assembled InAs quantum dots (QDs) on In_0.52Al_0.48As layer lattice matched to (1 0 0) InP substrates have been grown by molecular beam epitaxy (MBE) and evaluated by transmission electron microscopy (TEM) and photoluminescence (PL). TEM observations indicate that defect-free InAs QDs can be grown to obtain emissions over the technologically important 1.3–1.55 μm region. The PL peak positions for the QDs shift to low energy as the InAs coverage increases, corresponding to increase in QD size. The room temperature PL peak at 1.58 μm was observed from defect-free InAs QDs with average dot height of 3.6 nm.     

Self-assembled GaAs/AlGaAs quantum dots by molecular beam epitaxy and in situ AsBr3 etching

We report on a new method to produce self-assembled, unstrained, GaAs/AlGaAs quantum dots (QDs) with large confinement energy. First we create nanoholes on a GaAs surface by growing InAs islands on GaAs(0 0 1), overgrowing them with GaAs and etching the surface in situ with AsBr₃ gas. Then we transfer the holes to an AlGaAs surface, fill them with GaAs and overgrow them with AlGaAs. In this way we obtain GaAs inclusions in an AlGaAs matrix. We investigate the optical properties of such QDs by photoluminescence spectroscopy and their morphology by atomic force microscopy. We show that the QD size can be tuned and emission with inhomogeneous broadening down to 8.9 meV can be achieved.     

金纳米颗粒光散射提高InAs单量子点荧光提取效率

采用光学方法确定InAs/GaAs单量子点在样品外延面上的位置坐标, 利用AlAs牺牲层把含有量子点的GaAs层剥离并放置在含有金纳米颗粒或平整金膜上, 研究量子点周围环境不同对量子点自发辐射寿命及发光提取效率的影响. 实验结果显示, 剥离前后量子点发光寿命的变化小于13%, 含有金纳米颗粒的量子点发光强度是剥离前的7倍, 含有金属薄膜的量子点发光强度是剥离前的2倍. 分析表明在金纳米颗粒膜上的量子点荧光强度的增加主要来自于金纳米颗粒对量子点荧光的散射效应, 从而提高量子点发光的提取效率.     

Spontaneous one-dimensional lateral alignment of multistacked InGaAs quantum dots on GaAs (n 1 1)B substrates

In_0.45Ga_0.55As/GaAs multistacking quantum dot (QD) structures were fabricated on a GaAs (n 1 1)B (n=2–4) substrate by metalorganic vapor-phase epitaxy. QDs spontaneously aligned in the [0 1 1] direction were observed on stacked QDs, whereas QDs were randomly distributed in the initial In_0.45Ga_0.55As layer growth. The formation mechanism of this self-alignment was studied by changing the number of In_0.45Ga_0.55As/GaAs multilayers and crystallographic arrangement. Photoluminescence spectra showing clear polarization dependence indicate carrier coupling in the QD arrays. This growth technique results in spontaneously aligned InGaAs QDs without any preprocessing technique prior to growth.     

半导体自组织量子点量子发光机理与器件

介绍了自组织量子点单光子发光机理及器件研究进展.主要内容包括：半导体液滴自催化外延GaAs纳米线中InAs量子点和GaAs量子点的单光子发光效应、自组织InAs/GaAs量子点与分布布拉格平面微腔耦合结构的单光子发光效应和器件制备,单量子点发光的共振荧光测量方法、量子点单光子参量下转换实现的纠缠光子发射、单光子的量子存储效应以及量子点单光子发光的光纤耦合输出芯片制备等.