柱状与孔状图形衬底对MOVPE生长GaN体材料及LED器件的影响

在柱状图形蓝宝石衬底（PSS-p）和孔状图形蓝宝石衬底（PSS-h）上外延了GaN体材料和LED结构并进行了详细对比和分析.X射线衍射仪（XRD）和原子力显微镜（AFM）测试结果表明,PSS-h上体材料的晶体质量和表面形貌都优于PSS-p上体材料的特性,通过断面扫面电子显微镜（SEM）照片看出PSS-h上GaN的侧向生长是导致这种差异的原因.另外,基于PSS-p和PSS-h上外延的LED材料制作而成的器件结果表明,其20?mA下光功率水平相比普通蓝宝石衬底（CSS）分别提高了46%和33%.通过变温光荧光 关键词： 蓝宝石图形衬底 氮化镓 发光二极管 侧向生长     

InGaAs/GaAs应变脊形量子线分子束外延非平面生长研究

提出了新型InGaAs/GaAs应变脊形量子线结构．这种应变脊形量子线结合了非平面应变外延层中沿不同晶向能带带隙的变化、非平面生长应变层In组分的变化，以及非平面外延层厚度的变化等三方面共同形成的横向量子限制效应的综合作用．在非平面GaAs衬底上用分子束外延生长了侧面取向为（113）的脊形AlAs/In GaAs/AlAs应变量子线．用10K光致荧光谱测试了其发光性质．用Kronig-Penney模型近似计算了这种应变脊形结构所具有的横向量子限制效应，发现其光致荧光谱峰位的测试结果，与计算结果相比，有10meV的“蓝移”．认为这一跃迁能量的“蓝移”是上述三方面横向量子限制效应综合作用的结果 关键词：     

HgCdTe外延薄膜临界厚度的理论分析

基于在任意坐标系内应力与应变的关系、晶体弹性理论和位错滑移理论，研究了生长方向分别为［111］和［211］晶向，HgCdTe外延薄膜临界厚度与CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的关系. 结果表明，HgCdTe外延薄膜临界厚度依赖于CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的变化. 对于厚度为10μm，生长方向为［111］晶向的液相外延HgCdTe薄膜，要确保HgCdTe/CdZnTe无界面失配位错的前提条件，是CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的波动必须分别在±0.225‰和±5‰范围内；而对于相同厚度，生长方向为［211］晶向的分子束外延HgCdTe薄膜，CdZnTe衬底中Zn组分和HgCdTe外延层中Cd组分的波动范围分别为±0.2‰和±4‰. 关键词： HgCdTe/CdZnTe 临界厚度 位错滑移理论 失配位错     

图形衬底量子线生长制备与荧光特性研究

报道了在V型槽图形衬底上利用分子束外延技术外延生长的GaAs/AlGaAs量子线.外延截面在扫描电子显微镜下可以看到在V型槽底部形成了弯月型量子线结构,量子线尺寸约为底边60 nm高14 nm的近三角形.低温87 K下光致发光谱测试在793.7和799.5 nm处出现峰值,验证了量子线的存在.理论近似计算结果显示,相比等宽度量子阱有8 meV的蓝移正是由于横向量子限制引起的. 关键词： V型槽图形衬底 量子线 GaAs     

tetracene 分子在Ru(1010)表面的吸附结构及其电子态研究

利用紫外光电子能谱(UPS)、角分辨紫外光电子能谱(ARUPS)和扫描隧道显微镜(STM)等方法研究了tetracene分子在Ru(1010)表面上吸附的电子态，吸附位置和吸附取向.UPS实验显示，与tetracene分子有关的光电子谱峰在费米能级以下2.1, 3.5, 4.8, 6.0, 7.1和9.2 eV处；ARUPS 结果表明，tetracene分子的分子平面基本平行于衬底表面；从STM图像中可以看到tetracene分子的长轴沿［0001］和［1210］两个晶向.基于密度泛函理论的从头算计算证实了上述结论.当分子长轴沿［0001］晶向时，分子中心位置在衬底表面的“短桥位”上，当分子长轴沿［1210］晶向时，分子中心位置在衬底表面的“四原子中心空位”上. 关键词： tetracene分子 Ru(1010)表面 吸附结构 吸附电子态     

电化学沉积Fe单晶纳米线生长中的取向控制

利用电化学沉积方法，发现了一种能够动态地控制铁纳米线生长方向的沉积方法，利用该方法沉积了包括［110］取向，［200］取向及非晶态三种结构和取向的一维Fe纳米线阵列.对于三种纳米线阵列，测量了它们的磁特性，分析发现具有[200]择优取向纳米线阵列的方形度，各向异性特性和矫顽力都比[110]取向阵列有很大的改善. 关键词： 磁性纳米线 电化学沉积 取向控制     

钙钛矿结构氧化物薄膜 的外延生长

在成功地外延生长超导、铁电、铁磁等多种性质的钙钛矿结构氧化物薄膜的基础上,讨论影响氧化物薄膜 外延生长的一些因素.考虑到相形成和薄膜长征动力学,在利用脉冲激光淀积法外延生长氧化物薄膜中衬底温度是十分重要的工艺参数.衬底温度对成相和生长薄膜的取向都有影响.考虑到薄膜是首先在衬底表面成核、成相并生长.因此衬底材料晶格的影响是不容忽视的.观察到衬底材料对薄膜外延生长温度的影响.在适当的工艺条件下,利用低温三步法工艺制备得到有很强织构的外延薄膜.这突出表明界面层的相互作用对钙钛矿结构薄膜的取向有着相当大的影响. 关键词：     

冲击加载下孔洞诱导相变形核分析

用分子动力学方法模拟了冲击加载(沿［001］向)下单晶Fe中孔洞诱导相变形核及生长过程，并分析了初始温度对这一生长过程的影响.数值模拟显示：1) 相变形核首先出现在孔洞周围的(110)和(110)面上,并分别沿［110］，［110］向和［110］，［110］向生长成片状，之后核的生长方向则变为沿〈111〉向，形成“V”形板条状新相颗粒；2) 在相同冲击压力下，初始温度为300 K时在新相晶核边缘出现许多核胚，生成的新相颗粒比60 K时明显减小.这些现象表明，孔洞诱导相变形核及生长过程沿着特定晶向进行，而初     

窄台衬底内条形半导体激光器

研制了一种新型结构双异质结半导体激光器,这种激光器是利用非平面衬底液相外延的特点,使电流阻挡层和四层双异质结构在腐蚀成窄台的衬底上一次外延完成生长,内条形电流通路在外延生长中自然形成.工艺特别简单,且具有良好线性输出和稳定基横模式振荡等特点.     

金属纳米线应力分布特征的原子级模拟研究

运用分子静力学方法结合量子修正Sutten-Chen多体力场研究了Ni纳米线在平衡状态下的应力分布特征，考虑了三种不同取向的纳米线，即轴线方向分别沿［100］，［110］和［111］方向的纳米线.计算的结果表明：由于表面张应力的作用，纳米线在弛豫过程中沿轴线方向长度发生收缩；纳米线从表面向中心区域呈现出由张应力向压应力连续分布的特征.随着纳米线直径的增加，纳米线的表面区域的张应力先上升，然后略有下降，并趋向一个非零的常值；而中心区域的应力则属于压应力，其值随着直径的增加显著地减小，并趋向于零值.无论是轴向     

MBE and MOCVD growth and properties of self-assembling quantum dot arrays in III-V semiconductor structures

In this paper, we review our latest developments on the growth and properties of self-assembling quantum dot structures. The self-assembling growth technique which was initially developed using molecular beam epitaxy (MBE), has now been extended to metalorganic chemical vapor deposition (MOCVD). The paper first presents structural results based on atomic force and transmission electron microscopy studies of the quantum dot arrays which were obtained by MBE and MOCVD growth. From the detailed structural analysis we have observed that the formation of coherently strained dots of InAs, InAlAs, and InP dots on various cladding layer surfaces. MBE growth of InAs self-assembled dots has achieved the smallest size distribution, with dots as small as 12nm in diameter. For the MOCVD growth of InP dots we have found that the surface morphology and growth temperature of lower cladding layer growth has a profound influence on island size and density. Recent results on the optical and transport properties of the MBE grown self-assembling dot (SAD) arrays are also presented.     

Growth and time-resolved photoluminescence study of self-organized CdSe quantum dots in ZnSe

Employing two different growth methods: standard molecular beam epitaxy (MBE) and low-temperature atomic layer epitaxy (ALE) with subsequent annealing, we have obtained high-quality quantum dot structures consisting of CdSe embedded in ZnSe. Single dot emission lines are observed in micro-luminescence. The samples have been investigated by further optical methods including time-resolved photoluminescence under resonant excitation at 4.2 K. Distinct properties of systems with three-dimensional confinement are observed such as the suppression of the interaction between isolated quantum dots (QDs). In standard quantum wells tunneling/hopping processes generally lead to a pronounced red shift of the luminescence over time due to a lateral localization of excitons in potential fluctuations. A much less pronounced red shift is observed for the QDs reflecting only the different lifetimes of single dots and higher excited states. The red shift completely vanishes under resonant excitation that selectively excites only a few QDs of the ensemble in the layer. Typical behaviour is also observed from the halfwidth of the quantum dot emission.     

Single quantum dots as scanning tunneling microscope tips

We report the use of single quantum dot structures as tips on a scanning tunneling microscope (STM). A single quantum dot structure with a diameter of less than 200 nm and a height of 2 μm was fabricated by reactive ion etching. This dot was placed on a 40 μm-high mesa and mounted on the tip of a STM. The topography of large structures such as quantum wires or gold test substrates is clearly resolved with such a tip. To check the transport properties of the tip, quantum dot arrays were fabricated on resonant tunneling double barrier structures using the same process parameters. Conventional tunneling spectroscopy clearly resolved the 0D states in our samples. Using a metal substrate as second electrode such STM tips can be used to perform high resolution energy spectroscopy on single dots and free standing wire structures.     

Ge quantum dots growth on nanopatterned Si(0 0 1) surface: Morphology and stress relaxation study

The self-organized growth of germanium quantum dots on square nanopatterned Si(0 0 1) substrates is investigated by scanning tunnelling microscopy (STM) and grazing incidence X-ray diffraction (GIXRD) techniques. A regular surface patterning in the 10-100 nm period range is obtained by etching an interface dislocation network obtained by the controlled molecular bonding of Si substrates. The depth of the silicon surface profile is increased by a double etching process. Growth experiments are performed by solid source molecular beam epitaxy (MBE), and for deep trenches, germanium growth conditions are optimized to obtain one Ge dot per Si mesa. It is shown that the trench depth and the mesa profile strongly affect the dot size and its coincidence with the initial regular surface network. Anomalous GIXRD measurements are performed to highlight the Ge elastic relaxation and intermixing during heteroepitaxial growth. We report a significant modification in the stress state of Ge dots as a function of thermal annealing after growth.     

Photoluminescence of patterned arrays of vertically stacked InAs/GaAs quantum dots

We report on photoluminescence measurements of vertically stacked InAs/GaAs quantum dots grown by molecular beam epitaxy on focused ion beam patterned hole arrays with varying array spacing. Quantum dot emission at 1.24 eV was observed only on patterned regions, demonstrating preferential nucleation of optically active dots at desired locations and below the critical thickness for dot formation at these growth conditions. Photoluminescence measurements as a function of varying focused ion beam irradiated hole spacing showed that the quantum dot emission intensity increased with decreasing array periodicity, consistent with increasing dot density.     

磁场对非对称量子点中极化子性质的影响

采用线性组合算符和幺正变换方法研究磁场对非对称量子点中弱耦合磁极化子性质的影响.导出了非对称量子点中弱耦合磁极化子的振动频率、基态能量和基态结合能随量子点的横向和纵向有效受限长度、磁场和电子-声子耦合强度的变化关系.数值计算结果表明:非对称量子点中弱耦合磁极化子的基态能量和基态结合能随量子点的横向和纵向有效受限长度的增加而迅速增大.随回旋频率的增加而增大,随电子-声子耦合强度的增加而减小.     

Magnetic and optical properties of self-organized InMnAs quantum dots

Ten layers of self-assembled InMnAs quantum dots with InGaAs barrier were grown on high resistivity (1 0 0) p-type GaAs substrates by molecular beam epitaxy (MBE). The presence of ferromagnetic structure was confirmed in the InMnAs diluted magnetic quantum dots. The ten layers of self-assembled InMnAs quantum dots were found to be semiconducting, and have ferromagnetic ordering with a Curie temperature, T_C=80 K. It is likely that the ferromagnetic exchange coupling of sample with T_C=80 K is hole mediated resulting in Mn substituting In and is due to the bound magnetic polarons co-existing in the system. PL emission spectra of InMnAs samples grown at temperature of 275, 260 and 240 °C show that the interband transition peak centered at 1.31 eV coming from the InMnAs quantum dot blueshifts because of the strong confinement effects with increasing growth temperature.     

Fabrication and optical properties of quantum dots and wires

We describe photoluminescence measurements made on mesa geometry quantum dots and wires with exposed side walls fabricated by laterally patterning undoped GaAs/AlGaAs quantum wells using electron beam lithography and dry etching. At low temperature the photoluminescence efficiency of many but not all of the GaAs quantum dot arrays scales with the volume of quantum well material down to lateral dimensions of 50nm. This behaviour contrasts with that found in wires produced at the same time where the intensity falls off rapidly with decreasing wire width for dimensions below 500nm but is recovered by overgrowth with indium tin oxide, possibly as a result of strain. Narrow overgrown wires exhibit anisotropy in polarized excitation spectra which is discussed in relation to strain and lateral confinement effects.     

Growth of InGaAs-capped InAs quantum dots characterized by Atomic Force Microscope and Scanning Electron Microscope

Atomic force microscopy (AFM) is typically used to measure the quantum dot shape and density formed by lattice mismatched epitaxial growth such as InAs on GaAs. However, AFM images are distorted when two dots are situated in juxtaposition with a distance less than the AFM tip width. Scanning electron Microscope (SEM) is much better in distinguishing the dot density but not the dot height. Through these measurements of the growth of In_xGa_1-xAs cap layer on InAs quantum dots, it was observed that the InGaAs layer neither covered the InAs quantum dots and wetting layer uniformly nor 100% phase separates into InAs and GaAs grown on InAs quantum dots and wetting layer, respectively.     

红光InAlAs量子点的结构和光学性质

利用ＭＢＥ方法在（００１）衬底上成功地生长密度大、尺寸小、发红光的ＩｎＡｌＡｓ／ＡｌＧａＡｓ量子点结构。通过原子力显微镜观察表明,ＩｎＡｌＡｓ量子的密度和大小都随覆盖厚度的增加而增大;发现Ａｌ原子的表面迁移率决定ＩｎＡｌＡｓ量子点的形貌,光荧光谱证实了量子点的发光峰值在红光范围,并结合形貌的统计得到了量子点的发光峰展宽主要昌受量子点的横向尺寸影响。