CI在Si和Ge(111)面上的化学吸附

考虑了Si(111)和Ge(111)面吸附Cl的几何构形,本文采用集团模型,用电荷自洽的EHMO方法,对Si(111)和Ge(111)面,分别用能量极小的原则,确定了Cl的化学吸附位置。计算结果表明,对于Si(111)面,Cl是在顶位被吸附,形成共价结合,与实验结果一致。对于Ge(111)面,计算表明在顶位和三度开位上都能吸附Cl,与以前结论有一些不同,但本文认为偏振光电子谱的实验结果并不能完全排除Cl在Ge(111)面上顶位吸附的可能性。希望有其他实验能对Cl在Ge(111)面上的吸附作进一步的观察。此外,还计算了Cl在Si(111)面顶位上的吸附和它在Ge(111)面三度开位上的吸附时的状态密度,和实验结果进行了比较,相符甚好。 关键词：     

Ⅶ族元素在Si(111)和Ge(111)表面上的吸附

本文用原子集团模型和电荷自洽的EHT方法研究了Ⅶ族元素在Si(111)和Ge(111)表面上的化学吸附。利用能量极小的原则确定了各元素的化学吸附构型。对于Cl,在这两个表面均是顶位吸附。对于Ⅰ,都呈三度空位吸附。对Br,顶位及三度空位吸附均能发生,但是在Si(111)表面顶位吸附要优于三度空位,而在Ge(111)表面则三度空位吸附优于顶位。最后对Ⅶ族元素原子在这两种表面的吸附行为作了讨论,并与实验作了比较。 关键词：     

金属铝在半导体表面的吸附

本文采用集团模型,用自洽的EHT方法计算金属Al在Si(111)和GaAs(110)面上吸附的稳定的几何构型和电子态,结果表明,Al在Si(111)面的三度开位上的离子吸附比顶位的共价吸附更稳定,态密度与实验符合也更好,Al吸附在GaAs(110)面上,将取代表面Ga原子,形成AlAs,此时GaAs(110)面将恢复到不弛豫的理想位置。 关键词：     

用总能量密度泛函集团方法研究I/Si(111)及I/Ge(111)表面吸附

本文中用自洽总能量密度泛函集团方法研究了Ⅶ族的Ⅰ在Si(111)和Ge(111)表面的吸附。分别采用了两种集团模型来模拟顶位和三度位构型,用总能量极小原理确定了吸附的最佳构型和吸附能量,得到顶位比三度位吸附更为稳定的结果,与SEXAFS实验结果一致。本文还计算了Ⅶ族元素F,Cl,Br,I在Si(111)顶位吸附的状态密度,讨论了这系列DOS的变化情况,并与实验或其他理论结果进行了比较,最后还讨论了半经验EHT方法的适用性及限制。 关键词：     

Cluster model approach for electronic structure of Si and Ge(111) and GaAs(110) surfaces

For the purpose of exploring how realistic a cluster model can be for semiconductor surfaces, extended Huckel theory calculations are performed on clusters modeling Si and Ge(111) and GaAs(110) surfaces as prototypes. Boundary conditions of the clusters are devised to be reduced. The ideal, relaxed, and reconstructed Si and Ge(111) surfaces are dealt with. Hydrogen chemisorbed (111) clusters of Si and Ge are also investigated as prototypes of chemisorption systems. Some comparison of the results with finite slab calculations and experiments is presented. The cluster-size dependence of the calculated energy levels, local densities of states, and charge distributions is examined for Si and Ge(111) clusters. It is found that a 45-atom cluster which has seven layers along the [111] direction is large enough to identify basic surface states and study the hydrogen chemisorption on Si and Ge(111) surfaces. Also, it is presented that surface states on the clean Si and Ge(111) clusters exist independent of relaxation. Further, the calculation for the relaxed GaAs(110) cluster gives the empty and filled dangling-orbital surface states comparable to experimental data and results of finite slab calculations. The cluster approach is concluded to be a highly useful and economical one for semiconductor surface problems.     

Ge/Si(111)与Si/Ge(111)体系的生长特性与表面再构研究

本文利用RHEED和AES对Ge/Si(111)和Si/Ge(111)体系的生长特性与表面再构进行了研究。由此提出了其生长模式,并讨论了应力对生长特性、界面特性和表面再构的作用。     

Surface structure of GaAs(211)

The atomic structures of the two inequivalent (211) surfaces of GaAs have been investigated by LEED. Both surfaces, prepared by etching and heat-cleaning or ion-sputtering and annealing, are unstable and develop large (110) facets which exhibit the atomic geometry of the (110) GaAs surface. These facets entirely cover the surface. Three sets of facets, making 30°, 30° and 54° angles with the (211) plane, are detected on one surface. Only two sets, making 30° angles with the (211) plane, are detected on the other. The reasons for this difference are not understood at this time. The LEED study of Si(211) and Ge(211) shows that the Si surface is flat whereas the Ge surface exhibits reconstructed (311) facets. The structural difference between the (211) surfaces of GaAs and Ge and the facetting of the compound are invoked to explain the problems encountered in the MBE growth of GaAs on Ge(211).     

Si(111)分子束外延生长时RHEED强度振荡的观察

本文报道用反射式高能电子衍射的强度振荡测量来观察Si(111)衬底上分子束外延的生长行为,观察到了双原子层的振荡模式。振荡的衰减和恢复特性不同于Si(100)衬底上的生长行为,而同GaAs分子束外延时的特性非常相似。 关键词：     

用RHEED强度振荡锁相外延控制Ge/Si超晶格的生长

观察了Ge,Ge/Si交替外延时的反射式高能电子衍射(RHEED)强度振荡现象,并由此研究了Si(100)和Si(111)衬底上分子束外延Ge,Ge/Si超薄叠层的生长行为和生长特性。利用RHEED强度振荡,锁相控制生长了Ge(2ML)/Si(2ML),Ge(4ML)/Si(4ML)超薄超晶格。 关键词：     

Theoretical investigations of the (110) interface between the full Heusler alloys and GaAs

The ab initio calculations of the electronic structure and magnetic properties of the (110) interface between Co₂YZ (Y = Cr or Mn and Z = Al, Si, or Ge) and GaAs are carried out by means of the density functional theory depending on the contact configuration. It is revealed that two of four possible atomic interface configurations have high spin polarization. For Co₂MnSi/GaAs(110), one of the contacts has almost 100% spin polarization. Calculations of the adhesion energy on the interfaces allow the most stable contacts to be established.     

Growth and properties of GaAs and GaN films and low-dimensional GaAs/QWsInGaAs structures on Si substrates with a Ge buffer layer

The conditions for producing mirror-smooth Ge buffer layers of uniform size on Si(100) and Si(111) substrates by means of hot wire chemical vapor deposition (HW-CVD) at a low temperature (350°C) are determined. Single-crystal GaN and GaAs films and low-dimensional GaAs/QWInGaAs/ GaAs/QWInGaAs/GaAs/Ge/Si structures of uniform smoothness are obtained via MOVPE at reduced pressures. Their quantum wells are found to be characterized by intense photoluminescence comparable in intensity to that produced on GaAs substrates.     

应变(Ge)5/(Si)5超晶格的光学增益

本文采用具有驰豫展宽的半导体激光器密度矩阵理论计算了(Ge)5/(Si)5超晶格的线性光增益和异质结激光器的国值电流密度,从理论上定量地比较了(Ge)5/(Si)5超晶格和GaAs体材料的线性光增益和阈值电流密度。     

有源层掺杂剂对Ga1-xAlxAs/GaAs双异质结发光管特性的影响

本文研究了由液相外延技术生长的GaAIAs/GaAs双异质结材料制成的发光管,有源层掺杂剂对器件特性的影响结果表明,器件结构和器件制作工艺相同的GaAIAs/GaAs发光管,有源层掺Si可获得较大的光输出功率,而频响特性<15MHz,波长在8700Å以上;对有源层掺Ge器件,光输出功率低于掺Si器件,而频响特性则>15MHz,波长可控制在8200Å~8500Å.深能级测量表明二者有不同的深能级位置,对掺Si(氧沾污)器件,Ec-ET≈0.29eV,而掺Ge器件ET-Ev≈0.42eV.两种掺杂剂对有源层暗缺陷的影响尚无明显区别.     

Atomic and electronic structure of group-IV adsorbates on the GaAs(0 0 1)-(1 × 2) surface

Ab initio calculations, based on pseudopotentials and density functional theory, have been performed to investigate the atomic and electronic structure of the group-IV adsorbates (C, Si, Ge, Sn, and Pb) on the GaAs(0 0 1)-(1 × 2) surface considered in two different models: (i) non-segregated Ga-IV-capped structure and (ii) segregated structure in which the group-IV atoms occupying the second layer while the As atom floats to the surface. The non-segregated structure is energetically more favorable than the segregated structure for Sn and Pb, whereas it is the other way around for C, Si, and Ge.     

Recent Progress in Mid- and Far-Infrared Semiconductor Detectors

The recent developments of semiconductor infrared detectors in extending the wavelength coverage and improving the focal plane array (FPA) performance are reviewed. The emphasis is on the GeSi/Si heterojunction infrared photoemission detectors (HIPs), GaAs/AlGaAs quantum well infrared photodetecots (QWIPs), Si, Ge and GaAs blocked impurity band detectors (BIBS), and Si and GaAs homojunction interfacial work-function internal photo-emission (HIWIP) far-infrared (FIR) detectors. The advantages, current status, and potential limitations of these infrared detectors have also been discussed.     

Hydrogen chemisorption on the 100 (2 × 1) surfaces of Si and Ge

This paper combines a theoretical study of the Si(100) surface having a monolayer of atomic hydrogen chemisorbed to it with an experimental study of the analogous Ge(100) and Ge(110) surfaces. In the theoretical work the underlying (100) silicon surface is taken to be reconstructed according to the Schlier-Farnsworth-Levine pairing model with the hydrogen located on the unfilled tetrahedral bonds of this structure. Self-consistent calculations of the electronic potential, charge density, spectrum, and occupied surface density of states are carried out. The force on the hydrogen atoms is then calculated using the Hellman-Feynman theorem. This force is found to be close to zero, confirming that the hydrogen atoms are indeed at the equilibrium position for the chosen silicon geometry. Features in the calculated photoemission spectrum for the Si(100) 2 × 1 : H surface are discussed in terms of related features in the photoemission spectrum of Si(111) : H, but are found not to agree with the previously measured photoemission spectrum of Si(100) 2 × 1 : H. Measured photoemission and ion-neutralization spectra for Ge(100) 2 × 1 : H agree in their major features with what is calculated for Si(100) 2 × 1 : H, however, suggesting that the Ge(100) 2 × 1 : H surface is reconstricted according to the pairing model. Similarly, measured spectra for clean Ge(100) 2 × 1 agree with calculations for the row dimerized Si(100) surface.     

Electronic states of (2 × 1) and (1 × 1) (111) surfaces of Ge,Si, diamond,GaAs and Ge on Si

The “dangling-bond” surface state dispersion curves, E(k), have been calculated for the (2 × 1) and (1× 1) (111) surfaces of Ge, Si, and diamond, for (1 × 1) GaAs, and for (2 × 1) Ge on Si. The calculations employ the sp³s1 empirical tight-binding model of Vogl et al. and the atomic relaxation of Feder et al. The surface state band gaps are in good agreement with optical-absorption and electron-energy-loss measurements for Ge and Si. For the assumed epitaxial geometry, Ge on Si is predicted to shift the dangling-bond states downward by ≈0.1 to 0.4 eV.     

GaAs(111)表面硅烯、锗烯的几何及电子性质研究

基于密度泛函理论的第一性原理计算方法, 系统研究了硅烯、锗烯在GaAs(111) 表面的几何及电子结构. 研究发现, 硅烯、锗烯均可在As-中断和Ga-中断的GaAs(111) 表面稳定存在, 并呈现蜂窝状六角几何构型. 形成能计算结果证明了其实验制备的可行性. 同时发现硅烯、锗烯与GaAs表面存在共价键作用, 这破坏了其Dirac电子性质. 进一步探索了利用氢插层恢复硅烯、锗烯Dirac电子性质的方法. 发现该方法可使As-中断面上硅烯、锗烯的Dirac电子性质得到很好恢复, 而在Ga-中断面上的效果不够理想. 此外, 基于原子轨道成键和杂化理论揭示了GaAs表面硅烯、锗烯能带变化的物理机理. 研究结果为硅烯、锗烯在半导体基底上的制备及应用奠定了理论基础.     

Si衬底上分子束外延Ge,Si时的反射式高能电子衍射强度振荡观察

本文观察了在Si(100)和Si(111)衬底上分子束外延Si,Ge时的反射式高能电子衍射(RHEED)强度振荡现象。其振荡特性表明,外延一定厚度的缓冲层可以改善表面的平整性,较慢的生长速率或中断生长一段时间有利于外延膜晶体质量的提高。Si(100)上外延Si或Ge时,沿[100]和[110]方位观测到的振荡特性均为单原子模式,起因于表面存在双畴(2×1)再构;而Si(111)上外延Ge时,[112]方位观测到的振荡为双原子层模式,但在[110]方位观察到不均匀周期的强度振荡行为。两种衬底上保持RHEED     

A density-functional theory investigation on desorption of O2 on Sn（111） and its comparison with initial oxidation on the X（111） （X=Si,Ge, Sn,Pb） surfaces

<正>The first-principles calculations are performed to investigate the adsorption of O₂ molecules on an Sn（111） 2×2 surface.The chemisorbed adsorption precursor states for O₂ are identified to be along the parallel and vertical channels, and the surface reconstructions of Sn（lll） induced by oxygen adsorption are studied.Based on this,the adsorption behaviours of O₂ on X（111）（X=Si,Ge,Sn,Pb） surfaces are analysed,and the most stable adsorption channels of O₂ on X（111）（X=Si,Ge,Sn,Pb） are identified.The surface reconstructions and electron distributions along the most stable adsorption channels are discussed and compared.The results show that the O₂ adsorption ability declines gradually and the amount of charge transferred decreases with the enhancement of metallicity.