钛原子位置对立方BaTiO3电子结构的影响

本文基于密度泛函理论(DFT)的第一原理方法,计算了Ti原子位置对BaTiO3电子结构的影响.Ti的位置变化导致晶格畸变,使电子结构发生变化;从能带结构、能态密度(DOS)、电子密度、Mulliken布居等计算结果分析表明,导带和价带主要由Ti的3d电子和O的2p电子,Ti原子位置的变化,使Ti的3d电子能量分布上移,而O的2p电子能量下移;Ti位置变化,Ti的3d电子与的sp电子形成的杂化轨道更趋向离子化,以致于使OI出现了正电荷,表明发生了的2p电子向Ti的转移;O原子电子的转移使得Ti原子在导带的3d电子能量降低,与O原子在价带的2p电子能量重叠,禁带消失;随着畸变程度提高,转移逐渐增强,使禁带宽度逐渐减小,直至完全消失.     

掺锰铌酸锂晶体第一性原理研究

利用第一性原理研究了Mn:LiNbO3晶体的电子结构和光学性质。结果表明,Mn掺杂产生了杂质能级,主要由Mn的d态轨道贡献。杂质能级与导带之间的带隙小于理想LiNbO3晶体导带与价带之间宽度,降低了电子跃迁所需能量。同时,掺杂也降低了各原子的电子轨道能量。晶体中最高占据轨道不再是O的2p轨道,而是Mn的d 轨道。掺杂离子在晶体中同时充当电子的施主与受主。静态介电常数在掺杂后有明显的增大。Mn的掺杂使晶体在可见光区域的光学性质产生变化,并使晶体的吸收谱在可见光区域产生吸收峰。     

掺铁铌酸锂晶体第一性原理研究

利用第一性原理研究了Mn:LiNbO3晶体的电子结构和光学性质。结果表明,Mn掺杂产生了杂质能级,主要由Mn的d态轨道贡献。杂质能级与导带之间的带隙小于理想LiNbO3晶体导带与价带之间宽度,降低了电子跃迁所需能量。同时,掺杂也降低了各原子的电子轨道能量。晶体中最高占据轨道不再是O的2p轨道,而是Mn的d 轨道。掺杂离子在晶体中同时充当电子的施主与受主。静态介电常数在掺杂后有明显的增大。Mn的掺杂使晶体在可见光区域的光学性质产生变化,并使晶体的吸收谱在可见光区域产生吸收峰。     

Mg2Si:Fe 电子结构及磁性的理论研究

采用基于密度泛函理论的第一性原理赝势平面波方法研究了Mg_2Si:Fe体系的电子能带结构、态密度和磁性.结果表明:掺入的Fe原子优先占据晶格中的空隙位,也可能代替晶格中的Mg位.从能带结构和态密度可以看出,当Fe原子位于晶格中空隙位时,系统显示出金属性;当Fe占据Mg位置时,对于自旋向上电子态,体系有一带隙存在,系统呈现明显的半导体特性;对于自旋向下电子态,Fe的替位掺杂在该体系内引入新的杂质能级,杂质能级与导带价带分离,且100%自旋极化.两种位置的杂质,上自旋电子和下自旋电子的态密度均明显不对称,诱导出铁磁性,且铁磁性主要由于Fe的3d态电子诱导产生.Fe位于空隙位时,Fe原子的磁矩为1.69μB;Fe占据Mg位时,Fe原子的磁矩为1.38μB,说明原子磁矩与其所占位置和配位情况有关.     

Sc掺杂Ca3Si4的电子结构和光学性质

利用基于密度泛函理论的赝势平面波方法对Sc掺Ca3Si4的电子结构和光学性质进行了系统的计算和分析比较.研究结果为块体Ca3Si4是间接带隙半导体,带隙为0.372eV,价带主要是由Si的3s和3p及Ca的3d态电子构成,导带主要是由Ca的3d态电子构成,静态介电常数ε1(0)=19,折射率n0=4.35;吸收系数在能量3.024eV处达到最大峰值1.56×105cm-1.而掺杂Sc变为n型半导体;费米能级附近的导带主要则由Ca的3d态电子和Sc的3d态电子构成,静态介电常数变为ε1(0)=54.58,折射率n0=7.416;吸收系数在能量5.253eV处达到最大峰值1.614×105cm-1.通过掺杂有效调制了Ca3Si4的电子结构和光学性质,计算结果为Ca3Si4光电材料的设计与应用提供了理论依据.     

基于密度泛函理论下O和Na掺杂单层h-BN的电子结构性质和光学效应的分析

基于密度泛函理论的第一性原理方法研究了O、Na单掺杂及O和Na共掺杂单层h-BN的形成能、电子结构和光学性质.结果表明:单掺杂体系中,O掺杂N位置、Na掺杂B位置时,掺杂形成能最低;共掺杂体系中,O和Na邻位掺杂,掺杂形成能最低.与单层h-BN相比,引入杂质原子后的体系禁带宽度均减小,其中O掺杂为n型掺杂,Na掺杂为p型掺杂,而O和Na共掺h-BN体系为直接带隙材料,有利于提高载流子的迁移率.在光学性质方面,Na掺杂h-BN体系与O和Na共掺h-BN的静介电常数均增大,在低能区介电虚部和光吸收峰均发生红移,其中Na掺杂体系红移最为显著,极化能力最强.因此Na单掺和O和Na共掺有望增强单层h-BN的光催化能力,可扩展其在催化材料、光电器件等领域的应用.     

钴铝共掺3C-SiC电子结构和磁性的第一性原理计算

采用基于密度泛函理论的第一性原理计算方法,分别计算了不同Co原子比例单掺杂、Al原子单掺杂和Co-Al共掺杂3C-SiC的电子结构和磁性参数.结果表明:随着掺杂Co原子比例的增大,单个Co原子对体系总磁矩贡献的平均值反而减小.由电子态密度分析掺杂3C-SiC体系中的磁性来源,主要是由Co-3d以及Co原子附近的C-2p电子轨道的自旋极化产生的. Al单掺3C-SiC时体系中每个原子的平均磁矩和体系总磁矩均为0,即Al单掺杂体系不具有磁性.而Co-Al共掺杂得到的体系总磁矩比单掺等量Co时要大约0. 09μB,即Co-3d与Al-3p电子轨道发生轨道杂化,使得Co-Al共掺杂可以增大Co原子对体系总磁矩的贡献.     

Ce掺杂6H-SiC电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法,对未掺杂及Ce掺杂6H-SiC的电子结构和光学性质进行理论计算.计算结果表明,未掺杂6H-SiC是间接带隙半导体,其禁带宽度为2.045 eV,掺杂Ce元素,带隙宽度下降为0.812 eV.未掺杂6H-SiC在价带的低能区,Si-3s、C-2s电子轨道对态密度的贡献较大,在价带的高能区,主要是由Si-3p、Si-3s、C-2p态组成.掺杂后Ce原子的4f轨道主要贡献在导带部分,掺杂后电导率提高.未掺杂时,只有一个介电峰,是价带电子跃迁到导带电子所致,掺杂后有两个介电峰,第一个介电峰是由于导带电子跃迁到Ce原子4f轨道上产生,第二个峰是价带电子向导带电子跃迁产生.未掺杂6H-SiC,在能量为10.31 eV处吸收系数达到最大值,掺杂后在能量为6.57 eV处,吸收系数达到最大值.     

Ce掺杂6H-SiC电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法,对未掺杂及Ce掺杂6H-SiC的电子结构和光学性质进行理论计算.计算结果表明,未掺杂6H-SiC是间接带隙半导体,其禁带宽度为2.045 eV,掺杂Ce元素,带隙宽度下降为0.812 eV.未掺杂6H-SiC在价带的低能区,Si-3s、C-2s电子轨道对态密度的贡献较大,在价带的高能区,主要是由Si-3p、Si-3s、C-2p态组成.掺杂后Ce原子的4f轨道主要贡献在导带部分,掺杂后电导率提高.未掺杂时,只有一个介电峰,是价带电子跃迁到导带电子所致,掺杂后有两个介电峰,第一个介电峰是由于导带电子跃迁到Ce原子4f轨道上产生,第二个峰是价带电子向导带电子跃迁产生.未掺杂6H-SiC,在能量为10.31 eV处吸收系数达到最大值,掺杂后在能量为6.57 eV处,吸收系数达到最大值.     

外掺非典型富勒烯C64Si的几何结构和电子性质计算研究

采用密度泛函理论(density functional theory, DFT)中的广义梯度近似(generalized gradient approximation, GGA)对非典型富勒烯C64Si的几何结构和电子性质进行计算研究,发现在C64Si可能稳定存在的四种同分异构体中,Si原子吸附在三个直接相邻五边形的公共原子处形成的外掺杂结构是热力学最稳定的结构,即文中定义的C64Si-1,这和Ge等人对 Si原子在C28笼子外部最稳定位置的预测相一致.通过对C64Si-1的能级图、轨道分布和态密度图的分析可知:Si原子的原子轨道对电子最低未占据轨道的贡献比较大,而对电子最高占据轨道的贡献比较小,但是Si原子的局部态密度对C64Si-1整体态密度的影响非常小.对C64Si-1的亲和能和电离能分析得知:外掺Si原子之后,笼子的得电子能力和失电子能力都有所降低.     

First-principles study on electronic structure of Sr2Bi2O5 crystal

The electronic structure of Sr₂Bi₂O₅ is calculated by the GGA approach. Both of the valence band maximum and the conduction band minimum are located at Γ-point. This means that Sr₂Bi₂O₅ is a direct band-gap material. The wide energy-band dispersions near the valence band maximum and the conduction band minimum predict that holes and electrons generated by band gap excitation have a high mobility. The conduction band is composed of Bi 6p, Sr 4d and O 2p energy states. On the other hand, the valence band can be divided into two energy regions ranging from −9.5 to −7.9 eV (lower valence band) and from −4.13 to 0 eV (upper valence band). The former mainly consists of Bi 6s states hybridizing with O 2s and O 2p states, and the latter is mainly constructed from O 2p states strongly interacting with Bi 6s and Bi 6p states.     

Comparison of the electron energy loss spectrum of erbium metal with ErO2andErH2

Electron energy loss spectra of metallic erbium, Er under different exposures of oxygen at room temperature, and Er deposited in an atmosphere of H₂ are presented in both N(E) and $\text{dN}\text{dE}$ form for primary energies in the range 100–1000 eV. Resonant excitations associated with the 5p and 4d levels in Er show little environmental dependence, and are largely intraatomic in character. In contrast the main plasmon peak shifts to higher energy on exposure to oxygen or hydrogen, and the spectrum of one electron excitations at low energies alters with a decrease in metal losses around 3.5 eV accompanied by a build up of valence band transitions at 8–9 eV. There is no evidence of a stable chemisorption phase under oxygen exposure, but the results are consistent with rapid oxygen incorporation into subsurface layers and oxide formation.     

First-principles study of structural,electronic, and optical properties of ZnSnO3

The structural, electronic, and optical properties of ZnSnO₃ were investigated using density functional theory within the generalized gradient approximation. The structure parameters obtained agree well with the experimental results. The electronic structures indicate that ZnSnO₃ is a semiconductor with a direct band gap of 1.0 eV. The calculated optical spectra can be assigned to contributions of the interband transitions from valence band O 2p levels to conduction band Sn 5s levels or higher conduction band Zn 3d levels in the low-energy region, and from O 2p to Sn 5p or Zn 4p conduction band in the high-energy region.     

First-principles energy band calculation for undoped and N-doped InTaO4 with layered wolframite-type structure

The electronic structures of undoped and N-doped InTaO₄ with optimized structures are calculated within the framework of the density functional theory. Calculated lattice constants are in excellent agreement with experimental values, within a difference of 2%. The valence band maximum (VBM) is located near the middle point on the ZD line and the conduction band minimum (CBM) near the middle point on the DX line. This means that InTaO₄ is an indirect-gap material and a minimum theoretical gap between VBM and CBM is ca. 3.7 eV. The valence band in the range from −6.0 to 0 eV mainly consists of O 2p orbitals, where In 4d5s5p and Ta 5d orbitals are slightly hybridized with O 2p orbitals. On the other hand, the conduction band below 5.5 eV is mainly composed of the Ta 5d orbitals and the contributions of In and O orbitals are small. The band gap of N-doped InTaO₄ decreases by 0.3 eV than that of undoped InTaO₄, because new gap states originating from N 2p orbitals appear near the top of the valence band. This result indicates that doping of N atoms into metal oxides is a useful method to develop photocatalysts sensitive to visible light.     

Electronic structure of light emitting centers in Er doped Si

Ab-initio calculations are carried out for the Er-related electrically active centers in Si. Our proposed microscopic model is consistent with photoluminescence measurements on Si:Er and Si:Er:O samples. For isolated Er, the tetrahedral interstitial site is the stable configuration, being related to the photoluminescence lines in Si:Er. Several configurations containing oxygen and fluorine atoms, surrounding the Er impurities, are proposed to simulate the effects of co-implantation. The results suggest that six oxygen atoms around substitutional Er can stabilize the center, which can be related to the strong photoluminescence lines in Si:Er:O samples. On the other hand, no configuration containing fluorine atoms could explain the stronger photoluminescence lines resulting from fluorine co-implantation. Received: 9 September 2002 / Accepted: 12 September 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +55-11/3091-5585, E-mail: jjusto@lme.usp.br     

锐钛矿二氧化钛体相缺陷的准粒子能带结构

Quasiparticle band structures of the defective anatase TiO₂ bulk with O vacancy, Ti interstitial and H interstitial are investigated by the GW method within many-body Green''s function theory. The computed direct band gap of the perfect anatase bulk is 4.3 eV, far larger than the experimental optical absorption edge (3.2 eV). We found that this can be ascribed to the inherent defects in anatase which drag the conduction band (CB) edge down. The occupied band-gap states induced by these defects locate close to the CB edge, excluding the possible contribution of these bulk defects to the deep band-gap state below CB as observed in experiments.     

Ce和O空位共掺杂TiO_2的电子结构与光学性质

采用基于密度泛函理论加U的计算方法,研究了Ce和O空位单(共)掺杂锐钛矿相TiO_2的电子结构和光吸收性质.计算结果表明,Ce和O空位共掺杂TiO_2的带隙中出现了杂质能级,且带隙窄化为2.67 eV,明显比纯TiO_2和Ce,O空位单掺杂TiO_2的要小,因而可提高TiO_2对可见光的响应能力,使TiO_2的光吸收范围增加.光吸收谱显示,掺杂后TiO_2的光吸收边发生了显著红移;在400.0—677.1 nm的可见光区,共掺杂体系的光吸收强度显著高于纯TiO_2和Ce单掺杂TiO_2,而略低于O空位单掺杂TiO_2.此外,Ce掺杂TiO_2中引入O空位后,TiO_2的导带边从-0.27 eV变化为-0.32 eV,这表明TiO_2的导带边的还原能力得到了加强.计算结果为Ce和O空位共掺杂TiO_2在可见光光解水方面的进一步研究提供了有力的理论依据.     

PbWO4电子结构的密度泛函计算

采用基于密度泛函理论的相对论性离散变分和嵌入团簇方法模拟计算了PbWO₄晶体的本征能级结构.发现价带主要由O2p轨道组成,含有部分W5d轨道;导带主要由W5d和O2p的轨道组成.发现导带底由Pb6p_1/2的狭窄能级占有.禁带宽度和价带宽度分别约为4.8和4eV.计算结果很好地解释了实验得到的反射谱,并从理论上分析了PbWO₄晶体蓝光的发光模型. 关键词： 密度泛函 电子结构 4')" href="#">PbWO₄     

Ab initio study of the electronic and atomic structure of the wolframite-type ZnWO4

Ab initio quantum chemistry calculations of the structural and electronic properties of monoclinic wolframite-type ZnWO₄ crystal have been performed within the periodic linear combination of atomic orbitals (LCAO) method using six different Hamiltonians, based on density functional theory (DFT) and hybrid Hartree-Fock-DFT theory. The obtained results for optimized structural parameters, band gap and partial density of states are compared with available experimental data, and the best agreement is observed for hybrid Hamiltonians. The calculations show that zinc tungstate is a wide band gap material, with the direct gap about 4.6 eV, whose valence band has largely O 2p character, whereas the bottom of conduction band is dominated by W 5d states.     

Density functional theory analysis of electronic structure and optical properties of La-doped Cd_2SnO_4 transparent conducting oxide

The electronic structural, effective masses of carriers, and optical properties of pure and La-doped Cd_2SnO_4 are calculated by using the first-principles method based on the density functional theory. Using the GGA+U method, we show that Cd_2SnO_4 is a direct band-gap semiconductor with a band gap of 2.216 eV, the band gap decreases to 2.02 e V and the Fermi energy level moves to the conduction band after La doping. The density of states of Cd_2SnO_4 shows that the bottom of the conduction band is composed of Cd 5 s, Sn 5 s, and Sn 5 p orbits, the top of the valence band is composed of Cd 4d and O 2p, and the La 5 d orbital is hybridized with the O 2 p orbital, which plays a key role at the conduction band bottom after La doping. The effective masses at the conduction band bottom of pure and La-doped Cd_2SnO_4 are 0.18 m0 and 0.092 m_0, respectively, which indicates that the electrical conductivity of Cd_2SnO_4 after La doping is improved. The calculated optical properties show that the optical transmittance of La-doped Cd_2SnO_4 is 92%, the optical absorption edge is slightly blue shifted, and the optical band gap is increased to 3.263 eV. All the results indicate that the conductivity and optical transmittance of Cd_2SnO_4 can be improved by doping La.