入射能量对Au/Au(111)薄膜生长影响的分子动力学模拟

利用分子动力学模拟了Au原子在Au(111)表面低能沉积的动力学过程.采用嵌入原子方法的原子间相互作用势,通过对沉积层原子结构的分析和薄膜表面粗糙度、层覆盖率的计算,研究了沉积粒子能量对薄膜质量的影响及其机制.结果表明:当入射能量Ein25 eV时,沉积层和基体表层均呈现规则的单晶面心立方(111)表面的排列,沉积原子仅注入到基体最表面两层,随着入射能量的增加,薄膜表面粗糙度降低,薄膜越趋于层状生长,入射能量的增加有利于薄膜的成核和致密化;当Ein 25 eV时,沉积层表面原子结构出现了较为明显的晶界,沉积原子注入到基体表面第三层及以下,随着入射能量的增加,薄膜表面粗糙度增加,沉积层和基体表层原子排列越不规则,载能沉积会降低基体内部的稳定性,导致基体和薄膜内部缺陷的产生,降低薄膜质量.此外,当基体内部某层沉积原子数约等于该层总原子数的一半时,沉积原子将能穿过该层进入到基体内部更深层.     

Au/Cu(001)异质外延岛演化的分子动力学研究

利用分子动力学弛豫方法模拟了Au/Cu(001)异质外延生长初期Au异质外延岛的形貌演化，分析了Au外延岛演化过程中的局域应力及与基体结合能随表面岛尺寸的变化. 研究结果表明：当异质外延岛小于7×7时，外延岛原子分布呈现赝Cu点阵形貌；当外延岛达到8×8后，外延岛内开始出现失配位错，失配位错数量随外延岛尺寸的增加而增加. 局域压力分析指出，外延岛上原子之间的近邻环境不同导致了所受应力的差异，而外延岛的形变则是由外延岛原子的应力分布所决定. 研究还发现，失配位错的产生导致错位原子与基体原子之间的结合强度减弱，但相对增加了非错位原子与基体原子之间的结合强度. 关键词： 异质外延 表面形貌 局域压力 分子动力学模拟     

沉积粒子能量对薄膜早期生长过程的影响

利用Monte Carlo(MC)模型研究了能量粒子对薄膜生长的初始阶段岛膜的形貌和岛的尺寸的影响,沉积粒子的能量范围为:0—0.7eV.在模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,并详细考虑了临近和次临近原子的影响.结果表明,在所采用的参量范围内不同的基底温度情况下,能量粒子的影响有很大的区别.低基底温度情况下,沉积粒子强烈地影响着薄膜的生长过程中,岛膜的形貌、数量和尺寸随能量粒子的能量增加而有很大的变化.分析表明,这些变化都是由于能量粒子的介入使得表面吸附粒子的扩散能力增强所致 关键词： 薄膜生长 Monte Carlo方法 扩散     

非均匀基底上三维薄膜生长的模拟研究

考虑原子在基底表面的扩散、沿岛周界的扩散和不同层间的扩散以及非均匀基底上表面吸附能分布的各向异性，建立起非均匀基底表面上原子扩散和三维薄膜生长的动力学蒙特卡罗模型.模拟得到在不同生长条件下出现的层状生长、岛状生长和混合生长三种生长模式和相应的多层薄膜生长形貌图.通过统计三维薄膜中原子在各层的分布，计算薄膜的表面粗糙度，得到薄膜生长模式与生长条件之间的关系. 关键词： 薄膜生长 非均匀基底 动力学蒙特卡罗模拟     

薄膜外延生长的计算机模拟

以Cu膜为例，用Monte-Carlo算法模拟了薄膜生长的随机过程，并提出了更加完善的模型.在合理选择原子间相互作用计算方法的基础上，考虑了原子的吸附、在生长表面的迁移及迁移所引起的近邻原子连带效应、从生长表面的脱附等过程.模拟计算了薄膜的早期成核情况以及表面粗糙度和相对密度.结果表明，随着衬底温度的升高或入射率的降低，沉积在衬底上的原子逐步由离散型分布向聚集状态过渡形成一些岛核，并且逐步由二维岛核向三维岛核过渡.在一定的原子入射率下，存在三个优化温度，成核率最高时的最大成核温度Tn、薄膜的表面粗糙度最低 关键词： Monte-Carlo算法 计算机模拟 薄膜生长     

苝四甲酸二酐在Au(111)表面的取向生长及电子结构研究

利用X射线光电子能谱(XPS),同步辐射紫外光电子能谱(SRUPS),近边X射线吸收精细结构(NEXAFS)以及原子力显微镜(AFM)等技术研究了苝四甲酸二酐(PTCDA)与Au(111)的界面电子结构、PTCDA分子取向及有机薄膜的表面形貌.SRUPS价带谱显示,伴随PTCDA分子的微量沉积(0·5ML),位于费米能级附近Au的表面电子态迅速消失,但却观察不到明显的界面杂化态,这说明PTCDA分子和Au(111)界面间存在弱电子传输过程,但并没有发生明显的化学反应.角分辨NEXAFS以及SRUPS结果证明PTCDA分子是平铺在衬底表面.根据Au4f7/2和C1s峰积分强度随薄膜厚度的变化以及AFM图像可知,PTCDA分子在Au(111)表面是一种典型的Stranski-Krastanov生长模式,即先层状生长,再岛状生长,并且在层状生长到岛状生长的转变过程中,存在有机分子的去润湿过程.     

Au/TiN复合薄膜制备及其表面增强拉曼光谱研究

表面增强拉曼散射光谱(SERS)已用于环境监测、生物医药、食品卫生等领域,而高活性SERS基底是表面增强拉曼散射光谱技术应用的关键。TiN作为新型等离子材料具有较强的SERS性能,同时化学稳定性及生物相容性较好,但其SERS性能不如贵金属金强。该研究采用氨气还原氮化法和电化学沉积法,在TiN薄膜表面沉积贵金属Au纳米颗粒制备出Au/TiN复合薄膜。在Au/TiN复合薄膜中单质Au和TiN两种物相共存;随着电化学沉积时间延长,TiN薄膜表面单质金纳米颗粒数量逐渐增多,金纳米颗粒尺寸增大,颗粒间距减小。由于金与TiN两者的本征表面等离子共振耦合作用,Au/TiN复合薄膜的共振吸收峰发生了偏移。利用罗丹明6G为拉曼探针分子,对Au/TiN复合薄膜进行SERS性能分析,发现Au/TiN复合薄膜上的R6G探针分子的拉曼峰信号强度随沉积时间延长呈现先增大后减小的规律;当电化学沉积时间为5 min时,R6G拉曼信号峰较高,复合薄膜样品的SERS活性最大。将Au/TiN复合薄膜和Au薄膜分别浸泡在10-3,10-5,10-7,10-8及10-9 mol·L-1 R6G溶液5 min,进行检测限分析,发现Au/TiN复合薄膜检测极限达10-8 mol·L-1,增强因子达到8.82×105,与Au薄膜和TiN薄膜相比,Au/TiN复合薄膜上对R6G探针分子SERS活性最高。这得益于Au/TiN复合膜中表面等离子体产生的耦合效应,使得局域电磁场强度增强,从而引起R6G探针分子拉曼信号增强。通过2D-FDTD模拟电场分布发现Au/TiN,Au及TiN薄膜具有电场增强作用,其中Au/TiN复合薄膜的增强作用尤为显著,这也证实了氮化钛与金纳米颗粒之间存在耦合效应。另外发现TiN与Au之间可能存在电荷转移,促进了4-氨基苯硫酚氧化反应,进而证实了TiN与Au薄膜的协同作用。此外,Au/TiN复合薄膜均匀性较好,相对平均偏差仅为7.58%。由此可见,采用电化学沉积制备的Au/TiN复合薄膜具有作为SERS基底材料的应用潜力。     

Au纳米薄膜的熔化机理及其结构演变的分子动力学模拟

利用分子动力学模拟详细研究了不同厚度的Au纳米薄膜的熔化机理和结构演变. 模拟结果表明所有Au纳米薄膜的熔化行为分为两个阶段,即表面预熔和均相熔化. 只有最外层原子出现了预熔化行为, 其他内层原子在均相熔化之前始终保持稳定的固态,这与零维的Au纳米团簇和一维的Au纳米线的预熔化行为是不同的. 同时Au纳米薄膜的熔化温度随着薄膜厚度的增加而升高. 在预熔化过程中,在原子水平上发现了所有的Au纳米薄膜的f100g晶面向f111g晶面转变的表面重建过程. 对于最薄的L2纳米薄膜,当温度低于500 K 时表面应力不能诱导这样的表面重建. 然而一维的Au纳米线在更低温度下就能够观察到了由表面应力诱导的表面重建过程. 这主要是因为Au纳米线具有更高的比表面积所导致的. 另外研究结果还表明当模拟温度达到某一特定值时,由双原子层组成的Au纳米薄膜能够分裂成一维的纳米线.     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO₂纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO₂的沉积时间及SiO₂的沉积时间一定而改变薄膜厚度时，多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明：具有纳米层状结构的Au/SiO₂多层薄膜在560 nm波长附近有明显的表面等离子共振吸收峰，吸收峰的强度随Au颗粒的浓度增加而增强，在Au颗粒浓度相同的情况下，复合薄膜 关键词： 2纳米复合薄膜')" href="#">Au/SiO₂纳米复合薄膜 多靶磁控溅射 吸收光谱 有效介质理论     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO2纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO2的沉积时间及SiO2的沉积时间一定而改变薄膜厚度时,多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明:具有纳米层状结构的Au/SiO2多层薄膜在560nm波长附近有明显的表面等离子共振吸收峰,吸收峰的强度随Au颗粒的浓度增加而增强,在Au颗粒浓度相同的情况下,复合薄膜光学吸收强度随薄膜厚度的增加而增强.但当金属颗粒的浓度增加到一定程度时,金属颗粒相互接触,没有观察到纳米层状结构,薄膜不显示共振吸收峰特征.用修正后的M-G(Maxwell-Garnett)理论对吸收光谱进行了模拟,得到了与实验一致的结果.     

MOLECULAR DYNAMICS SIMULATION OF ENERGETIC ATOM DEPOSITIONS OF Au/Au(100) FILM

The energetic atom deposition of thin Au/Au(100) film has been studied by molecular dynamics simulation using the Au-Au interatomic interaction potential with embedded atom method. By investigating the variation of coverage curves and Bragg diffraction intensities during the film growth, the transition of Stranski-Kranstanov growth mode to Frank-van der Merwe growth mode was observed with the increase of the incident energy of deposition atoms. The role of energetic atoms in the film growth is discussed by analyzing the transport properties of deposited atoms and the evolution of incident energy and substrate temperatures.     

Diffusion-limited electrodeposition of ultrathin Au films on Pt(1 1 1)

The electrodeposition of Au on Pt(1 1 1) from electrolytes containing μM concentrations of was studied by in situ scanning tunneling microscopy. Under these conditions the Au flux is limited by diffusion in the electrolyte over a wide potential range, which allows to assess the effect of the electrochemical environment on the growth kinetics. Similar to gas phase metal deposition Au film growth proceeds via nucleation and lateral growth of Au monolayer islands, with the saturation island density strongly depending on the deposition potential and on the anion species in the electrolyte. For deposition in H₂SO₄ solution the saturation island density continuously increases with increasing potential between −0.2 and 0.5 V (SCE), whereas in Cl-containing H₂SO₄ it first decreases and then increases again. Following nucleation and growth theories this behavior can be attributed to potential-induced changes of the Au surface mobility, caused by changes in the density and structure of coadsorbed sulfate/bisulfate and chloride adlayers. Under conditions of high Au surface mobility multilayer growth proceeds via a typical Stranski-Krastanov growth mode, with layer-by-layer growth of a pseudomorphic Au film up to 2 ML and 3D growth of structurally relaxed islands at higher coverage, indicating thermodynamic control under these conditions.     

Kinetic Monte Carlo simulations of Au clusters on Si(111)-7 × 7 surface

Self-assembled growth of Au nanoclusters on the Si(111)-7 × 7 surface has been studied using kinetic Monte Carlo simulations. A model considering various atomic processes of deposition, adsorption, diffusion, nucleation, and aggregation is introduced, and the main energetic parameters are optimized based on the experimental results. The evolution of surface morphology during Au growth is simulated in real time, from which the atomic behaviors of Au could be really captured. Most of Au atoms diffuse on the substrate in the very early stage of growth, and Au clusters nucleate and grow with the increasing coverage. The competition among various atomic processes results in the distinct distribution of Au clusters under different coverages. The growth conditions are further optimized, showing that the higher uniformity of Au clusters would be obtained at a low deposition rate and an optimal substrate temperature of about 380 K.     

On the 2D-3D transition in epitaxial thin film growth

The theory is based on the fact that the equilibrium concentration of single atoms adsorbed on the surface of a monolayer island placed on a foreign substrate such that the substrate-deposit interaction is weaker than the deposit-deposit interaction is higher than the equilibrium concentration of atoms adsorbed on the surface of the same island now placed on a substrate of the same material. This higher adatom concentration leads to 2D nucleation on top of the monolayer island. The difference of the above equilibrium adatom concentrations appears as a driving force for the process of transformation of the initial monolayer island into a 3D island by detachment of atoms from the first monolayer island edges and their subsequent attachment to the edges of the second layer nucleus. The kinetics of this process are studied in detail, the following two cases being considered. The first case consists of breaking up and agglomeration of an initially continuous film into 3D crystals upon heating. The second case consists of change of the growth mode from layer to island mode during the vapour deposition when the substrate temperature increases. Expressions for the critical temperatures for these two phenomena to occur are derived. It is shown that they depend strongly on the substrate orientation, the critical temperature being higher for the 〈111〉 orientation in comparison with the 〈110〉 orientation, if substrate and deposit with a fcc lattice are considered. The theoretical results are compared with experimental data for deposition of Au on Mo{110}, Cu on W{110} and W{100} and Fe on Cu{111}.     

Effects of substrate shape, curvature and roughness on thin heteroepitaxial films of Pt on Au(1 1 1)

The growth of thin (1–10 nm) films of Pt on Au(1 1 1) was studied in order to understand and clarify differences in growth mode observed in ultra-high vacuum (UHV) studies and in electrochemical deposition studies. It was found that on flat Au(1 1 1), Pt grows in a layer-by-layer growth mode, but if the gold substrate is exposed to an acidic environment prior to Pt deposition, then the substrate becomes nanoscopically rough (islanded) and Pt growth follows a pseudo-Stranski–Krastanov (SK) growth mode in which an initially thin wetting layer becomes rougher with increasing film thickness. An analysis of curvature effects on epitaxial growth mode shows that thermodynamic curvature effects involving surface stress are negligible for the Pt/Au(1 1 1) system. Rather, the apparent SK growth is linked to kinetic effects associated with inhomogeneous in-plane elastic relaxation of Pt films on rough surfaces that drive Pt atoms from pits to the tops of islands in the early stages of growth. Implications for the control of epitaxial film roughness are discussed.     

Growth morphology of nanoscale sputter-deposited Au films on amorphous soft polymeric substrates

The growth of a room-temperature sputter-deposited thin Au film on two soft polymeric substrates, polystyrene (PS) and poly(methyl methacrylate) (PMMA), from nucleation to formation of a continuous film is investigated by means of atomic force microscopy. In particular, we studied the surface morphology evolution of the film as a function of the deposition time observing an initial Au three-dimensional island-type growth. Then the Au film morphology evolves, with increasing deposition time, from hemispherical islands to partially coalesced worm-like island structures, to percolation, and finally to a continuous and rough film. The overall Au morphology evolution is discussed in the framework of the interrupted coalescence model, allowing us to evaluate the island critical radius for the partial coalescence R _c=8.7±0.9 nm for Au on PS and R _c=7.6±0.8 nm for Au on PMMA. Furthermore, the application of the kinetic freezing model allows us to evaluate the room-temperature surface diffusion coefficient D _s≈1.8×10⁻¹⁸ m²/s for Au on PS and D _s≈1.1×10⁻¹⁸ m²/s for Au on PMMA. The application of the Vincent model allows us, also, to evaluate the critical coverage (at which the percolation occurs) P _c=61% for Au on PS and P _c=56% for Au on PMMA. Finally, the dynamic scaling theory of a growing interface was applied to characterize the kinetic roughening of the Au film on both PMMA and PS. Such analyses allow us to evaluate the dynamic scaling, growth, and roughness exponents z=3.8±0.4, β=0.28±0.03, α=1.06±0.05 for the growth of Au on PS and z=4.3±0.3, β=0.23±0.03, α=1.03±0.05 for the growth of Au on PMMA, in agreement with a non-equilibrium but conservative and linear growth process in which the surface diffusion phenomenon plays a key role.     

The structure of 55-atom Cu–Au bimetallic clusters: Monte Carlo study

We have investigated segregation phenomena in Cu–Au bimetallic clusters with decahedral structures at 100 K and 300 K, based on the second-moment approximation of the tight-binding (TB-SMA) potentials by using Monte Carlo method. The simulation results indicate that there are three regions (split, three-shell onion-like and core-shell region) at 100 K and two regions (split and core-shell) at 300 K with the structure of decahedral clusters, as the chemical potential difference Δμ changes. It is found that the structure of decahedral clusters undergoes a division into smaller clusters in the split region. In the core-shell structure, Au atoms are enriched in surface and Cu atoms occupy the core of the clusters because of the different surface energy of Cu and Au. The Au atoms are enriched in the surface shell, and the Cu atoms are in the middle shell, while a single Au atom is located in the center to form the three-shell onion-like structure. The structure and binding energy of smaller clusters after splitting are also discussed. The Au atoms generally lie on the surface of the smaller clusters after splitting.     

Growth of Ag on Pb Island with Si(111) Substrate

We study the growth of Ag on Pb island surface with low temperature scanning tunnelling microscopy.Two growth modes,the subsurface island mode and the surface alloy mode,are observed on tie substrate at room temperature and at 100 K,respectively.In the surface alloy mode,the perfect alloy AgPb_2 is formed on the Pb island surface after annealing.The two growth modes at different substrate temperatures are attributed to the existence of an exchange barrier of Ag atoms on the Pb island surface.The modulation of the exchange barrier by the quantum well states is also observed on the Pb island.     

Kinetic growth mechanisms of sputter-deposited Au films on mica: from nanoclusters to nanostructured microclusters

Au nanostructured film was deposited on mica by room temperature RF sputtering. The growth mechanism of the film was studied analyzing the evolution of the film morphology as a function of its thickness by the atomic force microscopy. In the early stages of a growth the film evolution proceeds by the nucleation and growth of nanoclusters. After a critical thickness the growth of microclusters formed by the joining of nanoclusters in preferential nucleation sites, onto a quasicontinuous film, is observed. We quantified the evolution of the mean nanoclusters height and surface density and of the film roughness. This data were analyzed by the dynamic scaling theory of growing interfaces obtaining the scaling and roughness exponents z and β whose values suggest a conservative growth process. We also quantified the growth of the microclusters showing that it is consistent with a coalescence/impingement dynamic. About the formation of the microclusters, furthermore, we speculate that their origin is strongly correlated to the features of the sputtering technique in connection with the deposition on a high-diffusivity substrate.